公开(公告)号：US20100199209A1

公开(公告)日：2010-08-05

申请号：US12685144

申请日：2010-01-11

申请人： Chie SUEOKA ,  Seiji Harada ,  Rei Yokoyama

发明人： Chie SUEOKA ,  Seiji Harada ,  Rei Yokoyama

IPC分类号： G06F3/048

CPC分类号： G06F3/04847 ,  G06F3/0483 ,  G06F3/1205 ,  G06F3/1255 ,  G06F3/1285

摘要： An item setting apparatus for changing over a screen corresponding to a desired tab by selecting the desired tab from plural tabs and setting items displayed on the screen based on a user's operation, comprises an item information holding section to hold item information about indication of items of plural tabs having plural items; a group information holding section to separate items into plural groups and hold group information about that to which group each item belongs; a display item editing section to edit items displayed on a screen of a tab; and a tab display control section to control to display items correctively by a group unit on a screen of a tab selected by a user by using the group information.

摘要翻译： 一种物品设定装置，用于根据用户的操作从多个标签中选择期望的标签和显示在画面上的设定项目来切换与期望的标签对应的画面，该物品设定装置包括：项目信息保持部， 具有多个项目的多个标签; 组信息保存部分，用于将项目分成多个组，并且保存关于每个项目所属的组的组信息; 显示项目编辑部分，用于编辑在标签的屏幕上显示的项目; 以及标签显示控制部分，用于控制通过使用组信息由用户选择的标签的画面上的组单元校正地显示项目。

公开(公告)号：US08526064B2

公开(公告)日：2013-09-03

申请号：US12951290

申请日：2010-11-22

申请人： Seiji Harada ,  Rei Yokoyama

发明人： Seiji Harada ,  Rei Yokoyama

IPC分类号： H04N1/40 ,  G06K15/02 ,  H04N1/32 ,  G06F21/60

CPC分类号： H04N1/32144 ,  G06F21/608 ,  H04N1/00233 ,  H04N1/00883

摘要： Disclosed is a computer readable storage medium storing a program to make a computer realize functions of an image storage unit to store image data for generating a tint block image, a tint block image generation unit to generate the tint block image based on the image data, a script generation unit to generate a script for forming the tint block image based on the tint block image generated by the generation unit, a script adding unit to add the script to print data and a print data input unit to input the print data in which the script is added by the adding unit to an image forming apparatus.

摘要翻译： 公开了一种存储程序以使计算机实现图像存储单元的功能以存储用于生成色调块图像的图像数据的程序的计算机可读存储介质，色调块图像生成单元，用于基于图像数据生成色调块图像， 脚本生成单元，用于基于由生成单元生成的色调块图像来生成用于形成色调块图像的脚本;脚本添加单元，用于将脚本添加到打印数据;以及打印数据输入单元，输入打印数据，其中， 该添加单元将该脚本添加到图像形成装置。

公开(公告)号：US20110122453A1

公开(公告)日：2011-05-26

申请号：US12951290

申请日：2010-11-22

申请人： Seiji Harada ,  Rei Yokoyama

发明人： Seiji Harada ,  Rei Yokoyama

IPC分类号： G06K15/02

CPC分类号： H04N1/32144 ,  G06F21/608 ,  H04N1/00233 ,  H04N1/00883

摘要： Disclosed is a computer readable storage medium storing a program to make a computer realize functions of an image storage unit to store image data for generating a tint block image, a tint block image generation unit to generate the tint block image based on the image data, a script generation unit to generate a script for forming the tint block image based on the tint block image generated by the generation unit, a script adding unit to add the script to print data and a print data input unit to input the print data in which the script is added by the adding unit to an image forming apparatus.

摘要翻译： 公开了一种存储程序以使计算机实现图像存储单元的功能以存储用于生成色调块图像的图像数据的程序的计算机可读存储介质，色调块图像生成单元，用于基于图像数据生成色调块图像， 脚本生成单元，用于基于由生成单元生成的色调块图像来生成用于形成色调块图像的脚本;脚本添加单元，用于将脚本添加到打印数据;以及打印数据输入单元，输入打印数据，其中， 该添加单元将该脚本添加到图像形成装置。

公开(公告)号：US20100199211A1

公开(公告)日：2010-08-05

申请号：US12693678

申请日：2010-01-26

申请人： Shin IGAWA ,  Seiji Harada ,  Rei Yokoyama

发明人： Shin IGAWA ,  Seiji Harada ,  Rei Yokoyama

IPC分类号： G06F3/048

CPC分类号： G06F3/0483 ,  H04N1/00416 ,  H04N1/00432 ,  H04N1/00472 ,  H04N1/00482 ,  H04N1/00514 ,  H04N2201/0082

摘要： The display information is compared with the displayed information on what items are already displayed at what positions on the editable tab screen capable of editing the items stored therein, wherein the aforementioned display information includes the display item information on which of the items contained in the fixed tabs are to be displayed on the editable tab screen and the display position information on the positions of the items to be found on the editable tab screen. If a change has been discovered, a step is taken to determine the method of change processing for displaying the editable tab screen according to the result of comparison. The editable tab screen selected by the user is displayed according to the method of change processing based on the result of comparison.

摘要翻译： 将显示信息与显示信息进行比较，显示信息已经显示在能够编辑存储在其中的项目的可编辑标签屏幕上的什么位置上，其中上述显示信息包括显示项目信息，其中包含在固定 选项卡将显示在可编辑的选项卡屏幕上，并显示关于可编辑选项卡屏幕上要找到的项目的位置的显示位置信息。 如果发现了改变，则采取步骤来确定根据比较结果显示可编辑标签画面的变更处理方法。 根据比较结果，根据变更处理方法显示用户选择的可编辑标签画面。

公开(公告)号：US20100199210A1

公开(公告)日：2010-08-05

申请号：US12687302

申请日：2010-01-14

申请人： Seiji Harada ,  Rei Yokoyama

发明人： Seiji Harada ,  Rei Yokoyama

IPC分类号： G06F3/048

CPC分类号： G06F3/0483 ,  G06F3/1204 ,  G06F3/1205 ,  G06F3/1253 ,  G06F3/1285 ,  G06F3/1286 ,  H04N1/00416 ,  H04N1/00432 ,  H04N1/00472 ,  H04N1/00482 ,  H04N1/00514 ,  H04N2201/0082

摘要： The editable tab selectably displayed as well as the fixed tabs is selected by the user, whereby an editable tab screen is created and displayed using the display item information on which item should be displayed on the editable tab screen, the display position information on the position of the item to be displayed on the editable tab screen, and the item information of item included in the fixed tab.

摘要翻译： 可选择显示的可编辑选项卡以及固定选项卡由用户选择，由此使用可在可编辑选项卡屏幕上显示哪个项目的显示项目信息来创建和显示可编辑的选项卡屏幕，关于位置的显示位置信息 要显示在可编辑选项卡屏幕上的项目以及包含在固定选项卡中的项目的项目信息。

公开(公告)号：US08407695B2

公开(公告)日：2013-03-26

申请号：US12575741

申请日：2009-10-08

申请人： Seiji Harada

发明人： Seiji Harada

IPC分类号： G06F9/445

CPC分类号： G06F3/1204 ,  G06F3/1218 ,  G06F3/1225 ,  G06F3/1228 ,  G06F3/1239

摘要： Execution is provided of at least: the first processing for making the installer software store the group information that relates to information which classifies a plurality of apparatuses into groups and specifies the apparatuses belonging to each group or the address information indicating the location storing this group information, at the time of building the installer software for installing the universal control software that provides universal control of a plurality of the apparatuses; the second processing for notifying about the group information or address information to prompt the group setting of a plurality of the apparatuses when installing the universal control software using installer software; and the third processing for selecting an apparatus as the object of control from among the apparatuses specified by group information acquired from the storage location having been notified or specified by the address information, when universal control software is executed.

摘要翻译： 执行至少提供：用于使安装软件存储与将多个装置分组成组的信息相关联的组信息和指定属于每个组的装置的第一处理或指示存储该组信息的位置的地址信息 在构建用于安装通用控制软件的安装软件时，提供对多个设备的通用控制; 用于在使用安装软件安装通用控制软件时通知组信息或地址信息以提示多个设备的组设置的第二处理; 以及当执行通用控制软件时，从通过地址信息通知或指定的从存储位置获取的组信息指定的装置中选择作为控制对象的装置的第三处理。

公开(公告)号：US07589023B2

公开(公告)日：2009-09-15

申请号：US10258282

申请日：2001-04-23

申请人： Toru Taniguchi ,  Etsuro Morita ,  Satoshi Matagawa ,  Seiji Harada ,  Isoroku Ono ,  Mitsuhiro Endo ,  Fumihiko Yoshida

发明人： Toru Taniguchi ,  Etsuro Morita ,  Satoshi Matagawa ,  Seiji Harada ,  Isoroku Ono ,  Mitsuhiro Endo ,  Fumihiko Yoshida

IPC分类号： H01L21/302

CPC分类号： B24B37/08 ,  B24B37/042 ,  B24B37/24 ,  B24B37/28

摘要： A method of manufacturing a semiconductor wafer, comprising the step of differentiating the glossiness of a front surface from that of a rear surface of the wafer by using an abrasive cloth with a semiconductor wafer sink rate different in polishing from that of the other abrasive cloth for one of a polishing cloth (14) on an upper surface plate (12) and a polishing cloth (15) on a lower surface plate (13) so as to simultaneously polish both the front and rear surfaces of the semiconductor wafer (W), or differentiating by differentiating the rotating speed of the upper surface plate from that of the lower surface plate.

摘要翻译： 一种半导体晶片的制造方法，其特征在于，通过使用具有与其它研磨布不同的半导体晶片沉降速率的研磨布，将前表面的光泽度与晶片的后表面的光泽度区分开的步骤， 在上表面板（12）上的抛光布（14）和下表面板（13）上的抛光布（15）之一，以同时抛光半导体晶片（W）的前表面和后表面， 或通过区分上表面板的转速与下表面板的转速来区分。

公开(公告)号：US06488573B1

公开(公告)日：2002-12-03

申请号：US09651299

申请日：2000-08-30

申请人： Tatsunori Kobayashi ,  Hiroshi Tanaka ,  Yasuyuki Ogata ,  Kanji Hosoki ,  Eturo Morita ,  Seiji Harada

发明人： Tatsunori Kobayashi ,  Hiroshi Tanaka ,  Yasuyuki Ogata ,  Kanji Hosoki ,  Eturo Morita ,  Seiji Harada

IPC分类号： B24B2900

CPC分类号： B24B53/017

摘要： A polishing apparatus has a plurality of polishing stations for polishing materials to be polished and a plurality of cleaning stations for cleaning the materials being polished, the polishing stations and the cleaning stations being alternately arranged; and an arm for holding the materials being polished and transferring the materials being polished between the polishing stations and the cleaning stations successively. The arm includes a polishing head for holding the material being polished. Each of the cleaning stations comprises a retainer stand on which the material being polished is placed, and a cleaning device for cleaning the material being polished in a state held by the polishing head, cleaning the material being polished in a state placed on the retainer stand, and cleaning the polishing head in a state where the material being polished is separated from the polishing head. A polishing method is used in a polishing apparatus having a plurality of polishing stations for polishing materials to be polished and an arm for holding the materials being polished and transferring the materials being polished between the polishing stations successively, each of the polishing stations including a platen having a polishing pad affixed to a surface of the platen, the arm including a plurality of polishing heads, each of which holds the material being polished and brings one surface of the material being polished into contact with the polishing pad, the material to be polished being polished by the polishing pad with relative movement between the polishing head and the platen. The polishing method comprises the steps of fitting a spindle for supporting the polishing head in a horizontally rotatable manner into each of fitting portions formed in each of a plurality of spindle housings provided in the arm; rotating the material being polished and the polishing pad relatively while keeping the material being polished and the polishing pad contacted with each other; and adjusting an axial position of the polishing head and changing a position of the polishing head relative to the arm by an adjusting mechanism provided on the spindle, whereby the materials to be polished are each polished while being adjusted in position thereof

公开(公告)号：US08461020B2

公开(公告)日：2013-06-11

申请号：US13450968

申请日：2012-04-19

申请人： Seiji Harada ,  Yoshikazu Kobayashi

发明人： Seiji Harada ,  Yoshikazu Kobayashi

IPC分类号： H01L21/46

CPC分类号： H01L21/78

摘要： In a device processing method, a laser beam is applied to a wafer along division lines from the back side of the wafer, thereby forming a division start point inside the wafer along the division lines at a depth not reaching the finished thickness of each device. A protective member is attached to the front side of the wafer before or after performing the division start points are formed. An external force is applied through the protective member to the wafer, thereby dividing the wafer along the division lines to obtain the individual devices. The back side of the wafer is ground to remove the modified layers, and a silicon nitride film is formed on at least the side surface of each device. The silicon nitride film has a gettering effect and is formed on the side surface of each device, which surface is formed by a cleavage plane.

摘要翻译： 在器件处理方法中，将激光束沿着从晶片背面的分割线施加到晶片，从而在未达到每个器件的最终厚度的深度处沿着分割线在晶片内形成分割开始点。 在形成分割开始点之前或之后，保护构件附接到晶片的前侧。 通过保护构件将外力施加到晶片，从而沿着分割线分割晶片以获得各个器件。 研磨晶片的背面以去除改性层，并且至少在每个器件的侧表面上形成氮化硅膜。 氮化硅膜具有吸气效应，并且形成在每个器件的侧表面上，该表面由解理面形成。

公开(公告)号：US20120289060A1

公开(公告)日：2012-11-15

申请号：US13451283

申请日：2012-04-19

申请人： Seiji Harada ,  Yoshikazu Kobayashi

发明人： Seiji Harada ,  Yoshikazu Kobayashi

IPC分类号： H01L21/304

CPC分类号： H01L21/304 ,  C23C14/0036 ,  C23C14/0652 ,  C23C14/34 ,  H01L21/0217 ,  H01L21/02266 ,  H01L21/30625 ,  H01L21/3221 ,  H01L21/78

摘要： In a wafer processing method, the back side of a wafer having a plurality of devices on the front side thereof is ground, thereby reducing the thickness of the wafer to a predetermined thickness. The back side of the wafer is polished after performing the back grinding step, thereby removing a grinding strain, and a silicon nitride film is formed on the back side of the wafer. The thickness of the silicon nitride film to be formed in the silicon nitride film forming step is set to 6 to 100 nm. Thus, the silicon nitride film having a thickness of 6 to 100 nm is formed on the polished back side of the wafer from which a grinding strain has been removed. Accordingly, each device constituting the wafer can ensure a sufficient die strength and a sufficient gettering effect.

摘要翻译： 在晶片处理方法中，将具有在其前侧上的多个器件的晶片的背面研磨，从而将晶片的厚度减小到预定厚度。 在进行后研磨工序后，对晶片的背面进行研磨，除去研磨应变，在晶片的背面形成氮化硅膜。 在氮化硅膜形成步骤中形成的氮化硅膜的厚度设定为6〜100nm。 因此，在去除了研磨应变的晶片的抛光背面上形成厚度为6〜100nm的氮化硅膜。 因此，构成晶片的每个装置可以确保足够的模具强度和充分的吸气效果。