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1.发明授权公开(公告)号：US07347953B2
公开(公告)日：2008-03-25
申请号：US11345812
申请日：2006-02-02
IPC分类号： B44C1/22
CPC分类号： B81C1/00031 , B81C2201/0149 , B82Y30/00 , Y10S430/146 , Y10T428/24479 , Y10T428/24488 , Y10T428/2457 , Y10T428/2462
摘要： A method for forming self-assembled patterns on a substrate surface is provided. First, a block copolymer layer, which comprises a block copolymer having two or more immiscible polymeric block components, is applied onto a substrate that comprises a substrate surface with a trench therein. The trench specifically includes at least one narrow region flanked by two wide regions, and wherein the trench has a width variation of more than 50%. Annealing is subsequently carried out to effectuate phase separation between the two or more immiscible polymeric block components in the block copolymer layer, thereby forming periodic patterns that are defined by repeating structural units. Specifically, the periodic patterns at the narrow region of the trench are aligned in a predetermined direction and are essentially free of defects. Block copolymer films formed by the above-described method as well as semiconductor structures comprising such block copolymer films are also described.
摘要翻译： 提供了一种在衬底表面上形成自组装图案的方法。 首先，将包含具有两个或更多个不混溶的聚合物嵌段组分的嵌段共聚物的嵌段共聚物层施加到包含其中具有沟槽的衬底表面的衬底上。 沟槽具体包括至少一个两个宽的区域的窄区域，并且其中沟槽具有大于50％的宽度变化。 随后进行退火以实现嵌段共聚物层中的两种或更多种不混溶的聚合物嵌段组分之间的相分离，从而形成由重复结构单元定义的周期性图案。 具体地说，在沟槽的窄区域的周期性图案在预定方向上排列，并且基本上没有缺陷。 还描述了通过上述方法形成的嵌段共聚物膜以及包含这种嵌段共聚物膜的半导体结构。
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2.发明申请EMBEDDED NANOPARTICLE FILMS AND METHOD FOR THEIR FORMATION IN SELECTIVE AREAS ON A SURFACE 有权嵌入式纳米薄膜及其在表面选择区域形成的方法公开(公告)号：US20090053129A1
公开(公告)日：2009-02-26
申请号：US12197688
申请日：2008-08-25
CPC分类号： C01B31/0226 , B82Y30/00 , B82Y40/00 , C01B32/16 , C01B32/162 , C01B2202/06 , C01B2202/36 , D01F9/127 , Y10S423/40 , Y10S977/742 , Y10S977/75 , Y10T428/24372 , Y10T428/24521 , Y10T428/24537 , Y10T428/24612 , Y10T428/2462 , Y10T428/2918
摘要： The invention is directed to a method of positioning nanoparticles on a patterned substrate. The method comprises providing a patterned substrate with selectively positioned recesses, and applying a solution or suspension of nanoparticles to the patterned substrate to form a wetted substrate. A wiper member is dragged across the surface of the wetted substrate to remove a portion of the applied nanoparticles from the wetted substrate, and leaving a substantial number of the remaining portion of the applied nanoparticles disposed in the selectively positioned recesses of the substrate. The invention is also directed to a method of making carbon nanotubes from the positioned nanoparticles.
摘要翻译： 本发明涉及一种将图案化衬底上的纳米颗粒定位的方法。 该方法包括提供具有选择性定位的凹部的图案化衬底，以及将纳米颗粒的溶液或悬浮液施加到图案化衬底以形成润湿衬底。 将擦拭器构件拖过湿润衬底的表面以从受湿衬底移除一部分所施加的纳米颗粒，并将大量剩余部分的所施加的纳米颗粒置于衬底的选择性定位的凹槽中。 本发明还涉及从定位的纳米颗粒制备碳纳米管的方法。
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3.发明申请公开(公告)号：US20130011612A1
公开(公告)日：2013-01-10
申请号：US13611636
申请日：2012-09-12
CPC分类号： C01B31/0226 , B82Y30/00 , B82Y40/00 , C01B32/16 , C01B32/162 , C01B2202/06 , C01B2202/36 , D01F9/127 , Y10S423/40 , Y10S977/742 , Y10S977/75 , Y10T428/24372 , Y10T428/24521 , Y10T428/24537 , Y10T428/24612 , Y10T428/2462 , Y10T428/2918
摘要： The invention is directed to a method of positioning nanoparticles on a patterned substrate. The method comprises providing a patterned substrate with selectively positioned recesses, and applying a solution or suspension of nanoparticles to the patterned substrate to form a wetted substrate. A wiper member is dragged across the surface of the wetted substrate to remove a portion of the applied nanoparticles from the wetted substrate, and leaving a substantial number of the remaining portion of the applied nanoparticles disposed in the selectively positioned recesses of the substrate. The invention is also directed to a method of making carbon nanotubes from the positioned nanoparticles.
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4.发明授权公开(公告)号：US07820270B2
公开(公告)日：2010-10-26
申请号：US12540440
申请日：2009-08-13
CPC分类号： B81C1/00031 , B81C2201/0149 , B82Y30/00 , Y10S430/146 , Y10T428/24479 , Y10T428/24488 , Y10T428/2457 , Y10T428/2462
摘要： A method for forming self-assembled patterns on a substrate surface is provided. First, a block copolymer layer, which comprises a block copolymer having two or more immiscible polymeric block components, is applied onto a substrate that comprises a substrate surface with a trench therein. The trench specifically includes at least one narrow region flanked by two wide regions, and wherein the trench has a width variation of more than 50%. Annealing is subsequently carried out to effectuate phase separation between the two or more immiscible polymeric block components in the block copolymer layer, thereby forming periodic patterns that are defined by repeating structural units. Specifically, the periodic patterns at the narrow region of the trench are aligned in a predetermined direction and are essentially free of defects. Block copolymer films formed by the above-described method as well as semiconductor structures comprising such block copolymer films are also described.
摘要翻译： 提供了一种在衬底表面上形成自组装图案的方法。 首先，将包含具有两个或更多个不混溶的聚合物嵌段组分的嵌段共聚物的嵌段共聚物层施加到包含其中具有沟槽的衬底表面的衬底上。 沟槽具体包括至少一个两个宽的区域的窄区域，并且其中沟槽具有大于50％的宽度变化。 随后进行退火以实现嵌段共聚物层中的两种或更多种不混溶的聚合物嵌段组分之间的相分离，从而形成由重复结构单元定义的周期性图案。 具体地说，在沟槽的窄区域的周期性图案在预定方向上排列，并且基本上没有缺陷。 还描述了通过上述方法形成的嵌段共聚物膜以及包含这种嵌段共聚物膜的半导体结构。
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5.发明申请EMBEDDED NANOPARTICLE FILMS AND METHOD FOR THEIR FORMATION IN SELECTIVE AREAS ON A SURFACE 有权嵌入式纳米薄膜及其在表面选择区域形成的方法公开(公告)号：US20100203295A1
公开(公告)日：2010-08-12
申请号：US12701977
申请日：2010-02-08
CPC分类号： C01B31/0226 , B82Y30/00 , B82Y40/00 , C01B32/16 , C01B32/162 , C01B2202/06 , C01B2202/36 , D01F9/127 , Y10S423/40 , Y10S977/742 , Y10S977/75 , Y10T428/24372 , Y10T428/24521 , Y10T428/24537 , Y10T428/24612 , Y10T428/2462 , Y10T428/2918
摘要： The invention is directed to a method of positioning nanoparticles on a patterned substrate. The method comprises providing a patterned substrate with selectively positioned recesses, and applying a solution or suspension of nanoparticles to the patterned substrate to form a wetted substrate. A wiper member is dragged across the surface of the wetted substrate to remove a portion of the applied nanoparticles from the wetted substrate, and leaving a substantial number of the remaining portion of the applied nanoparticles disposed in the selectively positioned recesses of the substrate. The invention is also directed to a method of making carbon nanotubes from the positioned nanoparticles.
摘要翻译： 本发明涉及一种将图案化衬底上的纳米颗粒定位的方法。 该方法包括提供具有选择性定位的凹部的图案化衬底，以及将纳米颗粒的溶液或悬浮液施加到图案化衬底以形成润湿衬底。 将擦拭器构件拖过湿润衬底的表面以从受湿衬底移除一部分所施加的纳米颗粒，并将大量剩余部分的所施加的纳米颗粒置于衬底的选择性定位的凹槽中。 本发明还涉及从定位的纳米颗粒制备碳纳米管的方法。
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6.发明授权公开(公告)号：US07726008B2
公开(公告)日：2010-06-01
申请号：US11030787
申请日：2005-01-07
IPC分类号： G01R33/09
CPC分类号： B82Y25/00 , G01R33/093 , Y10T29/49032 , Y10T29/49069 , Y10T29/49155 , Y10T428/25 , Y10T428/265
摘要： A magnetic-field sensor device comprises at least two electrodes; an insulating layer separating the at least two electrodes; at least one layer of chemically-synthesized magnetic nanoparticles disposed at or above a level with the insulating layer, and disposed between the at least two electrodes; and an organic spacer surrounding each of the chemically-synthesized magnetic nanoparticles. A deviation between diameters of different ones of the nanoparticles is less than 15%. Moreover, the chemically-synthesized magnetic nanoparticles range in size between 2 nm and 20 nm in diameter.
摘要翻译： 磁场传感器装置包括至少两个电极; 分离所述至少两个电极的绝缘层; 至少一层化学合成的磁性纳米颗粒设置在与绝缘层的水平面上或之上，并且设置在至少两个电极之间; 以及围绕每个化学合成的磁性纳米颗粒的有机间隔物。 不同纳米颗粒的直径之间的偏差小于15％。 此外，化学合成的磁性纳米粒子的尺寸范围在2nm和20nm之间。
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7.发明申请EMBEDDED NANOPARTICLE FILMS AND METHOD FOR THEIR FORMATION IN SELECTIVE AREAS ON A SURFACE 有权嵌入式纳米薄膜及其在表面选择区域形成的方法公开(公告)号：US20120148474A1
公开(公告)日：2012-06-14
申请号：US13399612
申请日：2012-02-17
CPC分类号： C01B31/0226 , B82Y30/00 , B82Y40/00 , C01B32/16 , C01B32/162 , C01B2202/06 , C01B2202/36 , D01F9/127 , Y10S423/40 , Y10S977/742 , Y10S977/75 , Y10T428/24372 , Y10T428/24521 , Y10T428/24537 , Y10T428/24612 , Y10T428/2462 , Y10T428/2918
摘要： The invention is directed to a method of positioning nanoparticles on a patterned substrate. The method comprises providing a patterned substrate with selectively positioned recesses, and applying a solution or suspension of nanoparticles to the patterned substrate to form a wetted substrate. A wiper member is dragged across the surface of the wetted substrate to remove a portion of the applied nanoparticles from the wetted substrate, and leaving a substantial number of the remaining portion of the applied nanoparticles disposed in the selectively positioned recesses of the substrate. The invention is also directed to a method of making carbon nanotubes from the positioned nanoparticles.
摘要翻译： 本发明涉及一种将图案化衬底上的纳米颗粒定位的方法。 该方法包括提供具有选择性定位的凹部的图案化衬底，以及将纳米颗粒的溶液或悬浮液施加到图案化衬底以形成润湿衬底。 将擦拭器构件拖过湿润衬底的表面以从受湿衬底移除一部分所施加的纳米颗粒，并将大量剩余部分的所施加的纳米颗粒置于衬底的选择性定位的凹槽中。 本发明还涉及从定位的纳米颗粒制备碳纳米管的方法。
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8.发明授权Embedded nanoparticle films and method for their formation in selective areas on a surface 有权嵌入的纳米颗粒膜及其在表面上的选择性区域中形成的方法公开(公告)号：US08187565B2
公开(公告)日：2012-05-29
申请号：US12701977
申请日：2010-02-08
IPC分类号： C01B31/02
CPC分类号： C01B31/0226 , B82Y30/00 , B82Y40/00 , C01B32/16 , C01B32/162 , C01B2202/06 , C01B2202/36 , D01F9/127 , Y10S423/40 , Y10S977/742 , Y10S977/75 , Y10T428/24372 , Y10T428/24521 , Y10T428/24537 , Y10T428/24612 , Y10T428/2462 , Y10T428/2918
摘要： The invention is directed to a method of positioning nanoparticles on a patterned substrate. The method comprises providing a patterned substrate with selectively positioned recesses, and applying a solution or suspension of nanoparticles to the patterned substrate to form a wetted substrate. A wiper member is dragged across the surface of the wetted substrate to remove a portion of the applied nanoparticles from the wetted substrate, and leaving a substantial number of the remaining portion of the applied nanoparticles disposed in the selectively positioned recesses of the substrate. The invention is also directed to a method of making carbon nanotubes from the positioned nanoparticles.
摘要翻译： 本发明涉及一种将图案化衬底上的纳米颗粒定位的方法。 该方法包括提供具有选择性定位的凹部的图案化衬底，以及将纳米颗粒的溶液或悬浮液施加到图案化衬底以形成润湿衬底。 将擦拭器构件拖过湿润衬底的表面以从受湿衬底移除一部分所施加的纳米颗粒，并将大量剩余部分的所施加的纳米颗粒置于衬底的选择性定位的凹槽中。 本发明还涉及从定位的纳米颗粒制备碳纳米管的方法。
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公开(公告)号：US07709079B2
公开(公告)日：2010-05-04
申请号：US11969496
申请日：2008-01-04
CPC分类号： B81C1/00031 , B81C2201/0149 , B82Y30/00 , Y10S430/146 , Y10T428/24479 , Y10T428/24488 , Y10T428/2457 , Y10T428/2462
摘要： A method for forming self-assembled patterns on a substrate surface is provided. First, a block copolymer layer, which comprises a block copolymer having two or more immiscible polymeric block components, is applied onto a substrate that comprises a substrate surface with a trench therein. The trench specifically includes at least one narrow region flanked by two wide regions, and wherein the trench has a width variation of more than 50%. Annealing is subsequently carried out to effectuate phase separation between the two or more immiscible polymeric block components in the block copolymer layer, thereby forming periodic patterns that are defined by repeating structural units. Specifically, the periodic patterns at the narrow region of the trench are aligned in a predetermined direction and are essentially free of defects. Block copolymer films formed by the above-described method as well as semiconductor structures comprising such block copolymer films are also described.
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10.发明申请公开(公告)号：US20090297778A1
公开(公告)日：2009-12-03
申请号：US12540440
申请日：2009-08-13
IPC分类号： B32B3/00
CPC分类号： B81C1/00031 , B81C2201/0149 , B82Y30/00 , Y10S430/146 , Y10T428/24479 , Y10T428/24488 , Y10T428/2457 , Y10T428/2462
摘要： A method for forming self-assembled patterns on a substrate surface is provided. First, a block copolymer layer, which comprises a block copolymer having two or more immiscible polymeric block components, is applied onto a substrate that comprises a substrate surface with a trench therein. The trench specifically includes at least one narrow region flanked by two wide regions, and wherein the trench has a width variation of more than 50%. Annealing is subsequently carried out to effectuate phase separation between the two or more immiscible polymeric block components in the block copolymer layer, thereby forming periodic patterns that are defined by repeating structural units. Specifically, the periodic patterns at the narrow region of the trench are aligned in a predetermined direction and are essentially free of defects. Block copolymer films formed by the above-described method as well as semiconductor structures comprising such block copolymer films are also described.
摘要翻译： 提供了一种在衬底表面上形成自组装图案的方法。 首先，将包含具有两个或更多个不混溶的聚合物嵌段组分的嵌段共聚物的嵌段共聚物层施加到包含其中具有沟槽的衬底表面的衬底上。 沟槽具体包括至少一个两个宽的区域的窄区域，并且其中沟槽具有大于50％的宽度变化。 随后进行退火以实现嵌段共聚物层中的两种或更多种不混溶的聚合物嵌段组分之间的相分离，从而形成由重复结构单元定义的周期性图案。 具体地说，在沟槽的窄区域的周期性图案在预定方向上排列，并且基本上没有缺陷。 还描述了通过上述方法形成的嵌段共聚物膜以及包含这种嵌段共聚物膜的半导体结构。
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