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154 条记录 (耗时 0.053 秒)

    Gas dispersion window for plasma apparatus and method of use thereof
    1.
    发明授权
    Gas dispersion window for plasma apparatus and method of use thereof 失效
    等离子体装置用气体分散窗及其使用方法

    公开(公告)号：US5824605A

    公开(公告)日：1998-10-20

    申请号：US509080

    申请日：1995-07-31

    申请人： Ching-Hwa Chen ,  David Liu ,  Mark J. Christensen

    发明人： Ching-Hwa Chen ,  David Liu ,  Mark J. Christensen

    IPC分类号： H01J37/32 ,  H05H1/46 ,  H05H1/00

    CPC分类号： H01J37/3244 ,  H01J37/321 ,  H05H1/46

    摘要： A gas dispersion window for a plasma etching or plasma deposition reactor including a housing having a chamber in which an article can be treated with plasma. The housing includes at least one inlet port connected to an interior of the chamber through which process gas can be supplied to the chamber. A radiofrequency energy source is arranged to pass radiofrequency energy into the chamber and induce plasma in the interior of the chamber by activating, with an electric field induced by the radiofrequency energy source, process gas supplied to the chamber through the inlet port. A dielectric window formed by spaced apart first and second dielectric members has an inner surface thereof forming part of an inner wall of the chamber. Radiofrequency energy passes from the radiofrequency energy source to the interior of the chamber through the dielectric window. The process gas is supplied to the gap between the first and second dielectric members and passes inwardly into the chamber through gas dispersion holes in the second member.

    摘要翻译： 一种用于等离子体蚀刻或等离子体沉积反应器的气体分散窗，其包括具有腔室的壳体，其中可以用等离子体处理制品。 壳体包括连接到室的内部的至少一个入口端口，通过该入口端口可将工艺气体供应到室。 射频能源设置成将射频能量传递到腔室中并且通过由射频能量源引起的电场通过入口端口供应到腔室的处理气体进行激活而在腔室的内部引起等离子体。 由间隔开的第一和第二电介质构件形成的电介质窗口具有形成室的内壁的一部分的内表面。 射频能量通过电介质窗从射频能量传递到腔室的内部。 工艺气体被供应到第一和第二电介质构件之间的间隙，并通过第二构件中的气体分散孔向内进入腔室。

    Plasma cleaning method for removing residues in a plasma treatment chamber
    2.
    发明授权
    Plasma cleaning method for removing residues in a plasma treatment chamber 失效
    用于去除等离子体处理室中的残留物的等离子体清洁方法

    公开(公告)号：US5356478A

    公开(公告)日：1994-10-18

    申请号：US176935

    申请日：1994-01-03

    申请人： Ching-Hwa Chen ,  David Arnett ,  David Liu

    发明人： Ching-Hwa Chen ,  David Arnett ,  David Liu

    IPC分类号： B08B7/00 ,  C23C16/44 ,  C23F4/00 ,  H01L21/00 ,  H01L21/302 ,  H01L21/3065

    CPC分类号： H01L21/67028 ,  B08B7/0035 ,  C23C16/4405 ,  H01J37/32862

    摘要： A plasma cleaning method for removing residues previously formed in a plasma treatment chamber by dry etching layers such as photoresist, barriers, etc., on a wafer. The method includes introducing a cleaning gas mixture of an oxidizing gas and a chlorine containing gas into the chamber followed by performing a plasma cleaning step. The plasma cleaning step is performed by activating the cleaning gas mixture and forming a plasma cleaning gas, contacting interior surfaces of the chamber with the plasma cleaning gas and removing residues on the interior surfaces. The cleaning gas mixture can also include a fluorine-based gas. For instance, the cleaning gas can include Cl.sub.2 and O.sub.2 and optionally CF.sub.4. An advantage of the cleaning method is that it is not necessary to open the plasma treatment chamber. Also, it is possible to completely remove all residues and prevent by-products formed during the cleaning step from remaining after the cleaning step.

    摘要翻译： 一种等离子体清洗方法，用于通过诸如光致抗蚀剂，阻挡层等的干蚀刻层去除等离子体处理室中先前形成的残留物。 该方法包括将氧化气体和含氯气体的清洁气体混合物引入室中，然后执行等离子体清洗步骤。 通过激活清洁气体混合物并形成等离子体清洁气体，使室的内表面与等离子体清洁气体接触并除去内表面上的残留物来进行等离子体清洗步骤。 清洁气体混合物还可以包括氟基气体。 例如，清洁气体可以包括Cl 2和O 2以及任选的CF 4。 清洗方法的优点在于不需要打开等离子体处理室。 此外，可以完全除去所有残留物并且防止在清洁步骤后形成的副产物在清洁步骤之后残留。

    Plasma apparatus including dielectric window for inducing a uniform electric field in a plasma chamber
    3.
    发明授权
    Plasma apparatus including dielectric window for inducing a uniform electric field in a plasma chamber 失效
    等离子体设备包括用于在等离子体室中诱导均匀电场的介电窗口

    公开(公告)号：US5226967A

    公开(公告)日：1993-07-13

    申请号：US883201

    申请日：1992-05-14

    申请人： Ching-Hwa Chen ,  David Liu ,  Duc Tran

    发明人： Ching-Hwa Chen ,  David Liu ,  Duc Tran

    IPC分类号： H05H1/46 ,  C23C16/50 ,  C23C16/507 ,  C23F4/00 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065

    CPC分类号： H01J37/32238 ,  C23C16/507 ,  H01J37/32082 ,  H01J37/321

    摘要： An apparatus for plasma etching or plasma deposition including a housing having a chamber in which a wafer can be treated with plasma. The housing includes at least one inlet port connected to an interior of the chamber through which process gas can be supplied to the chamber. A radiofrequency energy source is arranged to pass radiofrequency energy into the chamber and induce plasma in the interior of the chamber by activating, with an electric field induced by the radiofrequency energy source, process gas supplied to the chamber through the inlet port. A dielectric window having an inner surface thereof forms part of an inner wall of the chamber. Radiofrequency energy passes from the radiofrequency energy source to the interior of the chamber through the dielectric window. The dielectric window has a thickness which varies at different points along the inner surface thereof such that the thickness is largest at a central portion of the dielectric window. The dielectric window is effective to decrease the induced electric field in the interior of the chamber near the central portion of the dielectric window.

    摘要翻译： 一种用于等离子体蚀刻或等离子体沉积的装置，包括具有可以用等离子体处理晶片的室的壳体。 壳体包括连接到室的内部的至少一个入口端口，通过该入口端口可将工艺气体供应到室。 射频能源设置成将射频能量传递到腔室中并且通过由射频能量源引起的电场通过入口端口供应到腔室的处理气体进行激活而在腔室的内部引起等离子体。 具有内表面的电介质窗形成室的内壁的一部分。 射频能量通过电介质窗从射频能量传递到腔室的内部。 电介质窗口具有在其内表面的不同点处变化的厚度，使得在电介质窗口的中心部分处的厚度最大。 电介质窗口有效地减小在电介质窗口的中心部分附近的室内的感应电场。

    Method of treating an article with a plasma apparatus in which a uniform electric field is induced by a dielectric window
    4.
    发明授权
    Method of treating an article with a plasma apparatus in which a uniform electric field is induced by a dielectric window 失效
    用等离子体装置处理物品的方法，其中电介质窗口引起均匀的电场

    公开(公告)号：US5368710A

    公开(公告)日：1994-11-29

    申请号：US038612

    申请日：1993-03-29

    申请人： Ching-Hwa Chen ,  David Liu ,  Duc Tran

    发明人： Ching-Hwa Chen ,  David Liu ,  Duc Tran

    IPC分类号： H05H1/46 ,  C23C16/50 ,  C23C16/507 ,  C23F4/00 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  C23C14/00

    CPC分类号： H01J37/32238 ,  C23C16/507 ,  H01J37/32082 ,  H01J37/321

    摘要： A method of plasma treating an article in a housing having a chamber in which the article such as a wafer can be treated with plasma. The housing includes at least one inlet port connected to an interior of the chamber through which process gas can be supplied to the chamber. A radiofrequency energy source is arranged to pass radiofrequency energy into the chamber and induce plasma in the interior of the chamber by activating, with an electric field induced by the radiofrequency energy source, process gas supplied to the chamber through the inlet port. A dielectric window having an inner surface thereof forms part of an inner wall of the chamber. Radiofrequency energy passes from the radiofrequency energy source to the interior of the chamber through the dielectric window. The dielectric window has a thickness which varies at different points along the inner surface thereof such that the thickness is largest at a central portion of the dielectric window. The dielectric window is effective to decrease the induced electric field in the interior of the chamber near the central portion of the dielectric window.

    摘要翻译： 一种等离子体处理具有室的壳体中的物品的方法，其中诸如晶片的物品可以用等离子体处理。 壳体包括连接到室的内部的至少一个入口端口，通过该入口端口可将工艺气体供应到室。 射频能源设置成将射频能量传递到腔室中并且通过由射频能量源引起的电场通过入口端口供应到腔室的处理气体进行激活而在腔室的内部引起等离子体。 具有内表面的电介质窗形成室的内壁的一部分。 射频能量通过电介质窗从射频能量传递到腔室的内部。 电介质窗口具有在其内表面的不同点处变化的厚度，使得在电介质窗口的中心部分处的厚度最大。 电介质窗口有效地减小在电介质窗口的中心部分附近的室内的感应电场。

    Structured network traffic data retrieval in vast volume
    6.
    发明授权
    Structured network traffic data retrieval in vast volume 有权
    大量结构化网络流量数据检索

    公开(公告)号：US09442883B2

    公开(公告)日：2016-09-13

    申请号：US13971707

    申请日：2013-08-20

    申请人： James Liao ,  Lin Du ,  David Liu

    发明人： James Liao ,  Lin Du ,  David Liu

    IPC分类号： G06F15/167 ,  G06F15/173

    CPC分类号： G06F15/17331 ,  G06F17/30073 ,  G06F17/30861

    摘要： A method and apparatus are disclosed herein for retrieving network traffic data. In one embodiment, a networking apparatus comprises a memory; a network device; and a processing unit coupled to the network device and the memory. The processing unit is operable to execute a data engine that performs bulk data transfers from the network device periodically into a data buffer in the memory and translates data received from the network device, based on a mapping definition, into a user defined format for export to one or more applications running on networking apparatus.

    摘要翻译： 本文公开了一种用于检索网络业务数据的方法和装置。 在一个实施例中，网络装置包括存储器; 网络设备; 以及耦合到网络设备和存储器的处理单元。 所述处理单元可操作以执行数据引擎，所述数据引擎从所述网络设备周期性地进行批量数据传输到所述存储器中的数据缓冲器中，并且将从所述网络设备接收的数据基于映射定义转换成用户定义的格式以输出到 网络设备上运行的一个或多个应用程序。

    CONTENT RECOMMENDATION USING THIRD PARTY PROFILES
    10.
    发明申请
    CONTENT RECOMMENDATION USING THIRD PARTY PROFILES 有权
    使用第三方配置文件的内容建议

    公开(公告)号：US20130066973A1

    公开(公告)日：2013-03-14

    申请号：US13614816

    申请日：2012-09-13

    申请人： Mike MACADAAN ,  William G. Wetherell ,  David Liu

    发明人： Mike MACADAAN ,  William G. Wetherell ,  David Liu

    IPC分类号： G06F15/16

    CPC分类号： G06F17/30864 ,  G06F3/0482 ,  G06F17/30274 ,  G06F17/30554 ,  G06F17/3056 ,  G06F17/30867 ,  G06Q30/0255 ,  G06Q30/0269 ,  G06Q30/0271 ,  H04L67/22 ,  H04L67/306

    摘要： A method includes identifying one or more features of a short term profile of a user that are not included in a long term profile of the user, using the one or more features to identify one or more third party profiles having features that substantially match the one or more features of the user's short term profile, accessing the identified one or more third party profiles, and providing one or more content items included in the third party profile to the user, the one or more content items having associated features that match the one or more features of the short term profile. An alternative method includes accessing one or more third party profiles that are not a profile of the user, and using the accessed third party profile to identify a plurality of content items for recommendation based on a feature set of the third party profile.

    摘要翻译： 一种方法包括使用一个或多个特征来识别不包括在用户的长期简档中的用户的短期简档的一个或多个特征，以识别具有基本上匹配于该特征的特征的一个或多个第三方简档 或更多的特征，用户的短期简档，访问所识别的一个或多个第三方简档，以及向所述用户提供包括在所述第三方简档中的一个或多个内容项，所述一个或多个内容项具有与所述一个 或更多的短期特征。 替代方法包括访问不是用户的简档的一个或多个第三方简档，并且使用所访问的第三方简档来基于第三方简档的特征集来标识用于推荐的多个内容项。