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22 条记录 (耗时 0.019 秒)

    Patterning a surface comprising silicon and carbon
    1.
    发明申请
    Patterning a surface comprising silicon and carbon 有权
    图案化包括硅和碳的表面

    公开(公告)号：US20090023100A1

    公开(公告)日：2009-01-22

    申请号：US11880157

    申请日：2007-07-19

    申请人： Cherngye Hwang ,  Dennis R. McKean ,  Gary J. Suzuki

    发明人： Cherngye Hwang ,  Dennis R. McKean ,  Gary J. Suzuki

    IPC分类号： H01L21/306 ,  G03C5/00

    CPC分类号： G03F7/0751 ,  G11B5/3163 ,  G11B5/3169 ,  G11B5/6082

    摘要： Patterning a surface, comprising at least one feature having silicon coupled to a substrate, is described herein. In one embodiment a method is described for patterning a surface which comprises at least one feature having silicon and at least one feature having carbon coupled to a substrate. The surface is coated with 3-(trimethoxysilyl)propyl methacrylate, and a photoresist is applied the 3-(trimethoxysilyl)propyl methacrylate coated surface. The photoresist is imaged and the surface is etched. The photoresist is then removed.

    摘要翻译： 在此描述包括至少一个具有耦合到衬底的硅的特征的表面。 在一个实施例中，描述了一种用于图案化表面的方法，该表面包括至少一个具有硅的特征和至少一个具有与基底结合的碳的特征。 表面用甲基丙烯酸3-（三甲氧基甲硅烷基）丙酯涂覆，并且使用光致抗蚀剂涂覆甲基丙烯酸3-（三甲氧基甲硅烷基）丙酯涂布表面。 光致抗蚀剂成像，表面被蚀刻。 然后除去光致抗蚀剂。

    Patterning a surface comprising silicon and carbon
    2.
    发明授权
    Patterning a surface comprising silicon and carbon 有权
    图案化包括硅和碳的表面

    公开(公告)号：US07851138B2

    公开(公告)日：2010-12-14

    申请号：US11880157

    申请日：2007-07-19

    申请人： Cherngye Hwang ,  Dennis R. McKean ,  Gary J. Suzuki

    发明人： Cherngye Hwang ,  Dennis R. McKean ,  Gary J. Suzuki

    IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/11 ,  G03F7/26 ,  G03F7/40

    CPC分类号： G03F7/0751 ,  G11B5/3163 ,  G11B5/3169 ,  G11B5/6082

    摘要： Patterning a surface, comprising at least one feature having silicon coupled to a substrate, is described herein. In one embodiment a method is described for patterning a surface which comprises at least one feature having silicon and at least one feature having carbon coupled to a substrate. The surface is coated with 3-(trimethoxysilyl)propyl methacrylate, and a photoresist is applied the 3-(trimethoxysilyl)propyl methacrylate coated surface. The photoresist is imaged and the surface is etched. The photoresist is then removed.

    摘要翻译： 在此描述包括至少一个具有耦合到衬底的硅的特征的表面。 在一个实施例中，描述了一种用于图案化表面的方法，该表面包括至少一个具有硅的特征和至少一个具有与基底结合的碳的特征。 表面用甲基丙烯酸3-（三甲氧基甲硅烷基）丙酯涂覆，并且使用光致抗蚀剂涂覆甲基丙烯酸3-（三甲氧基甲硅烷基）丙酯涂布表面。 光致抗蚀剂成像，表面被蚀刻。 然后除去光致抗蚀剂。

    Forming a planarized surface for at least one bar of sliders
    3.
    发明授权
    Forming a planarized surface for at least one bar of sliders 有权
    形成用于至少一个滑块的平坦化表面

    公开(公告)号：US08220136B2

    公开(公告)日：2012-07-17

    申请号：US11800127

    申请日：2007-05-03

    申请人： Cherngye Hwang ,  Jorge Goitia ,  Kenneth L. Larson ,  Dennis R. McKean

    发明人： Cherngye Hwang ,  Jorge Goitia ,  Kenneth L. Larson ,  Dennis R. McKean

    IPC分类号： G11B5/127 ,  H04R31/00

    CPC分类号： G11B5/4853 ,  G11B5/102 ,  G11B5/3163 ,  G11B5/3173 ,  Y10T29/49027 ,  Y10T29/49039 ,  Y10T29/49041 ,  Y10T29/49055 ,  Y10T29/53165 ,  Y10T156/10

    摘要： A method for forming a planarized surface for at least one bar of sliders for utilization in a hard disk drive is disclosed. In general, at least one bar of sliders is placed on an adhesive layer. A single thermoplastic layer is then provided above the at least one bar of sliders. The single thermoplastic layer is then heated to a softening temperature such that the single thermoplastic layer will flow between the at least one bar of sliders. The single thermoplastic layer is then cooled to form a planarized surface of both said single thermoplastic layer and said at least one bar of sliders at said adhesive layer.

    摘要翻译： 公开了一种用于形成至少一个用于硬盘驱动器的滑块的平面化表面的方法。 通常，将至少一个滑杆放置在粘合剂层上。 然后在至少一个滑杆上方设置单个热塑性层。 然后将单个热塑性层加热到软化温度，使得单个热塑性层将在至少一个滑块之间流动。 然后将单个热塑性层冷却以在所述粘合剂层处形成所述单一热塑性层和所述至少一个滑块条的平坦化表面。

    Forming a planarized surface for at least one bar of sliders
    4.
    发明申请
    Forming a planarized surface for at least one bar of sliders 有权
    形成用于至少一个滑块的平坦化表面

    公开(公告)号：US20080273270A1

    公开(公告)日：2008-11-06

    申请号：US11800127

    申请日：2007-05-03

    申请人： Cherngye Hwang ,  Jorge Goitia ,  Kenneth L. Larson ,  Dennis R. McKean

    发明人： Cherngye Hwang ,  Jorge Goitia ,  Kenneth L. Larson ,  Dennis R. McKean

    IPC分类号： G11B5/60 ,  G11B5/147 ,  B29C65/00

    CPC分类号： G11B5/4853 ,  G11B5/102 ,  G11B5/3163 ,  G11B5/3173 ,  Y10T29/49027 ,  Y10T29/49039 ,  Y10T29/49041 ,  Y10T29/49055 ,  Y10T29/53165 ,  Y10T156/10

    摘要： A method for forming a planarized surface for at least one bar of sliders for utilization in a hard disk drive is disclosed. In general, at least one bar of sliders is placed on an adhesive layer. A single thermoplastic layer is then provided above the at least one bar of sliders. The single thermoplastic layer is then heated to a softening temperature such that the single thermoplastic layer will flow between the at least one bar of sliders. The single thermoplastic layer is then cooled to form a planarized surface of both said single thermoplastic layer and said at least one bar of sliders at said adhesive layer.

    摘要翻译： 公开了一种用于形成至少一个用于硬盘驱动器的滑块的平面化表面的方法。 通常，将至少一个滑杆放置在粘合剂层上。 然后在至少一个滑杆上方设置单个热塑性层。 然后将单个热塑性层加热到软化温度，使得单个热塑性层将在至少一个滑块之间流动。 然后将单个热塑性层冷却以在所述粘合剂层处形成所述单一热塑性层和所述至少一个滑块条的平坦化表面。

    Segmented resist islands for photolithography on single sliders
    5.
    发明授权
    Segmented resist islands for photolithography on single sliders 失效
    在单个滑块上用于光刻的分段抗蚀岛

    公开(公告)号：US07396636B2

    公开(公告)日：2008-07-08

    申请号：US10928038

    申请日：2004-08-27

    申请人： Cherngye Hwang ,  Kim Y. Lee ,  Dennis R. McKean ,  Gary Suzuki

    发明人： Cherngye Hwang ,  Kim Y. Lee ,  Dennis R. McKean ,  Gary Suzuki

    IPC分类号： G03F7/00

    CPC分类号： G11B5/6005 ,  G11B5/3163 ,  G11B5/3173

    摘要： A method for creating segmented resist islands for photolithography on single sliders is disclosed. The method includes ramping the temperature of a number of single sliders, to a temperature that is below a proper softbake temperature. The single sliders reside in a divider and the single sliders and walls of the divider have a layer of resist deposited on them. Coarse lithography is then performed to remove the resist from above portions of the walls of the divider; and the temperature of the single sliders, the resist and the divider is then ramped to a proper softbake temperature.

    摘要翻译： 公开了一种用于在单个滑块上创建用于光刻的分割的抗蚀岛的方法。 该方法包括将多个单个滑块的温度升高到低于适当的软烘烤温度的温度。 单个滑块位于分隔器中，分隔器的单个滑块和壁具有沉积在其上的抗蚀剂层。 然后进行粗光刻以从分隔器的壁的上部的部分去除抗蚀剂; 然后将单个滑块，抗蚀剂和分隔器的温度倾斜到适当的软烘烤温度。

    Process for patterned electroplating
    7.
    发明授权
    Process for patterned electroplating 失效
    图案化电镀工艺

    公开(公告)号：US5545307A

    公开(公告)日：1996-08-13

    申请号：US417621

    申请日：1995-04-06

    申请人： Saad K. Doss ,  Dennis R. McKean ,  Alfred F. Renaldo ,  Robert J. Wilson

    发明人： Saad K. Doss ,  Dennis R. McKean ,  Alfred F. Renaldo ,  Robert J. Wilson

    IPC分类号： C25D5/02

    CPC分类号： C25D5/024

    摘要： A process for patterned electroplating involves the steps of: (i) coating a substrate with a layer of amninoalkylpyridine which acts as an adhesion promoter; (ii) coating the adhesion layer with a radiation sensitive polymeric resist; (iii) imagewise exposing the film to radiation; (iv) developing the image to patternwise expose the substrate; (v) electroplating metal onto the exposed portions of the substrate; and (vi) removing the remaining polymeric film from the substrate.

    摘要翻译： 用于图案化电镀的方法包括以下步骤：（i）用作为粘合促进剂的氨基烷基吡啶层涂覆底物; （ii）用辐射敏感聚合物抗蚀剂涂覆粘附层; （iii）将膜成像曝光于辐射; （iv）显影所述图像以图案地曝光所述基底; （v）将金属电镀到衬底的暴露部分上; 和（vi）从基底上除去剩余的聚合物膜。