Buffer bilayers for electronic devices
    7.
    发明授权
    Buffer bilayers for electronic devices 失效
    电子设备缓冲层双层

    公开(公告)号:US08785913B2

    公开(公告)日:2014-07-22

    申请号:US12645647

    申请日:2009-12-23

    IPC分类号: H01L51/00

    摘要: The present invention relates to buffer bilayers, and their use in electronic devices. The bilayer has a first layer including (i) at least one electrically conductive polymer doped with at least one non-fluorinated polymeric acid and (ii) at least one highly-fluorinated acid polymer. The bilayer has a second layer which is a reacted layer from a metal which can be one or more transition metals, Group 13 metals, Group 14 metals, or lanthanide metals.

    摘要翻译: 本发明涉及缓冲双层体及其在电子设备中的应用。 双层具有第一层,其包括(i)至少一种掺杂有至少一种非氟化聚合酸的导电聚合物和(ii)至少一种高度氟化的酸聚合物。 双层具有第二层,其是来自可以是一种或多种过渡金属,第13族金属,第14族金属或镧系金属的金属的反应层。

    BUFFER BILAYERS FOR ELECTRONIC DEVICES
    8.
    发明申请
    BUFFER BILAYERS FOR ELECTRONIC DEVICES 失效
    电子设备缓冲器

    公开(公告)号:US20110042688A1

    公开(公告)日:2011-02-24

    申请号:US12466879

    申请日:2009-05-15

    IPC分类号: B32B15/08 B32B5/00 H01L33/40

    摘要: The present invention relates to buffer bilayers, and their use in electronic devices. The bilayer has a first layer including (i) at least one electrically conductive polymer doped with at least one non-fluorinated polymeric acid and (ii) at least one highly-fluorinated acid polymer. The bilayer has a second layer including a metal which can be one or more transition metals, Group 13 metals, Group 14 metals, or lanthanide metals.

    摘要翻译: 本发明涉及缓冲双层体及其在电子设备中的应用。 双层具有第一层,其包括(i)至少一种掺杂有至少一种非氟化聚合酸的导电聚合物和(ii)至少一种高度氟化的酸聚合物。 双层具有包括可以是一种或多种过渡金属,第13族金属,第14族金属或镧系金属的金属的第二层。

    Buffer bilayers for electronic devices
    9.
    发明授权
    Buffer bilayers for electronic devices 失效
    电子设备缓冲层双层

    公开(公告)号:US08766239B2

    公开(公告)日:2014-07-01

    申请号:US12645634

    申请日:2009-12-23

    IPC分类号: H01L29/08

    摘要: The present invention relates to buffer bilayers, and their use in electronic devices. The bilayer has a first layer including at least one electrically conductive polymer doped with at least one highly-fluorinated acid polymer. The second layer is a reacted layer from a metal which can be one or more transition metals, Group 13 metals, Group 14 metals, or lanthanide metals.

    摘要翻译: 本发明涉及缓冲双层体及其在电子设备中的应用。 双层具有包含至少一种掺杂有至少一种高度氟化的酸性聚合物的导电聚合物的第一层。 第二层是来自可以是一种或多种过渡金属,第13族金属,第14族金属或镧系金属的金属的反应层。

    Buffer bilayers for electronic devices
    10.
    发明授权
    Buffer bilayers for electronic devices 失效
    电子设备缓冲层双层

    公开(公告)号:US08216685B2

    公开(公告)日:2012-07-10

    申请号:US12466879

    申请日:2009-05-15

    IPC分类号: B32B15/04

    摘要: The present invention relates to buffer bilayers, and their use in electronic devices. The bilayer has a first layer including (i) at least one electrically conductive polymer doped with at least one non-fluorinated polymeric acid and (ii) at least one highly-fluorinated acid polymer. The bilayer has a second layer including a metal which can be one or more transition metals, Group 13 metals, Group 14 metals, or lanthanide metals.

    摘要翻译: 本发明涉及缓冲双层体及其在电子设备中的应用。 双层具有第一层,其包括(i)至少一种掺杂有至少一种非氟化聚合酸的导电聚合物和(ii)至少一种高度氟化的酸聚合物。 双层具有包括可以是一种或多种过渡金属,第13族金属,第14族金属或镧系金属的金属的第二层。