利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

14 条记录 (耗时 0.053 秒)

    Method, system, and computer program product for determining refractive index distribution
    5.
    发明授权
    Method, system, and computer program product for determining refractive index distribution 有权
    确定折射率分布的方法

    公开(公告)号：US06741362B2

    公开(公告)日：2004-05-25

    申请号：US10138714

    申请日：2002-05-06

    申请人： Stanislav Smirnov ,  Mark L. Oskotsky ,  Lev Sakin ,  John D. Martin

    发明人： Stanislav Smirnov ,  Mark L. Oskotsky ,  Lev Sakin ,  John D. Martin

    IPC分类号： G01N2141

    CPC分类号： G01N21/45

    摘要： The present invention provides a method and system for determining three-dimensional refractive gradient index distribution. The method and system of the present invention determine inhomogeneity data and calculate index of refraction changes in three-dimensions (3D). The method and system provide 3D modeling of an optical object or system that determines the three-dimensional distribution of the refractive index in the object. In one embodiment, the optical object is a blank. In different embodiments, the optical system is more than one blank. In alternative embodiments, the optical system can be a projection optics system that can include optical components such as lenses, filters, plates, and prisms. The present invention also provides a method for selecting a plurality of preferred optical elements to assemble a composite optical system with predetermined parameters.

    摘要翻译： 本发明提供一种用于确定三维折射梯度指数分布的方法和系统。 本发明的方法和系统确定不均匀性数据并计算三维（3D）中的折射变化指数。 该方法和系统提供了确定物体中折射率的三维分布的光学对象或系统的3D建模。 在一个实施例中，光学对象是空白的。 在不同的实施例中，光学系统是多于一个空白的。 在替代实施例中，光学系统可以是可以包括诸如透镜，滤光器，板和棱镜的光学部件的投影光学系统。 本发明还提供一种用于选择多个优选光学元件以组合具有预定参数的复合光学系统的方法。

    Relay lens used in an illumination system of a lithography system
    6.
    发明授权
    Relay lens used in an illumination system of a lithography system 有权
    用于光刻系统的照明系统的中继透镜

    公开(公告)号：US07289277B2

    公开(公告)日：2007-10-30

    申请号：US10607193

    申请日：2003-06-27

    申请人： Lev Ryzhikov ,  Stanislav Smirnov

    发明人： Lev Ryzhikov ,  Stanislav Smirnov

    IPC分类号： G02B9/08

    CPC分类号： G03F7/70066 ,  G02B13/143 ,  G02B13/22 ,  G02B13/24

    摘要： A relay lens is provided in an illumination system for use in microlithography. The relay lens can be used to uniformly illuminate a field at a reticle by telecentric light beams with variable aperture size. The relay lens can include first, second, and third lens groups. At least one of the second and third lens groups can include a single lens. This can reduce costs and increase transmission by requiring less CaF2 because fewer optical elements are used compared to prior systems.

    摘要翻译： 中继透镜设置在用于微光刻的照明系统中。 中继透镜可以用于通过具有可变孔径尺寸的远心光束来均匀地照射光罩处的场。 中继透镜可以包括第一，第二和第三透镜组。 第二和第三透镜组中的至少一个可以包括单个透镜。 这可以通过要求更少的CaF 2 2来降低成本并增加传输，因为与现有系统相比，使用较少的光学元件。

    Off-axis catadioptric projection optical system for lithography
    8.
    发明授权
    Off-axis catadioptric projection optical system for lithography 有权
    用于光刻的离轴反射折射投影光学系统

    公开(公告)号：US07834979B2

    公开(公告)日：2010-11-16

    申请号：US12389593

    申请日：2009-02-20

    申请人： Stanislav Smirnov ,  Mark Oskotsky

    发明人： Stanislav Smirnov ,  Mark Oskotsky

    IPC分类号： G03B27/42 ,  G03B27/70

    CPC分类号： G03B27/54 ,  G02B17/0812 ,  G03F7/70225

    摘要： An off-axis catadioptric projection optical systems for use in lithography tools for processing modulated light used to form an image on a substrate is provided. The optical system includes an off-axis mirror segment, a fold mirror, a relay, an aperture stop and a refractive lens group. Modulated light is transmitted through the system to form an image on a substrate. The projection system includes an off-axis mirror segment, an aperture stop and a refractive lens group. Alternatively, the projection system includes an off-axis mirror segment, a negative refractive lens group, a concave mirror, a relay, an aperture stop, and a refractive lens group.

    摘要翻译： 提供了用于光刻工具中用于处理用于在基板上形成图像的调制光的离轴反射折射投影光学系统。 光学系统包括离轴镜片段，折叠镜，继电器，孔径光阑和折射透镜组。 调制光通过系统透射以在基底上形成图像。 投影系统包括离轴镜片段，孔径光阑和折射透镜组。 或者，投影系统包括离轴镜片段，负折射透镜组，凹面镜，继电器，孔径光阑和折射透镜组。

    Optical system for maskless lithography
    9.
    发明授权
    Optical system for maskless lithography 有权
    无掩模光刻的光学系统

    公开(公告)号：US07110082B2

    公开(公告)日：2006-09-19

    申请号：US10602069

    申请日：2003-06-24

    申请人： Stanislav Smirnov ,  Mark Oskotsky

    发明人： Stanislav Smirnov ,  Mark Oskotsky

    IPC分类号： G03B27/42 ,  G03B27/58 ,  G03B27/54 ,  G03F9/00

    CPC分类号： G03F7/70191 ,  G03F7/70291

    摘要： A maskless lithography system including an illuminating system, a SLM having a non-linear shape (e.g., curved, concave, spherical, etc.), an exposure system, and a beam splitter that directs light from the illuminating system to the SLM and from the SLM to the exposure system. In some embodiments, an optical element can be located between the beam splitter and the SLM, possibly to correct for aberrations.

    摘要翻译： 一种无掩模光刻系统，包括照明系统，具有非线性形状（例如，弯曲，凹入，球形等）的SLM，曝光系统和将照明系统的光引导到SLM的分束器 SLM到曝光系统。 在一些实施例中，光学元件可以位于分束器和SLM之间，可能用于校正像差。

    Off-axis catadioptric projection optical system for lithography
    10.
    发明申请
    Off-axis catadioptric projection optical system for lithography 有权
    用于光刻的离轴反射折射投影光学系统

    公开(公告)号：US20060023191A1

    公开(公告)日：2006-02-02

    申请号：US10902469

    申请日：2004-07-30

    申请人： Stanislav Smirnov ,  Mark Oskotsky

    发明人： Stanislav Smirnov ,  Mark Oskotsky

    IPC分类号： G03B27/54

    CPC分类号： G03B27/54 ,  G02B17/0812 ,  G03F7/70225

    摘要： The present invention is directed to off-axis catadioptric projection optical systems for use in lithography tools for processing modulated light used to form an image on a substrate, such as a semiconductor wafer or flat panel display. In one embodiment the optical system includes an off-axis mirror segment, a fold mirror, a relay, an aperture stop and a refractive lens group. Modulated light is transmitted through the system to form an image on a substrate. In a second embodiment the projection system includes an off-axis mirror segment, an aperture stop and a refractive lens group. In a third embodiment the projection system includes an off-axis mirror segment, a negative refractive lens group, a concave mirror, a relay, an aperture stop, and a refractive lens group. A method to produce a device using a lithographic apparatus including a projection system with an off-axis mirror segment as the first element in a projection optics system is also provided.

    摘要翻译： 本发明涉及用于光刻工具的离轴反射折射投影光学系统，用于处理用于在诸如半导体晶片或平板显示器的基板上形成图像的调制光。 在一个实施例中，光学系统包括离轴镜片段，折叠镜，继电器，孔径光阑和折射透镜组。 调制光通过系统透射以在基底上形成图像。 在第二实施例中，投影系统包括离轴镜片段，孔径光阑和折射透镜组。 在第三实施例中，投影系统包括离轴镜片段，负折射透镜组，凹面镜，继电器，孔径光阑和折射透镜组。 还提供了使用包括具有离轴镜片段的投影系统作为投影光学系统中的第一元素的光刻设备的方法。