公开(公告)号：US20160163511A1

公开(公告)日：2016-06-09

申请号：US14829662

申请日：2015-08-19

Applicant: Applied Materials, Inc.

Inventor： Andrew NGUYEN ,  Tza-Jing GUNG ,  Haitao WANG ,  Maxim Mikhailovich NOGINOV ,  Reza SADJADI ,  Chunlei ZHANG ,  Xue YANG

IPC: H01J37/32 ,  H01L21/3065 ,  C23C14/22 ,  H01L21/02 ,  C23C16/50 ,  C23C16/455

CPC classification number: H01L21/3065 ,  C23C14/22 ,  C23C16/45565 ,  C23C16/46 ,  C23C16/50 ,  C23C16/505 ,  H01J37/32082 ,  H01J37/32669 ,  H01L21/02274

Abstract: Implementations described herein provide a magnetic ring which enables both lateral and azimuthal tuning of the plasma in a processing chamber. In one embodiment, the magnetic ring has a body. The body has a top surface and a bottom surface, and a plurality of magnets are disposed on the bottom surface of the body.

Abstract translation: 本文所述的实施方案提供一种能够在处理室中进行等离子体的横向和方位调谐的磁环。 在一个实施例中，磁环具有主体。 主体具有顶表面和底表面，并且多个磁体设置在主体的底表面上。