公开(公告)号：US09252024B2

公开(公告)日：2016-02-02

申请号：US13897327

申请日：2013-05-17

Applicant: Applied Materials, Inc.

Inventor： Hyman Lam ,  Nicholas R. Denny ,  Joseph AuBuchon ,  Mei Chang

IPC: C23C16/00 ,  H01L21/3205 ,  C23C16/48 ,  H01L21/67 ,  H01L21/768

CPC classification number: H01L21/32051 ,  C23C16/482 ,  H01L21/67115 ,  H01L21/76862

Abstract: Described are apparatus and methods for processing semiconductor wafers so that a film can be deposited on the wafer and the film can be UV treated without the need to move the wafer to a separate location for treatment. The apparatus and methods include a window which is isolated from the reactive gases by a flow of an inert gas.

Abstract translation: 描述了用于处理半导体晶片的装置和方法，使得膜可以沉积在晶片上，并且膜可以被UV处理，而不需要将晶片移动到单独的处理位置。 该装置和方法包括通过惰性气体流与活性气体隔离的窗口。

公开(公告)号：US09627185B2

公开(公告)日：2017-04-18

申请号：US14557671

申请日：2014-12-02

Applicant: APPLIED MATERIALS, INC.

Inventor： Joel M. Huston ,  Nicholas R. Denny ,  Chien-Teh Kao

IPC: B08B7/00 ,  H01J37/32

CPC classification number: H01J37/32862 ,  H01J37/32449 ,  H01J37/32834

Abstract: Methods and apparatus for in-situ cleaning of substrate processing chambers are provided herein. A substrate processing chamber may include a chamber body enclosing an inner volume; a chamber lid removably coupled to the chamber body and including a first flow channel fluidly coupled to the inner volume to selectively open or seal the inner volume to or from a first outlet; a chamber floor including a second flow channel fluidly coupled to the inner volume to selectively open or seal the inner volume to or from a first inlet; and a pump ring disposed in and in fluid communication with the inner volume, the pump ring comprising an upper chamber fluidly coupled to a lower chamber, and a second outlet fluidly coupled to the lower chamber to selectively open or seal the inner volume to or from the second outlet.