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    OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES
    2.
    发明申请
    OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES 审中-公开
    光学元件曝光过程

    公开(公告)号：US20150168846A1

    公开(公告)日：2015-06-18

    申请号：US14560756

    申请日：2014-12-04

    申请人： Carl Zeiss SMT GmbH

    发明人： Tilman Schwertner ,  Ulrich Bingel ,  Guido Limbach ,  Julian Kaller ,  Hans-Juergen Scherle ,  Jens Kugler ,  Dirk Schaffer ,  Bernhard Gellrich

    IPC分类号： G03F7/20 ,  G02B27/00

    CPC分类号： G03F7/7015 ,  G02B27/0006 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/70883 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70933 ,  Y10T29/49

    摘要： An optical element unit including a first optical element module and a sealing arrangement is disclosed. The first optical element module occupies a first module space and includes a first module component of a first component type and an associated second module component of a second component type. The first component type is optical elements and the second component type being different from the first component type. The sealing arrangement separates the first module space into a first space and a second space and substantially prevents, at least in a first direction, the intrusion of substances from one of the first space and the second space into the other one of the first space and the second space. The first module component at least partially contacts the first space and, at least in its area optically used, not contacting the second space. The second module component at least partially contacts the second space.

    摘要翻译： 公开了一种包括第一光学元件模块和密封装置的光学元件单元。 第一光学元件模块占据第一模块空间并且包括第一组件类型的第一模块组件和第二组件类型的相关联的第二模块组件。 第一部件类型是光学元件，第二部件类型与第一部件类型不同。 密封装置将第一模块空间分隔成第一空间和第二空间，并至少在第一方向上基本上防止物质从第一空间和第二空间中的一个进入第一空间和 第二个空间。 第一模块部件至少部分地接触第一空间，并且至少在其光学使用的区域中不接触第二空间。 第二模块组件至少部分地接触第二空间。

    LITHOGRAPHY APPARATUS AND METHOD FOR PRODUCING A MIRROR ARRANGEMENT
    3.
    发明申请
    LITHOGRAPHY APPARATUS AND METHOD FOR PRODUCING A MIRROR ARRANGEMENT 有权
    用于生产镜像装置的平面设备和方法

    公开(公告)号：US20150055112A1

    公开(公告)日：2015-02-26

    申请号：US14534644

    申请日：2014-11-06

    申请人： Carl Zeiss SMT GmbH

    发明人： Dirk Schaffer ,  Wilfried Clauss ,  Hin-Yiu Anthony Chung

    IPC分类号： G03F7/20 ,  G02B7/182 ,  G02B5/08

    CPC分类号： G03F7/702 ,  G02B5/0891 ,  G02B7/182 ,  G03F7/70825

    摘要： A lithography apparatus is disclosed, having at least one mirror arrangement which includes a mirror substrate including a front side with a reflecting surface, a side wall, which extends along a circumference of the mirror substrate from a rear side of the mirror substrate, and mounting elements to mount the mirror arrangement on a structural element of the lithography apparatus. The rear side of the mirror substrate and an inner side of the side wall delimit a cavity. Each of the mounting elements is connected to the mirror arrangement at a connection surface. The relation S/D>0.5 is satisfied at least one of the connection surfaces, wherein D denotes a thickness of the side wall at the connection surface and S denotes the length of the shortest path through the mirror material from the centroid of the connection surface to the rear side of the mirror substrate.

    摘要翻译： 公开了一种光刻设备，其具有至少一个反射镜装置，该反射镜装置包括反射镜基板，该反射镜基板包括具有反射表面的前侧，从该反射镜基板的后侧沿着该反射镜基板的圆周延伸的侧壁， 用于将反射镜装置安装在光刻设备的结构元件上的元件。 镜面基板的后侧和侧壁的内侧限定空腔。 每个安装元件在连接表面处连接到反射镜装置。 关系S / D> 0.5满足至少一个连接表面，其中D表示连接表面处的侧壁的厚度，S表示从连接表面的质心通过镜子材料的最短路径的长度 到镜基板的后侧。

    Optical element module with minimized parasitic loads
    6.
    发明授权
    Optical element module with minimized parasitic loads 有权

    公开(公告)号：US10215948B2

    公开(公告)日：2019-02-26

    申请号：US13690227

    申请日：2012-11-30

    申请人： Carl Zeiss SMT GmbH

    发明人： Jens Kugler ,  Ulrich Weber ,  Dirk Schaffer

    IPC分类号： G02B7/02 ,  G03F7/20

    摘要： An optical element module includes an optical element unit and a support structure. The optical element module includes an optical element. The support structure includes a support device and a contact device connected to the support device. A surface of the contact device contacts a surface of the optical element unit and exerts a holding force on the optical element unit along a holding force direction.

    Optical element unit for exposure processes
    10.
    发明授权
    Optical element unit for exposure processes 有权

    公开(公告)号：US10203607B2

    公开(公告)日：2019-02-12

    申请号：US14560756

    申请日：2014-12-04

    申请人： Carl Zeiss SMT GmbH

    发明人： Tilman Schwertner ,  Ulrich Bingel ,  Guido Limbach ,  Julian Kaller ,  Hans-Juergen Scherle ,  Jens Kugler ,  Dirk Schaffer ,  Bernhard Gellrich

    IPC分类号： G03F7/20 ,  G02B27/00

    摘要： An optical element unit including a first optical element module and a sealing arrangement is disclosed. The first optical element module occupies a first module space and includes a first module component of a first component type and an associated second module component of a second component type. The first component type is optical elements and the second component type being different from the first component type. The sealing arrangement separates the first module space into a first space and a second space and substantially prevents, at least in a first direction, the intrusion of substances from one of the first space and the second space into the other one of the first space and the second space. The first module component at least partially contacts the first space and, at least in its area optically used, not contacting the second space. The second module component at least partially contacts the second space.