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    Process for patterned electroplating
    1.
    发明授权
    Process for patterned electroplating 失效
    图案化电镀工艺

    公开(公告)号：US5545307A

    公开(公告)日：1996-08-13

    申请号：US417621

    申请日：1995-04-06

    申请人： Saad K. Doss ,  Dennis R. McKean ,  Alfred F. Renaldo ,  Robert J. Wilson

    发明人： Saad K. Doss ,  Dennis R. McKean ,  Alfred F. Renaldo ,  Robert J. Wilson

    IPC分类号： C25D5/02

    CPC分类号： C25D5/024

    摘要： A process for patterned electroplating involves the steps of: (i) coating a substrate with a layer of amninoalkylpyridine which acts as an adhesion promoter; (ii) coating the adhesion layer with a radiation sensitive polymeric resist; (iii) imagewise exposing the film to radiation; (iv) developing the image to patternwise expose the substrate; (v) electroplating metal onto the exposed portions of the substrate; and (vi) removing the remaining polymeric film from the substrate.

    摘要翻译： 用于图案化电镀的方法包括以下步骤：（i）用作为粘合促进剂的氨基烷基吡啶层涂覆底物; （ii）用辐射敏感聚合物抗蚀剂涂覆粘附层; （iii）将膜成像曝光于辐射; （iv）显影所述图像以图案地曝光所述基底; （v）将金属电镀到衬底的暴露部分上; 和（vi）从基底上除去剩余的聚合物膜。

    Patterned electroplating
    2.
    发明授权
    Patterned electroplating 失效
    图案电镀

    公开(公告)号：US5516418A

    公开(公告)日：1996-05-14

    申请号：US494862

    申请日：1995-06-26

    申请人： Saad K. Doss ,  Dennis R. McKean ,  Alfred F. Renaldo ,  Robert J. Wilson

    发明人： Saad K. Doss ,  Dennis R. McKean ,  Alfred F. Renaldo ,  Robert J. Wilson

    IPC分类号： C25D5/02 ,  H05K3/10 ,  H05K3/38

    CPC分类号： C25D5/024 ,  H05K3/108 ,  H05K3/389

    摘要： A process for patterned electroplating involves the steps of: (i) coating a substrate with a layer of hydroxyquinoline which acts as an adhesion promoter; (ii) coating the adhesion layer with a radiation sensitive polymeric resist; (iii) imagewise exposing the film to radiation; (iv) developing the image to patternwise expose the substrate; (v) electroplating metal onto the exposed portions of the substrate; and (vi) removing the remaining polymeric film from the substrate.

    摘要翻译： 图案化电镀的方法包括以下步骤：（i）用作为粘合促进剂的羟基喹啉层涂覆基材; （ii）用辐射敏感聚合物抗蚀剂涂覆粘附层; （iii）将膜成像曝光于辐射; （iv）显影所述图像以图案地曝光所述基底; （v）将金属电镀到衬底的暴露部分上; 和（vi）从基底上除去剩余的聚合物膜。

    Patterning a surface comprising silicon and carbon
    6.
    发明申请
    Patterning a surface comprising silicon and carbon 有权
    图案化包括硅和碳的表面

    公开(公告)号：US20090023100A1

    公开(公告)日：2009-01-22

    申请号：US11880157

    申请日：2007-07-19

    申请人： Cherngye Hwang ,  Dennis R. McKean ,  Gary J. Suzuki

    发明人： Cherngye Hwang ,  Dennis R. McKean ,  Gary J. Suzuki

    IPC分类号： H01L21/306 ,  G03C5/00

    CPC分类号： G03F7/0751 ,  G11B5/3163 ,  G11B5/3169 ,  G11B5/6082

    摘要： Patterning a surface, comprising at least one feature having silicon coupled to a substrate, is described herein. In one embodiment a method is described for patterning a surface which comprises at least one feature having silicon and at least one feature having carbon coupled to a substrate. The surface is coated with 3-(trimethoxysilyl)propyl methacrylate, and a photoresist is applied the 3-(trimethoxysilyl)propyl methacrylate coated surface. The photoresist is imaged and the surface is etched. The photoresist is then removed.

    摘要翻译： 在此描述包括至少一个具有耦合到衬底的硅的特征的表面。 在一个实施例中，描述了一种用于图案化表面的方法，该表面包括至少一个具有硅的特征和至少一个具有与基底结合的碳的特征。 表面用甲基丙烯酸3-（三甲氧基甲硅烷基）丙酯涂覆，并且使用光致抗蚀剂涂覆甲基丙烯酸3-（三甲氧基甲硅烷基）丙酯涂布表面。 光致抗蚀剂成像，表面被蚀刻。 然后除去光致抗蚀剂。

    Patterning a surface comprising silicon and carbon
    9.
    发明授权
    Patterning a surface comprising silicon and carbon 有权
    图案化包括硅和碳的表面

    公开(公告)号：US07851138B2

    公开(公告)日：2010-12-14

    申请号：US11880157

    申请日：2007-07-19

    申请人： Cherngye Hwang ,  Dennis R. McKean ,  Gary J. Suzuki

    发明人： Cherngye Hwang ,  Dennis R. McKean ,  Gary J. Suzuki

    IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/11 ,  G03F7/26 ,  G03F7/40

    CPC分类号： G03F7/0751 ,  G11B5/3163 ,  G11B5/3169 ,  G11B5/6082

    摘要： Patterning a surface, comprising at least one feature having silicon coupled to a substrate, is described herein. In one embodiment a method is described for patterning a surface which comprises at least one feature having silicon and at least one feature having carbon coupled to a substrate. The surface is coated with 3-(trimethoxysilyl)propyl methacrylate, and a photoresist is applied the 3-(trimethoxysilyl)propyl methacrylate coated surface. The photoresist is imaged and the surface is etched. The photoresist is then removed.

    摘要翻译： 在此描述包括至少一个具有耦合到衬底的硅的特征的表面。 在一个实施例中，描述了一种用于图案化表面的方法，该表面包括至少一个具有硅的特征和至少一个具有与基底结合的碳的特征。 表面用甲基丙烯酸3-（三甲氧基甲硅烷基）丙酯涂覆，并且使用光致抗蚀剂涂覆甲基丙烯酸3-（三甲氧基甲硅烷基）丙酯涂布表面。 光致抗蚀剂成像，表面被蚀刻。 然后除去光致抗蚀剂。

    SYSTEM AND METHOD FOR PATTERNING A MASTER DISK FOR NANOIMPRINTING PATTERNED MAGNETIC RECORDING DISKS
    10.
    发明申请
    SYSTEM AND METHOD FOR PATTERNING A MASTER DISK FOR NANOIMPRINTING PATTERNED MAGNETIC RECORDING DISKS 审中-公开
    用于绘制图形磁记录盘的主磁盘的系统和方法

    公开(公告)号：US20100147797A1

    公开(公告)日：2010-06-17

    申请号：US12711987

    申请日：2010-02-24

    申请人： Thomas R. Albrecht ,  Dennis R. McKean ,  Gurinder Pal Singh ,  Henry Hung Yang

    发明人： Thomas R. Albrecht ,  Dennis R. McKean ,  Gurinder Pal Singh ,  Henry Hung Yang

    IPC分类号： C23F1/02

    CPC分类号： G11B5/855

    摘要： A system and method for patterning a master disk or “stamper” to be used for nanoimprinting magnetic recording disks uses an air-bearing slider that supports an aperture structure within the optical near-field of a resist layer on a rotating master disk substrate. Laser pulses directed to the input side of the aperture are output to the resist layer. The aperture structure includes a metal film reflective to the laser radiation with the aperture formed in it. The aperture has a size less than the wavelength of the incident laser radiation and is maintained by the air-bearing slider near the resist layer to within the radiation wavelength. The timing of the laser pulses is controlled to form a pattern of exposed regions in the resist layer, with this pattern ultimately resulting in the desired pattern of data islands and nondata islands in the magnetic recording disks when they are nanoimprinted by the master disk.

    摘要翻译： 用于图形化用于纳米压印磁记录盘的母盘或“压模”的系统和方法使用支撑旋转母盘衬底上的抗蚀剂层的光学近场内的孔结构的空气轴承滑块。 指向孔径输入侧的激光脉冲输出到抗蚀剂层。 孔结构包括反射激光辐射的金属膜，其中形成有孔。 孔径的尺寸小于入射激光辐射的波长，并且由抗蚀剂层附近的空气轴承滑块维持在辐射波长内。 控制激光脉冲的定时以形成抗蚀剂层中的暴露区域的图案，当这些图案被母盘纳米压印时，该图案最终导致磁记录盘中的数据岛和非数据岛的期望图案。