公开(公告)号：US11091615B2

公开(公告)日：2021-08-17

申请号：US14947163

申请日：2015-11-20

Applicant: Cytec Industries Inc.

Inventor： J. Mon Hei Eng ,  Joseph Kozakiewicz ,  Ram B. Gupta ,  Jian-Yang Cho ,  Roderick G. Ryles ,  Fadi Khawam

IPC: C08L23/12 ,  C08K5/3492 ,  C08K5/00 ,  C08K5/3475 ,  C08K5/357 ,  C08K5/06 ,  C08K5/132 ,  C08K5/134 ,  C08K5/1535 ,  C08L23/06 ,  C08L77/06

Abstract: Stabilizer compositions having a stabilizing amount of at least one co-active agent; and a stabilizing amount of any one or more ultraviolet light absorber chosen from an ortho-hydroxyphenyl triazine, an ortho-hydroxy benzophenone, or an ortho-hydroxyphenyl benzotriazole, optionally in combination with a stabilizing amount of a hindered amine light stabilizer, are provided herein, along with masterbatch concentrates containing same, and processes for using same for stabilizing organic materials to protect against light and thermal degradation due to exposure to UV irradiation.

公开(公告)号：US12227635B2

公开(公告)日：2025-02-18

申请号：US17403820

申请日：2021-08-16

Applicant: Cytec Industries Inc.

Inventor： J. Mon Hei Eng ,  Joseph Kozakiewicz ,  Ram B. Gupta ,  Jian-Yang Cho ,  Roderick G. Ryles ,  Fadi Khawam

IPC: C08L23/12 ,  C08K5/00 ,  C08K5/06 ,  C08K5/132 ,  C08K5/134 ,  C08K5/1535 ,  C08K5/3475 ,  C08K5/3492 ,  C08K5/357 ,  C08L23/06 ,  C08L77/06

Abstract: Stabilizer compositions having a stabilizing amount of at least one co-active agent; an ultraviolet light absorber chosen from orthohydroxyphenyl triazine compounds and/or benzoxazinone compounds; and a hindered amine light stabilizer, are provided herein, along with masterbatch concentrates containing same, and processes for using same for stabilizing polymeric organic materials to protect against light and thermal degradation due to exposure to UV irradiation.

公开(公告)号：US12215215B2

公开(公告)日：2025-02-04

申请号：US17365172

申请日：2021-07-01

Applicant: Cytec Industries Inc.

Inventor： Jerry Mon Hei Eng ,  Joseph Kozakiewicz ,  Ram B. Gupta ,  Jian-Yang Cho ,  Roderick G. Ryles ,  Fadi Khawam

IPC: C08L23/12 ,  C08K5/00 ,  C08K5/06 ,  C08K5/132 ,  C08K5/134 ,  C08K5/1535 ,  C08K5/3475 ,  C08K5/3492 ,  C08K5/357 ,  C08L23/06 ,  C08L77/06

Abstract: Stabilizer compositions having a stabilizing amount of at least one co-active agent; an ultraviolet light absorber chosen from an ortho-hydroxy benzophenone, and/or an ortho-hydroxyphenyl benzotriazole; and a hindered amine light stabilizer, are provided herein, along with masterbatch concentrates containing same, and processes for using same for stabilizing polymeric organic materials to protect against light and thermal degradation due to exposure to UV irradiation.

公开(公告)号：US20240294732A1

公开(公告)日：2024-09-05

申请号：US18660006

申请日：2024-05-09

Applicant: Cytec Industries Inc.

Inventor： Jerry Mon-Hei Eng ,  Ram B. Gupta ,  Xin Li ,  Jian-Yang Cho ,  Kyle O'Connor ,  Thomas Santamaria ,  Min Wang

IPC: C08K5/00 ,  C08K5/132 ,  C08K5/3435 ,  C08K5/3462 ,  C08K5/3492 ,  C08K5/529 ,  C08L23/06 ,  C08L23/12

CPC classification number: C08K5/005 ,  C08K5/132 ,  C08K5/3435 ,  C08K5/3462 ,  C08K5/3492 ,  C08K5/529 ,  C08L23/06 ,  C08L23/12 ,  C08L2201/08

Abstract: Polymer compositions for making a stabilized polymeric articles that are resistant to discoloration upon exposure to UV-C light having: (i) an organic polymeric material; and (ii) a hindered phenol, organic phosphite, or a combination thereof, with the provisos that: (a) the OH group on the aromatic ring of the hindered phenol is flanked by two tertiary hydrocarbyl groups, and (b) the organic phosphite does not have any-OAr group linked directly to the P atom of the phosphite, wherein Ar represents an unsubstituted or substituted aryl group, are provided herein. Reduced discoloration is associated with the use of specific hindered phenols and the organic phosphites compared to other hindered phenols and organic phosphites, even in the absence of other polymer additives including UV absorbers, hindered amine light stabilizers (HALS), metal oxides and/or barium salts. Methods of reducing discoloration of an organic polymeric material upon exposure to UV-C light are also provided, wherein such methods include the step of adding to the organic polymeric material a stabilizing amount of hindered phenol, organic phosphite, or a combination thereof.

公开(公告)号：US20220169828A1

公开(公告)日：2022-06-02

申请号：US17535060

申请日：2021-11-24

Applicant: CYTEC INDUSTRIES INC.

Inventor： Jerry Mon-Hei ENG ,  Ram B. Gupta ,  Xin Li ,  Jian-Yang Cho ,  Kyle O'Connor ,  Thomas Santamaria ,  Min Wang

IPC: C08K5/00 ,  C08L23/06 ,  C08L23/12 ,  C08K5/132 ,  C08K5/529 ,  C08K5/3492 ,  C08K5/3435 ,  C08K5/3462

Abstract: Polymer compositions for making a stabilized polymeric articles that are resistant to discoloration upon exposure to UV-C light having: (i) an organic polymeric material; and (ii) a hindered phenol, organic phosphite, or a combination thereof, with the provisos that: (a) the OH group on the aromatic ring of the hindered phenol is flanked by two tertiary hydrocarbyl groups, and (b) the organic phosphite does not have any —OAr group linked directly to the P atom of the phosphite, wherein Ar represents an unsubstituted or substituted aryl group, are provided herein. Reduced discoloration is associated with the use of specific hindered phenols and the organic phosphites compared to other hindered phenols and organic phosphites, even in the absence of other polymer additives including UV absorbers, hindered amine light stabilizers (HALS), metal oxides and/or barium salts. Methods of reducing discoloration of an organic polymeric material upon exposure to UV-C light are also provided, wherein such methods include the step of adding to the organic polymeric material a stabilizing amount of hindered phenol, organic phosphite, or a combination thereof.

公开(公告)号：US20210403690A1

公开(公告)日：2021-12-30

申请号：US17403820

申请日：2021-08-16

Applicant: Cytec Industries Inc.

Inventor： J. Mon Hei ENG ,  Joseph Kozakiewicz ,  Ram B. Gupta ,  Jian-Yang Cho ,  Roderick G. Ryles ,  Fadi Khawam

IPC: C08L23/12 ,  C08K5/3492 ,  C08K5/00 ,  C08K5/3475 ,  C08K5/357 ,  C08K5/06 ,  C08K5/132 ,  C08K5/134 ,  C08K5/1535 ,  C08L23/06 ,  C08L77/06

Abstract: Stabilizer compositions having a stabilizing amount of at least one co-active agent; an ultraviolet light absorber chosen from orthohydroxyphenyl triazine compounds and/or benzoxazinone compounds; and a hindered amine light stabilizer, are provided herein, along with masterbatch concentrates containing same, and processes for using same for stabilizing polymeric organic materials to protect against light and thermal degradation due to exposure to UV irradiation.

公开(公告)号：US10975278B2

公开(公告)日：2021-04-13

申请号：US16286875

申请日：2019-02-27

Applicant: Cytec Industries Inc.

Inventor： Joseph Kozakiewicz ,  J. Mon-Hei Eng ,  Jian-Yang Cho ,  Ram B. Gupta ,  Robert Hopper

IPC: C09K3/22 ,  C08K5/3475 ,  C08K5/3492 ,  C08K5/132 ,  C08K5/357 ,  C08K5/3435 ,  C08K5/3462 ,  C08K5/134 ,  C08K5/13 ,  C08K5/523 ,  C08K5/527 ,  C08K5/5393 ,  C08K5/38 ,  C08K5/17 ,  C08K5/20 ,  C08K5/06 ,  C08K5/103 ,  C08K5/101 ,  C08K5/05

Abstract: Granular stabilizer compositions including concentrated blends of one or more polymer additive, and one or more co-active agent, which compositions are low-dusting and substantially free of a carrier polymer resin are disclosed herein, along with process for making the stabilizer compositions, and uses of such stabilizer compositions for providing enhanced protection of polymer resins against deleterious effects from air (oxygen), residual catalyst, mechanical stress, heat, and light.