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公开(公告)号：US20200285976A1
公开(公告)日：2020-09-10
申请号：US16807581
申请日：2020-03-03
发明人： Abhilash Srikantha , Christian Wojek , Keumsil Lee , Thomas Korb , Jens Timo Neumann , Eugen Foca
摘要： Methods for determining metrology sites for products includes detecting corresponding objects in measurement data of one or more product samples, and aligning the detected objects are aligned. The methods also include analyzing the aligned objects, and determining metrology sites based on the analysis. Devices use such methods to determine metrology sites for products.
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公开(公告)号：US11436506B2
公开(公告)日：2022-09-06
申请号：US16807581
申请日：2020-03-03
发明人： Abhilash Srikantha , Christian Wojek , Keumsil Lee , Thomas Korb , Jens Timo Neumann , Eugen Foca
IPC分类号： G06N20/00 , G06N5/04 , G06K9/00 , G06V10/82 , G06K9/62 , G01N23/06 , G01N23/046 , G01N23/22 , G01N21/65 , G06N3/04 , G06N3/08
摘要： Methods for determining metrology sites for products includes detecting corresponding objects in measurement data of one or more product samples, and aligning the detected objects are aligned. The methods also include analyzing the aligned objects, and determining metrology sites based on the analysis. Devices use such methods to determine metrology sites for products.
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公开(公告)号：US20210296089A1
公开(公告)日：2021-09-23
申请号：US17220519
申请日：2021-04-01
申请人： Carl Zeiss SMT GmbH
发明人： Dirk Zeidler , Thomas Korb , Philipp Huethwohl , Jens Timo Neumann , Christof Riedesel , Christian Wojek , Joaquin Correa , Wolfgang Hoegele
IPC分类号： H01J37/28
摘要： A method, including: recording plural images of an object by scanning plural particle beams across the object and detecting signals generated by the particle beams, wherein the plural particle beams are generated by a multi-beam particle microscope; determining plural regions of interest; determining plural image regions in each of the recorded images; determining plural displacement vectors; and determining image distortions based on image data of the recorded images and the determined displacement vectors.
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4.发明申请公开(公告)号：US20200258212A1
公开(公告)日：2020-08-13
申请号：US16786307
申请日：2020-02-10
申请人： Carl Zeiss SMT GmbH
摘要： Methods for determining one or more quality or size parameters of a structure in a semiconductor product, on the basis of an image of the semiconductor product which was generated with the aid of charged particles which have been radiated onto the semiconductor product, include: providing the image of the semiconductor product; applying the provided image to a machine-learning-based method such as, e.g., an artificial neural network which has been trained with training images of semiconductor products and which is configured to generate an output parameter from the provided image; and determining the size parameter of the structure on the basis of the output parameter.
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公开(公告)号：US12045969B2
公开(公告)日：2024-07-23
申请号：US17034640
申请日：2020-09-28
申请人： Carl Zeiss SMT GmbH
发明人： Jens Timo Neumann , Eugen Foca , Ramani Pichumani , Abhilash Srikantha , Christian Wojek , Thomas Korb , Joaquin Correa
CPC分类号： G06T7/0004 , H01L22/26 , G06T2207/10061 , G06T2207/20081 , G06T2207/30148
摘要： A method includes obtaining at least one 2-D image dataset of semiconductor structures formed on a wafer including one or more defects during a wafer run of a wafer using a predefined fabrication process. The method also includes determining, based on at least one machine-learning algorithm trained on prior knowledge of the fabrication process and based on the at least one 2-D image dataset, one or more process deviations of the wafer run from the predefined fabrication process as a root cause of the one or more defects. A 3-D image dataset may be determined as a hidden variable.
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公开(公告)号：US20210158215A1
公开(公告)日：2021-05-27
申请号：US17140250
申请日：2021-01-04
申请人： Carl Zeiss SMT GmbH
发明人： Dirk Seidel , Alexander Freytag , Christian Wojek , Susanne Töpfer , Carsten Schmidt , Christoph Husemann
摘要： The present invention relates to a method for evaluating a statistically distributed measured value in the examination of an element for a photolithography process, comprising the following steps: (a) using a plurality of parameters in a trained machine learning model, wherein the parameters characterize a state of a measurement environment in a time period assigned to a measurement of the measured value; and (b) executing the trained machine learning model in order to evaluate the measured value.
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公开(公告)号：US20210358101A1
公开(公告)日：2021-11-18
申请号：US17388589
申请日：2021-07-29
申请人： Carl Zeiss SMT GmbH
摘要： A method includes obtaining an image data set that depicts semiconductor components, and applying a hierarchical bricking to the image data set. In this case, the bricking includes a plurality of bricks on a plurality of hierarchical levels. The bricks on different hierarchical levels have different image element sizes of corresponding image elements.
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公开(公告)号：US11728130B2
公开(公告)日：2023-08-15
申请号：US17220519
申请日：2021-04-01
申请人： Carl Zeiss SMT GmbH
发明人： Dirk Zeidler , Thomas Korb , Philipp Huethwohl , Jens Timo Neumann , Christof Riedesel , Christian Wojek , Joaquin Correa , Wolfgang Hoegele
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , H01J2237/063 , H01J2237/221 , H01J2237/2806
摘要： A method, including: recording plural images of an object by scanning plural particle beams across the object and detecting signals generated by the particle beams, wherein the plural particle beams are generated by a multi-beam particle microscope; determining plural regions of interest; determining plural image regions in each of the recorded images; determining plural displacement vectors; and determining image distortions based on image data of the recorded images and the determined displacement vectors.
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9.发明授权公开(公告)号：US11226481B2
公开(公告)日：2022-01-18
申请号：US16142947
申请日：2018-09-26
申请人： Carl Zeiss AG , Carl Zeiss SMT GmbH
摘要： Methods and apparatuses for designing optical systems are provided. In this case, on a plurality of known optical systems, machine learning is carried out in order to train a computing device. After this training, the computing device can generate a design for an optical system on the basis of parameters describing desired properties of an optical system.
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公开(公告)号：US20210132594A1
公开(公告)日：2021-05-06
申请号：US17119053
申请日：2020-12-11
申请人： Carl Zeiss SMT GmbH
IPC分类号： G05B19/4155
摘要： The invention relates to a device for examining and/or processing an element for photolithography with a beam of charged particles, wherein the device comprises: (a) means for acquiring measurement data while the element for photolithography is exposed to the beam of charged particles; and (b) means for predetermining a drift of the beam of charged particles relative to the element for photolithography with a trained machine learning model and/or a predictive filter, wherein the trained machine learning model and/or the predictive filter use(s) at least the measurement data as input data.
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