Non-volatile memory device using mobile ionic charge and method of manufacturing the same
    2.
    发明申请
    Non-volatile memory device using mobile ionic charge and method of manufacturing the same 审中-公开
    使用移动离子电荷的非易失性存储器件及其制造方法

    公开(公告)号:US20060121661A1

    公开(公告)日:2006-06-08

    申请号:US11296084

    申请日:2005-12-06

    IPC分类号: H01L21/8234 H01L21/425

    摘要: A non-volatile memory device using mobile ionic charges and a method of manufacturing the same are provided. The method includes forming a gate dielectric layer on a semiconductor substrate, injecting mobile ionic charges into the gate dielectric layer by leading source plasma to a surface of the gate dielectric layer and implanting ions within the source plasma into the gate dielectric layer using plasma doping, forming on the gate dielectric layer a gate to which a control voltage controlling distribution of the mobile ionic charges within the gate dielectric layer is supplied to control a threshold voltage, and forming a source region and a drain region in the semiconductor substrate near the gate.

    摘要翻译: 提供了使用移动离子电荷的非易失性存储器件及其制造方法。 该方法包括在半导体衬底上形成栅极电介质层,通过将源极等离子体引导到栅极电介质层的表面并将源极等离子体内的离子注入到等离子体掺杂的栅极介质层中,将移动的离子电荷注入到栅极电介质层中, 在所述栅极电介质层上形成控制栅极电介质层内的移动离子电荷分布的控制电压以控制阈值电压的栅极,以及在栅极附近的半导体衬底中形成源极区域和漏极区域。

    MECHANISM FOR FACILITATING DYNAMIC GENERATION AND TRANSMISSION OF CANNED RESPONSES ON COMPUTING DEVICES
    3.
    发明申请
    MECHANISM FOR FACILITATING DYNAMIC GENERATION AND TRANSMISSION OF CANNED RESPONSES ON COMPUTING DEVICES 审中-公开
    促进计算机设备动态生成和传输咔ED响应的机制

    公开(公告)号:US20150188861A1

    公开(公告)日:2015-07-02

    申请号:US14140641

    申请日:2013-12-26

    IPC分类号: H04L12/58 H04W4/14

    CPC分类号: H04L51/06 H04L51/02 H04W4/14

    摘要: A mechanism is described for facilitating a dynamic selection and transmission of canned messages according to one embodiment. A method of embodiments, as described herein, includes selecting, at a computing device, a canned message from a plurality of canned messages, where the canned message includes a text message having one or more of a default message, a variable, and a symbol, wherein the selection is to be performed without a keyboard at the computing device, and transmitting the selected canned message.

    摘要翻译: 描述了根据一个实施例的用于促进固定消息的动态选择和传输的机制。 如本文所描述的,实施例的方法包括在计算设备处选择来自多个固定消息的固定消息,其中所述固定消息包括具有默认消息,变量和符号中的一个或多个的文本消息 ,其中所述选择将在所述计算设备处不使用键盘执行,并且发送所选择的固定消息。

    Transistor using impact ionization and method of manufacturing the same
    5.
    发明申请
    Transistor using impact ionization and method of manufacturing the same 审中-公开
    使用冲击电离的晶体管及其制造方法

    公开(公告)号:US20060125041A1

    公开(公告)日:2006-06-15

    申请号:US11296152

    申请日:2005-12-06

    IPC分类号: H01L27/095

    摘要: A transistor using impact ionization and a method of manufacturing the same are provided. A gate dielectric layer, a gate, and first and second spacers are formed on a semiconductor substrate. A first impurity layer is formed spaced from the first spacer and a second impurity layer is formed expanding and overlapping with the second spacer therebelow, by performing slant ion-implantation on the semiconductor substrate using the gate and the first and second spacers as a mask. A source and a drain are formed on the semiconductor substrate to be self-aligned with the first and second spacers, respectively, thereby defining an ionization region between the source and the drain in the semiconductor substrate. The source includes a first silicide layer to form a schottky junction with the ionization region. The drain includes a portion of the second impurity layer overlapping with the second spacer and a second silicide layer which is aligned with the second spacer to form an ohmic contact with the second impurity layer.

    摘要翻译: 提供了使用冲击电离的晶体管及其制造方法。 栅极电介质层,栅极以及第一和第二间隔物形成在半导体衬底上。 第一杂质层与第一间隔物隔开形成,并且通过使用栅极和第一和第二间隔物作为掩模在半导体衬底上进行倾斜离子注入,形成第二杂质层与其间的第二间隔物膨胀和重叠。 源极和漏极分别形成在半导体衬底上以与第一和第二间隔物自对准,由此在半导体衬底中的源极和漏极之间限定电离区域。 源包括与电离区形成肖特基结的第一硅化物层。 漏极包括与第二间隔物重叠的第二杂质层的一部分和与第二间隔物对准的第二硅化物层以与第二杂质层形成欧姆接触。

    Crushing method using large boreholes in underwater rock
    6.
    发明申请
    Crushing method using large boreholes in underwater rock 失效
    在水下岩石中使用大型钻孔的破碎方法

    公开(公告)号:US20050194832A1

    公开(公告)日:2005-09-08

    申请号:US10900690

    申请日:2004-07-27

    CPC分类号: E21B7/12 E21C37/005

    摘要: The present invention relates to a crushing method using large boreholes in an underwater rock in which plural large boreholes are drilled on the rock in a predetermined space, the drilled boreholes form plural free surfaces, and the large drop hammer gives a blow to the free surface, thus enhancing the crushing effect. The crushing method is comprised of the following processes: plural large boreholes, of which each size is 100˜300 mmφ, are arranged on the rock to be crushed, and are drilled in a depth of 1˜10 m, and the free surface is reserved before the drop hammer work; a middle point between the adjoining large boreholes is set as target point; the drop hammer is lift above a position perpendicular to the target point, and is free-fallen to give a blow to the rock to be crushed; and the above processes are repeatedly operated.

    摘要翻译: 本发明涉及一种在水下岩石中使用大的钻孔的破碎方法,其中在预定的空间中在岩石上钻出多个大的钻孔,钻孔形成多个自由表面,并且大滴锤给自由表面打击 ,从而提高破碎效果。 破碎方法由以下工艺组成:将岩石上的多个大孔径为100〜300mmφ的多个钻孔布置在待粉碎的岩石上,并且在1〜10μm的深度钻出,自由面为 落锤前工作; 相邻大孔之间的中点设定为目标点; 跌落锤在垂直于目标点的位置上方升起,自由下落以对被粉碎的岩石施加打击; 并且上述处理被重复地操作。

    Semiconductor device including diffusion barrier and method for manufacturing the same
    7.
    发明申请
    Semiconductor device including diffusion barrier and method for manufacturing the same 审中-公开
    包括扩散阻挡层的半导体器件及其制造方法

    公开(公告)号:US20070040275A1

    公开(公告)日:2007-02-22

    申请号:US11502366

    申请日:2006-08-11

    申请人: Han Lee In Baek

    发明人: Han Lee In Baek

    IPC分类号: H01L23/52 H01L21/4763

    摘要: Provided are a semiconductor device including a diffusion barrier and a method for manufacturing the same. In the method, an interlayer insulating layer on a semiconductor substrate is formed. The interlayer insulating layer is selectively removed, so that a via hole is formed therein. A first diffusion barrier is formed on sidewalls and a bottom of the via hole using PEALD. A copper layer is formed above the first diffusion barrier, and CMP is performed on the copper layer until the interlayer insulating layer is exposed to form a copper line.

    摘要翻译: 提供了包括扩散阻挡层的半导体器件及其制造方法。 在该方法中,形成半导体衬底上的层间绝缘层。 选择性地去除层间绝缘层,从而在其中形成通孔。 使用PEALD在通孔的侧壁和底部上形成第一扩散阻挡层。 在第一扩散阻挡层上形成铜层,在铜层上进行CMP,直到层间绝缘层露出来形成铜线。

    Ultra thin film SOI MOSFET having recessed source/drain structure and method of fabricating the same
    8.
    发明申请
    Ultra thin film SOI MOSFET having recessed source/drain structure and method of fabricating the same 审中-公开
    具有凹陷源极/漏极结构的超薄膜SOI MOSFET及其制造方法

    公开(公告)号:US20060131648A1

    公开(公告)日:2006-06-22

    申请号:US11137396

    申请日:2005-05-26

    IPC分类号: H01L27/12

    摘要: There are provided an ultra thin film silicon on insulator (SOI) metal oxide semiconductor field effect transistor (MOSFET) having a recessed source/drain structure, and a method of fabricating the same. The ultra thin film SOI MOS transistor includes a semiconductor substrate; a buried insulating layer disposed on the semiconductor substrate, and formed recessed except for a center portion thereof; an ultra thin film single crystalline silicon layer pattern disposed on the recessed buried insulating layer; a gate stack disposed on the ultra thin film single crystalline silicon layer pattern, and including a gate insulating layer pattern and a gate conductive layer pattern, which are sequentially stacked; a gate spacer layer disposed on sidewalls of the gate stack; and a recessed source/drain region disposed on the recessed buried insulating layer, and formed to overlap a bottom surface portion of the ultra thin film single crystalline silicon layer pattern, which does not overlap the center portion of the recessed buried insulating layer.

    摘要翻译: 提供了具有凹陷的源极/漏极结构的超薄膜绝缘体上硅(SOI)金属氧化物半导体场效应晶体管(MOSFET)及其制造方法。 超薄膜SOI MOS晶体管包括半导体衬底; 掩埋绝缘层,设置在所述半导体衬底上,除了其中心部分外形成凹陷; 设置在凹入的掩埋绝缘层上的超薄膜单晶硅层图案; 设置在超薄膜单晶硅层图案上的栅堆叠,并且包括依次层叠的栅极绝缘层图案和栅极导电层图案; 设置在所述栅极堆叠的侧壁上的栅极间隔层; 以及凹陷的源极/漏极区,设置在所述凹入的掩埋绝缘层上,并且形成为与所述超薄膜单晶硅层图案的底表面部分重叠,所述底表面部分不与所述凹入的绝缘层的中心部分重叠。

    Boring machine having differential global positioning system receiver for underwater rock and boring method thereof
    9.
    发明申请
    Boring machine having differential global positioning system receiver for underwater rock and boring method thereof 失效
    镗床具有用于水下岩石的差分全球定位系统接收器及其镗孔方法

    公开(公告)号:US20050121230A1

    公开(公告)日:2005-06-09

    申请号:US10892363

    申请日:2004-07-14

    摘要: The present invention relates to a boring machine having differential global positioning system receiver for underwater rock and boring method thereof, new boring technology—a satellite navigation device orients the accurate position of a target—is brought to the underwater boring technology. A differential global positioning system (DGPS) receiver is provided at the body of a boring machine that is installed at the central opening of a self elevation platform (SEP) barge, the location of the boring machine is set to concentricity of the target boring position, and the position of the hull can be controlled without any movement of the boring machine. Then, the barge quickly moves to the next target boring location owing to the operation of a hull moving means so that the construction efficiency of the boring work can be enhanced.

    摘要翻译: 本发明涉及一种具有用于水下岩石和镗孔方法的差分全球定位系统接收器的钻孔机,将采用目标的准确位置的卫星导航装置的新型钻孔技术带入到水下钻孔技术中。 在镗床的主体上设置差速全球定位系统(DGPS)接收器,其安装在自升式平台(SEP)驳船的中心开口处,钻孔机的位置设定为目标钻孔位置的同心度 ,并且可以在没有镗床的任何运动的情况下控制船体的位置。 然后,由于船体移动装置的操作,驳船快速移动到下一个目标钻孔位置,从而可以提高镗孔加工的施工效率。