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    LIQUID CRYSTAL DISPLAY DEVICE
    4.
    发明申请
    LIQUID CRYSTAL DISPLAY DEVICE 审中-公开
    液晶显示装置

    公开(公告)号：US20120182491A1

    公开(公告)日：2012-07-19

    申请号：US13498329

    申请日：2010-05-12

    申请人： Katsuya Ogawa ,  Masakatsu Tominaga ,  Masayuki Takashima ,  Tomoo Furukawa

    发明人： Katsuya Ogawa ,  Masakatsu Tominaga ,  Masayuki Takashima ,  Tomoo Furukawa

    IPC分类号： G02F1/136

    CPC分类号： G02F1/133707 ,  G02F1/1393

    摘要： The present invention provides a liquid crystal display device that uniformly stabilizes the alignment direction of liquid crystal molecules, prevents display roughness and what is called an afterimage phenomenon in which a previous display state remains unchanged in switching display, has excellent display performance, and responds to finer pixels. A liquid crystal display device of the present invention comprises: a pair of substrates; and a liquid crystal layer sealed between the pair of substrates, wherein the liquid crystal layer contains liquid crystal molecules that are aligned vertically to a substrate surface when no voltage is applied, at least one of the pair of substrates includes a pixel electrode, a gate bus line, and a source bus line, the pixel electrode is provided with a slit, the slit bends, and a part of the slit is along the gate bus line.

    摘要翻译： 本发明提供一种使液晶分子的取向方向均匀稳定的液晶显示装置，防止显示粗糙度和切换显示中先前显示状态保持不变的所谓残像现象，具有优异的显示性能，并且响应于 更精细的像素。 本发明的液晶显示装置包括：一对基板; 以及密封在所述一对基板之间的液晶层，其中，当没有施加电压时，所述液晶层包含垂直于基板表面取向的液晶分子，所述一对基板中的至少一个包括像素电极，栅极 总线和源极总线，像素电极设置有狭缝，狭缝弯曲，狭缝的一部分沿着栅极总线。

    Electronic parts cleaning solution
    5.
    发明申请
    Electronic parts cleaning solution 失效
    电子零件清洗液

    公开(公告)号：US20060008925A1

    公开(公告)日：2006-01-12

    申请号：US11174061

    申请日：2005-06-30

    申请人： Masayuki Takashima

    发明人： Masayuki Takashima

    IPC分类号： H01L21/00 ,  C11D11/00

    CPC分类号： C11D11/0047 ,  H01L21/02052 ,  H01L21/02068

    摘要： (Object) To provide a new electronic parts cleaning solution that inhibits the corrosion of silicon or metals other than the silicon, and that efficiently cleans off fine dust or organic matters adhered on the surface of electronic parts, and that does not have white turbidity easily. (Solution) An electronic parts clearing solution which is characterized in containing an anionic surfactant, hydroxide, metal corrosion inhibitor, water, and a nonionic surfactant represented by formula (I) and/or a nonionic surfactant represented by formula (II): HO-((EO)x—(PO)y)z—H   (I) R-[((EO)a—(PO)b)c—H]m   (II) (EO is an oxyethylene group, and PO is an oxypropylene group. x and y, and a and b are positive number, which x(x+y) and a(a+b) are 0.05 to 0.5 respectively, and z and c are positive integers. R is a residue group wherein hydrogen atoms are removed from hydroxyl group of alcohol or amine represented by a group having valency of 1˜4).

    摘要翻译： （目的）提供抑制硅或金属以外的硅腐蚀的新的电子部件清洗液，能够有效地清除附着在电子部件表面的细小尘埃或有机物，并且不容易发生白浊 。 （溶液）一种电子部件清除液，其特征在于含有式（I）所示的阴离子表面活性剂，氢氧化物，金属缓蚀剂，水和非离子表面活性剂和/或式（II）表示的非离子性表面活性剂： 在线公式描述=“在线公式”end =“lead”？> HO - （（EO）x - - （PO）y） z-H（I）<？in-line-formula description =“In-line Formulas”end =“tail”？> <？in-line-formula description =“In-line Formulas”end =“ 铅“→> R - [（（EO））a - （PO）b）） - C（H） - （II）<？in-line-formula description =“In-line Formulas”end =“tail”？>（EO是氧化乙烯基，PO是氧化亚丙基，x和y，a和b是正的 数，其中x（x + y）和a（a + b）分别为0.05〜0.5，z和c为正整数，R为残基，其中氢原子由醇或胺的羟基除去， 基团的化合价为1〜4）。

    Metal-corrosion inhibitor and cleaning liquid
    6.
    发明授权
    Metal-corrosion inhibitor and cleaning liquid 有权
    金属腐蚀抑制剂和清洗液

    公开(公告)号：US06200947B1

    公开(公告)日：2001-03-13

    申请号：US09484217

    申请日：2000-01-18

    申请人： Masayuki Takashima ,  Kenichi Sawara

    发明人： Masayuki Takashima ,  Kenichi Sawara

    IPC分类号： C11D904

    CPC分类号： C11D7/3209 ,  C11D7/06 ,  C11D7/08 ,  C11D7/34 ,  C11D7/5009 ,  C11D11/0047 ,  C23F11/161 ,  H01L21/02071 ,  H01L21/32134

    摘要： There are provided a metal-corrosion inhibitor and a cleaning liquid comprising said corrosion inhibitor, which are suitable for cleaning semiconductor devices, and less than that so far in use in the possibility of affecting human health and the ecological system through a water medium, the corrosion inhibitor comprising an aliphatic alcohol compound having at least one mercapto group in the molecule, wherein a number of carbon atoms constituting said alcohol compound is not less than 2, and a carbon atom bonded with a mercato group and another carbon atom bonded with a hydroxyl group are contiguously bonded with each other.

    摘要翻译： 提供了一种金属腐蚀抑制剂和包含适用于清洁半导体器件的所述腐蚀抑制剂的清洗液，并且比通过水介质影响人体健康和生态系统的可能性低得多的清洗液， 包含在分子中具有至少一个巯基的脂肪族醇化合物的腐蚀抑制剂，其中构成所述醇化合物的碳原子数为2以上，和与巯基键合的碳原子和与羟基键合的另一碳原子 组相互粘连。

    Washing liquid for semiconductor substrate and method of producing semiconductor device
    9.
    发明授权
    Washing liquid for semiconductor substrate and method of producing semiconductor device 有权
    用于半导体衬底的洗涤液及其制造方法

    公开(公告)号：US07176173B2

    公开(公告)日：2007-02-13

    申请号：US10659190

    申请日：2003-09-10

    申请人： Masayuki Takashima

    发明人： Masayuki Takashima

    IPC分类号： C11D1/62

    CPC分类号： H01L21/02074 ,  C11D3/221 ,  C11D7/06 ,  C11D11/0047 ,  C23G1/24

    摘要： An object of the present invention is to provide washing liquid for semiconductor substrate capable of removing grinding grains of silica, alumina or the like in a polishing agent and polishing trashes of copper, and capable of leaving little organic substance due to an additive used for preventing corrosion of copper on the surface of a copper wiring after washing, while corrosion of copper is suppressed, and a method of producing a semiconductor device using this washing liquid. The object is achieved by washing liquid for a semiconductor substrate having a copper wiring, comprising a basic compound and at least one selected from the group consisting of sugar alcohols and saccharides. Also the present invention provides a method of producing a semiconductor device comprising a step of forming a copper wiring by chemical mechanical polishing and washing it with washing liquid for a semiconductor substrate containing a basic compound and at least one selected from the group consisting of sugar alcohols and saccharides.

    摘要翻译： 本发明的目的是提供一种用于半导体衬底的洗涤液，其能够除去研磨剂中的二氧化硅，氧化铝等的研磨颗粒，并抛光铜的抛光物质，并且由于用于预防的添加剂而能够留下少量有机物质 洗涤后铜线表面的铜的腐蚀，同时铜的腐蚀被抑制，以及使用该洗涤液的半导体装置的制造方法。 该目的是通过洗涤具有铜布线的半导体衬底的液体来实现的，其包括碱性化合物和选自糖醇和糖类的至少一种。 本发明还提供一种半导体器件的制造方法，其包括通过化学机械抛光形成铜布线并用含有碱性化合物的半导体基板的洗涤液和从糖醇中选择的至少一种 和糖。

    Photoresist stripper composition
    10.
    发明申请
    Photoresist stripper composition 审中-公开
    光刻胶剥离剂组合物

    公开(公告)号：US20050287480A1

    公开(公告)日：2005-12-29

    申请号：US11096681

    申请日：2005-03-31

    申请人： Masayuki Takashima

    发明人： Masayuki Takashima

    IPC分类号： G03F7/42 ,  G03C5/00 ,  H01L21/027 ,  H01L21/304

    CPC分类号： G03F7/423

    摘要： (Problem) It is to provide a stripper having excellent ability to suppress corrosion or damage to the copper wiring or the low-k film, and having excellent photoresist residue removability after ashing. (Solution) The invention provides a photoresist stripper composition characterized in containing salts of at least two different inorganic acids, surfactants and a corrosion inhibitor for metal, and having a pH in the range of 3-10; and a process for preparation of semiconductor devices characterized in that the photoresist residues generated during the preparation of semiconductor devices which employs copper or a copper-dominant alloy as the material for wiring is stripped using said photoresist stripper.

    摘要翻译： （问题）提供具有优异的抑制铜布线或低k膜的腐蚀或损坏的能力的剥离器，并且在灰化后具有优异的光致抗蚀剂残留物去除性。 （溶液）本发明提供一种光致抗蚀剂剥离剂组合物，其特征在于含有至少两种不同的无机酸，表面活性剂和金属腐蚀抑制剂的盐，并且pH在3-10的范围内; 以及半导体器件的制备方法，其特征在于，使用所述光致抗蚀剂剥离剂剥离在制备半导体器件期间产生的光致抗蚀剂残留物，其使用铜或铜主导合金作为布线材料。