TOUCH DISPLAY PANEL, MANUFACTURING METHOD THEREOF, AND DRIVING METHOD THEREOF, AND TOUCH DISPLAY DEVICE
    6.
    发明申请
    TOUCH DISPLAY PANEL, MANUFACTURING METHOD THEREOF, AND DRIVING METHOD THEREOF, AND TOUCH DISPLAY DEVICE 有权
    触摸显示面板及其制造方法及其驱动方法以及触摸显示装置

    公开(公告)号:US20160342251A1

    公开(公告)日:2016-11-24

    申请号:US14894936

    申请日:2015-07-16

    IPC分类号: G06F3/041 G09G3/20

    摘要: A touch display panel, a manufacturing method thereof, a driving method and a touch display device are disclosed. The touch display panel comprises an array substrate and a color film substrate, wherein the array substrate comprises a first thin film transistor and a first detection line formed on a first substrate, and the color film substrate comprises a main spacer, an auxiliary spacer, a reference signal line and a second detection line formed on a second substrate. The bottom of the main spacer is connected to the reference signal line, the top of the main spacer is connected to a first source, the bottom of the auxiliary spacer is connected to the second detection line, and a projection of the top of the auxiliary spacer on the array substrate connects a first drain with the first detection line.

    摘要翻译: 公开了触摸显示面板及其制造方法,驱动方法和触摸显示装置。 触摸显示面板包括阵列基板和彩色薄膜基板,其中阵列基板包括形成在第一基板上的第一薄膜晶体管和第一检测线,彩色薄膜基板包括主间隔物,辅助间隔物, 参考信号线和形成在第二基板上的第二检测线。 主间隔件的底部连接到参考信号线,主间隔件的顶部连接到第一源,辅助间隔件的底部连接到第二检测线,辅助顶部的突起 阵列基板上的间隔物将第一漏极与第一检测线连接。

    PHASE SHIFT MASK AND ELECTRONIC COMPONENT MANUFACTURING METHOD

    公开(公告)号:US20210356856A1

    公开(公告)日:2021-11-18

    申请号:US16343756

    申请日:2018-10-26

    IPC分类号: G03F1/32 H01L21/027

    摘要: A phase shift mask includes a transparent substrate and light-shielding portions. The light-shielding portions include a first light-shielding portion, and over one side of it, a first compensating light-shielding portion, which has a first distance to the first light-shielding portion and a first width smaller than a resolution of an exposing machine utilized for an exposure process using the phase shift mask. The light-shielding portions can further include a second compensating light-shielding portion, having a second distance to another side of the first light-shielding portion and a second width smaller than the resolution of the exposing machine. The first distance and the second distance respectively allow the first and the second compensating light-shielding portion to reduce an exposure at a region corresponding to two sides of the first light-shielding portion during the exposure process. A method manufacturing an electronic component utilizing the phase shift mask is also provided.