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1.发明申请MONOMER FOR HARDMASK COMPOSITION AND HARDMASK COMPOSITION INCLUDING THE MONOMER AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION 有权HARDMASK组合物和HARDMASK组合物的单体包括单体和使用HARDMASK组合物形成图案的方法公开(公告)号：US20140186775A1
公开(公告)日：2014-07-03
申请号：US14079990
申请日：2013-11-14
申请人： Bum-Jin LEE , Yun-Jun KIM , Youn-Jin CHO
发明人： Bum-Jin LEE , Yun-Jun KIM , Youn-Jin CHO
摘要： A monomer for a hardmask composition is represented by the following Chemical Formula 1,
摘要翻译： 用于硬掩模组合物的单体由以下化学式1表示，
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2.发明申请HARDMASK COMPOSITION AND METHOD OF FORMING PATTERNS AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING THE PATTERNS 有权HARDMASK组合物和形成图案的方法和包括图案的半导体集成电路装置公开(公告)号：US20140183701A1
公开(公告)日：2014-07-03
申请号：US14037722
申请日：2013-09-26
申请人： Yoo-Jeong CHOI , Yun-Jun KIM , Joon-Young MOON , Bum-Jin LEE , Chung-Heon LEE , Youn-Jin CHO
发明人： Yoo-Jeong CHOI , Yun-Jun KIM , Joon-Young MOON , Bum-Jin LEE , Chung-Heon LEE , Youn-Jin CHO
IPC分类号： H01L21/308 , H01L21/311 , H01L23/00 , G03F7/11
CPC分类号： H01L23/564 , H01L21/02118 , H01L21/02282 , H01L21/0271 , H01L21/0332 , H01L2924/0002 , H01L2924/00
摘要： A hardmask composition includes a monomer represented by the following Chemical Formula 1 and an aromatic ring-containing polymer,
摘要翻译： 硬掩模组合物包括由以下化学式1表示的单体和含芳环的聚合物，
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3.发明申请MONOMER FOR HARDMASK COMPOSITION AND HARDMASK COMPOSITION INCLUDING THE MONOMER AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION 审中-公开HARDMASK组合物和HARDMASK组合物的单体包括单体和使用HARDMASK组合物形成图案的方法公开(公告)号：US20150001178A1
公开(公告)日：2015-01-01
申请号：US14258489
申请日：2014-04-22
申请人： Hyun-Ji SONG , Yun-Jun KIM , Go-Un KIM , Young-Min KIM , Hea-Jung KIM , Joon-Young MOON , Yo-Choul PARK , Yu-Shin PARK , You-Jung PARK , Seung-Wook SHIN , Yong-Woon YOON , Chung-Heon LEE , Yoo-Jeong CHOI , Seung-Hee HONG
发明人： Hyun-Ji SONG , Yun-Jun KIM , Go-Un KIM , Young-Min KIM , Hea-Jung KIM , Joon-Young MOON , Yo-Choul PARK , Yu-Shin PARK , You-Jung PARK , Seung-Wook SHIN , Yong-Woon YOON , Chung-Heon LEE , Yoo-Jeong CHOI , Seung-Hee HONG
IPC分类号： G03F1/00 , C07D311/58 , C07D333/50 , C07C39/17 , C07D333/16 , G03F7/40 , C07C39/225 , C07C255/53 , C07C22/04 , G03F7/16 , G03F7/20 , C07D215/14 , C07C35/21
CPC分类号： G03F7/40 , C07C22/04 , C07C39/12 , C07C39/225 , C07C217/58 , C07C255/53 , C07C323/19 , C07C2601/14 , C07C2603/50 , C07C2603/52 , C07C2603/54 , C07D215/14 , C07D311/58 , C07D333/16 , C07D333/50 , G03F7/09 , G03F7/091 , G03F7/094 , G03F7/11 , G03F7/30 , G03F7/36 , G03F7/38
摘要： A monomer for a hardmask composition is represented by the following Chemical Formula 1,
摘要翻译： 用于硬掩模组合物的单体由以下化学式1表示，
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4.发明申请HARDMASK COMPOSITION, METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING THE PATTERNS 有权HARDMASK组合物，使用HARDMASK组合物形成图案的方法和包括图案的半导体集成电路装置公开(公告)号：US20150004531A1
公开(公告)日：2015-01-01
申请号：US14263323
申请日：2014-04-28
申请人： Yoo-Jeong CHOI , Yun-Jun KIM , Go-Un KIM , Young-Min KIM , Hea-Jung KIM , Joon-Young MOON , Yo-Choul PARK , Yu-Shin PARK , You-Jung PARK , Hyun-Ji SONG , Seung-Wook SHIN , Yong-Woon YOON , Chung-Heon LEE , Seung-Hee HONG
发明人： Yoo-Jeong CHOI , Yun-Jun KIM , Go-Un KIM , Young-Min KIM , Hea-Jung KIM , Joon-Young MOON , Yo-Choul PARK , Yu-Shin PARK , You-Jung PARK , Hyun-Ji SONG , Seung-Wook SHIN , Yong-Woon YOON , Chung-Heon LEE , Seung-Hee HONG
摘要： A hardmask composition includes a monomer represented by the following Chemical Formula 1, a polymer including a moiety represented by the following Chemical Formula 2, a polymer including a moiety represented by the following Chemical Formula 3, or a combination thereof, and a solvent,
摘要翻译： 硬掩模组合物包括由以下化学式1表示的单体，包含由以下化学式2表示的部分的聚合物，包含由以下化学式3表示的部分的聚合物或其组合，以及溶剂，
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