公开(公告)号：US20240178022A1

公开(公告)日：2024-05-30

申请号：US18071400

申请日：2022-11-29

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Ofer Dudovitch

IPC: H01L21/67 ,  B65G47/90 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01L21/677 ,  H01L21/687

CPC classification number: H01L21/67253 ,  B65G47/90 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01L21/67766 ,  H01L21/68707 ,  H01J2237/201 ,  H01J2237/20278 ,  H01J2237/24578 ,  H01J2237/31749

Abstract: A method of operating a substrate processing system that includes a substrate processing chamber, a substrate storage container and robot configured to select a substrate from the substrate storage container and transfer a selected substrate into the substrate processing chamber, the method comprising: detecting a lower edge and upper edge of the substrate; calculating a thickness of the substrate based on the detected lower and upper edges of the substrate; comparing the calculated thickness of the substrate to an expected thickness of the substrate; and (i) if the calculated thickness matches the expected thickness, controlling the robot to transfer the substrate into the substrate processing chamber, (ii) if the calculated thickness does not match the expected thickness, generating an alert indicating a thickness mismatch.

公开(公告)号：US20240290572A1

公开(公告)日：2024-08-29

申请号：US18115689

申请日：2023-02-28

Applicant: Applied Materials Israel Ltd.

Inventor： Ofer Dudovitch ,  Erez Admoni

IPC: H01J37/20 ,  H01L21/683

CPC classification number: H01J37/20 ,  H01L21/6833 ,  H01J2237/2007 ,  H01J2237/20235

Abstract: A chuck that supports a sample in a processing chamber and comprises: a support plate formed from a dielectric material, the support plate including an upper planar support surface sized and shaped to retain a substrate disposed on the support plate; one or more electrodes disposed within the support plate proximate the upper planar support surface; a plurality of lift pin holes formed completely through the support plate; a plurality of stub cavities formed within the support plate, each stub cavity having an opening at the upper planar support surface; a plurality of retractable stubs corresponding in number to the plurality of stub cavities, wherein each retractable stub is disposed in a unique one of the stub cavities; and a stub lift mechanism operable to move each retractable stub in the plurality of stubs between a down position and an up position, wherein in the down position a distal end of the retractable stub is disposed within its respective stub cavity and recessed below the upper planar support surface and the up position the distal end of the retractable stub protrudes above the upper planar support surface through the stub cavity opening.

公开(公告)号：US20240177962A1

公开(公告)日：2024-05-30

申请号：US18072451

申请日：2022-11-30

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Ofer Dudovitch ,  Ido Ben Noon ,  Efi Zertser

IPC: H01J37/20 ,  G01N23/2251 ,  H01J37/18 ,  H01J37/21 ,  H01J37/28

CPC classification number: H01J37/20 ,  G01N23/2251 ,  H01J37/18 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/24578

Abstract: A system for processing a sample comprising: a vacuum chamber having a window formed along one of its walls; a sample support configured to hold a sample within the vacuum chamber during a sample processing operation and move the substrate within the vacuum chamber along the X, Y and Z axes; a charged particle beam column configured to direct a charged particle beam into the vacuum chamber and focus the beam to collide with a region of interest on the sample; an optical distance measurement device configured to generate and direct electromagnetic radiation into the vacuum chamber through the window, detect photons from the electromagnetic radiation reflected off the sample, and determine a working distance between the sample and charged particle column based on the generated electromagnetic radiation and the detected photons; and one or more mirrors disposed within the vacuum chamber and positioned to direct the electromagnetic radiation generated by the optical distance measurement system to a measured location on the sample that is in close proximity to the region of interest, the one or more mirrors comprising at least one mirror positioned directly under a portion of the charged particle column.