Polyurethanes containing secondary amide groups and their use in one-component thermoset compositions
    1.
    发明授权
    Polyurethanes containing secondary amide groups and their use in one-component thermoset compositions 失效
    含有仲酰胺基团的聚氨酯及其在单组分热固性组合物中的用途

    公开(公告)号:US06552157B2

    公开(公告)日:2003-04-22

    申请号:US09730080

    申请日:2000-12-05

    IPC分类号: C08G1832

    摘要: The present invention relates to polyurethanes containing secondary amide groups in the backbones of the polyurethanes, wherein the secondary amide groups (calculated as NH—CO—, MW 43) are present in an amount of 1 to 14% by weight, based on the weight of the polyurethanes, and correspond to the formula —X1—R1—NH—C(O)—R2—X2—  (I) wherein X1 and X2 are the same or different and represent the groups obtained by removing a hydrogen atom from a hydroxy group or a primary or secondary amino group and R1 and R2 are the same or different and represent linear or branched hydrocarbon groups that are optionally substituted by groups that do not contain isocyanate-reactive hydrogen atoms. The present invention also relates to one-component, thermoset compositions containing the polyurethanes with secondary amide groups in the backbone and a cross-linking component that is reactive with amide groups. Finally, the present invention relates to coatings, sealants and adhesives prepared from these one-component, thermoset compositions.

    摘要翻译: 本发明涉及在聚氨酯的主链中含有仲酰胺基团的聚氨酯,其中仲酰胺基团(以NH-CO-,MW 43计算)的存在量为基于重量的1至14重量% 的氨基甲酸酯,并且对应于肟基X 1和X 2相同或不同,表示通过从羟基或伯或仲氨基除去氢原子获得的基团,R 1和R 2相同或不同,表示直链或支链 任选被不含有异氰酸酯反应性氢原子的基团取代的烃基。本发明还涉及含有在主链中具有仲酰胺基团的聚氨酯和含有异氰酸酯反应性氢原子的反应性的交联组分的单组分热固性组合物 酰胺基。 最后,本发明涉及由这些单组分热固性组合物制备的涂料,密封剂和粘合剂。

    Aqueous polyurethane dispersions containing secondary amide groups and their use in one-component thermoset compositions
    4.
    发明授权
    Aqueous polyurethane dispersions containing secondary amide groups and their use in one-component thermoset compositions 有权
    含有仲酰胺基团的水性聚氨酯分散体及其在单组分热固性组合物中的用途

    公开(公告)号:US06455632B1

    公开(公告)日:2002-09-24

    申请号:US09730079

    申请日:2000-12-05

    IPC分类号: C08J300

    摘要: The present invention relates to aqueous polyurethane dispersions containing secondary amide groups in the backbone of the polyurethane, wherein the secondary amide groups (calculated as NH—CO—, MW 43) are present in an amount of 1 to 14% by weight, based on the weight of the polyurethanes, and correspond to the formula —X1—R1—NH—C(O)—R2—X2—  (I) wherein X1, and X2 are the same or different and represent the groups obtained by removing a hydrogen atom from a hydroxy group or a primary or secondary amino group and R1and R2 are the same or different and represent linear or branched hydrocarbon groups that are optionally substituted by groups that do not contain isocyanate-reactive hydrogen atoms. The present invention also relates to aqueous, one-component, thermoset compositions containing the polyurethanes with amide groups in the backbone and a cross-linking component that is reactive with amide groups. Finally, the present invention relates to coatings, sealants and adhesives prepared from these aqueous, one-component, thermoset compositions.

    摘要翻译: 本发明涉及在聚氨酯主链中含有仲酰胺基团的含水聚氨酯分散体,其中仲酰胺基团(以NH-CO-,MW 43计算)的存在量为1至14重量%,基于 聚氨酯的重量,对应于X 1和X 2的化学式相同或不同,表示通过从羟基或伯或仲氨基除去氢原子而获得的基团,R 1和R 2相同或不同,表示直链 或任选被不含有异氰酸酯反应性氢原子的基团取代的支链烃基。本发明还涉及包含在主链中具有酰胺基团的聚氨酯的含水单组分热固性组合物和交联组分, 与酰胺基反应。 最后,本发明涉及由这些水性单组分热固性组合物制备的涂料,密封剂和粘合剂。

    One-component thermoset coating compositions
    6.
    发明授权
    One-component thermoset coating compositions 失效
    单组分热固性涂料组合物

    公开(公告)号:US06127514A

    公开(公告)日:2000-10-03

    申请号:US197910

    申请日:1998-11-23

    摘要: The present invention relates to one-component, thermoset compositions containinga) compounds containing modified hydrazide groups and corresponding to formula I ##STR1## wherein p2 R represents the residue obtained by removing the isocyanate groups from a monomeric polyisocyanate, a polyisocyanate adduct or an NCO prepolymer,X represents OR' or NHR' andR' represents a group which is inert to isocyanate groups under the conditions used to form the compound of formula I andn has a value of 2 to 6,b) compounds containing two or more epoxy groups andc) a basic catalyst.The present invention also relates to coatings, adhesives and sealants prepared from these thermoset compositions.

    摘要翻译: 本发明涉及含有a)含有改性酰肼基团且对应于式I的化合物的单组分热固性组合物,其中p2R表示通过从单体多异氰酸酯,多异氰酸酯加合物或NCO预聚物除去异氰酸酯基团获得的残基,X 表示OR'或NHR',R'表示在用于形成式I化合物的条件下对异氰酸酯基团呈惰性的基团,n表示2〜6的数值,b)含有2个以上环氧基和c )碱性催化剂。 本发明还涉及由这些热固性组合物制备的涂料,粘合剂和密封剂。

    Method of preparing polymer modified pigments
    8.
    发明申请
    Method of preparing polymer modified pigments 有权
    制备聚合物改性颜料的方法

    公开(公告)号:US20100160536A1

    公开(公告)日:2010-06-24

    申请号:US12316997

    申请日:2008-12-18

    IPC分类号: C09D11/10

    摘要: The present invention relates to a method of preparing a polymer modified pigment comprising the steps of, combining, in any order, a modified pigment comprising a pigment having attached at least one reactive group, a polymer comprising at least one functional group, and a non-reactive diluent, to form a reaction mixture, reacting the polymer and the modified pigment in the reaction mixture to form a mixture comprising the polymer modified pigment and the non-reactive diluent; and removing the non-reactive diluent from the mixture to form the polymer modified pigment. Also disclosed are the resulting polymer modified pigments and inkjet ink compositions comprising them.

    摘要翻译: 本发明涉及一种制备聚合物改性颜料的方法,包括以任何顺序将包含连接至少一个反应性基团的颜料的改性颜料,包含至少一个官能团的聚合物和非 - 反应性稀释剂,以形成反应混合物,使反应混合物中的聚合物和改性颜料反应形成包含聚合物改性颜料和非反应性稀释剂的混合物; 并从混合物中除去非反应性稀释剂以形成聚合物改性颜料。 还公开了得到的聚合物改性颜料和包含它们的喷墨油墨组合物。

    Positive-tone photoresist containing novel diester dissolution inhibitors
    9.
    发明授权
    Positive-tone photoresist containing novel diester dissolution inhibitors 失效
    含有新型二酯溶解抑制剂的正色光致抗蚀剂

    公开(公告)号:US5585223A

    公开(公告)日:1996-12-17

    申请号:US633637

    申请日:1996-04-17

    IPC分类号: G03F7/004 G03F7/36 G03F7/38

    摘要: A positive-tone photoresist is provided. The photoresist comprises a polymer, a photoactive agent, and a dissolution inhibitor. The dissolution inhibitor comprises a compound of Formula I: ##STR1## wherein R.sub.1 is a C.sub.1 -C.sub.20 alkyl, cyclo alkyl, benzyl, phenyl, alkyl substituted cyclo alkyl, alkoxy substituted cyclo alkyl, alkyl substituted phenyl, alkoxy substituted phenyl, acetoxy substituted phenyl, hydroxy substituted phenyl, t-butyloxycarbonyloxy substituted phenyl, diphenyl alkyl, alkyl substituted diphenyl, alkoxy substituted diphenyl, alkyl substituted diphenyl alkyl, or alkoxy substituted diphenyl alkyl; and R.sub.2 is a C.sub.1 -C.sub.20 alkyl, cyclo alkyl, benzyl, phenyl, alkyl substituted cyclo alkyl, alkoxy substituted cyclo alkyl, alkyl substituted phenyl, alkoxy substituted phenyl, hydroxy substituted phenyl, acetoxy substituted phenyl, or t-butyloxycarbonyloxy substituted phenyl.The present invention also provides a method of making microelectronic structures.

    摘要翻译: 提供正色光致抗蚀剂。 光致抗蚀剂包括聚合物,光活性剂和溶解抑制剂。 溶解抑制剂包括式I化合物:其中R 1是C 1 -C 20烷基,环烷基,苄基,苯基,烷基取代的环烷基,烷氧基取代的环烷基,烷基取代的苯基,烷氧基取代的苯基, 乙酰氧基取代的苯基,羟基取代的苯基,叔丁氧基羰氧基取代的苯基,二苯基烷基,烷基取代的二苯基,烷氧基取代的二苯基,烷基取代的二苯基烷基或烷氧基取代的二苯基烷基; 烷基取代的苯基,烷氧基取代的苯基,羟基取代的苯基,乙酰氧基取代的苯基或叔丁氧羰基氧基取代的苯基。 本发明还提供了一种制造微电子结构的方法。