Fabricating amorphous zinc oxide semiconductor layer
    10.
    发明授权
    Fabricating amorphous zinc oxide semiconductor layer 有权
    制造无定形氧化锌半导体层

    公开(公告)号:US08222076B2

    公开(公告)日:2012-07-17

    申请号:US11498031

    申请日:2006-08-02

    IPC分类号: H01L21/16

    CPC分类号: H01L29/7869

    摘要: A process for fabricating a semiconductor layer of an electronic device including: liquid depositing one or more zinc oxide precursor compositions and forming at least one semiconductor layer of the electronic device comprising predominately amorphous zinc oxide from the liquid deposited one or more zinc oxide precursor compositions.

    摘要翻译: 一种用于制造电子器件的半导体层的方法,包括:液体沉积一种或多种氧化锌前体组合物并形成电子器件的至少一个半导体层,所述半导体层包含主要为无定形氧化锌的沉积的一种或多种氧化锌前体组合物。