公开(公告)号：US07084955B2

公开(公告)日：2006-08-01

申请号：US10803104

申请日：2004-03-18

申请人： Cheng-Qun Gui ,  Henricus Van Buel ,  Maurits Van Der Schaar ,  Arie Den Boef

发明人： Cheng-Qun Gui ,  Henricus Van Buel ,  Maurits Van Der Schaar ,  Arie Den Boef

IPC分类号： G03B27/54 ,  G03B27/42 ,  G03B27/32 ,  G01B11/00

CPC分类号： G03F7/70691 ,  G03F7/70216 ,  G03F9/7084

摘要： A lithographic projection apparatus is provided with an optical system built into the wafer table for producing an image of a wafer mark that is provided on the back side of the wafer. The image is located at the plane of the front side of the wafer and can be viewed by an alignment system from the front side of the wafer. Simultaneous alignment between marks on the back and front of the wafer and a mask can be performed using a pre-existing alignment system.

公开(公告)号：US20050018159A1

公开(公告)日：2005-01-27

申请号：US10845521

申请日：2004-05-14

申请人： Henricus Van Buel ,  Cheng-Qun Gui ,  Alex De Vries

发明人： Henricus Van Buel ,  Cheng-Qun Gui ,  Alex De Vries

IPC分类号： G03F9/00 ,  H01L21/027 ,  G03B27/68

CPC分类号： G03F9/7019 ,  G03F9/7003 ,  G03F9/7011 ,  G03F9/7084

摘要： In one method of compensating for the distortion of front-to-backside alignment optics, a displacement vector between the estimated position of a substrate mark and the actual position of a substrate mark is calculated. An optical correction array is also calculated by moving a reference substrate by a fixed amount and comparing how far an image of a point on the back side of a reference substrate moves to how far a corresponding point on the front side of the substrate moves. The displacement vector and optical correction array may then be used to accurately calculate the position of further substrates.

摘要翻译： 在补偿前后对准光学元件的失真的一种方法中，计算衬底标记的估计位置与衬底标记的实际位置之间的位移矢量。 还通过将参考基板移动固定量并且比较参考基板的背面上的点的图像移动到基板的正面上的对应点移动多远的距离来计算光学校正阵列。 然后可以使用位移矢量和光学校正阵列来精确地计算另外的衬底的位置。

公开(公告)号：US20050200819A1

公开(公告)日：2005-09-15

申请号：US10795801

申请日：2004-03-09

申请人： Henricus Van Buel

发明人： Henricus Van Buel

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03H1/00

CPC分类号： G03F7/70291 ,  G03F7/70275 ,  G03F7/70383

摘要： A lithographic apparatus has a plurality of patterning arrays (e.g., 2, 4, etc.), which are spaced apart in an object plane. A combined, overlapped image of the patterning arrays is projected onto the substrate. Because the image is formed from radiation produced from spaced apart patterning arrays, the image arrives from different angles and has a higher effective numerical aperture (NA).

摘要翻译： 光刻设备具有在物平面中间隔开的多个图案阵列（例如2,4等）。 将图案化阵列的组合的重叠图像投影到基板上。 由于图像由间隔开的图案阵列产生的辐射形成，所以图像从不同的角度到达并具有较高的有效数值孔径（NA）。

公开(公告)号：US20070153253A1

公开(公告)日：2007-07-05

申请号：US11321467

申请日：2005-12-30

申请人： Henricus Van Buel ,  Franciscus Bijnen

发明人： Henricus Van Buel ,  Franciscus Bijnen

IPC分类号： G03B27/58 ,  G03B27/52

CPC分类号： G03F7/70716 ,  G03F9/7084 ,  G03F9/7088

摘要： A substrate table is provided with an optical system that includes a first window and a second window arranged to allow radiation to pass into an optical arm. At least two mirrors are provided within the optical arm and are arranged to reflect radiation that is passed through the windows. At least two lenses are positioned to receive radiation reflected from the mirrors, wherein the first window is provided with a first alignment mark and the at least two mirrors and at least two lenses are arranged to form an image of the first alignment mark at the second window. A second alignment mark is provided in the second window, or in the substrate table at a location adjacent to the second window.

摘要翻译： 衬底台设置有光学系统，该光学系统包括第一窗口和布置成允许辐射进入光学臂的第二窗口。 至少两个反射镜设置在光学臂内，并被布置成反射穿过窗户的辐射。 至少两个透镜被定位成接收从反射镜反射的辐射，其中第一窗口设置有第一对准标记，并且至少两个反射镜和至少两个透镜被布置成在第二个第二对准标记处形成第一对准标记的图像 窗口。 第二对准标记设置在第二窗口中，或者在与第二窗口相邻的位置处的衬底台中。

公开(公告)号：US20050248740A1

公开(公告)日：2005-11-10

申请号：US11069058

申请日：2005-03-02

申请人： Michael Veen ,  Anastasius Bruinsma ,  Henricus Van Buel ,  Jacob Klinkhamer ,  Martinus Leenders ,  Christianus Mol ,  Hubert Mierlo

发明人： Michael Veen ,  Anastasius Bruinsma ,  Henricus Van Buel ,  Jacob Klinkhamer ,  Martinus Leenders ,  Christianus Mol ,  Hubert Mierlo

IPC分类号： G03F7/20 ,  G03B27/42 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F9/7084 ,  G03F7/70425 ,  G03F9/7011 ,  G03F9/7019 ,  G03F9/7076

摘要： The invention is directed to enabling substrate identification by comparing the measured distance between two features on an unidentified substrate with one or more stored distances. The one or more stored distances are the distances intended during the design of one or more substrates. The unidentified substrate is identified by a stored distance that corresponds to the measured distance. The two features are selected from a plurality of features that may be placed on a back side or a front side of a substrate. An optical system is provided for reading the features from the back side or a front side of the substrate.

摘要翻译： 本发明旨在通过将未识别基底上的两个特征之间的测量距离与一个或多个存储的距离进行比较来实现基底识别。 一个或多个存储的距离是在一个或多个基板的设计期间的距离。 通过与测量距离对应的存储距离来识别未识别的底物。 两个特征从可以放置在基板的背面或前侧的多个特征中选择。 提供了用于从基板的背面或前侧读取特征的光学系统。

公开(公告)号：US20060114442A1

公开(公告)日：2006-06-01

申请号：US10998180

申请日：2004-11-29

申请人： Henricus Van Buel

发明人： Henricus Van Buel

IPC分类号： G03B27/58

CPC分类号： G03F9/7088 ,  G03F7/70716 ,  G03F9/7011 ,  G03F9/7049 ,  G03F9/7084

摘要： The invention relates to a substrate table arranged to support a substrate provided with at least one substrate mark. The at least one substrate mark having a position that can be measured using an alignment system. The substrate table is provided with an optical system having a magnification factor deviating from 1, for providing an image of the at least one alignment mark to be measured by the alignment system.

摘要翻译： 本发明涉及一种布置成支撑设置有至少一个基板标记的基板的基板台。 所述至少一个基板标记具有可以使用对准系统测量的位置。 衬底台设置有具有偏离1的放大系数的光学系统，用于提供由对准系统测量的至少一个对准标记的图像。

公开(公告)号：US20050024643A1

公开(公告)日：2005-02-03

申请号：US10871699

申请日：2004-06-21

申请人： Arno Bleeker ,  Henricus Van Buel ,  Joeri Lof

发明人： Arno Bleeker ,  Henricus Van Buel ,  Joeri Lof

IPC分类号： H01L21/027 ,  G03F7/20 ,  G03F9/00 ,  G01B11/00 ,  G03C5/00

CPC分类号： G03F9/7019 ,  G03F7/70291 ,  G03F9/7011

摘要： A calibration method comprising generating a pattern with an array of individually controllable elements, providing a substrate table with a radiation sensor, using radiation to generate an image of the pattern at the substrate table, moving at least one of the generated pattern and the substrate table relative to each other in order to move the image relative to the sensor, detecting radiation intensity with the sensor, and calculating a calibration establishing a relationship between coordinates of the coordinate system of the array of individually controllable elements and coordinates of the coordinate system of the substrate table, based on the detected intensity and the positions of the array of individually controllable elements and the substrate table.

摘要翻译： 一种校准方法，包括用独立可控元件的阵列生成图案，使用辐射来提供具有辐射传感器的衬底台，以在衬底台上产生图案的图像，移动所生成的图案和衬底台中的至少一个 相对于彼此相对于传感器移动图像，利用传感器检测辐射强度，并且计算建立单独可控元件的阵列的坐标系的坐标与坐标系的坐标之间的关系的校准 基于检测到的强度和单独可控元件阵列的位置和基板台。