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    ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY
    2.
    发明申请
    ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY 有权
    投影光刻照明光学单元

    公开(公告)号：US20140111785A1

    公开(公告)日：2014-04-24

    申请号：US14135540

    申请日：2013-12-19

    申请人： Carl Zeiss SMT GmbH

    发明人： Christoph Hennerkes ,  Ingo Saenger ,  Joerg Zimmermann ,  Johannes Ruoff ,  Martin Meier ,  Frank Schlesener

    IPC分类号： G03F7/20 ,  G02B7/18 ,  G02B26/08 ,  G02B17/06

    CPC分类号： G03F7/70191 ,  G02B7/1815 ,  G02B17/06 ,  G02B26/0816 ,  G03F7/70108 ,  G03F7/70116 ,  G03F7/70891

    摘要： An illumination optical unit for projection lithography has a first polarization mirror device to reflect and polarize of illumination light. A second mirror device, which is disposed downstream of the polarization mirror device reflects an illumination light beam. At least one drive device is operatively connected to at least one of the two mirror devices. The two mirror devices are displaceable relative to one another via the drive device between a first relative position, which leads to a first beam geometry of the illumination light beam after reflection at the second mirror device, and a second relative position, which leads to a second beam geometry of the illumination light beam after reflection at the second mirror device, which is different from the first beam geometry. This results in a flexible predefinition of different illumination geometries, in particular of different illumination geometries with rotationally symmetrical illumination.

    摘要翻译： 用于投影光刻的照明光学单元具有用于反射和偏振照明光的第一偏振镜装置。 设置在偏振镜装置下游的第二反射镜装置反射照明光束。 至少一个驱动装置可操作地连接到两个镜装置中的至少一个。 两个镜装置可以经由驱动装置相对于彼此移位，该第一相对位置在第二反射镜装置反射之后导致照明光束的第一光束几何形状和第二相对位置，该第二相对位置导致 在第二镜装置反射后的照明光束的第二光束几何形状，其与第一光束几何形状不同。 这导致不同照明几何形状的灵活预定义，特别是具有旋转对称照明的不同照明几何形状。

    Optical system of a microlithographic projection exposure apparatus, and microlithographic exposure
    4.
    发明授权
    Optical system of a microlithographic projection exposure apparatus, and microlithographic exposure 有权
    微光刻投影曝光装置的光学系统和微光刻曝光

    公开(公告)号：US09500956B2

    公开(公告)日：2016-11-22

    申请号：US14143878

    申请日：2013-12-30

    申请人： Carl Zeiss SMT GmbH

    发明人： Ingo Saenger ,  Joerg Zimmermann ,  Johannes Ruoff ,  Martin Meier ,  Frank Schlesener ,  Christoph Hennerkes

    IPC分类号： G03F7/20 ,  G02B27/28

    CPC分类号： G03F7/70191 ,  G02B27/283 ,  G03F7/70108 ,  G03F7/70116 ,  G03F7/70566

    摘要： The disclosure relates to optical systems of a microlithographic projection exposure apparatus, and to a microlithographic exposure method. According to an aspect of the disclosure, an optical system has a light source, a ray-splitting optical element, which splits a light ray incident on this element when the projection exposure apparatus is in operation into a first partial ray and a second partial ray, with the first and the second partial ray having mutually orthogonal polarization directions, and at least one ray-deflecting optical element for generating a desired polarized illumination setting from the first partial ray and the second partial ray, wherein the ray-splitting optical element is arranged such that light incident on this ray-splitting optical element when the projection exposure apparatus is in operation has a degree of polarization of less than one.

    摘要翻译： 本公开涉及微光刻投影曝光装置的光学系统以及微光刻曝光方法。 根据本公开的一个方面，一种光学系统具有光源，分光光学元件，其在投影曝光装置工作时分裂入射在该元件上的光线到第一部分光线和第二部分光线 其中第一和第二部分光线具有相互正交的偏振方向，以及至少一个光线偏转光学元件，用于从第一部分光线和第二部分光线产生期望的偏振照明设置，其中光线分离光学元件是 被布置成使得当投影曝光装置运行时入射在该分光光学元件上的光具有小于1的偏振度。

    Illumination optical unit for projection lithography
    5.
    发明授权
    Illumination optical unit for projection lithography 有权
    用于投影光刻的照明光学单元

    公开(公告)号：US09507269B2

    公开(公告)日：2016-11-29

    申请号：US14135540

    申请日：2013-12-19

    申请人： Carl Zeiss SMT GmbH

    发明人： Christoph Hennerkes ,  Ingo Saenger ,  Joerg Zimmermann ,  Johannes Ruoff ,  Martin Meier ,  Frank Schlesener

    IPC分类号： G03B27/54 ,  G03F7/20 ,  G02B7/18 ,  G02B17/06 ,  G02B26/08

    CPC分类号： G03F7/70191 ,  G02B7/1815 ,  G02B17/06 ,  G02B26/0816 ,  G03F7/70108 ,  G03F7/70116 ,  G03F7/70891

    摘要： An illumination optical unit for projection lithography has a first polarization mirror device to reflect and polarize of illumination light. A second mirror device, which is disposed downstream of the polarization mirror device reflects an illumination light beam. At least one drive device is operatively connected to at least one of the two mirror devices. The two mirror devices are displaceable relative to one another via the drive device between a first relative position, which leads to a first beam geometry of the illumination light beam after reflection at the second mirror device, and a second relative position, which leads to a second beam geometry of the illumination light beam after reflection at the second mirror device, which is different from the first beam geometry. This results in a flexible predefinition of different illumination geometries, in particular of different illumination geometries with rotationally symmetrical illumination.

    摘要翻译： 用于投影光刻的照明光学单元具有用于反射和偏振照明光的第一偏振镜装置。 设置在偏振镜装置下游的第二反射镜装置反射照明光束。 至少一个驱动装置可操作地连接到两个镜装置中的至少一个。 两个镜装置可以经由驱动装置相对于彼此移位，该第一相对位置在第二反射镜装置反射之后导致照明光束的第一光束几何形状和第二相对位置，该第二相对位置导致 在第二镜装置反射后的照明光束的第二光束几何形状，其与第一光束几何形状不同。 这导致不同照明几何形状的灵活预定义，特别是具有旋转对称照明的不同照明几何形状。

    OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS, AND MICROLITHOGRAPHIC EXPOSURE
    6.
    发明申请
    OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS, AND MICROLITHOGRAPHIC EXPOSURE 有权
    微观投影曝光装置的光学系统和微观曝光

    公开(公告)号：US20140132942A1

    公开(公告)日：2014-05-15

    申请号：US14143878

    申请日：2013-12-30

    申请人： Carl Zeiss SMT GmbH

    发明人： Ingo Saenger ,  Joerg Zimmermann ,  Johannes Ruoff ,  Martin Meier ,  Frank Schlesener ,  Christoph Hennerkes

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70191 ,  G02B27/283 ,  G03F7/70108 ,  G03F7/70116 ,  G03F7/70566

    摘要： The disclosure relates to optical systems of a microlithographic projection exposure apparatus, and to a microlithographic exposure method. According to an aspect of the disclosure, an optical system has a light source, a ray-splitting optical element, which splits a light ray incident on this element when the projection exposure apparatus is in operation into a first partial ray and a second partial ray, with the first and the second partial ray having mutually orthogonal polarization directions, and at least one ray-deflecting optical element for generating a desired polarized illumination setting from the first partial ray and the second partial ray, wherein the ray-splitting optical element is arranged such that light incident on this ray-splitting optical element when the projection exposure apparatus is in operation has a degree of polarization of less than one.

    摘要翻译： 本公开涉及微光刻投影曝光装置的光学系统以及微光刻曝光方法。 根据本公开的一个方面，一种光学系统具有光源，分光光学元件，其在投影曝光装置工作时分裂入射在该元件上的光线到第一部分光线和第二部分光线 其中第一和第二部分光线具有相互正交的偏振方向，以及至少一个光线偏转光学元件，用于从第一部分光线和第二部分光线产生期望的偏振照明设置，其中光线分离光学元件是 被布置成使得当投影曝光装置运行时入射在该分光光学元件上的光具有小于1的偏振度。