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公开(公告)号：US20060290867A1
公开(公告)日：2006-12-28
申请号：US11471653
申请日：2006-06-21
IPC分类号： G02F1/1343
CPC分类号： G02F1/134363 , G02F1/13439 , G02F1/136213 , G02F1/136286 , G02F2001/13629 , G02F2001/136295
摘要： A liquid crystal display device and a fabricating method thereof for simplifying a process are disclosed. In the method of fabricating the liquid crystal display device, a first conductive pattern group including a gate line and a gate electrode, a common line and a common electrode, a pixel electrode and a pad is formed on a substrate. An insulating film including a plurality of contact holes and a semiconductor pattern is formed on the first mask pattern group. And a second conductive pattern group including a data line, a source electrode and a drain electrode is formed on an insulating film provided with the semiconductor pattern, and exposes an active layer of the semiconductor pattern
摘要翻译： 公开了一种用于简化处理的液晶显示装置及其制造方法。 在制造液晶显示装置的方法中，在基板上形成包括栅极线和栅电极的第一导电图案组，公共线和公共电极，像素电极和焊盘。 在第一掩模图案组上形成包括多个接触孔和半导体图案的绝缘膜。 并且在设置有半导体图案的绝缘膜上形成包括数据线，源极和漏电极的第二导电图案组，并且暴露半导体图案的有源层
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公开(公告)号：US20070218577A1
公开(公告)日：2007-09-20
申请号：US11643653
申请日：2006-12-22
IPC分类号： H01L21/00
CPC分类号： G02F1/13458 , G02F1/136286 , G02F2001/136236 , H01L27/124 , H01L27/1288 , H01L29/66742
摘要： A liquid crystal display (LCD) panel is fabricated with a reduced number of mask processes and includes a thin film transistor (TFT) array substrate and a color filter array substrate. The TFT array substrate includes gate and data lines insulatively crossing each other to define a pixel area, a TFT provided at the crossing of the gate and data lines, a passivation film protecting the TFT, a pixel electrode partially overlapped by the TFT, a gate pad connected to the gate line, and a data pad connected to the data line. The gate line, the gate and data pads, and the pixel electrode include a transparent conductive material. A gate metal material is on the transparent conductive material where the TFT partially overlaps the pixel electrode. The passivation film over the gate and data pads is removed to expose the transparent conductive material included within the gate and data pads.
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公开(公告)号：US20050077524A1
公开(公告)日：2005-04-14
申请号：US10963925
申请日：2004-10-14
IPC分类号： G02F1/136 , G02F1/1362 , H01L21/336 , H01L21/77 , H01L21/84 , H01L27/12 , H01L29/04
CPC分类号： G02F1/13458 , G02F1/136286 , G02F2001/136236 , H01L27/124 , H01L27/1288 , H01L29/66742
摘要： A liquid crystal display (LCD) panel is fabricated with a reduced number of mask processes and includes a thin film transistor (TFT) array substrate and a color filter array substrate. The TFT array substrate includes gate and data lines insulatively crossing each other to define a pixel area, a TFT provided at the crossing of the gate and data lines, a passivation film protecting the TFT, a pixel electrode partially overlapped by the TFT, a gate pad connected to the gate line, and a data pad connected to the data line. The gate line, the gate and data pads, and the pixel electrode include a transparent conductive material. A gate metal material is on the transparent conductive material where the TFT partially overlaps the pixel electrode. The passivation film over the gate and data pads is removed to expose the transparent conductive material included within the gate and data pads.
摘要翻译： 液晶显示器（LCD）面板以较少数量的掩模工艺制造，并且包括薄膜晶体管（TFT）阵列基板和滤色器阵列基板。 TFT阵列基板包括彼此绝缘交叉以限定像素区域的栅极和数据线，设置在栅极和数据线的交叉处的TFT，保护TFT的钝化膜，与TFT部分重叠的像素电极，栅极 焊盘连接到栅极线，以及连接到数据线的数据焊盘。 栅极线，栅极和数据焊盘以及像素电极包括透明导电材料。 栅极金属材料在透明导电材料上，其中TFT部分地与像素电极重叠。 去除栅极和数据焊盘上的钝化膜以暴露包括在栅极和数据焊盘内的透明导电材料。
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公开(公告)号：US20060138422A1
公开(公告)日：2006-06-29
申请号：US11345370
申请日：2006-02-02
IPC分类号： H01L29/04
CPC分类号： H01L27/124 , G02F1/134363 , G02F1/136213 , G02F1/1368 , G02F2001/136295 , H01L27/1288
摘要： A thin film transistor substrate of horizontal electric field type includes: a gate line and a first common line formed on a substrate to be in parallel to each other; a data line crossing the gate line and the first common line with a gate insulating film therebetween to define a pixel area; a second common line crossing the first common line having the gate insulating film therebetween; a thin film transistor connected to the gate line and the data line; a common electrode extending from the second common line in said pixel area; a pixel electrode that is parallel to the common electrode and the second common line; a protective film for covering the thin film transistor; a gate pad having a lower gate pad electrode connected to an upper gate pad electrode through a first contact hole; a common pad having a lower common pad electrode connected to an upper common pad electrode through a second contact hole; and a data pad having a lower data pad electrode connected to an upper data pad electrode provided within a third contact hole.
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5.发明申请公开(公告)号：US20050092991A1
公开(公告)日：2005-05-05
申请号：US10979096
申请日：2004-11-02
IPC分类号： G02F1/133 , G02F1/1343 , G02F1/136 , G02F1/1362 , G02F1/1368 , G03F7/20 , H01L21/00 , H01L21/77 , H01L21/84 , H01L27/12 , H01L29/786 , H01L31/20
CPC分类号： H01L27/124 , G02F1/134363 , G02F1/136213 , G02F1/1368 , G02F2001/136295 , H01L27/1288
摘要： A thin film transistor substrate of horizontal electric field type includes: a gate line and a first common line formed on a substrate to be in parallel to each other; a data line crossing the gate line and the first common line with a gate insulating film therebetween to define a pixel area; a second common line crossing the first common line having the gate insulating film therebetween; a thin film transistor connected to the gate line and the data line; a common electrode extending from the second common line in said pixel area; a pixel electrode that is parallel to the common electrode and the second common line; a protective film for covering the thin film transistor; a gate pad having a lower gate pad electrode connected to an upper gate pad electrode through a first contact hole; a common pad having a lower common pad electrode connected to an upper common pad electrode through a second contact hole; and a data pad having a lower data pad electrode connected to an upper data pad electrode provided within a third contact hole.
摘要翻译： 水平电场型薄膜晶体管基板包括：形成在彼此平行的基板上的栅极线和第一公共线; 跨越所述栅极线和所述第一公共线的数据线，其间具有栅极绝缘膜，以限定像素区域; 第二公共线与其间具有栅绝缘膜的第一公共线交叉; 连接到栅极线和数据线的薄膜晶体管; 在所述像素区域中从所述第二公共线延伸的公共电极; 平行于公共电极和第二公共线的像素电极; 用于覆盖薄膜晶体管的保护膜; 栅极焊盘，其具有通过第一接触孔连接到上部栅极焊盘电极的下部栅极焊盘电极; 公共焊盘，其具有通过第二接触孔连接到上公共焊盘电极的下公共焊盘电极; 以及数据焊盘，其具有连接到设置在第三接触孔内的上数据焊盘电极的下数据焊盘电极。
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公开(公告)号：US20080007167A1
公开(公告)日：2008-01-10
申请号：US11819953
申请日：2007-06-29
CPC分类号： H01L27/3253
摘要： Provided are an organic light emitting device and a manufacturing method thereof. The organic light emitting device includes a first display substrate, a second display substrate, and a first adhesive force improving member. The first display substrate includes a first substrate, a first electrode, organic light emitting patterns, a first spacer, and a second electrode. The first electrode is formed on an entire surface of the first substrate, and the organic light emitting patterns are disposed on the first electrode. The first spacer corresponds to the organic light emitting pattern and is disposed on the first electrode. The second electrode covers the organic light emitting patterns and the first spacer. The second display substrate includes a second substrate, and a first driving signal delivery part. The first adhesive force improving member electrically/physically couples the second electrode to the first driving signal delivery part.
摘要翻译： 提供一种有机发光器件及其制造方法。 有机发光装置包括第一显示基板，第二显示基板和第一粘接力改善部件。 第一显示基板包括第一基板，第一电极，有机发光图案，第一间隔件和第二电极。 第一电极形成在第一基板的整个表面上，并且有机发光图案设置在第一电极上。 第一间隔物对应于有机发光图案并且设置在第一电极上。 第二电极覆盖有机发光图案和第一间隔物。 第二显示基板包括第二基板和第一驱动信号传送部。 第一粘合力改善构件将第二电极电/物理耦合到第一驱动信号传递部分。
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7.发明申请Thin film transistor substrate for display device and fabricating method thereof 有权用于显示装置的薄膜晶体管基板及其制造方法公开(公告)号：US20050077523A1
公开(公告)日：2005-04-14
申请号：US10963599
申请日：2004-10-14
IPC分类号： G02F1/1368 , G02F1/1345 , G02F1/136 , G02F1/1362 , G09F9/30 , H01L21/336 , H01L21/77 , H01L21/84 , H01L27/12 , H01L27/13 , H01L29/786
CPC分类号： G02F1/136227 , G02F1/136213 , H01L27/124 , H01L27/1255 , H01L27/1288
摘要： A thin film transistor (TFT) substrate is fabricated in three mask processes. In a first mask process, a gate line and a gate electrode are formed. In a second mask process, a data line, a source electrode, a drain electrode, a semiconductor layer, and a first upper storage electrode overlapping the gate line are formed from a gate insulating film, undoped and doped amorphous silicon layers, and a data metal layer. In a third mask process, a pixel hole is formed through protective and gate insulating films within and outside a pixel area, the first upper storage electrode is partially removed, a pixel electrode contacts a side of the drain electrode within the pixel hole at the pixel area, and a second upper storage electrode contacts a side of the first upper storage electrode in the pixel hole outside the pixel area.
摘要翻译： 在三个掩模工艺中制造薄膜晶体管（TFT）衬底。 在第一掩模工艺中，形成栅极线和栅电极。 在第二掩模处理中，从栅极绝缘膜，未掺杂和掺杂的非晶硅层形成数据线，源电极，漏极，半导体层和与栅极线重叠的第一上部存储电极，以及数据 金属层。 在第三掩模处理中，通过像素区域内和外部的保护栅极绝缘膜形成像素孔，部分地去除第一上部存储电极，像素电极在像素的像素孔内接触漏电极的一侧 并且第二上部存储电极接触像素区域外的像素孔中的第一上部存储电极的一侧。
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8.发明申请公开(公告)号：US20050046776A1
公开(公告)日：2005-03-03
申请号：US10962461
申请日：2004-10-13
申请人： Byung Ahn , Youn Chang , Heung Cho
发明人： Byung Ahn , Youn Chang , Heung Cho
IPC分类号： G02F1/1343 , G02F1/1362
CPC分类号： G02F1/1333 , G02F1/134363 , G02F1/13458 , G02F1/136227
摘要： A liquid crystal display (LCD) device of a horizontal electric field type is disclosed. The LCD device is fabricated by a three-mask process, and has gate pad, common pad and data pad electrodes, each including a upper electrode formed of a transparent conductive material. With a lift-off process, these upper electrodes are formed within contact holes.
摘要翻译： 公开了一种水平电场型液晶显示器（LCD）装置。 LCD装置由三掩模工艺制造，并具有栅极焊盘，公共焊盘和数据焊盘电极，每个包括由透明导电材料形成的上电极。 通过剥离处理，这些上部电极形成在接触孔内。
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公开(公告)号：US20070002249A1
公开(公告)日：2007-01-04
申请号：US11471648
申请日：2006-06-21
申请人： Soon Yoo , Oh Kwon , Youn Chang , Heung Cho , Seung Nam
发明人： Soon Yoo , Oh Kwon , Youn Chang , Heung Cho , Seung Nam
IPC分类号： G02F1/1343
CPC分类号： G02F1/134363 , G02F1/136213 , G02F1/136286 , G02F2001/13629 , G02F2001/136295
摘要： A liquid crystal display device and a fabricating method thereof for simplifying a process are disclosed. In the method of fabricating the liquid crystal display device, a first conductive pattern group including a gate line and a gate electrode, a common line and a common electrode, a pixel electrode and a pad in a multiple conductive layer having a stepwise shape including a transparent conductive layer is formed on a substrate by a first mask process. An insulating film and a semiconductor layer including a plurality of contact holes are formed on the first mask pattern group by a second mask process. A second pattern group including a data line, a source electrode and a drain electrode is formed on the semiconductor layer and the semiconductor layer is patterned, and an active layer is exposed between the source electrode and the drain electrode by a third mask process.
摘要翻译： 公开了一种用于简化处理的液晶显示装置及其制造方法。 在制造液晶显示装置的方法中，包括栅极线和栅电极，公共线和公共电极的第一导电图案组，具有逐层形状的多导电层中的像素电极和焊盘，包括 通过第一掩模工艺在衬底上形成透明导电层。 通过第二掩模处理在第一掩模图案组上形成包括多个接触孔的绝缘膜和半导体层。 在半导体层上形成包括数据线，源电极和漏电极的第二图案组，对半导体层进行构图，通过第三掩模工艺在源电极和漏电极之间露出有源层。
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10.发明申请Method of forming fine pattern, liquid crystal display device having a fine pattern and fabricating method thereof 有权形成精细图案的方法，具有精细图案的液晶显示装置及其制造方法公开(公告)号：US20070001979A1
公开(公告)日：2007-01-04
申请号：US11473590
申请日：2006-06-23
IPC分类号： G09G3/36
CPC分类号： G02F1/13439 , G02F1/134363 , G02F1/136286 , G02F2201/123
摘要： This invention relates to a method of forming fine pattern that is adaptive for forming a fine pattern without limit of an exposure resolution, a liquid crystal display device and a fabricating method. The method of forming fine pattern comprises forming a photo-resist pattern on a transparent conductive layer. The photo-resist pattern having a minimum line width corresponding to an exposure resolution of an exposure device. The method further comprises over-etching the transparent conductive layer by an etching process using the photo-resist pattern as a mask to form an electrode pattern having a line width narrower than the exposure resolution of the exposure device.
摘要翻译： 本发明涉及一种形成精细图案的方法，该方法适于形成无限制的曝光分辨率的精细图案，液晶显示装置和制造方法。 形成精细图案的方法包括在透明导电层上形成光刻胶图案。 具有对应于曝光装置的曝光分辨率的最小线宽的光刻胶图案。 该方法还包括通过使用光致抗蚀剂图案作为掩模的蚀刻工艺来过度蚀刻透明导电层，以形成具有比曝光装置的曝光分辨率窄的线宽的电极图案。
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