公开(公告)号：US20220084845A1

公开(公告)日：2022-03-17

申请号：US17023987

申请日：2020-09-17

Applicant: Applied Materials, Inc.

Inventor： Samartha Subramanya ,  Dmitry Lubomirsky ,  Mehmet Tugrul Samir ,  Lala Zhu ,  Martin Y. Choy ,  Son T. Nguyen ,  Pranav Gopal

IPC: H01L21/67 ,  B05B1/18 ,  C23C16/455 ,  H01L21/3065 ,  H01J37/305

Abstract: Exemplary semiconductor processing chambers may include showerhead. The chambers may include a pedestal configured to support a semiconductor substrate, where the showerhead and pedestal at least partially define a processing region within the semiconductor chamber. The chamber may include a spacer characterized by a first surface in contact with the showerhead and a second surface opposite the first surface. The chamber may include a pumping liner characterized by a first surface in contact with the spacer and a second surface opposite the first surface. The pumping liner may define a plurality of apertures within the first surface of the pumping liner.

公开(公告)号：US11901161B2

公开(公告)日：2024-02-13

申请号：US17824977

申请日：2022-05-26

Applicant: APPLIED MATERIALS, INC.

Inventor： Tae Seung Cho ,  Saravana Kumar Natarajan ,  Kenneth D. Schatz ,  Dmitry Lubomirsky ,  Samartha Subramanya

IPC: H01J37/32 ,  H05H1/46

CPC classification number: H01J37/32357 ,  H01J37/32128 ,  H01J37/32596 ,  H05H1/46

Abstract: Methods and apparatus for reducing particle generation in a remote plasma source (RPS) include an RPS having a first plasma source with a first electrode and a second electrode, wherein the first electrode and the second electrode are symmetrical with hollow cavities configured to induce a hollow cathode effect within the hollow cavities, and wherein the RPS provides radicals or ions into the processing volume, and a radio frequency (RF) power source configured to provide a symmetrical driving waveform on the first electrode and the second electrode to produce an anodic cycle and a cathodic cycle of the RPS, wherein the anodic cycle and the cathodic cycle operate in a hollow cathode effect mode.

公开(公告)号：US11373845B2

公开(公告)日：2022-06-28

申请号：US16894002

申请日：2020-06-05

Applicant: APPLIED MATERIALS, INC.

Inventor： Tae Seung Cho ,  Saravana Kumar Natarajan ,  Kenneth D. Schatz ,  Dmitry Lubomirsky ,  Samartha Subramanya

IPC: H01J37/32 ,  H05H1/46

Abstract: Methods and apparatus for reducing particle generation in a remote plasma source (RPS) include an RPS having a first plasma source with a first electrode and a second electrode, wherein the first electrode and the second electrode are symmetrical with hollow cavities configured to induce a hollow cathode effect within the hollow cavities, and wherein the RPS provides radicals or ions into the processing volume, and a radio frequency (RF) power source configured to provide a symmetrical driving waveform on the first electrode and the second electrode to produce an anodic cycle and a cathodic cycle of the RPS, wherein the anodic cycle and the cathodic cycle operate in a hollow cathode effect mode.