公开(公告)号：US20100296073A1

公开(公告)日：2010-11-25

申请号：US12856106

申请日：2010-08-13

申请人： Michiel PUYT ,  Arno Jan Bleeker ,  Johannes Hendrikus Gertrudis Franssen ,  Rene Theodorus Petrus Compen ,  Johannes Theodorus Guillielmus Maria Van De Ven ,  Egbert Dirk Stam ,  Rudolf Hartmut Fischer ,  Edwin Robert Martin Gelinck

发明人： Michiel PUYT ,  Arno Jan Bleeker ,  Johannes Hendrikus Gertrudis Franssen ,  Rene Theodorus Petrus Compen ,  Johannes Theodorus Guillielmus Maria Van De Ven ,  Egbert Dirk Stam ,  Rudolf Hartmut Fischer ,  Edwin Robert Martin Gelinck

IPC分类号： G03B27/58

CPC分类号： G03F7/707 ,  G03F7/70708 ,  H01L21/6875 ,  H01L21/68757

摘要： A lithographic apparatus includes an illumination system constructed and arranged to condition a radiation beam, and a support constructed and arranged to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed and arranged to hold a substrate, and a projection system constructed and arranged to project the patterned radiation beam onto a target portion of the substrate. The substrate table includes a chuck having a plurality of protrusions constructed and arranged to support corresponding parts of a bottom surface of a wafer. The top surface of at least one of the protrusions includes a plurality of elements that define a reduced contact area between the substrate and the top surface of the protrusion.

摘要翻译： 光刻设备包括构造和布置成调节辐射束的照明系统，以及构造和布置成支撑图案形成装置的支撑件。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 所述装置还包括被构造和布置成保持基板的基板台，以及构造和布置成将图案化的辐射束投影到基板的目标部分上的投影系统。 衬底台包括具有多个突出部的卡盘，所述多个突起被构造和布置成支撑晶片底面的对应部分。 至少一个突起的顶表面包括多个元件，其限定了基板和突起的顶表面之间的减小的接触面积。

公开(公告)号：US07791708B2

公开(公告)日：2010-09-07

申请号：US11645812

申请日：2006-12-27

申请人： Michiel Puyt ,  Arno Jan Bleeker ,  Johannes Hendrikus Gertrudis Franssen ,  Rene Theodorus Petrus Compen ,  Johannes Theodorus Guillielmus Maria Van De Ven ,  Egbert Dirk Stam ,  Rudolf Hartmut Fischer ,  Edwin Robert Martin Gelinck

发明人： Michiel Puyt ,  Arno Jan Bleeker ,  Johannes Hendrikus Gertrudis Franssen ,  Rene Theodorus Petrus Compen ,  Johannes Theodorus Guillielmus Maria Van De Ven ,  Egbert Dirk Stam ,  Rudolf Hartmut Fischer ,  Edwin Robert Martin Gelinck

IPC分类号： G03B27/58 ,  G03B27/42 ,  G03B27/32 ,  B25B11/00

CPC分类号： G03F7/707 ,  G03F7/70708 ,  H01L21/6875 ,  H01L21/68757

摘要： A lithographic apparatus includes an illumination system constructed and arranged to condition a radiation beam, and a support constructed and arranged to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed and arranged to hold a substrate, and a projection system constructed and arranged to project the patterned radiation beam onto a target portion of the substrate. The substrate table includes a chuck having a plurality of protrusions constructed and arranged to support corresponding parts of a bottom surface of a wafer. The top surface of at least one of the protrusions includes a plurality of elements that define a reduced contact area between the substrate and the top surface of the protrusion.

摘要翻译： 光刻设备包括构造和布置成调节辐射束的照明系统，以及构造和布置成支撑图案形成装置的支撑件。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 所述装置还包括被构造和布置成保持基板的基板台，以及构造和布置成将图案化的辐射束投影到基板的目标部分上的投影系统。 衬底台包括具有多个突出部的卡盘，所述多个突起被构造和布置成支撑晶片底面的对应部分。 至少一个突起的顶表面包括多个元件，其限定了基板和突起的顶表面之间的减小的接触面积。

公开(公告)号：US20080158538A1

公开(公告)日：2008-07-03

申请号：US11645812

申请日：2006-12-27

申请人： Michiel Puyt ,  Arno Jan Bleeker ,  Johannes Hendrikus Gertrudis Franssen ,  Rene Theodorus Petrus Compen ,  Johannes Theodorus Guillielmus Maria Van De Ven ,  Egbert Dirk Stam ,  Rudolf Hartmut Fischer ,  Edwin Robert Martin Gelinck

发明人： Michiel Puyt ,  Arno Jan Bleeker ,  Johannes Hendrikus Gertrudis Franssen ,  Rene Theodorus Petrus Compen ,  Johannes Theodorus Guillielmus Maria Van De Ven ,  Egbert Dirk Stam ,  Rudolf Hartmut Fischer ,  Edwin Robert Martin Gelinck

IPC分类号： G03B27/58

CPC分类号： G03F7/707 ,  G03F7/70708 ,  H01L21/6875 ,  H01L21/68757

摘要： A lithographic apparatus includes an illumination system constructed and arranged to condition a radiation beam, and a support constructed and arranged to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed and arranged to hold a substrate, and a projection system constructed and arranged to project the patterned radiation beam onto a target portion of the substrate. The substrate table includes a chuck having a plurality of protrusions constructed and arranged to support corresponding parts of a bottom surface of a wafer. The top surface of at least one of the protrusions includes a plurality of elements that define a reduced contact area between the substrate and the top surface of the protrusion.

摘要翻译： 光刻设备包括构造和布置成调节辐射束的照明系统，以及构造和布置成支撑图案形成装置的支撑件。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 所述装置还包括被构造和布置成保持基板的基板台，以及构造和布置成将图案化的辐射束投影到基板的目标部分上的投影系统。 衬底台包括具有多个突出部的卡盘，所述多个突起被构造和布置成支撑晶片底面的对应部分。 至少一个突起的顶表面包括多个元件，其限定了基板和突起的顶表面之间的减小的接触面积。

公开(公告)号：US08792085B2

公开(公告)日：2014-07-29

申请号：US12856106

申请日：2010-08-13

申请人： Michiel Puyt ,  Arno Jan Bleeker ,  Rene Theodorus Petrus Compen ,  Rudolf Hartmut Fischer

发明人： Michiel Puyt ,  Arno Jan Bleeker ,  Rene Theodorus Petrus Compen ,  Rudolf Hartmut Fischer

IPC分类号： G03B27/58 ,  G03F7/20 ,  H01L21/687

CPC分类号： G03F7/707 ,  G03F7/70708 ,  H01L21/6875 ,  H01L21/68757

摘要： A lithographic apparatus includes an illumination system constructed and arranged to condition a radiation beam, and a support constructed and arranged to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed and arranged to hold a substrate, and a projection system constructed and arranged to project the patterned radiation beam onto a target portion of the substrate. The substrate table includes a chuck having a plurality of protrusions constructed and arranged to support corresponding parts of a bottom surface of a wafer. The top surface of at least one of the protrusions includes a plurality of elements that define a reduced contact area between the substrate and the top surface of the protrusion.

摘要翻译： 光刻设备包括构造和布置成调节辐射束的照明系统，以及构造和布置成支撑图案形成装置的支撑件。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 所述装置还包括被构造和布置成保持基板的基板台，以及构造和布置成将图案化的辐射束投影到基板的目标部分上的投影系统。 衬底台包括具有多个突出部的卡盘，所述多个突起被构造和布置成支撑晶片底面的对应部分。 至少一个突起的顶表面包括多个元件，其限定了基板和突起的顶表面之间的减小的接触面积。

公开(公告)号：US08384882B2

公开(公告)日：2013-02-26

申请号：US12580066

申请日：2009-10-15

申请人： Rene Theodorus Petrus Compen ,  Gerardus Petrus Matthijs Van Nunen ,  Martijn Houben ,  Marco Adrianus Peter Van Den Heuvel

发明人： Rene Theodorus Petrus Compen ,  Gerardus Petrus Matthijs Van Nunen ,  Martijn Houben ,  Marco Adrianus Peter Van Den Heuvel

IPC分类号： G03B27/32 ,  G03B27/58

CPC分类号： G03B27/58 ,  G03F7/70516 ,  G03F7/70691

摘要： A calibration method for calibrating an optimum take over height of a substrate in a lithographic apparatus between a substrate table and an ejector element moveable to load and unload the substrate from the substrate table, the method including clamping the substrate on one of the substrate table and ejector element; moving the ejector element between an unloaded state wherein the substrate is supported by the substrate table and a loaded state wherein the substrate is at least partly supported by the ejector element; determining a reference height of the ejector element at the moment that the weight of the substrate is at least partly taken over between the substrate table and the ejector element; and determining the optimum take over height for the ejector element from the determined reference height.

摘要翻译： 一种校准方法，用于校准光刻设备中的基板的最佳接管高度，该基板在基板台和顶板元件之间移动，可移动以从基板台装载和卸载基板，该方法包括将基板夹在基板台之一和 喷射元件 在所述衬底被所述衬底台支撑的卸载状态和所述衬底至少部分地被所述顶出器元件支撑的负载状态之间移动所述顶出器元件; 在衬底的重量至少部分地覆盖在衬底台和顶出器元件之间的时刻，确定顶出器元件的基准高度; 以及从所确定的参考高度确定所述喷射器元件的最佳接管高度。

公开(公告)号：US08086348B2

公开(公告)日：2011-12-27

申请号：US12248290

申请日：2008-10-09

申请人： Jozef Augustinus Maria Alberti ,  Gerardus Petrus Matthijs Van Nunen ,  Frans Erik Groensmit ,  Rene Theodorus Petrus Compen

发明人： Jozef Augustinus Maria Alberti ,  Gerardus Petrus Matthijs Van Nunen ,  Frans Erik Groensmit ,  Rene Theodorus Petrus Compen

IPC分类号： G06F7/00

CPC分类号： G03F7/70725 ,  G03F7/70633 ,  G03F7/70775 ,  G03F7/70783 ,  G03F9/7011 ,  H01L21/67265 ,  H01L21/67745

摘要： A method is provided for transferring a substrate from a first substrate holder, e.g., a pre-alignment unit, to a second substrate holder, e.g., a substrate table in a lithographic apparatus, by means of a transfer unit on the basis of transfer data available thereto. First, the substrate is provided on the first substrate holder. Subsequently, a position error of the substrate is measured, and positioning adjustment data are calculated based on the position error as measured. Then, the second substrate holder is moved relative to a reference position thereof in accordance with the positioning adjustment data. Finally, the substrate is transferred by means of the transfer unit from the first substrate holder to the second substrate holder in accordance with the transfer data, and placed on the second substrate holder as moved.

摘要翻译： 提供了一种用于将基板从第一基板保持器（例如，预对准单元）传送到第二基板保持器（例如光刻设备中的基板台）的方法，借助于基于转印数据的转印单元 可用。 首先，将基板设置在第一基板支架上。 随后，测量基板的位置误差，并根据所测量的位置误差来计算定位调整数据。 然后，第二基板支架根据定位调整数据相对于其基准位置移动。 最后，根据传送数据，将基板通过传送单元从第一基板保持器传送到第二基板保持器，并且移动时放置在第二基板保持器上。

公开(公告)号：US07050147B2

公开(公告)日：2006-05-23

申请号：US10886050

申请日：2004-07-08

申请人： Rene Theodorus Petrus Compen

发明人： Rene Theodorus Petrus Compen

IPC分类号： H01J21/27

CPC分类号： G03F7/707 ,  G03F7/70783 ,  G03F7/7095 ,  G03F7/70975

摘要： A lithographic projection apparatus is disclosed. The apparatus includes a beam production system configured to provide a beam of radiation, pattern the beam, and project the patterned beam onto a target portion of a substrate, and a support table for supporting an article so that a planar surface of the article lies in a predetermined plane transverse to a propagation direction of the projection beam. The support table has a support surface and an array of protrusions disposed on the support surface that are constructed and arranged to support the article. A position selective material surface melting device is configured to act on individual protrusions when the support table is operable in the apparatus, such that localized areas of an upper surface of the protrusion are melted and subsequently allowed to cool, thereby causing the localized areas to be raised with respect to the upper surface of the protrusion.

摘要翻译： 公开了一种光刻投影装置。 该装置包括：束生产系统，其被配置为提供辐射束，图案束，并将图案化束投影到基底的目标部分上;以及支撑台，用于支撑制品，使得制品的平坦表面位于 与投影光束的传播方向横切的预定平面。 支撑台具有支撑表面和布置在支撑表面上的突出物阵列，其构造和布置成支撑物品。 位置选择性材料表面熔化装置构造成当支撑台在装置中可操作时作用于单独的突起，使得突起的上表面的局部区域熔化并随后允许冷却，从而使局部区域成为 相对于突起的上表面凸起。

公开(公告)号：US09329497B2

公开(公告)日：2016-05-03

申请号：US13979278

申请日：2011-11-17

申请人： Bensely Albert ,  Rene Theodorus Petrus Compen

发明人： Bensely Albert ,  Rene Theodorus Petrus Compen

IPC分类号： G03F7/20 ,  H01L21/687 ,  C23C16/44 ,  C23F1/00

CPC分类号： G03F7/70716 ,  C23C16/44 ,  C23F1/00 ,  H01L21/6875

摘要： A substrate table comprising a base and a plurality of burls that project from the base, wherein an upper surface of the burls is provided with a multilayer coating.

摘要翻译： 一种基材台，其包括基部和从所述基部突出的多个毛刺，其中所述毛边的上表面设置有多层涂层。

公开(公告)号：US09019476B2

公开(公告)日：2015-04-28

申请号：US13114714

申请日：2011-05-24

申请人： Rene Theodorus Petrus Compen ,  Oleg Voznyi ,  Martijn Houben ,  Majid El Bouchaibi ,  Franciscus Johannes Maria Boekholt ,  Remko Wakker

发明人： Rene Theodorus Petrus Compen ,  Oleg Voznyi ,  Martijn Houben ,  Majid El Bouchaibi ,  Franciscus Johannes Maria Boekholt ,  Remko Wakker

IPC分类号： G03F7/20

CPC分类号： G03F7/70783 ,  G03F7/707

摘要： A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate is disclosed, the apparatus including a substrate table constructed to hold a substrate, a first clamping system configured to clamp the substrate table to a substrate table support structure, and a second clamping system configured to clamp a substrate to the substrate table after the substrate table has been clamped to the substrate table support structure.

摘要翻译： 公开了一种布置成将图案从图案形成装置转印到基板上的光刻设备，该设备包括：被构造成保持基板的基板台，构造成将基板台夹持于基板台支撑结构的第一夹紧系统;以及第二 夹紧系统构造成在衬底台已被夹持到衬底台支撑结构之后将衬底夹持到衬底台。

公开(公告)号：US08149387B2

公开(公告)日：2012-04-03

申请号：US12248586

申请日：2008-10-09

申请人： Jozef Augustinus Maria Alberti ,  Gerardus Petrus Matthijs Van Nunen ,  Frans Erik Groensmit ,  Rene Theodorus Petrus Compen ,  Abraham Alexander Soethoudt

发明人： Jozef Augustinus Maria Alberti ,  Gerardus Petrus Matthijs Van Nunen ,  Frans Erik Groensmit ,  Rene Theodorus Petrus Compen ,  Abraham Alexander Soethoudt

IPC分类号： G03B27/58 ,  G03B27/62

CPC分类号： G03F7/70783 ,  G03F7/70633

摘要： A method is provided for placing a substrate onto a surface of a substrate holder, the surface having a plurality of burls. First substrate placement data is calculated. This data enables placement of the substrate at a certain position with respect to a position of the plurality of burls on the surface of the substrate holder. Then, the substrate is placed at the certain position in accordance with the substrate placement data. The certain position may be based on the position at which placement would result in a minimized overlay error or may be based on the position at which placement would result in minimized substrate deformation.

摘要翻译： 提供了一种将衬底放置在衬底保持器的表面上的方法，该表面具有多个毛刺。 计算第一衬底放置数据。 该数据使得能够将衬底相对于衬底保持器表面上的多个毛刺的位置放置在特定位置。 然后，根据基板放置数据将基板放置在特定位置。 该位置可以基于放置将导致最小重叠误差的位置，或者可以基于放置将导致最小化的基板变形的位置。