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    Supercritical developing for a lithographic process
    1.
    发明授权
    Supercritical developing for a lithographic process 有权
    光刻工艺的超临界发展

    公开(公告)号：US07473517B2

    公开(公告)日：2009-01-06

    申请号：US11025538

    申请日：2004-12-29

    申请人： Ching-Yu Chang ,  Burn Jeng Lin ,  Chi-Wen Liu

    发明人： Ching-Yu Chang ,  Burn Jeng Lin ,  Chi-Wen Liu

    IPC分类号： G03F7/30

    CPC分类号： G03F7/322

    摘要： A method of creating a resist image on a semiconductor substrate includes exposing a layer of photoresist on the semiconductor substrate and developing the exposed layer of photoresist using a first fluid including supercritical carbon dioxide and a base such as Tetra-Methyl Ammonium Hydroxide (TMAH). Additionally, the developed photoresist can be cleaned using a second fluid including supercritical carbon dioxide and a solvent such as methanol, ethanol, isopropanol, and xylene.

    摘要翻译： 在半导体衬底上产生抗蚀剂图像的方法包括：使用包括超临界二氧化碳和碱（例如四甲基氢氧化铵（TMAH））的第一流体在半导体衬底上曝光光致抗蚀剂层并显影曝光的光致抗蚀剂层。 此外，可以使用包括超临界二氧化碳和溶剂如甲醇，乙醇，异丙醇和二甲苯的第二流体来清洗显影的光致抗蚀剂。

    Photoresist materials and photolithography processes
    4.
    发明授权
    Photoresist materials and photolithography processes 有权
    光刻胶材料和光刻工艺

    公开(公告)号：US08848163B2

    公开(公告)日：2014-09-30

    申请号：US13050251

    申请日：2011-03-17

    申请人： Hsien-Cheng Wang ,  Chin-Hsiang Lin ,  Heng-Jen Lee ,  Ching-Yu Chang ,  Hua-Tai Lin ,  Burn Jeng Lin

    发明人： Hsien-Cheng Wang ,  Chin-Hsiang Lin ,  Heng-Jen Lee ,  Ching-Yu Chang ,  Hua-Tai Lin ,  Burn Jeng Lin

    IPC分类号： G03B27/52 ,  G03B27/42

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/30 ,  G03F7/38 ,  G03F7/70858 ,  Y10S430/106 ,  Y10S430/111

    摘要： A lithography apparatus generates a tunable magnetic field to facilitate processing of photoresist. The lithography apparatus includes a chamber and a substrate stage in the chamber operable to hold a substrate. A magnetic module provides a magnetic field to the substrate on the substrate stage. The magnetic module is configured to provide the magnetic field in a tunable and alternating configuration with respect to its magnitude and frequency. The magnetic field is provided to have a gradient in magnitude along a Z-axis that is perpendicular to the substrate stage to cause magnetically-charged particles disposed over the substrate stage to move up and down along the Z-axis. The lithography apparatus also includes a radiation energy source and an objective lens configured to receive radiation energy from the radiation energy source and direct the radiation energy toward the substrate positioned on the substrate stage.

    摘要翻译： 光刻设备产生可调磁场以便于光致抗蚀剂的加工。 光刻设备包括腔室和腔室中的衬底台，其可操作以保持衬底。 磁性模块为衬底台上的衬底提供磁场。 磁模块被配置为相对于其幅度和频率提供可调和交替配置的磁场。 磁场被提供为具有沿垂直于衬底台的Z轴的幅度梯度，以使得设置在衬底台上的带磁性颗粒沿Z轴上下移动。 光刻设备还包括辐射能量源和物镜，其被配置为从辐射能量源接收辐射能量并将辐射能量引向位于衬底台上的衬底。

    Immersion lithography system using direction-controlling fluid inlets
    5.
    发明授权
    Immersion lithography system using direction-controlling fluid inlets 有权
    浸入光刻系统采用方向控制流体入口

    公开(公告)号：US08767178B2

    公开(公告)日：2014-07-01

    申请号：US13482879

    申请日：2012-05-29

    申请人： Burn Jeng Lin ,  Ching-Yu Chang

    发明人： Burn Jeng Lin ,  Ching-Yu Chang

    IPC分类号： G03B27/42

    CPC分类号： G03B27/52 ,  G03F7/70341

    摘要： Immersion lithography system and method using direction-controlling fluid inlets are described. According to one embodiment of the present disclosure, an immersion lithography apparatus includes a lens assembly having an imaging lens disposed therein and a wafer stage configured to retain a wafer beneath the lens assembly. The apparatus also includes a plurality of direction-controlling fluid inlets disposed adjacent to the lens assembly, each direction-controlling fluid inlet in the plurality of direction-controlling fluid inlets being configured to direct a flow of fluid beneath the lens assembly and being independently controllable with respect to the other fluid inlets in the plurality of direction-controlling fluid inlets.

    摘要翻译： 描述了使用方向控制流体入口的浸渍光刻系统和方法。 根据本公开的一个实施例，浸没式光刻设备包括具有设置在其中的成像透镜的透镜组件和被配置为将晶片保持在透镜组件下方的晶片台。 该装置还包括多个方向控制流体入口，其邻近透镜组件设置，多个方向控制流体入口中的每个方向控制流体入口构造成将透镜流体下方的流体引导到透镜组件的下方并且可独立控制 相对于多个方向控制流体入口中的其它流体入口。

    Immersion lithography system using a sealed wafer bath
    6.
    发明授权
    Immersion lithography system using a sealed wafer bath 有权
    浸没光刻系统使用密封晶圆槽

    公开(公告)号：US08208116B2

    公开(公告)日：2012-06-26

    申请号：US11670860

    申请日：2007-02-02

    申请人： Burn Jeng Lin ,  Ching-Yu Chang

    发明人： Burn Jeng Lin ,  Ching-Yu Chang

    IPC分类号： G03B27/52

    CPC分类号： G03B27/52 ,  G03F7/70341

    摘要： Immersion lithography system and method using a sealed wafer bottom are described. One embodiment is an immersion lithography apparatus including a lens assembly comprising an imaging lens and a wafer stage for retaining a wafer beneath the lens assembly and comprising a seal ring for sealing a gap between a bottom edge of a wafer retained on the wafer stage and the wafer stage. The apparatus further includes a fluid tank for retaining immersion fluid, the fluid tank situated with respect to the wafer stage for enabling full immersion of the wafer retained on the wafer stage in the immersion fluid; a cover disposed over at least a portion of the fluid tank for providing a temperature-controlled, fluid-rich environment within the fluid tank; and at least one directional flow control fluid inlet surrounding the imaging lens for directing immersion fluid toward an edge of the wafer retained on the wafer stage closest to the imaging lens.

    摘要翻译： 描述了浸没光刻系统和使用密封晶片底部的方法。 一个实施例是一种浸没光刻设备，其包括透镜组件，该透镜组件包括成像透镜和用于将晶片保持在透镜组件下方的晶片台，并且包括密封环，用于密封保留在晶片台上的晶片的底部边缘与 晶圆台。 该装置还包括用于保持浸没流体的流体箱，相对于晶片台定位的流体箱，用于使保留在晶片台上的晶片能够完全浸入浸没流体中; 设置在所述流体箱的至少一部分上的盖，用于在所述流体箱内提供温度控制的，富含流体的环境; 以及围绕成像透镜的至少一个方向流量控制流体入口，用于将浸没流体引向保持在最靠近成像透镜的晶片台上的晶片的边缘。

    Immersion Lithography System Using A Sealed Wafer Bath
    8.
    发明申请
    Immersion Lithography System Using A Sealed Wafer Bath 有权
    浸入式平版印刷系统使用密封晶片浴

    公开(公告)号：US20080106710A1

    公开(公告)日：2008-05-08

    申请号：US11670860

    申请日：2007-02-02

    申请人： Burn Jeng Lin ,  Ching-Yu Chang

    发明人： Burn Jeng Lin ,  Ching-Yu Chang

    IPC分类号： G03B27/52

    CPC分类号： G03B27/52 ,  G03F7/70341

    摘要： Immersion lithography system and method using a sealed wafer bottom are described. One embodiment is an immersion lithography apparatus including a lens assembly comprising an imaging lens and a wafer stage for retaining a wafer beneath the lens assembly and comprising a seal ring for sealing a gap between a bottom edge of a wafer retained on the wafer stage and the wafer stage. The apparatus further includes a fluid tank for retaining immersion fluid, the fluid tank situated with respect to the wafer stage for enabling full immersion of the wafer retained on the wafer stage in the immersion fluid; a cover disposed over at least a portion of the fluid tank for providing a temperature-controlled, fluid-rich environment within the fluid tank; and at least one directional flow control fluid inlet surrounding the imaging lens for directing immersion fluid toward an edge of the wafer retained on the wafer stage closest to the imaging lens.

    摘要翻译： 描述了浸没光刻系统和使用密封晶片底部的方法。 一个实施例是一种浸没式光刻设备，其包括透镜组件，该透镜组件包括成像透镜和用于将晶片保持在透镜组件下方的晶片台，并且包括密封环，用于密封保留在晶片台上的晶片的底部边缘与 晶圆台。 该装置还包括用于保持浸没流体的流体箱，相对于晶片台定位的流体箱，用于使保留在晶片台上的晶片能够完全浸入浸没流体中; 设置在所述流体箱的至少一部分上的盖，用于在所述流体箱内提供温度控制的，富含流体的环境; 以及围绕成像透镜的至少一个方向流量控制流体入口，用于将浸没流体引向保持在最靠近成像透镜的晶片台上的晶片的边缘。

    APPARATUS AND METHOD FOR IMMERSION LITHOGRAPHY
    9.
    发明申请
    APPARATUS AND METHOD FOR IMMERSION LITHOGRAPHY 有权
    装置和方法

    公开(公告)号：US20080002164A1

    公开(公告)日：2008-01-03

    申请号：US11697469

    申请日：2007-04-06

    申请人： Ching-Yu Chang ,  Burn Jeng Lin

    发明人： Ching-Yu Chang ,  Burn Jeng Lin

    IPC分类号： G03B27/00 ,  B08B3/12

    CPC分类号： B08B3/12 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/70925

    摘要： A lithography apparatus includes an imaging lens module, a substrate table positioned underlying the imaging lens module and configured to hold a substrate, and a cleaning module adapted to clean the lithography apparatus. The cleaning module comprises one inlet and one outlet for providing a cleaning fluid to and from a portion of the lithography apparatus to be cleaned, and an ultrasonic unit configured to provide ultrasonic energy to the cleaning fluid.

    摘要翻译： 光刻设备包括成像透镜模块，位于成像透镜模块下方并构造成保持基板的基板台，以及适于清洁光刻设备的清洁模块。 清洁模块包括一个入口和一个出口，用于向待清洁的光刻设备的一部分提供清洁流体;以及超声波单元，被配置为向清洁流体提供超声波能量。

    Immersion lithography system using a sealed wafer bath
    10.
    发明授权
    Immersion lithography system using a sealed wafer bath 有权
    浸没光刻系统使用密封晶圆槽

    公开(公告)号：US09046789B2

    公开(公告)日：2015-06-02

    申请号：US13595734

    申请日：2012-08-27

    申请人： Burn Jeng Lin ,  Ching-Yu Chang

    发明人： Burn Jeng Lin ,  Ching-Yu Chang

    IPC分类号： G03B27/42 ,  G03F7/20

    CPC分类号： G03F7/70866 ,  G03F7/70341

    摘要： Immersion lithography system and method using a sealed wafer bottom are described. One embodiment is an immersion lithography apparatus comprising a lens assembly comprising an imaging lens and a wafer stage for retaining a wafer beneath the lens assembly, the wafer stage comprising a seal ring disposed on a seal ring frame along a top edge of the wafer retained on the wafer stage, the seal ring for sealing a gap between an edge of the wafer and the wafer stage. The embodiment further includes a fluid tank for retaining immersion fluid, the fluid tank situated with respect to the wafer stage for enabling full immersion of the wafer retained on the wafer stage in the immersion fluid and a cover disposed over at least a portion of the fluid tank for providing a temperature-controlled, fluid-rich environment within the fluid tank fluid-rich environment within the fluid tank.

    摘要翻译： 描述了浸没光刻系统和使用密封晶片底部的方法。 一个实施例是一种浸没光刻设备，其包括透镜组件，该透镜组件包括成像透镜和用于将晶片保持在透镜组件下方的晶片台，晶片台包括沿着晶片的顶部边缘设置在密封环框架上的密封环， 晶片台，用于密封晶片边缘与晶片台之间的间隙的密封环。 该实施例还包括用于保持浸没流体的流体箱，相对于晶片台定位的流体箱，用于使保留在晶片台上的晶片完全浸没在浸没流体中，并且覆盖设置在流体的至少一部分上 罐，用于在流体箱内的流体槽流体富含环境内提供温度控制的，富含流体的环境。