公开(公告)号：US20170140907A1

公开(公告)日：2017-05-18

申请号：US15420472

申请日：2017-01-31

Applicant: CANON ANELVA CORPORATION

Inventor： Taichi HIROMI ,  Hidetoshi SHIMOKAWA ,  Atsuyuki ICHIKAWA

IPC: H01J37/34 ,  G01L21/00

CPC classification number: H01J37/3447 ,  C23C14/564 ,  C23C16/4401 ,  G01L21/00 ,  H01J37/32816 ,  H01J37/32935 ,  H01J37/3411 ,  H01J37/3441 ,  H01J37/3476 ,  H01J2237/026 ,  H01J2237/24585 ,  H01J2237/3322 ,  H01L21/203 ,  H01L21/285 ,  H01L21/2855

Abstract: A sputtering apparatus includes a space defining member defining a sputtering space for forming a film on a substrate. The space defining member includes a concave portion, and an opening portion is provided in the bottom portion of the concave portion. The sputtering apparatus includes a shield member configured to shield the opening portion from the sputtering space. The opening portion is formed so that a pressure gauge capable of measuring the pressure in the sputtering space can be attached, and the shield member is arranged so that at least a part of the shield member is buried in the concave portion.

公开(公告)号：US20220139729A1

公开(公告)日：2022-05-05

申请号：US17576111

申请日：2022-01-14

Applicant: Canon Anelva Corporation

Inventor： Jun MIURA ,  Naoya FUKUDA ,  Shuji KUMAGAI ,  Shinji TAKAGI ,  Tetsuro TODA ,  Hidetoshi SHIMOKAWA ,  Satoshi NEGISHI ,  Satoshi NOMURA ,  Junya SOEDA

IPC: H01L21/67 ,  H01L21/677 ,  H01L21/687

Abstract: A load lock device includes a load lock chamber including a first conveyance port connected to a transfer chamber connected to a reduced-pressure processing device, and a second conveyance port connected to a loader chamber; a substrate holder configured to hold a substrate in the load lock chamber; a driving mechanism arranged below the load lock chamber to move the substrate holder up and down and connected to the substrate holder via a connecting member; an extension chamber extended from a lower portion of the load lock chamber to a side; and a pump arranged below the extension chamber and configured to discharge a gas in the load lock chamber via the extension chamber. The extension chamber includes a bottom surface with an opening at a position deviated from a vertically lower position of the substrate holder, and the pump is connected to the opening.

公开(公告)号：US20220139761A1

公开(公告)日：2022-05-05

申请号：US17575690

申请日：2022-01-14

Applicant: Canon Anelva Corporation

Inventor： Jun MIURA ,  Naoya FUKUDA ,  Shinji TAKAGI ,  Hidetoshi SHIMOKAWA

IPC: H01L21/687 ,  H01L21/677 ,  H01L21/67

Abstract: A load lock device includes a load lock chamber, and a substrate holding structure configured to hold a substrate in the load lock chamber, wherein the substrate holding structure includes a facing surface facing the substrate, and is configured to allow a gas to flow through a space between the substrate and the facing surface, and in a state in which the substrate is held by the substrate holding structure, a distance between the substrate and a portion located inside an outer edge of the facing surface is larger than a distance between the substrate and the outer edge of the facing surface.