Micromechanical component having a damping device
    1.
    发明授权
    Micromechanical component having a damping device 有权
    具有阻尼装置的微机械部件

    公开(公告)号:US09206033B2

    公开(公告)日:2015-12-08

    申请号:US13479770

    申请日:2012-05-24

    摘要: A micromechanical component including a mass structure which may be deflected with respect to a substrate with the aid of at least one spiral spring in a direction of deflection. The spiral spring includes at least one folding section, which is formed by two spring legs which are situated essentially in parallel to each other and are connected to each other with the aid of a connecting bar. A damping device for oscillating movements of the folding section in the direction of deflection is provided in the area of the connecting bar.

    摘要翻译: 一种微机械部件,其包括质量结构,所述质量结构可以借助于沿偏转方向的至少一个螺旋弹簧而相对于基板偏转。 螺旋弹簧包括至少一个折叠部分,其由两个基本上彼此平行地定位并且通过连接杆彼此连接的弹簧腿形成。 在连接杆的区域中设置有用于使折叠部在偏转方向上摆动的阻尼装置。

    rotational rate sensor having preset quadrature offset
    2.
    发明申请
    rotational rate sensor having preset quadrature offset 审中-公开
    旋转速率传感器具有预设的正交偏移

    公开(公告)号:US20150052999A1

    公开(公告)日:2015-02-26

    申请号:US14467943

    申请日:2014-08-25

    IPC分类号: G01C19/5747 G01C19/5769

    摘要: A rotational rate sensor includes a substrate and a seismic mass situated thereon, and configured for detecting a rate of rotation about a rotation axis, the seismic mass having a second mass element coupled to a first mass element, which is drivable to a drive movement along a drive direction perpendicular to the rotation axis, the first and second mass element being deflectable along a detection direction essentially perpendicular to the drive direction and to the rotation axis, the rotational rate sensor having at least one compensating arrangement to produce a compensating force acting on the second mass element, the compensating force being oriented in a compensation direction essentially parallel to the detection direction, the at least one compensating arrangement being the only compensating arrangement and being configured exclusively to produce the compensating force oriented in the compensation direction, the rotational rate sensor being configured such that a quadrature offset force acting on the second mass element is directed exclusively in a preferred direction opposite and parallel to the compensation direction.

    摘要翻译: 旋转速率传感器包括基板和位于其上的地震质量块,并且被构造成用于检测围绕旋转轴线的旋转速率,所述地震质量块具有耦合到第一质量元件的第二质量元件,所述第二质量元件可驱动成驱动运动 垂直于旋转轴的驱动方向,第一质量元件和第二质量元件沿着基本上垂直于驱动方向和旋转轴线的检测方向可偏转,所述转速传感器具有至少一个补偿装置,以产生作用于 第二质量元件,补偿力在与检测方向基本平行的补偿方向上定向,所述至少一个补偿装置是唯一的补偿装置,并且被构造成专门产生在补偿方向上定向的补偿力,转速 传感器被配置成使得正交关闭 作用在第二质量元件上的力仅在与补偿方向相反并平行的优选方向上引导。

    METHOD FOR COMPENSATING FOR QUADRATURE
    3.
    发明申请
    METHOD FOR COMPENSATING FOR QUADRATURE 有权
    用于补偿的方法

    公开(公告)号:US20110153251A1

    公开(公告)日:2011-06-23

    申请号:US12645010

    申请日:2009-12-22

    IPC分类号: G06F19/00 G01P21/00

    CPC分类号: G01C19/5755 G01C19/5726

    摘要: A method for compensating for the quadrature of a micromechanical structure, the micromechanical structure having a substrate having a main extension plane, a seismic mass that is attached by spring elements to the substrate, and first and second compensation electrodes anchored to the substrate; in response to application of a first quadrature voltage between the first compensation electrode and the seismic mass, a first compensation force being produced on the seismic mass and, in response to application of a second quadrature voltage between the second compensation electrode and the seismic mass, a second compensation force being produced on the seismic mass and, in addition, the second quadrature voltage being adjusted as a function of the first quadrature voltage.

    摘要翻译: 一种用于补偿微机械结构的正交的方法,所述微机械结构具有具有主延伸平面的基板,通过弹簧元件附接到所述基板的地震质量以及锚定到所述基板的第一和第二补偿电极; 响应于在第一补偿电极和地震质量之间施加第一正交电压,在地震质量上产生第一补偿力,并且响应于在第二补偿电极和地震块之间施加第二正交电压, 在地震质量上产生第二补偿力,此外,第二正交电压被调整为第一正交电压的函数。

    QUADRATURE COMPENSATION FOR A ROTATION-RATE SENSOR
    4.
    发明申请
    QUADRATURE COMPENSATION FOR A ROTATION-RATE SENSOR 有权
    旋转速率传感器的补偿补偿

    公开(公告)号:US20100132461A1

    公开(公告)日:2010-06-03

    申请号:US12623621

    申请日:2009-11-23

    IPC分类号: G01C19/56

    CPC分类号: G01C19/5747

    摘要: A rotation-rate sensor includes a substrate having a surface, a movable element situated above the surface, which is deflectable based on a Coriolis force along a first axis that runs perpendicular to the surface, a driving device which is prepared to activate the movable element along a second axis that runs parallel to the surface, a compensation device, in order to generate an electrostatic force along the first axis, including electrodes corresponding to one another, developed on the substrate and on the movable element; a relative degree of covering of the electrodes in the direction of the first axis being a function of the deflection of the movable element along the second axis; and the electrode developed on the movable element runs around an insulating region of the movable element.

    摘要翻译: 旋转速率传感器包括具有表面的基板,位于表面上方的可移动元件,其基于沿着垂直于该表面延伸的第一轴线的科里奥利力可偏转;驱动装置,其准备激活可移动元件 沿着平行于所述表面延伸的第二轴线,补偿装置,以便沿着所述第一轴线产生静电力,所述静电力包括彼此对应的电极,所述电极在所述基板上和所述可移动元件上显影; 电极在第一轴方向上的相对的覆盖程度是可移动元件沿着第二轴的偏转的函数; 并且在可移动元件上显影的电极围绕可移动元件的绝缘区域延伸。

    Method for compensating for quadrature
    5.
    发明授权
    Method for compensating for quadrature 有权
    补偿正交的方法

    公开(公告)号:US08479555B2

    公开(公告)日:2013-07-09

    申请号:US12645010

    申请日:2009-12-22

    IPC分类号: G01P21/00

    CPC分类号: G01C19/5755 G01C19/5726

    摘要: A method for compensating for the quadrature of a micromechanical structure, the micromechanical structure having a substrate having a main extension plane, a seismic mass that is attached by spring elements to the substrate, and first and second compensation electrodes anchored to the substrate; in response to application of a first quadrature voltage between the first compensation electrode and the seismic mass, a first compensation force being produced on the seismic mass and, in response to application of a second quadrature voltage between the second compensation electrode and the seismic mass, a second compensation force being produced on the seismic mass and, in addition, the second quadrature voltage being adjusted as a function of the first quadrature voltage.

    摘要翻译: 一种用于补偿微机械结构的正交的方法,所述微机械结构具有具有主延伸平面的基板,通过弹簧元件附接到所述基板的地震质量以及锚定到所述基板的第一和第二补偿电极; 响应于在第一补偿电极和地震质量之间施加第一正交电压,在地震质量上产生第一补偿力,并且响应于在第二补偿电极和地震块之间施加第二正交电压, 在地震质量上产生第二补偿力,此外,第二正交电压被调整为第一正交电压的函数。

    Micromechanical structures
    6.
    发明授权
    Micromechanical structures 有权
    微机械结构

    公开(公告)号:US08726731B2

    公开(公告)日:2014-05-20

    申请号:US12683316

    申请日:2010-01-06

    IPC分类号: G01C19/56

    CPC分类号: G01C19/5747

    摘要: A micromechanical structure including a substrate having a main plane of extension, and including a first seismic mass, the first seismic mass including a grid structure made of intersecting first mass lines and the first seismic mass being flexibly secured with the aid of first bending-spring elements, and moreover, a first line width of the first mass lines parallel to the main plane of extension being between 20 and 50 percent of a further first line width of the first bending-spring elements parallel to the main plane of extension.

    摘要翻译: 一种微机械结构,包括具有主平面延伸的基板,并且包括第一抗震块,所述第一抗震块包括由相交的第一质量线形成的格栅结构,并且所述第一抗震块借助于第一弯曲弹簧而被灵活地固定 元件,此外,平行于主延伸平面的第一质量线的第一线宽度在平行于主延伸平面的第一弯曲弹簧元件的另一第一线宽的20%至50%之间。

    Method for operating and/or for measuring a micromechanical device, and micromechanical device
    8.
    发明授权
    Method for operating and/or for measuring a micromechanical device, and micromechanical device 有权
    用于操作和/或测量微机械装置的方法和微机械装置

    公开(公告)号:US09291455B2

    公开(公告)日:2016-03-22

    申请号:US13918556

    申请日:2013-06-14

    摘要: A method for operating and/or measuring a micromechanical device. The device has a first and second seismic mass which are movable by oscillation relative to a substrate; a first drive device for deflecting the first seismic mass and a second drive device for deflecting the second seismic mass, parallel to a drive direction in a first orientation; a third drive device for deflecting the first seismic mass, and a fourth drive device for deflecting the second seismic mass in parallel to the drive direction and according to a second orientation opposite from the first orientation; a first detection device for detecting drive motion of the first seismic mass; and a second detection device for detecting drive motion of the second seismic mass. A first and a second detection signal are generated by the first and second detection devices, the first detection signal being evaluated separately from the second detection signal.

    摘要翻译: 一种用于操作和/或测量微机械装置的方法。 该装置具有第一和第二震动块,它们通过相对于基底振动而移动; 第一驱动装置,用于偏转第一抗震块;以及第二驱动装置,用于使第二抗震块平行于第一取向的驱动方向; 第三驱动装置,用于偏转所述第一抗震块;以及第四驱动装置,用于使所述第二抗震块平行于所述驱动方向并且根据与所述第一方向相反的第二方位偏转; 第一检测装置,用于检测第一抗震块的驱动运动; 以及用于检测第二地震块的驱动运动的第二检测装置。 第一和第二检测信号由第一和第二检测装置产生,第一检测信号与第二检测信号分开评估。

    Quadrature compensation for a rotation-rate sensor
    9.
    发明授权
    Quadrature compensation for a rotation-rate sensor 有权
    旋转速率传感器的正交补偿

    公开(公告)号:US08650954B2

    公开(公告)日:2014-02-18

    申请号:US12623621

    申请日:2009-11-23

    IPC分类号: G01C19/56

    CPC分类号: G01C19/5747

    摘要: A rotation-rate sensor includes a substrate having a surface, a movable element situated above the surface, which is deflectable based on a Coriolis force along a first axis that runs perpendicular to the surface, a driving device which is prepared to activate the movable element along a second axis that runs parallel to the surface, a compensation device, in order to generate an electrostatic force along the first axis, including electrodes corresponding to one another, developed on the substrate and on the movable element; a relative degree of covering of the electrodes in the direction of the first axis being a function of the deflection of the movable element along the second axis; and the electrode developed on the movable element runs around an insulating region of the movable element.

    摘要翻译: 旋转速率传感器包括具有表面的基板,位于表面上方的可移动元件,其基于沿着垂直于该表面延伸的第一轴线的科里奥利力可偏转;驱动装置,其准备激活可移动元件 沿着平行于所述表面延伸的第二轴线,补偿装置,以便沿着所述第一轴线产生静电力,所述静电力包括彼此对应的电极,所述电极在所述基板上和所述可移动元件上显影; 电极在第一轴方向上的相对的覆盖程度是可移动元件沿着第二轴的偏转的函数; 并且在可移动元件上显影的电极围绕可移动元件的绝缘区域延伸。

    MICROMECHANICAL STRUCTURES
    10.
    发明申请
    MICROMECHANICAL STRUCTURES 有权
    微观结构

    公开(公告)号:US20100192690A1

    公开(公告)日:2010-08-05

    申请号:US12683316

    申请日:2010-01-06

    IPC分类号: G01C19/56

    CPC分类号: G01C19/5747

    摘要: A micromechanical structure including a substrate having a main plane of extension, and including a first seismic mass, the first seismic mass including a grid structure made of intersecting first mass lines and the first seismic mass being flexibly secured with the aid of first bending-spring elements, and moreover, a first line width of the first mass lines parallel to the main plane of extension being between 20 and 50 percent of a further first line width of the first bending-spring elements parallel to the main plane of extension.

    摘要翻译: 一种微机械结构,包括具有主平面延伸的基板,并且包括第一抗震块,所述第一抗震块包括由相交的第一质量线形成的格栅结构,并且所述第一抗震块借助于第一弯曲弹簧而被灵活地固定 元件,此外,平行于主延伸平面的第一质量线的第一线宽度在平行于主延伸平面的第一弯曲弹簧元件的另一第一线宽的20%至50%之间。