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    MEMS devices requiring no mechanical support
    7.
    发明授权
    MEMS devices requiring no mechanical support 失效
    不需要机械支撑的MEMS器件

    公开(公告)号：US07715079B2

    公开(公告)日：2010-05-11

    申请号：US11952873

    申请日：2007-12-07

    申请人： Lior Kogut ,  Ming-Hau Tung ,  Yeh-Jiun Tung

    发明人： Lior Kogut ,  Ming-Hau Tung ,  Yeh-Jiun Tung

    IPC分类号： G02B26/08

    CPC分类号： G02B26/001 ,  B81B3/0021 ,  B81B2201/042

    摘要： MEMS devices such as interferometric modulators are described having movable layers that are mechanically isolated. The movable layers are electrically attractable such that they can be selectively moved between a top and bottom electrode through application of a voltage. In interferometric modulators, the movable layers are reflective such that an optically resonant cavity is formed between the layer and a partially reflective layer, thereby providing a display pixel that can be turned on or off depending on the distance between the reflective layers in the resonant cavity.

    摘要翻译： 描述了诸如干涉式调制器的MEMS器件具有机械隔离的可移动层。 可移动层是电吸引的，使得它们可以通过施加电压而选择性地在顶部和底部电极之间移动。 在干涉式调制器中，可移动层是反射性的，使得在该层和部分反射层之间形成光学谐振腔，从而提供可根据谐振腔中的反射层之间的距离而导通或截止的显示像素 。

    MEMS DEVICES REQUIRING NO MECHANICAL SUPPORT
    8.
    发明申请
    MEMS DEVICES REQUIRING NO MECHANICAL SUPPORT 失效
    不需要机械支持的MEMS器件

    公开(公告)号：US20090147343A1

    公开(公告)日：2009-06-11

    申请号：US11952873

    申请日：2007-12-07

    申请人： Lior Kogut ,  Ming-Hau Tung ,  Yeh-Jiun Tung

    发明人： Lior Kogut ,  Ming-Hau Tung ,  Yeh-Jiun Tung

    IPC分类号： G02F1/03 ,  B29D11/00

    CPC分类号： G02B26/001 ,  B81B3/0021 ,  B81B2201/042

    摘要： MEMS devices such as interferometric modulators are described having movable layers that are mechanically isolated. The movable layers are electrically attractable such that they can be selectively moved between a top and bottom electrode through application of a voltage. In interferometric modulators, the movable layers are reflective such that an optically resonant cavity is formed between the layer and a partially reflective layer, thereby providing a display pixel that can be turned on or off depending on the distance between the reflective layers in the resonant cavity.

    摘要翻译： 描述了诸如干涉式调制器的MEMS器件具有机械隔离的可移动层。 可移动层是电吸引的，使得它们可以通过施加电压而选择性地在顶部和底部电极之间移动。 在干涉式调制器中，可移动层是反射性的，使得在该层和部分反射层之间形成光学谐振腔，由此提供可根据谐振腔中的反射层之间的距离而导通或截止的显示像素 。

    Method of manufacturing MEMS devices providing air gap control
    9.
    发明授权
    Method of manufacturing MEMS devices providing air gap control 有权
    制造提供气隙控制的MEMS器件的方法

    公开(公告)号：US08102590B2

    公开(公告)日：2012-01-24

    申请号：US12436059

    申请日：2009-05-05

    申请人： Ming-Hau Tung ,  Lior Kogut

    发明人： Ming-Hau Tung ,  Lior Kogut

    IPC分类号： G02B26/00

    CPC分类号： B81B3/0072 ,  B81B2201/042 ,  B81C1/00047 ,  B81C2201/0167

    摘要： Methods and apparatus are provided for controlling a depth of a cavity between two layers of a light modulating device. A method of making a light modulating device includes providing a substrate, forming a sacrificial layer over at least a portion of the substrate, forming a reflective layer over at least a portion of the sacrificial layer, and forming one or more flexure controllers over the substrate, the flexure controllers configured so as to operably support the reflective layer and to form cavities, upon removal of the sacrificial layer, of a depth measurably different than the thickness of the sacrificial layer, wherein the depth is measured perpendicular to the substrate.

    摘要翻译： 提供了用于控制光调制装置的两层之间的腔的深度的方法和装置。 一种制造光调制装置的方法包括提供衬底，在衬底的至少一部分上形成牺牲层，在牺牲层的至少一部分上形成反射层，以及在衬底上形成一个或多个弯曲控制器 所述挠曲控制器被配置为可操作地支撑所述反射层并且在去除所述牺牲层时形成可能与所述牺牲层的厚度相差的深度的空腔，其中所述深度垂直于所述基板测量。

    MEMS DEVICES WITH MULTI-COMPONENT SACRIFICIAL LAYERS
    10.
    发明申请
    MEMS DEVICES WITH MULTI-COMPONENT SACRIFICIAL LAYERS 失效
    具有多组分功能层的MEMS器件

    公开(公告)号：US20110205615A1

    公开(公告)日：2011-08-25

    申请号：US13098292

    申请日：2011-04-29

    申请人： Ming-Hau Tung ,  Lior Kogut

    发明人： Ming-Hau Tung ,  Lior Kogut

    IPC分类号： G02B26/00 ,  B05D5/06 ,  B05D3/10 ,  B05D1/36 ,  C23C16/44 ,  B05D5/00 ,  C23C14/34

    CPC分类号： B81C1/00801 ,  B81B3/001 ,  B81B3/0072 ,  B81B2201/042 ,  B81C2201/0109 ,  B81C2201/017 ,  B81C2201/112 ,  B81C2201/115 ,  G02B26/001 ,  Y10T428/30 ,  Y10T428/31678 ,  Y10T428/31935

    摘要： Methods of forming a protective coating on one or more surfaces of a microelectromechanical device are disclosed comprising the steps of forming a composite layer of a sacrificial material and a protective material, and selectively etching the sacrificial material to form a protective coating. The protective coatings of the invention preferably improve one or more aspects of the performance of the microelectromechanical devices in which they are incorporated. Also disclosed are microelectromechanical devices formed by methods of the invention, and visual display devices incorporating such devices.

    摘要翻译： 公开了在微机电装置的一个或多个表面上形成保护涂层的方法，其包括以下步骤：形成牺牲材料和保护材料的复合层，并选择性地蚀刻牺牲材料以形成保护涂层。 本发明的保护性涂层优选地改进了其中并入其中的微机电装置的性能的一个或多个方面。 还公开了通过本发明的方法形成的微机电装置以及包括这种装置的视觉显示装置。