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1.发明授权Lithographic apparatus and a subtrate table for exciting a shockwave in a substrate 失效平版印刷设备和用于激发基板中的冲击波的减号表公开(公告)号：US07508494B2
公开(公告)日：2009-03-24
申请号：US11643952
申请日：2006-12-22
申请人： Arno Jan Bleeker , Dominicus Jacobus Petrus Adrianus Franken , Johannes Hendrikus Gertrudis Franssen , Johannes Theodorus Guillielmus Maria Van De Ven , Michiel Puyt , Teun Peterus Adrianus De Wilt
发明人： Arno Jan Bleeker , Dominicus Jacobus Petrus Adrianus Franken , Johannes Hendrikus Gertrudis Franssen , Johannes Theodorus Guillielmus Maria Van De Ven , Michiel Puyt , Teun Peterus Adrianus De Wilt
CPC分类号： G03F7/707 , H01L21/683
摘要： A lithographic apparatus includes an illumination system constructed and arranged to condition a radiation beam, and a support constructed and arranged to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed and arranged to hold a substrate, and a projection system constructed and arranged to project the patterned radiation beam onto a target portion of the substrate. The substrate table includes a plurality of projections constructed and arranged to support corresponding parts of a bottom section of the substrate, and an actuator constructed and arranged to excite a shockwave in the substrate.
摘要翻译： 光刻设备包括构造和布置成调节辐射束的照明系统，以及构造和布置成支撑图案形成装置的支撑件。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 所述装置还包括被构造和布置成保持基板的基板台，以及构造和布置成将图案化的辐射束投影到基板的目标部分上的投影系统。 衬底台包括多个突起，其被构造和布置成支撑衬底的底部的对应部分，以及构造和布置成激发衬底中的冲击波的致动器。
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2.发明申请公开(公告)号：US20080151212A1
公开(公告)日：2008-06-26
申请号：US11643952
申请日：2006-12-22
申请人： Arno Jan Bleeker , Dominicus Jacobus Petrus Adrianus Franken , Johannes Hendrikus Gertrudis Franssen , Johannes Theodorus Guillielmus Maria Van De Ven , Michiel Puyt , Teun Peterus Adrianus De Wilt
发明人： Arno Jan Bleeker , Dominicus Jacobus Petrus Adrianus Franken , Johannes Hendrikus Gertrudis Franssen , Johannes Theodorus Guillielmus Maria Van De Ven , Michiel Puyt , Teun Peterus Adrianus De Wilt
CPC分类号： G03F7/707 , H01L21/683
摘要： A lithographic apparatus includes an illumination system constructed and arranged to condition a radiation beam, and a support constructed and arranged to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed and arranged to hold a substrate, and a projection system constructed and arranged to project the patterned radiation beam onto a target portion of the substrate. The substrate table includes a plurality of projections constructed and arranged to support corresponding parts of a bottom section of the substrate, and an actuator constructed and arranged to excite a shockwave in the substrate.
摘要翻译： 光刻设备包括构造和布置成调节辐射束的照明系统，以及构造和布置成支撑图案形成装置的支撑件。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 所述装置还包括被构造和布置成保持基板的基板台，以及构造和布置成将图案化的辐射束投影到基板的目标部分上的投影系统。 衬底台包括多个突起，其被构造和布置成支撑衬底的底部的对应部分，以及构造和布置成激发衬底中的冲击波的致动器。
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3.发明申请Lithographic Apparatus, Substrate Table, and Method for Enhancing Substrate Release Properties 有权平版印刷设备，基板和增强基材释放性能的方法公开(公告)号：US20100296073A1
公开(公告)日：2010-11-25
申请号：US12856106
申请日：2010-08-13
申请人： Michiel PUYT , Arno Jan Bleeker , Johannes Hendrikus Gertrudis Franssen , Rene Theodorus Petrus Compen , Johannes Theodorus Guillielmus Maria Van De Ven , Egbert Dirk Stam , Rudolf Hartmut Fischer , Edwin Robert Martin Gelinck
发明人： Michiel PUYT , Arno Jan Bleeker , Johannes Hendrikus Gertrudis Franssen , Rene Theodorus Petrus Compen , Johannes Theodorus Guillielmus Maria Van De Ven , Egbert Dirk Stam , Rudolf Hartmut Fischer , Edwin Robert Martin Gelinck
IPC分类号： G03B27/58
CPC分类号： G03F7/707 , G03F7/70708 , H01L21/6875 , H01L21/68757
摘要： A lithographic apparatus includes an illumination system constructed and arranged to condition a radiation beam, and a support constructed and arranged to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed and arranged to hold a substrate, and a projection system constructed and arranged to project the patterned radiation beam onto a target portion of the substrate. The substrate table includes a chuck having a plurality of protrusions constructed and arranged to support corresponding parts of a bottom surface of a wafer. The top surface of at least one of the protrusions includes a plurality of elements that define a reduced contact area between the substrate and the top surface of the protrusion.
摘要翻译： 光刻设备包括构造和布置成调节辐射束的照明系统，以及构造和布置成支撑图案形成装置的支撑件。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 所述装置还包括被构造和布置成保持基板的基板台，以及构造和布置成将图案化的辐射束投影到基板的目标部分上的投影系统。 衬底台包括具有多个突出部的卡盘，所述多个突起被构造和布置成支撑晶片底面的对应部分。 至少一个突起的顶表面包括多个元件，其限定了基板和突起的顶表面之间的减小的接触面积。
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4.发明授权Lithographic apparatus, substrate table, and method for enhancing substrate release properties 有权平版印刷装置，基板台，以及增强基板剥离性能的方法公开(公告)号：US07791708B2
公开(公告)日：2010-09-07
申请号：US11645812
申请日：2006-12-27
申请人： Michiel Puyt , Arno Jan Bleeker , Johannes Hendrikus Gertrudis Franssen , Rene Theodorus Petrus Compen , Johannes Theodorus Guillielmus Maria Van De Ven , Egbert Dirk Stam , Rudolf Hartmut Fischer , Edwin Robert Martin Gelinck
发明人： Michiel Puyt , Arno Jan Bleeker , Johannes Hendrikus Gertrudis Franssen , Rene Theodorus Petrus Compen , Johannes Theodorus Guillielmus Maria Van De Ven , Egbert Dirk Stam , Rudolf Hartmut Fischer , Edwin Robert Martin Gelinck
CPC分类号： G03F7/707 , G03F7/70708 , H01L21/6875 , H01L21/68757
摘要： A lithographic apparatus includes an illumination system constructed and arranged to condition a radiation beam, and a support constructed and arranged to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed and arranged to hold a substrate, and a projection system constructed and arranged to project the patterned radiation beam onto a target portion of the substrate. The substrate table includes a chuck having a plurality of protrusions constructed and arranged to support corresponding parts of a bottom surface of a wafer. The top surface of at least one of the protrusions includes a plurality of elements that define a reduced contact area between the substrate and the top surface of the protrusion.
摘要翻译： 光刻设备包括构造和布置成调节辐射束的照明系统，以及构造和布置成支撑图案形成装置的支撑件。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 所述装置还包括被构造和布置成保持基板的基板台，以及构造和布置成将图案化的辐射束投影到基板的目标部分上的投影系统。 衬底台包括具有多个突出部的卡盘，所述多个突起被构造和布置成支撑晶片底面的对应部分。 至少一个突起的顶表面包括多个元件，其限定了基板和突起的顶表面之间的减小的接触面积。
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5.发明申请Lithographic apparatus, substrate table, and method for enhancing substrate release properties 有权平版印刷装置，基板台，以及增强基板剥离性能的方法公开(公告)号：US20080158538A1
公开(公告)日：2008-07-03
申请号：US11645812
申请日：2006-12-27
申请人： Michiel Puyt , Arno Jan Bleeker , Johannes Hendrikus Gertrudis Franssen , Rene Theodorus Petrus Compen , Johannes Theodorus Guillielmus Maria Van De Ven , Egbert Dirk Stam , Rudolf Hartmut Fischer , Edwin Robert Martin Gelinck
发明人： Michiel Puyt , Arno Jan Bleeker , Johannes Hendrikus Gertrudis Franssen , Rene Theodorus Petrus Compen , Johannes Theodorus Guillielmus Maria Van De Ven , Egbert Dirk Stam , Rudolf Hartmut Fischer , Edwin Robert Martin Gelinck
IPC分类号： G03B27/58
CPC分类号： G03F7/707 , G03F7/70708 , H01L21/6875 , H01L21/68757
摘要： A lithographic apparatus includes an illumination system constructed and arranged to condition a radiation beam, and a support constructed and arranged to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed and arranged to hold a substrate, and a projection system constructed and arranged to project the patterned radiation beam onto a target portion of the substrate. The substrate table includes a chuck having a plurality of protrusions constructed and arranged to support corresponding parts of a bottom surface of a wafer. The top surface of at least one of the protrusions includes a plurality of elements that define a reduced contact area between the substrate and the top surface of the protrusion.
摘要翻译： 光刻设备包括构造和布置成调节辐射束的照明系统，以及构造和布置成支撑图案形成装置的支撑件。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 所述装置还包括被构造和布置成保持基板的基板台，以及构造和布置成将图案化的辐射束投影到基板的目标部分上的投影系统。 衬底台包括具有多个突出部的卡盘，所述多个突起被构造和布置成支撑晶片底面的对应部分。 至少一个突起的顶表面包括多个元件，其限定了基板和突起的顶表面之间的减小的接触面积。
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6.发明授权Method for performing a software process, controller and lithographic apparatus 有权用于执行软件处理，控制器和光刻设备的方法公开(公告)号：US08112752B2
公开(公告)日：2012-02-07
申请号：US11175035
申请日：2005-07-06
CPC分类号： G06F9/4887 , G06F9/4825
摘要： A method for performing a software process, such as a real time software process, is disclosed, the process having a plurality of tasks, the method including starting a task of the plurality of tasks of the process, monitoring a progress of the started task, comparing the progress with a desired progress, if the progress does not meet the desired progress, skipping at least a part of a task of the plurality of tasks, and performing the process making use of an outcome of the tasks which have been completed. The monitoring of the progress may be performed upon completion of the task or at a predetermined moment in time.
摘要翻译： 公开了一种用于执行诸如实时软件过程的软件过程的方法，该过程具有多个任务，该方法包括启动该过程的多个任务的任务，监视所启动的任务的进度， 将进度与期望的进度进行比较，如果进展不符合期望的进度，则跳过多个任务的任务的至少一部分，并且执行利用已经完成的任务的结果的处理。 可以在完成任务时或在预定的时间点执行进度的监视。
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