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    Lithographic apparatus, substrate table, and method for enhancing substrate release properties
    6.
    发明授权
    Lithographic apparatus, substrate table, and method for enhancing substrate release properties 有权
    平版印刷装置，基板台，以及增强基板剥离性能的方法

    公开(公告)号：US08792085B2

    公开(公告)日：2014-07-29

    申请号：US12856106

    申请日：2010-08-13

    申请人： Michiel Puyt ,  Arno Jan Bleeker ,  Rene Theodorus Petrus Compen ,  Rudolf Hartmut Fischer

    发明人： Michiel Puyt ,  Arno Jan Bleeker ,  Rene Theodorus Petrus Compen ,  Rudolf Hartmut Fischer

    IPC分类号： G03B27/58 ,  G03F7/20 ,  H01L21/687

    CPC分类号： G03F7/707 ,  G03F7/70708 ,  H01L21/6875 ,  H01L21/68757

    摘要： A lithographic apparatus includes an illumination system constructed and arranged to condition a radiation beam, and a support constructed and arranged to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed and arranged to hold a substrate, and a projection system constructed and arranged to project the patterned radiation beam onto a target portion of the substrate. The substrate table includes a chuck having a plurality of protrusions constructed and arranged to support corresponding parts of a bottom surface of a wafer. The top surface of at least one of the protrusions includes a plurality of elements that define a reduced contact area between the substrate and the top surface of the protrusion.

    摘要翻译： 光刻设备包括构造和布置成调节辐射束的照明系统，以及构造和布置成支撑图案形成装置的支撑件。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 所述装置还包括被构造和布置成保持基板的基板台，以及构造和布置成将图案化的辐射束投影到基板的目标部分上的投影系统。 衬底台包括具有多个突出部的卡盘，所述多个突起被构造和布置成支撑晶片底面的对应部分。 至少一个突起的顶表面包括多个元件，其限定了基板和突起的顶表面之间的减小的接触面积。

    Inspection apparatus and method
    7.
    发明授权
    Inspection apparatus and method 有权
    检验仪器及方法

    公开(公告)号：US09304077B2

    公开(公告)日：2016-04-05

    申请号：US13166384

    申请日：2011-06-22

    申请人： Lucas Henricus Johannes Stevens ,  Arno Jan Bleeker

    发明人： Lucas Henricus Johannes Stevens ,  Arno Jan Bleeker

    IPC分类号： G01N21/00 ,  G01N21/17 ,  G01N21/956

    CPC分类号： G01N21/1717 ,  G01N21/00 ,  G01N21/95623

    摘要： Ghost reflections in a catadioptric scatterometer objective are excluded from an angle-resolved spectrum measurement by using a partial pupil for illumination and for the measurement excluding the area of the pupil plane that has been illuminated. Ghost reflections are reflected back into same point in the pupil plane. The ghost reflections do not interfere with the signal in the non-illuminated area of the pupil plane. An illumination system provides a beam of electromagnetic radiation to illuminate a first area in an illumination pupil plane of the objective. The objective is arranged as to illuminate the substrate with the beam of electromagnetic radiation. The illumination pupil plane is the back projected image of the pupil plane of the objective and is also imaged into the measurement pupil plane at the back focal plane of the objective, via auxiliary optics. A detector is configured to measure an angle resolved spectrum arising from the illumination of the substrate, in a measurement area of the measurement pupil plane of the objective excluding an area corresponding to the first area.

    摘要翻译： 通过使用用于照明的部分光瞳和除了被照明的光瞳面的区域之外的测量，从角度分辨光谱测量中排除反射折射式散射仪物镜中的鬼反射。 幽灵反射回到瞳孔平面上的相同点。 幽灵反射不影响瞳孔平面的非照明区域中的信号。 照明系统提供电磁辐射束以照射物镜的照明光瞳平面中的第一区域。 该目的被布置为用电磁辐射束照射基板。 照明光瞳平面是物镜的光瞳平面的背投影像，并且还通过辅助光学器件在物镜的后焦平面处成像到测量光瞳平面中。 检测器被配置为测量除了与第一区域相对应的区域之外的物镜的测量光瞳平面的测量区域中由基板照射产生的角度分辨光谱。

    Lithographic apparatus and device manufacturing method utilizing multiple die designs on a substrate using a data buffer that stores pattern variation data
    10.
    发明授权
    Lithographic apparatus and device manufacturing method utilizing multiple die designs on a substrate using a data buffer that stores pattern variation data 有权
    使用存储图案变化数据的数据缓冲器在衬底上利用多个管芯设计的平版印刷设备和器件制造方法

    公开(公告)号：US07728956B2

    公开(公告)日：2010-06-01

    申请号：US11098607

    申请日：2005-04-05

    申请人： Arno Jan Bleeker ,  Kars Zeger Troost ,  Adrianus Johannes Henricus Maas

    发明人： Arno Jan Bleeker ,  Kars Zeger Troost ,  Adrianus Johannes Henricus Maas

    IPC分类号： G03B27/32

    CPC分类号： G03F7/70508 ,  G03F7/70275 ,  G03F7/70291

    摘要： A lithographic system and method are provided that allow for variations of a basic device design to be generated without substantially increasing the cost of the data path hardware. The lithographic apparatus includes an array of individually controllable elements, a control system, a first data buffer, and a second data buffer. The control system provides control signals to the array of individually controllable elements. The first data buffer stores pattern data that corresponds to a pattern to be exposed on a plurality of areas on the substrate. The second data buffer stores pattern variation data, corresponding to at least one change to a part of the pattern. The control system is configured, such that at least one variation of the pattern is exposed on one of the areas on the substrate with the pattern variation data.

    摘要翻译： 提供了一种光刻系统和方法，其允许在不显着增加数据路径硬件的成本的情况下生成基本设备设计的变化。 光刻设备包括独立可控元件阵列，控制系统，第一数据缓冲器和第二数据缓冲器。 控制系统向独立可控元件阵列提供控制信号。 第一数据缓冲器存储对应于要暴露在基板上的多个区域上的图案的图案数据。 第二数据缓冲器存储对应于图案的一部分的至少一个改变的图案变化数据。 控制系统被配置为使得图案的至少一个变化在图案变化数据的基板上的一个区域上露出。