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公开(公告)号:US07762873B2
公开(公告)日:2010-07-27
申请号:US12119580
申请日:2008-05-13
申请人: Chung-Chih Feng , Chen-Hsiang Chao , I-Peng Yao
发明人: Chung-Chih Feng , Chen-Hsiang Chao , I-Peng Yao
IPC分类号: B24D11/00
CPC分类号: B24D11/003 , B24B37/24 , Y10T428/24612
摘要: A polishing pad includes a body having a polymer layer and a polishing layer. The polymer layer has opposite first and second faces. The polymer layer includes a plurality of first ultrafine fibers and a polymer bonding the first ultrafine fibers together. The polishing layer is formed on the first face of the polymer layer. The polishing layer includes a plurality of second ultrafine fibers and is free of the polymer. The first and second ultrafine fibers are identical to each other. The second ultrafine fibers have a first concentration of ultrafine fibers by volume higher than 80% a total volume of the polishing layer. The first ultrafine fibers of the polymer layer have a second concentration of ultrafine fibers by volume to a total volume of the polymer layer. The first concentration is higher than the second concentration.
摘要翻译: 抛光垫包括具有聚合物层和抛光层的主体。 聚合物层具有相对的第一和第二面。 聚合物层包括多个第一超细纤维和将第一超细纤维结合在一起的聚合物。 抛光层形成在聚合物层的第一面上。 抛光层包括多个第二超细纤维,并且不含聚合物。 第一和第二超细纤维彼此相同。 第二超细纤维的第一浓度的超细纤维的体积高于抛光层的总体积的80%。 聚合物层的第一超细纤维具有体积至聚合物层的总体积的超细纤维的第二浓度。 第一浓度高于第二浓度。
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2.
公开(公告)号:US20090252876A1
公开(公告)日:2009-10-08
申请号:US12482330
申请日:2009-06-10
申请人: Chung-Chih Feng , I-Peng Yao , Chen-Hsiang Chao
发明人: Chung-Chih Feng , I-Peng Yao , Chen-Hsiang Chao
IPC分类号: B05D5/02
CPC分类号: B24B37/30 , B24B41/068
摘要: The present invention relates to a sheet for mounting a polishing workpiece. The sheet comprises a substrate and a surface layer. The substrate has a surface. The surface layer is located on the surface of the substrate, with no hole structure existing in the interior thereof, and has a surface and a slightly rough layer. The slightly rough layer is located on the surface of the surface layer to carry and mount the polishing workpiece, with no hole structure existing in the interior thereof. Accordingly, when the polishing workpiece contacts the slightly rough layer, the air therebetween is easily vented out via the slightly rough layer, without the phenomenon of air wrapping, which increases the adsorption force between the polishing workpiece and the sheet.
摘要翻译: 本发明涉及一种用于安装抛光工件的片材。 片材包括基底和表面层。 基板具有表面。 表面层位于基板的表面上,其内部没有孔结构,并且具有表面和稍微粗糙的层。 稍微粗糙的层位于表层的表面上,以承载和安装抛光工件,其内部没有孔结构。 因此,当研磨工件接触稍微粗糙的层时,它们之间的空气容易通过稍微粗糙的层排出,而没有空气缠绕现象,这增加了研磨工件和片材之间的吸附力。
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公开(公告)号:US20110003536A1
公开(公告)日:2011-01-06
申请号:US12883509
申请日:2010-09-16
申请人: Chung-Chih Feng , I-Peng Yao , Chen-Hsiang Chao , Yung-Chang Hung
发明人: Chung-Chih Feng , I-Peng Yao , Chen-Hsiang Chao , Yung-Chang Hung
CPC分类号: B24B37/24 , B24D3/22 , B24D11/02 , B32B5/022 , B32B5/024 , B32B5/06 , B32B5/08 , B32B5/18 , B32B5/245 , B32B5/26 , B32B2260/021 , B32B2260/048 , B32B2262/0246 , B32B2262/0261 , B32B2262/0276 , B32B2262/12 , B32B2262/14 , B32B2266/0207 , B32B2307/50 , D04H3/105 , D04H3/12
摘要: The present invention mainly relates to a polishing pad and method of producing the same. The polishing pad comprises a base material having a surface for polishing a substrate, wherein the surface comprises a non-woven fabric and an elastomer. The elastomer is embedded into the fabric, and the non-woven fabric comprises a plurality of first long fibers randomly entangled with each other.
摘要翻译: 本发明主要涉及一种抛光垫及其制造方法。 抛光垫包括具有用于抛光基底的表面的基材,其中该表面包括无纺织物和弹性体。 弹性体嵌入到织物中,无纺布包括彼此无规缠结的多个第一长纤维。
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4.
公开(公告)号:US07789738B2
公开(公告)日:2010-09-07
申请号:US11478601
申请日:2006-07-03
申请人: Chung-Chih Feng , I-Peng Yao , Chen-Hsiang Chao
发明人: Chung-Chih Feng , I-Peng Yao , Chen-Hsiang Chao
IPC分类号: B24B41/06
CPC分类号: B24B37/30 , B24B41/068
摘要: The present invention relates to a sheet for mounting a polishing workpiece. The sheet comprises a substrate, a surface layer and a slightly rough layer. The substrate has a surface. The surface layer is located on the surface of the substrate, with no hole structure existing in the interior thereof, and has a surface. The slightly rough layer is located on the surface of the surface layer to carry and mount the polishing workpiece, with no hole structure existing in the interior thereof. Accordingly, when the polishing workpiece contacts the slightly rough layer, the air therebetween is easily vented out via the slightly rough layer, without the phenomenon of air wrapping, which increases the adsorption force between the polishing workpiece and the sheet.
摘要翻译: 本发明涉及一种用于安装抛光工件的片材。 片材包括基底,表面层和稍微粗糙的层。 基板具有表面。 表面层位于基板的表面上,其内部没有孔结构,并具有表面。 稍微粗糙的层位于表层的表面上,以承载和安装抛光工件,其内部没有孔结构。 因此,当研磨工件接触稍微粗糙的层时,它们之间的空气容易通过稍微粗糙的层排出,而没有空气缠绕现象,这增加了研磨工件和片材之间的吸附力。
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5.
公开(公告)号:US07629554B2
公开(公告)日:2009-12-08
申请号:US11723358
申请日:2007-03-19
申请人: Chung-Chih Feng , I-Peng Yao , Chen-Hsiang Chao
发明人: Chung-Chih Feng , I-Peng Yao , Chen-Hsiang Chao
CPC分类号: B24B37/30 , B24B37/34 , B24B41/068
摘要: The present invention relates to a sheet for mounting a polishing workpiece. The sheet comprises a substrate and a surface layer. The substrate has a surface. The surface layer is located on the surface of the substrate, with no hole structure existing in the interior thereof, and has a plurality of through holes. Accordingly, when the polishing workpiece contacts the surface layer, the air therebetween is vented to the substrate via the through holes and then is easily vented out, without the phenomenon of air wrapping, which increases the adsorption force between the polishing workpiece and the sheet, thereby improving the polishing effect of the polishing workpiece.
摘要翻译: 本发明涉及一种用于安装抛光工件的片材。 片材包括基底和表面层。 基板具有表面。 表面层位于基板的表面上,其内部没有孔结构,并且具有多个通孔。 因此,当抛光工件与表面层接触时,其间的空气通过通孔排出到基板上,并且容易排出,而不会产生空气包裹现象,这增加了研磨工件和片材之间的吸附力, 从而提高抛光工件的抛光效果。
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公开(公告)号:US07316605B1
公开(公告)日:2008-01-08
申请号:US11478606
申请日:2006-07-03
申请人: Chung-Chih Feng , I-Peng Yao , Chen-Hsiang Chao
发明人: Chung-Chih Feng , I-Peng Yao , Chen-Hsiang Chao
IPC分类号: B24D11/00
CPC分类号: B24B37/30 , B24B37/34 , B24B41/068
摘要: The present invention relates to a sheet for mounting a polishing workpiece. The sheet comprises a substrate and a surface layer. The substrate has a surface. The surface layer is located on the surface of the substrate, with no hole structure existing in the interior thereof, and has a plurality of through holes. Accordingly, when the polishing workpiece contacts the surface layer, the air therebetween is vented to the substrate via the through holes and then is easily vented out, without the phenomenon of air wrapping, which increases the adsorption force between the polishing workpiece and the sheet, thereby improving the polishing effect of the polishing workpiece.
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公开(公告)号:US20080171493A1
公开(公告)日:2008-07-17
申请号:US11652595
申请日:2007-01-12
申请人: Chung-Chih Feng , I-Peng Yao , Chen-Hsiang Chao , Yung-Chang Hung
发明人: Chung-Chih Feng , I-Peng Yao , Chen-Hsiang Chao , Yung-Chang Hung
CPC分类号: B24B37/20 , B24D3/22 , B24D11/02 , Y10T442/608
摘要: The present invention mainly relates to a polishing pad and method of producing the same. The polishing pad comprises a base material having a surface for polishing a substrate, wherein the surface comprises a non-woven fabric and an elastomer. The non-woven fabric is made of a long fiber and the elastomer is embedded into the fabric.
摘要翻译: 本发明主要涉及一种抛光垫及其制造方法。 抛光垫包括具有用于抛光基底的表面的基材,其中该表面包括无纺织物和弹性体。 无纺布由长纤维制成,弹性体嵌入织物中。
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公开(公告)号:US20080003935A1
公开(公告)日:2008-01-03
申请号:US11478605
申请日:2006-07-03
申请人: Chung-Chih Feng , I-Peng Yao , Chen-Hsiang Chao , Kun-Cheng Sung
发明人: Chung-Chih Feng , I-Peng Yao , Chen-Hsiang Chao , Kun-Cheng Sung
IPC分类号: B24D11/00
CPC分类号: B24B37/26
摘要: The present invention relates to a polishing pad having a surface texture. The surface texture is disposed on the polishing surface of the polishing pad. The surface texture comprises at least one first groove, at least one second groove, and a plurality of holes. The second groove extends from a central portion of the polishing pad to the edge of the polishing pad, and the first groove(s) is intersected with the second groove(s) to form a plurality of intersection points. The holes are disposed at the intersection points, and the depth of the holes is larger than that of the first groove. Thus, the second groove(s) enables impurities suspended in the polishing slurry to be quickly removed from the polishing pad, and the holes can store the polishing slurry to delay the polishing particles in the polishing slurry from departing from the polishing pad.
摘要翻译: 本发明涉及具有表面纹理的抛光垫。 表面纹理设置在抛光垫的抛光表面上。 表面纹理包括至少一个第一凹槽,至少一个第二凹槽和多个孔。 第二凹槽从抛光垫的中心部分延伸到抛光垫的边缘,并且第一凹槽与第二凹槽相交以形成多个交点。 孔设置在交点处,孔的深度大于第一槽的深度。 因此,第二凹槽使得悬浮在抛光浆料中的杂质能够快速地从抛光垫移除,并且孔可以存储抛光浆料以延迟抛光浆料中的抛光颗粒从抛光垫离开。
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公开(公告)号:US20080003927A1
公开(公告)日:2008-01-03
申请号:US11797714
申请日:2007-05-07
申请人: Chung-Chih Feng , I-Peng Yao , Chen-Hsiang Chao
发明人: Chung-Chih Feng , I-Peng Yao , Chen-Hsiang Chao
IPC分类号: B24B1/00
CPC分类号: B24B37/30 , B24B41/068
摘要: The present invention relates to a sheet for mounting a polishing workpiece. The sheet comprises a substrate, a surface layer and a slightly rough layer. The substrate has a surface. The surface layer is located on the surface of the substrate, with no hole structure existing in the interior thereof, and has a surface. The slightly rough layer is located on the surface of the surface layer to carry and mount the polishing workpiece, with no hole structure existing in the interior thereof. Accordingly, when the polishing workpiece contacts the slightly rough layer, the air therebetween is easily vented out via the slightly rough layer, without the phenomenon of air wrapping, which increases the adsorption force between the polishing workpiece and the sheet.
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10.
公开(公告)号:US20060270329A1
公开(公告)日:2006-11-30
申请号:US11369139
申请日:2006-03-06
申请人: Chung-Chih Feng , Chen-Hsiang Chao , I-Peng Yao
发明人: Chung-Chih Feng , Chen-Hsiang Chao , I-Peng Yao
IPC分类号: B24D11/00
CPC分类号: B24D11/003 , B24B37/24 , Y10T428/24612
摘要: A method is provided for making a polishing pad. In the method, ultrafine fiber-generating fibers are made into a non-woven fabric with two sides. At least one of the sides of the non-woven fabric is made a dense layer. The non-woven fabric is coated with a polymer. Because of the dense layer, the polymer cannot penetrate the non-woven fabric. The ultrafine fiber-generating fibers are converted to ultrafine fibers. Since the dense layer prevents the polymer from penetrating the ultrafine fiber-generating fibers, the ultrafine fibers remain a high concentration of fiber. The ultrafine fibers are transformed into nap. Therefore, the polishing pad is made with a polishing layer that includes the nap. The concentration of fiber of the polishing layer is higher than 80%.
摘要翻译: 提供了制造抛光垫的方法。 在该方法中,将超细纤维发生纤维制成具有两侧的无纺织物。 无纺布的至少一侧被制成致密层。 无纺织物涂覆聚合物。 由于致密层,聚合物不能穿透无纺织物。 超细纤维生成纤维被转换为超细纤维。 由于致密层防止聚合物渗透超细纤维发生纤维,所以超细纤维保持高浓度的纤维。 超细纤维被转化为绒毛。 因此,抛光垫由包括绒毛的抛光层制成。 抛光层的纤维浓度高于80%。
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