TOUCH CONTROL STRUCTURE, METHOD OF DETECTING TOUCH USING TOUCH CONTROL STRUCTURE, TOUCH CONTROL APPARATUS, AND TOUCH CONTROL DISPLAY APPARATUS

    公开(公告)号:US20210405811A1

    公开(公告)日:2021-12-30

    申请号:US16761861

    申请日:2019-12-16

    Abstract: A touch control structure is provided. The touch control structure includes a first touch electrode including a plurality of first touch control blocks; a second touch electrode including a plurality of second touch control blocks; and one or more reversibly deformable elastic supports between and in direct contact with a respective one of the plurality of first touch control blocks and a respective one of the plurality of second touch control blocks. When the touch control structure is in a first state without a touch, the respective one of the plurality of first touch control blocks includes a first overlapping portion and a first margin portion abutting the first overlapping portion, and the respective one of the plurality of second touch control blocks includes a second overlapping portion and a second margin portion abutting the second overlapping portion.

    Array substrate, and display device, and fabrication methods

    公开(公告)号:US10249763B2

    公开(公告)日:2019-04-02

    申请号:US15528215

    申请日:2016-12-12

    Abstract: A semiconductor device, an array substrate, and a display device, and their fabrication methods are provided. An exemplary semiconductor device includes a first electrode, an insulating layer, and a second electrode, over a substrate. A conductive layer is on the insulating layer. A semiconductor layer is on the first electrode, on a first sidewall of the insulating layer, on the conductive layer, on the second sidewall of the insulating layer, and on the second electrode. A first gate electrode is over a portion of the semiconductor layer that is on the first sidewall of the insulating layer. A second gate electrode is over a portion of the semiconductor layer that is on the second sidewall of the insulating layer.

    Dry etching method
    7.
    发明授权

    公开(公告)号:US10468266B2

    公开(公告)日:2019-11-05

    申请号:US15546475

    申请日:2016-04-07

    Abstract: A dry etching method includes performing at least two etching steps, and further includes injecting protective gas into an etch chamber for processing between any two successive etching steps, wherein the protective gas generates plasma to neutralize electrons accumulated on a side wall of an etching trench. According to the present disclosure, hydrogen plasma is added in an etching process to remove the electrons accumulated on the side wall of the etching trench so as to reduce the microetching effect in multiple etching. In this way, process stability and reliability of a display substrate are improved.

    Touch control structure, method of detecting touch using touch control structure, touch control apparatus, and touch control display apparatus

    公开(公告)号:US11281342B2

    公开(公告)日:2022-03-22

    申请号:US16761861

    申请日:2019-12-16

    Abstract: A touch control structure is provided. The touch control structure includes a first touch electrode including a plurality of first touch control blocks; a second touch electrode including a plurality of second touch control blocks; and one or more reversibly deformable elastic supports between and in direct contact with a respective one of the plurality of first touch control blocks and a respective one of the plurality of second touch control blocks. When the touch control structure is in a first state without a touch, the respective one of the plurality of first touch control blocks includes a first overlapping portion and a first margin portion abutting the first overlapping portion, and the respective one of the plurality of second touch control blocks includes a second overlapping portion and a second margin portion abutting the second overlapping portion.

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