公开(公告)号：US07713826B2

公开(公告)日：2010-05-11

申请号：US12045797

申请日：2008-03-11

申请人： Chel Jong Choi ,  Moon Gyu Jang ,  Yark Yeon Kim ,  Myung Sim Jun ,  Tae Youb Kim

发明人： Chel Jong Choi ,  Moon Gyu Jang ,  Yark Yeon Kim ,  Myung Sim Jun ,  Tae Youb Kim

IPC分类号： H01L21/336

CPC分类号： H01L21/28229 ,  H01L21/28079 ,  H01L29/495 ,  H01L29/513 ,  H01L29/517 ,  H01L29/6659 ,  H01L29/7833

摘要： Provided is a method of manufacturing a semiconductor device including a high-k dielectric thin layer formed using an interfacial reaction. The method includes the steps of: forming an oxide layer on a silicon substrate; depositing a metal layer on the oxide layer to form a metal silicate layer using an interfacial reaction between the oxide layer and the metal layer; forming a metal gate by etching the metal silicate layer and the metal layer; and forming a lightly doped drain (LDD) region and source and drain regions in the silicon substrate after forming the metal gate. In this method, a semiconductor device having high quality and performance can be manufactured by a simpler process at lower cost.

摘要翻译： 提供一种制造包括使用界面反应形成的高k电介质薄层的半导体器件的方法。 该方法包括以下步骤：在硅衬底上形成氧化物层; 使用氧化物层和金属层之间的界面反应，在氧化物层上沉积金属层以形成金属硅酸盐层; 通过蚀刻金属硅酸盐层和金属层形成金属栅极; 以及在形成金属栅极之后在硅衬底中形成轻掺杂漏极（LDD）区域和源极和漏极区域。 在该方法中，可以通过更简单的工艺以较低的成本制造具有高品质和高性能的半导体器件。

公开(公告)号：US20080299736A1

公开(公告)日：2008-12-04

申请号：US12045797

申请日：2008-03-11

申请人： Chel Jong Choi ,  Moon Gyu Jang ,  Yark Yeon Kim ,  Myung Sim Jun ,  Tae Youb Kim

发明人： Chel Jong Choi ,  Moon Gyu Jang ,  Yark Yeon Kim ,  Myung Sim Jun ,  Tae Youb Kim

IPC分类号： H01L21/336

CPC分类号： H01L21/28229 ,  H01L21/28079 ,  H01L29/495 ,  H01L29/513 ,  H01L29/517 ,  H01L29/6659 ,  H01L29/7833

摘要： Provided is a method of manufacturing a semiconductor device including a high-k dielectric thin layer formed using an interfacial reaction. The method includes the steps of: forming an oxide layer on a silicon substrate; depositing a metal layer on the oxide layer to form a metal silicate layer using an interfacial reaction between the oxide layer and the metal layer; forming a metal gate by etching the metal silicate layer and the metal layer; and forming a lightly doped drain (LDD) region and source and drain regions in the silicon substrate after forming the metal gate. In this method, a semiconductor device having high quality and performance can be manufactured by a simpler process at lower cost.

摘要翻译： 提供一种制造包括使用界面反应形成的高k电介质薄层的半导体器件的方法。 该方法包括以下步骤：在硅衬底上形成氧化物层; 使用氧化物层和金属层之间的界面反应，在氧化物层上沉积金属层以形成金属硅酸盐层; 通过蚀刻金属硅酸盐层和金属层形成金属栅极; 以及在形成金属栅极之后在硅衬底中形成轻掺杂漏极（LDD）区域和源极和漏极区域。 在该方法中，可以通过更简单的工艺以较低的成本制造具有高品质和高性能的半导体器件。

公开(公告)号：US07981735B2

公开(公告)日：2011-07-19

申请号：US12434779

申请日：2009-05-04

申请人： Yark Yeon Kim ,  Seong Jae Lee ,  Moon Gyu Jang ,  Chel Jong Choi ,  Myung Sim Jun ,  Byoung Chul Park

发明人： Yark Yeon Kim ,  Seong Jae Lee ,  Moon Gyu Jang ,  Chel Jong Choi ,  Myung Sim Jun ,  Byoung Chul Park

IPC分类号： H01L21/336

CPC分类号： H01L29/47 ,  H01L29/458 ,  H01L29/4908 ,  H01L29/66545 ,  H01L29/66772 ,  H01L29/7839

摘要： Provided are a Schottky barrier tunnel transistor and a method of manufacturing the same that are capable of minimizing leakage current caused by damage to a gate sidewall of the Schottky barrier tunnel transistor using a Schottky tunnel barrier naturally formed at a semiconductor-metal junction as a tunnel barrier. The method includes the steps of: forming a semiconductor channel layer on an insulating substrate; forming a dummy gate on the semiconductor channel layer; forming a source and a drain at both sides of the dummy gate on the insulating substrate; removing the dummy gate; forming an insulating layer on a sidewall from which the dummy gate is removed; and forming an actual gate in a space from which the dummy gate is removed. In manufacturing the Schottky barrier tunnel transistor using the dummy gate, it is possible to form a high-k dielectric gate insulating layer and a metal gate, and stable characteristics in silicidation of the metal layer having very strong reactivity can be obtained.

摘要翻译： 提供了一种肖特基势垒隧道晶体管及其制造方法，该晶体管能够使用在半导体 - 金属结上自然形成的肖特基隧道势垒作为隧道来最小化对肖特基势垒隧道晶体管的栅极侧壁的损坏所造成的漏电流 屏障。 该方法包括以下步骤：在绝缘基板上形成半导体沟道层; 在半导体沟道层上形成虚拟栅极; 在绝缘基板上的虚拟栅极的两侧形成源极和漏极; 去除虚拟门; 在去除所述伪栅极的侧壁上形成绝缘层; 并且在从其中去除虚拟栅极的空间中形成实际栅极。 在使用伪栅极制造肖特基势垒隧道晶体管时，可以形成高k电介质栅极绝缘层和金属栅极，并且可以获得具有非常强反应性的金属层的硅化物的稳定特性。

公开(公告)号：US07545000B2

公开(公告)日：2009-06-09

申请号：US11485837

申请日：2006-07-13

申请人： Yark Yeon Kim ,  Seong Jae Lee ,  Moon Gyu Jang ,  Chel Jong Choi ,  Myung Sim Jun ,  Byoung Chul Park

发明人： Yark Yeon Kim ,  Seong Jae Lee ,  Moon Gyu Jang ,  Chel Jong Choi ,  Myung Sim Jun ,  Byoung Chul Park

IPC分类号： H01L27/01

CPC分类号： H01L29/47 ,  H01L29/458 ,  H01L29/4908 ,  H01L29/66545 ,  H01L29/66772 ,  H01L29/7839

摘要： Provided are a Schottky barrier tunnel transistor and a method of manufacturing the same that are capable of minimizing leakage current caused by damage to a gate sidewall of the Schottky barrier tunnel transistor using a Schottky tunnel barrier naturally formed at a semiconductor-metal junction as a tunnel barrier. The method includes the steps of: forming a semiconductor channel layer on an insulating substrate; forming a dummy gate on the semiconductor channel layer; forming a source and a drain at both sides of the dummy gate on the insulating substrate; removing the dummy gate; forming an insulating layer on a sidewall from which the dummy gate is removed; and forming an actual gate in a space from which the dummy gate is removed. In manufacturing the Schottky barrier tunnel transistor using the dummy gate, it is possible to form a high-k dielectric gate insulating layer and a metal gate, and stable characteristics in silicidation of the metal layer having very strong reactivity can be obtained.

摘要翻译： 提供了一种肖特基势垒隧道晶体管及其制造方法，该晶体管能够使用在半导体 - 金属结上自然形成的肖特基隧道势垒作为隧道，将肖特基势垒隧道晶体管的栅极侧壁损坏所造成的漏电流减到最小 屏障。 该方法包括以下步骤：在绝缘基板上形成半导体沟道层; 在半导体沟道层上形成虚拟栅极; 在绝缘基板上的虚拟栅极的两侧形成源极和漏极; 去除虚拟门; 在去除所述伪栅极的侧壁上形成绝缘层; 并且在从其中去除虚拟栅极的空间中形成实际栅极。 在使用伪栅极制造肖特基势垒隧道晶体管时，可以形成高k电介质栅极绝缘层和金属栅极，并且可以获得具有非常强反应性的金属层的硅化物的稳定特性。

公开(公告)号：US08241939B2

公开(公告)日：2012-08-14

申请号：US12682571

申请日：2008-07-24

申请人： Chan Woo Park ,  Chang Geun Ahn ,  Jong Heon Yang ,  In Bok Baek ,  Chil Seong Ah ,  Han Young Yu ,  An Soon Kim ,  Tae Youb Kim ,  Moon Gyu Jang ,  Myung Sim Jun

发明人： Chan Woo Park ,  Chang Geun Ahn ,  Jong Heon Yang ,  In Bok Baek ,  Chil Seong Ah ,  Han Young Yu ,  An Soon Kim ,  Tae Youb Kim ,  Moon Gyu Jang ,  Myung Sim Jun

IPC分类号： H01L21/00 ,  H01L29/06

CPC分类号： H01L29/0665 ,  B82Y10/00 ,  B82Y15/00 ,  H01L29/0673 ,  H01L29/78696

摘要： A method for manufacturing a biosensor includes forming a silicon nanowire channel, etching a first conductivity-type single crystalline silicon layer which is a top layer of a Silicon-On-Insulator (SOI) substrate to form a first conductivity-type single crystalline silicon line pattern, doping both sidewalls of the first conductivity-type single crystalline silicon line pattern with impurities of a second conductivity-type opposite to the first conductivity-type to form a second conductivity-type channel, forming second conductivity-type pads for forming electrodes at both ends of the first conductivity-type single crystalline silicon line pattern, forming, in an undoped region of the first conductivity-type single crystalline silicon line pattern, a first electrode for applying a reverse-bias voltage to insulate the first conductivity-type single crystalline silicon line pattern and the second conductivity-type channel from each other, and forming second electrodes for applying a bias voltage across the second conductivity-type channel on the second conductivity-type pad.

摘要翻译： 制造生物传感器的方法包括形成硅纳米线通道，蚀刻作为绝缘体上硅（SOI）衬底的顶层的第一导电型单晶硅层，以形成第一导电型单晶硅线 以与第一导电类型相反的第二导电类型的杂质掺杂第一导电型单晶硅线图案的两个侧壁以形成第二导电型沟道，形成第二导电型垫，用于在 第一导电型单晶硅线图案的两端，在第一导电型单晶硅线图案的未掺杂区域中形成用于施加反向偏置电压以使第一导电型单晶硅线型图案绝缘的第一电极 晶体硅线图案和第二导电型沟道，并且形成用于施加双面的第二电极 在第二导电型垫上的第二导电类型沟道上的电压。

公开(公告)号：US20100270530A1

公开(公告)日：2010-10-28

申请号：US12682571

申请日：2008-07-24

申请人： Chan Woo Park ,  Chang Geun Ahn ,  Jong Heon Yang ,  In Book Baek ,  Chil Seong Ah ,  Han Young Yu ,  An Soon Kim ,  Tae Youb Kim ,  Moon Gyu Jang ,  Myung Sim Jun

发明人： Chan Woo Park ,  Chang Geun Ahn ,  Jong Heon Yang ,  In Book Baek ,  Chil Seong Ah ,  Han Young Yu ,  An Soon Kim ,  Tae Youb Kim ,  Moon Gyu Jang ,  Myung Sim Jun

IPC分类号： H01L29/775 ,  H01L21/336

CPC分类号： H01L29/0665 ,  B82Y10/00 ,  B82Y15/00 ,  H01L29/0673 ,  H01L29/78696

摘要： A method for manufacturing a biosensor device is provided. The method involves forming a silicon nanowire channel with a line width of several nanometers to several tens of nanometers using a typical photolithography process, and using the channel to manufacture a semiconductor nanowire sensor device. The method includes etching a first conductivity-type single crystalline silicon layer which is a top layer of a Silicon-On-Insulator (SOI) substrate to form a first conductivity-type single crystalline silicon line pattern, doping both sidewalls of the first conductivity-type single crystalline silicon line pattern with impurities of a second conductivity-type opposite to the first conductivity-type to form a second conductivity-type channel, forming second conductivity-type pads for forming electrodes at both ends of the first conductivity-type single crystalline silicon line pattern, forming, in an undoped region of the first conductivity-type single crystalline silicon line pattern, a first electrode for applying a reverse-bias voltage to insulate the first conductivity-type single crystalline silicon line pattern and the second conductivity-type channel from each other, and forming second electrodes for applying a bias voltage across the second conductivity-type channel on the second conductivity-type pad.

摘要翻译： 提供一种制造生物传感器装置的方法。 该方法包括使用典型的光刻工艺形成线宽为几纳米至几十纳米的硅纳米线通道，并使用该通道制造半导体纳米线传感器装置。 该方法包括蚀刻作为绝缘体上硅（SOI）衬底的顶层的第一导电型单晶硅层，以形成第一导电型单晶硅线图案，掺杂第一导电型单晶硅线阵列的两个侧壁， 形成具有与第一导电类型相反的第二导电类型的杂质的单晶硅线图案，以形成第二导电型沟道，形成用于在第一导电型单晶的两端形成电极的第二导电型焊盘 硅线图案，在第一导电型单晶硅线图案的未掺杂区域中形成第一电极，用于施加反向偏置电压以使第一导电型单晶硅线图案和第二导电型 并且形成用于在第二导通型通道上施加偏置电压的第二电极 导电型垫。

公开(公告)号：US20090152596A1

公开(公告)日：2009-06-18

申请号：US12195302

申请日：2008-08-20

申请人： Jong Heon YANG ,  In Bok Baek ,  Chang Geun Ahn ,  Chan Woo Park ,  An Soon Kim ,  Han Young Yu ,  Chil Seong Ah ,  Tae Youb Kim ,  Myung Sim Jun ,  Moon Gyu Jang

发明人： Jong Heon YANG ,  In Bok Baek ,  Chang Geun Ahn ,  Chan Woo Park ,  An Soon Kim ,  Han Young Yu ,  Chil Seong Ah ,  Tae Youb Kim ,  Myung Sim Jun ,  Moon Gyu Jang

IPC分类号： H01L29/78 ,  H01L21/336

CPC分类号： G01N27/4145 ,  H01L29/66818 ,  H01L29/7853

摘要： Provided are a semiconductor Field-Effect Transistor (FET) sensor and a method of fabricating the same. The method includes providing a semiconductor substrate, forming a sensor structure having a fin-shaped structure on the semiconductor substrate, injecting ions for electrical ohmic contact into the sensor structure, and depositing a metal electrode on the sensor structure, immobilizing a sensing material to be specifically combined with a target material onto both sidewall surfaces of the fin-shaped structure, and forming a passage on the sensor structure such that the target material passes through the fin-shaped structure.

摘要翻译： 提供了一种半导体场效应晶体管（FET）传感器及其制造方法。 该方法包括提供半导体衬底，在半导体衬底上形成具有鳍状结构的传感器结构，将用于电欧姆接触的离子注入到传感器结构中，以及在传感器结构上沉积金属电极，将感测材料固定为 特别地将目标材料组合到鳍状结构的两个侧壁表面上，并且在传感器结构上形成通道，使得目标材料通过鳍状结构。

公开(公告)号：US07893466B2

公开(公告)日：2011-02-22

申请号：US12195302

申请日：2008-08-20

申请人： Jong Heon Yang ,  In Bok Baek ,  Chang Geun Ahn ,  Chan Woo Park ,  An Soon Kim ,  Han Young Yu ,  Chil Seong Ah ,  Tae Youb Kim ,  Myung Sim Jun ,  Moon Gyu Jang

发明人： Jong Heon Yang ,  In Bok Baek ,  Chang Geun Ahn ,  Chan Woo Park ,  An Soon Kim ,  Han Young Yu ,  Chil Seong Ah ,  Tae Youb Kim ,  Myung Sim Jun ,  Moon Gyu Jang

IPC分类号： G01N27/403

CPC分类号： G01N27/4145 ,  H01L29/66818 ,  H01L29/7853

摘要： Provided are a semiconductor Field-Effect Transistor (FET) sensor and a method of fabricating the same. The method includes providing a semiconductor substrate, forming a sensor structure having a fin-shaped structure on the semiconductor substrate, injecting ions for electrical ohmic contact into the sensor structure, and depositing a metal electrode on the sensor structure, immobilizing a sensing material to be specifically combined with a target material onto both sidewall surfaces of the fin-shaped structure, and forming a passage on the sensor structure such that the target material passes through the fin-shaped structure.

摘要翻译： 提供了一种半导体场效应晶体管（FET）传感器及其制造方法。 该方法包括提供半导体衬底，在半导体衬底上形成具有鳍状结构的传感器结构，将用于电欧姆接触的离子注入到传感器结构中，以及在传感器结构上沉积金属电极，将感测材料固定为 特别地将目标材料组合到鳍状结构的两个侧壁表面上，并且在传感器结构上形成通道，使得目标材料通过鳍状结构。

公开(公告)号：US20090152598A1

公开(公告)日：2009-06-18

申请号：US12240114

申请日：2008-09-29

申请人： In Bok BAEK ,  Jong Heon Yang ,  Chang Geun Ahn ,  Han Young Yu ,  Chil Seong Ah ,  Chan Woo Park ,  An Soon Kim ,  Tae Youb Kim ,  Moon Gyu Jang ,  Myung Sim Jun

发明人： In Bok BAEK ,  Jong Heon Yang ,  Chang Geun Ahn ,  Han Young Yu ,  Chil Seong Ah ,  Chan Woo Park ,  An Soon Kim ,  Tae Youb Kim ,  Moon Gyu Jang ,  Myung Sim Jun

IPC分类号： H01L29/00 ,  H01L21/00

CPC分类号： G01N27/4145 ,  G01N27/4146

摘要： Provided are a biosensor using a silicon nanowire and a method of manufacturing the same. The silicon nanowire can be formed to have a shape, in which identical patterns are continuously repeated, to enlarge an area in which probe molecules are fixed to the silicon nanowire, thereby increasing detection sensitivity. In addition, the detection sensitivity can be easily adjusted by adjusting a gap between the identical patterns of the silicon nanowire depending on characteristics of target molecules, without adjusting a line width of the silicon nanowire in the conventional art. Further, the gap between the identical patterns of the silicon nanowire can be adjusted depending on characteristics of the target molecule to differentiate detection sensitivities, thereby simultaneously detecting various detection sensitivities.

摘要翻译： 提供了使用硅纳米线的生物传感器及其制造方法。 可以将硅纳米线形成为具有连续重复相同图案的形状，以扩大探针分子固定在硅纳米线上的面积，从而提高检测灵敏度。 此外，通过根据目标分子的特性调整硅纳米线的相同图案之间的间隙，而不调整现有技术中的硅纳米线的线宽，可以容易地调整检测灵敏度。 此外，可以根据目标分子的特性来调整硅纳米线的相同图案之间的间隙，以区分检测灵敏度，从而同时检测各种检测灵敏度。

公开(公告)号：US07605065B2

公开(公告)日：2009-10-20

申请号：US11839704

申请日：2007-08-16

申请人： Moon Gyu Jang ,  Yark Yeon Kim ,  Jae Heon Shin ,  Seong Jae Lee

发明人： Moon Gyu Jang ,  Yark Yeon Kim ,  Jae Heon Shin ,  Seong Jae Lee

IPC分类号： H01L21/28 ,  H01L21/44

CPC分类号： H01L29/7613 ,  B82Y10/00 ,  H01L29/872

摘要： Provided are a Schottky barrier tunnel single electron transistor and a method of manufacturing the same that use a Schottky barrier formed between metal and semiconductor by replacing a source and a drain with silicide as a reactant of silicon and metal, instead of a conventional method of manufacturing a single electron transistor (SET) that includes source and drain regions by implanting dopants such that an artificial quantum dot is formed in a channel region. As a result, it does not require a conventional PADOX process to form a quantum dot for a single electron transistor (SET), height and width of a tunneling barrier can be artificially adjusted by using silicide materials that have various Schottky junction barriers, and it is possible to improve current driving capability of the single electron transistor (SET).

摘要翻译： 提供了一种肖特基势垒隧道单电子晶体管及其制造方法，其替代传统的制造方法，而是用硅化物替代源极和漏极作为硅和金属的反应物，从而形成金属和半导体之间形成的肖特基势垒 单电子晶体管（SET），其通过注入掺杂剂而包括源极和漏极区域，使得在沟道区域中形成人造量子点。 结果，不需要传统的PADOX工艺来形成单电子晶体管（SET）的量子点，隧道势垒的高度和宽度可以通过使用具有各种肖特基结屏障的硅化物材料进行人工调整，而且 可以提高单电子晶体管（SET）的电流驱动能力。