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    Polishing pad having groove structure for avoiding stripping of a polishing surface of the polishing pad
    1.
    发明授权
    Polishing pad having groove structure for avoiding stripping of a polishing surface of the polishing pad 有权
    抛光垫具有用于避免剥离抛光垫的抛光表面的凹槽结构

    公开(公告)号：US07662028B2

    公开(公告)日：2010-02-16

    申请号：US12139525

    申请日：2008-06-16

    申请人： Chung-Chih Feng ,  Wei-Te Liu ,  Yung-Chang Hung ,  Chun-Ta Wang ,  I-Peng Yao

    发明人： Chung-Chih Feng ,  Wei-Te Liu ,  Yung-Chang Hung ,  Chun-Ta Wang ,  I-Peng Yao

    IPC分类号： B24D11/00

    CPC分类号： B24B37/26

    摘要： A groove structure for avoiding stripping of a polishing surface of a polishing pad, the polishing pad including a base material and a grinding layer. The base material has a surface. The grinding layer is disposed on the surface, and part of the surface around the edge of the base material is exposed. The grinding layer has a plurality of first grooves and second grooves, and the first grooves cross the second grooves to define a plurality of grinding areas. The exposed part of the surface around the edge of the base material is located between the first grooves, the second grooves and the edge of the polishing pad. The polishing pad contains more grinding liquid, to clean the small grinded pieces. The grinding layer does not have an acute structure and is not easily peeled to form the small grinded pieces. Therefore, grinding quality and grinding effect are improved.

    摘要翻译： 一种用于避免剥离抛光垫的抛光表面的凹槽结构，所述抛光垫包括基底材料和研磨层。 基材具有表面。 磨削层设置在表面上，并且暴露基体材料边缘周围的一部分表面。 研磨层具有多个第一凹槽和第二凹槽，并且第一凹槽与第二凹槽交叉以限定多个研磨区域。 围绕基材边缘的表面的暴露部分位于第一凹槽，第二凹槽和抛光垫的边缘之间。 抛光垫包含更多的研磨液，以清洁小磨碎的碎片。 研磨层不具有尖锐的结构，并且不容易剥离以形成小的研磨件。 因此，磨削质量和磨削效果得到提高。

    POLISHING PAD HAVING INSULATION LAYER AND METHOD FOR MAKING THE SAME
    2.
    发明申请
    POLISHING PAD HAVING INSULATION LAYER AND METHOD FOR MAKING THE SAME 审中-公开
    具有绝缘层的抛光垫及其制造方法

    公开(公告)号：US20100146863A1

    公开(公告)日：2010-06-17

    申请号：US12536164

    申请日：2009-08-05

    申请人： Chung-Chih Feng ,  I-Peng Yao ,  Yung-Chang Hung ,  Chun-Ta Wang ,  Wei-Te Liu

    发明人： Chung-Chih Feng ,  I-Peng Yao ,  Yung-Chang Hung ,  Chun-Ta Wang ,  Wei-Te Liu

    IPC分类号： B24D11/00 ,  B24D3/00

    CPC分类号： B24B37/22

    摘要： The present invention relates to a polishing pad having an insulation layer and a method for making the same. The polishing pad includes a bottom layer, an insulation layer, and an abrasive layer. The bottom layer includes a fabric layer wrapped in a high polymer. The insulation layer is disposed on the bottom layer. The abrasive layer is disposed on the insulation layer. The abrasive layer is a high polymeric elastomer and has a plurality of columnar-like cells. The insulation layer can prevent the slurry from infiltrating into the bottom layer during the polishing processs to improve the polishing effect and quality.

    摘要翻译： 本发明涉及一种具有绝缘层的抛光垫及其制造方法。 抛光垫包括底层，绝缘层和磨料层。 底层包括缠绕在高聚合物中的织物层。 绝缘层设置在底层上。 研磨层设置在绝缘层上。 研磨层是高聚物弹性体，并且具有多个柱状细胞。 绝缘层可以防止浆料在抛光过程中渗入底层，以提高抛光效果和质量。

    POLISHING PAD HAVING GROOVE STRUCTURE FOR AVOIDING THE POLISHING SURFACE STRIPPING
    3.
    发明申请
    POLISHING PAD HAVING GROOVE STRUCTURE FOR AVOIDING THE POLISHING SURFACE STRIPPING 有权
    用于避免抛光表面剥落的抛光结构的抛光垫

    公开(公告)号：US20090258587A1

    公开(公告)日：2009-10-15

    申请号：US12139525

    申请日：2008-06-16

    申请人： Chung-Chih Feng ,  Wei-Te Liu ,  Yung-Chang Hung ,  Chun-Ta Wang ,  I-Peng Yao

    发明人： Chung-Chih Feng ,  Wei-Te Liu ,  Yung-Chang Hung ,  Chun-Ta Wang ,  I-Peng Yao

    IPC分类号： B24D11/00

    CPC分类号： B24B37/26

    摘要： The present invention relates to a polishing pad having a groove structure for avoiding the polishing surface stripping. The polishing pad of present invention includes a base material and a grinding layer. The base material has a surface. The grinding layer is disposed on the surface, and part of the surface around the edge of the base material is exposed. The grinding layer has a plurality of first grooves and second grooves, and the first grooves cross the second grooves to define a plurality of grinding areas. The exposed part of the surface around the edge of the base material is located between the first grooves, the second grooves and the edge of the polishing pad. Whereby, the polishing pad of present invention is capable to contain more grinding liquid, and is contributive to clean the small grinded pieces. Furthermore, the grinding layer does not have acute structure and is not easy to peel to form the small grinded pieces. Therefore, the grinding quality and grinding effect can be improved.

    摘要翻译： 本发明涉及一种具有用于避免抛光表面剥离的凹槽结构的抛光垫。 本发明的抛光垫包括基材和研磨层。 基材具有表面。 磨削层设置在表面上，并且暴露基体材料边缘周围的一部分表面。 研磨层具有多个第一凹槽和第二凹槽，并且第一凹槽与第二凹槽交叉以限定多个研磨区域。 围绕基材边缘的表面的暴露部分位于第一凹槽，第二凹槽和抛光垫的边缘之间。 因此，本发明的抛光垫能够容纳更多的研磨液，并且有助于清洁小的研磨件。 此外，研磨层不具有尖锐的结构，并且不容易剥离以形成小的研磨件。 因此，可以提高研磨质量和研磨效果。

    METHOD FOR PATTERNING A COVERING MATERIAL BY USING HIGH-POWER EXCITING BEAM
    4.
    发明申请
    METHOD FOR PATTERNING A COVERING MATERIAL BY USING HIGH-POWER EXCITING BEAM 审中-公开
    通过使用高功率光束来绘制覆盖材料的方法

    公开(公告)号：US20090258316A1

    公开(公告)日：2009-10-15

    申请号：US12189833

    申请日：2008-08-12

    申请人： Chung-Chih FENG ,  Chun-Ta WANG ,  Yung-Chang HUNG ,  Wei-Te LIU ,  I-Peng Yao

    发明人： Chung-Chih FENG ,  Chun-Ta WANG ,  Yung-Chang HUNG ,  Wei-Te LIU ,  I-Peng Yao

    IPC分类号： G03F1/00

    CPC分类号： B41M5/245 ,  B29C2791/009 ,  B29K2023/12 ,  B29K2055/02 ,  B29K2067/00 ,  B29K2069/00 ,  B29K2075/00 ,  B29K2995/0021 ,  B29L2009/00 ,  B41M5/24 ,  B41M5/34

    摘要： The present invention relates to a method for patterning a covering material by using a high-power exciting beam. The method includes the steps of (a) providing a base material having a plurality of thin layers, the neighboring thin layers having different colors; and (b) utilizing a high-power exciting beam to form at least one pattern on the base material, in which the pattern has at least one concave portion, so as to expose the thin layers with different colors. As a result, the covering material has a layered visual effect and many colors. Furthermore, the patterning method of the present invention is simple, and can form the pattern on the base material easily Therefore, the manufacturing time of the covering material with the pattern is reduced.

    摘要翻译： 本发明涉及通过使用大功率激光束来图案化覆盖材料的方法。 该方法包括以下步骤：（a）提供具有多个薄层的基材，相邻的薄层具有不同的颜色; 以及（b）利用大功率激光束在所述基材上形成至少一种图案，其中所述图案具有至少一个凹部，以便以不同的颜色曝光所述薄层。 结果，覆盖材料具有分层的视觉效果和许多颜色。 此外，本发明的图案形成方法简单，可以容易地在基材上形成图案。因此，具有图案的覆盖材料的制造时间减少。

    POLISHING PAD AND METHOD FOR MAKING THE SAME
    6.
    发明申请
    POLISHING PAD AND METHOD FOR MAKING THE SAME 审中-公开
    抛光垫及其制造方法

    公开(公告)号：US20090258578A1

    公开(公告)日：2009-10-15

    申请号：US12208520

    申请日：2008-09-11

    申请人： Chung-Chih Feng ,  Chun-Ta Wang ,  Yung-Chang Hung ,  I-Peng Yao

    发明人： Chung-Chih Feng ,  Chun-Ta Wang ,  Yung-Chang Hung ,  I-Peng Yao

    IPC分类号： B24D11/00

    CPC分类号： B24B37/24 ,  B24B37/22 ,  B24D18/00

    摘要： The present invention relates to a polishing pad and method for making the same. In the invention, a liquid-state polymer material is directly formed on the surface of a base material, and then the liquid-state polymer material is solidified to form a flat grinding layer. Whereby, the polishing pad has high unity and flatness. The grinding layer has attenuated structures and a plurality of holes, thus increasing the storage ability of polishing particles distributed in a polishing liquid. In addition, the polishing pad has high compression ratio, so the polishing pad can compactly contact a polishing workpiece, and will not scratch the surface of the polishing workpiece scratched. Therefore, the polishing effect and quality will be improved.

    摘要翻译： 抛光垫及其制造方法技术领域本发明涉及抛光垫及其制造方法。 在本发明中，在基材的表面上直接形成液态聚合物材料，然后使液态聚合物材料固化，形成平坦的研磨层。 因此，抛光垫具有高的一体性和平坦度。 研磨层具有衰减结构和多个孔，从而增加了分布在抛光液中的抛光颗粒的储存能力。 此外，抛光垫具有高压缩比，因此抛光垫可以紧密接触抛光工件，并且不会刮擦抛光工件的表面划伤。 因此，抛光效果和质量将得到提高。

    Sheet for mounting a workpiece
    8.
    发明授权
    Sheet for mounting a workpiece 有权
    用于安装工件的板

    公开(公告)号：US09193028B2

    公开(公告)日：2015-11-24

    申请号：US13287328

    申请日：2011-11-02

    申请人： Chung-Chih Feng ,  I-Peng Yao ,  Lyang-Gung Wang ,  Wen-Chieh Wu ,  Wei-Te Liu

    发明人： Chung-Chih Feng ,  I-Peng Yao ,  Lyang-Gung Wang ,  Wen-Chieh Wu ,  Wei-Te Liu

    IPC分类号： B24B37/30 ,  B24B41/06

    CPC分类号： B24B37/30 ,  B24B41/061

    摘要： The present invention relates to a sheet for mounting a workpiece, which includes a sheet body. The sheet body includes a top surface, a plurality of foamed pores, and a plurality of surface holes or at least one surface groove. The top surface is used for mounting a workpiece. The foamed pores are disposed in the interior of the sheet body. The surface holes or the surface groove have opening on the top surface but does not communicate with the foamed pores. The surface holes or the surface groove is formed by machining, and arranged in at least one pattern. Whereby, the time for taking off the workpiece from the sheet is reduced.

    摘要翻译： 本发明涉及一种用于安装工件的片材，其包括片体。 片体包括顶表面，多个发泡孔，以及多个表面孔或至少一个表面凹槽。 顶面用于安装工件。 发泡孔设置在片体的内部。 表面孔或表面凹槽在顶表面上具有开口，但不与发泡孔连通。 表面孔或表面凹槽通过机械加工形成，并以至少一种图案布置。 从而减少了从片材中取出工件的时间。

    Method for manufacturing polishing pad and polishing pad
    9.
    发明授权
    Method for manufacturing polishing pad and polishing pad 有权

    公开(公告)号：US09862071B2

    公开(公告)日：2018-01-09

    申请号：US12887363

    申请日：2010-09-21

    申请人： Chung-Chih Feng ,  I-Peng Yao ,  Yung-Chang Hung ,  Lyang-Gung Wang

    发明人： Chung-Chih Feng ,  I-Peng Yao ,  Yung-Chang Hung ,  Lyang-Gung Wang

    IPC分类号： C09K3/14 ,  B24B37/24

    CPC分类号： B24B37/24

    摘要： The present invention relates to a method for manufacturing a polishing pad. The method of the invention includes the steps of forming a polishing layer from a polyurethane solution has a solid content more than about 90 wt % and drying the polyurethane solution at a temperature from about 130° C. to about 170° C. The invention also provides a polishing pad manufactured by the method mentioned above. The defect of scraping the surface of the substrate to be polished due to polishing particles remaining is avoided when applying the polishing pad according to the invention, and the flatness of the substrate to be polished is raised and the defective rate is eliminated also.

    Polishing pad, the use thereof and the method for manufacturing the same
    10.
    发明授权
    Polishing pad, the use thereof and the method for manufacturing the same 有权
    抛光垫及其制造方法

    公开(公告)号：US08414669B2

    公开(公告)日：2013-04-09

    申请号：US12883446

    申请日：2010-09-16

    申请人： Chung-Chih Feng ,  I-Peng Yao ,  Lyang-Gung Wang ,  Yung-Chang Hung

    发明人： Chung-Chih Feng ,  I-Peng Yao ,  Lyang-Gung Wang ,  Yung-Chang Hung

    IPC分类号： B24D11/00

    CPC分类号： B24D18/00 ,  B24B37/22 ,  B24B37/24 ,  B24D3/26

    摘要： The present invention mainly relates to a polishing pad comprising a base material comprising fibers; a first membrane with low permeability; a two-component paste formed on the upper surface of the first membrane with low permeability for adhering the base material to the first membrane with low permeability; and a polyurethane paste formed on the lower surface of the first membrane with low permeability. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad as described above are also provided. The polishing pad as mentioned above prevents the polishing pad from detaching from the polishing platen or head. The polishing pad is easy to be replaced without leaving residues on the polishing platen or head.

    摘要翻译： 本发明主要涉及一种包括由纤维构成的基材的抛光垫; 具有低渗透性的第一膜; 在所述第一膜的上表面上形成低渗透性的双组分糊料，用于将所述基材粘附到所述第一膜，所述第一膜具有低渗透性; 以及形成在第一膜的下表面上的低渗透性的聚氨酯浆料。 还提供了一种抛光包括使用抛光垫的基板的方法和如上所述的用于制造抛光垫的方法。 如上所述的抛光垫防止抛光垫从抛光台板或头部分离。 抛光垫易于更换，而不会在研磨台板或头部上留下残留物。