公开(公告)号：US09785050B2

公开(公告)日：2017-10-10

申请号：US14794508

申请日：2015-07-08

Applicant: Cymer, LLC

Inventor： Kevin M. O'Brien ,  Rahul Ahlawat

IPC: H01S3/10 ,  G03F7/20 ,  G01B11/02 ,  G02B26/00

CPC classification number: G03F7/2006 ,  G01B11/02 ,  G01J3/12 ,  G02B26/007 ,  G03F7/70 ,  G03F7/70141 ,  G03F7/70575 ,  H01S3/10 ,  H01S3/104 ,  H01S3/11

Abstract: A system includes a first actuation module coupled to a first actuatable apparatus of an optical source, the first actuatable apparatus being altered by the first actuation module to adjust the spectral feature of the pulsed light beam; a second actuation module coupled to a second actuatable apparatus of the optical source, the second actuatable apparatus being altered by the second actuation module to adjust the spectral feature of the pulsed light beam; and a control system configured to receive an indication regarding the operating state of the first actuatable apparatus; and send a signal to the second actuation module to adjust the spectral feature of the pulsed light beam to either: prevent the first actuatable apparatus from saturating based on the operating state of the first actuatable apparatus, or desaturate the first actuatable apparatus if the first actuatable apparatus is saturated.

公开(公告)号：US20170160638A1

公开(公告)日：2017-06-08

申请号：US15435491

申请日：2017-02-17

Applicant: Cymer, LLC

Inventor： Kevin M. O'Brien ,  Rahul Ahlawat

IPC: G03F7/20 ,  G01J3/12 ,  H01S3/104 ,  G02B26/00 ,  H01S3/11

CPC classification number: G03F7/2006 ,  G01B11/02 ,  G01J3/12 ,  G02B26/007 ,  G03F7/70 ,  G03F7/70141 ,  G03F7/70575 ,  H01S3/10 ,  H01S3/104 ,  H01S3/11

Abstract: A system includes a first actuatable apparatus of an optical source, the first actuatable apparatus being altered within a range of values about a target value to thereby alter a spectral feature of the light beam; a second actuatable apparatus of the optical source, the second actuatable apparatus being altered to thereby alter the spectral feature of the light beam; a metrology system including an observation system configured to output an indication of a deviation between the actual value at which the first actuatable apparatus is operating and the target value; and a control system configured to determine whether the deviation is greater than an acceptable deviation, and, if it is greater than the acceptable deviation, then send a signal to a second actuation module controlling the second actuatable apparatus to adjust the actual value at which the first actuatable apparatus is operating to be closer to the target value.

公开(公告)号：US20180335701A1

公开(公告)日：2018-11-22

申请号：US15602028

申请日：2017-05-22

Applicant: Cymer, LLC

Inventor： Andrei Dorobantu ,  Joshua Jon Thornes ,  Kevin M. O'Brien ,  Matthew Ryan Graham

IPC: G03F7/20

CPC classification number: G03F7/7055

Abstract: An optical lithography system is monitored. Information is received from the optical lithography system; a rule is accessed, the rule being associated with one or more of an event in the optical lithography system and an amount of time; a module stored in a library of modules is identified based on the accessed rule; whether a particular condition exists in the optical lithography system is determined using the identified module and the information received from the optical lithography system; and if the particular condition exists, a command signal is generated based on one or more characteristics of the particular condition and provided to an optical source of the optical lithography system. The command signal is based on the determined particular condition, and the command signal is sufficient to change one or more operating parameters of the optical source.

公开(公告)号：US20160380402A1

公开(公告)日：2016-12-29

申请号：US14794508

申请日：2015-07-08

Applicant: Cymer, LLC

Inventor： Kevin M. O'Brien ,  Rahul Ahlawat

IPC: H01S3/00 ,  G03F7/20 ,  H01S3/11 ,  G02B26/00 ,  G01B11/02 ,  H01S3/22

CPC classification number: G03F7/2006 ,  G01B11/02 ,  G01J3/12 ,  G02B26/007 ,  G03F7/70 ,  G03F7/70141 ,  G03F7/70575 ,  H01S3/10 ,  H01S3/104 ,  H01S3/11

Abstract: A system includes a first actuation module coupled to a first actuatable apparatus of an optical source, the first actuatable apparatus being altered by the first actuation module to adjust the spectral feature of the pulsed light beam; a second actuation module coupled to a second actuatable apparatus of the optical source, the second actuatable apparatus being altered by the second actuation module to adjust the spectral feature of the pulsed light beam; and a control system configured to receive an indication regarding the operating state of the first actuatable apparatus; and send a signal to the second actuation module to adjust the spectral feature of the pulsed light beam to either: prevent the first actuatable apparatus from saturating based on the operating state of the first actuatable apparatus, or desaturate the first actuatable apparatus if the first actuatable apparatus is saturated.

Abstract translation: 系统包括耦合到光源的第一致动装置的第一致动模块，第一致动装置被第一致动模块改变以调节脉冲光束的光谱特征; 耦合到所述光源的第二致动装置的第二致动模块，所述第二致动装置被所述第二致动模块改变以调整所述脉冲光束的光谱特征; 以及控制系统，被配置为接收关于所述第一可致动装置的操作状态的指示; 并且向第二致动模块发送信号以将脉冲光束的光谱特征调整为：基于第一致动装置的操作状态来防止第一致动装置饱和，或者如果第一可致动装置 装置饱和。

公开(公告)号：US10234769B2

公开(公告)日：2019-03-19

申请号：US15602028

申请日：2017-05-22

Applicant: Cymer, LLC

Inventor： Andrei Dorobantu ,  Joshua Jon Thornes ,  Kevin M. O'Brien ,  Matthew Ryan Graham

IPC: G03B27/42 ,  G03F7/20

Abstract: An optical lithography system is monitored. Information is received from the optical lithography system; a rule is accessed, the rule being associated with one or more of an event in the optical lithography system and an amount of time; a module stored in a library of modules is identified based on the accessed rule; whether a particular condition exists in the optical lithography system is determined using the identified module and the information received from the optical lithography system; and if the particular condition exists, a command signal is generated based on one or more characteristics of the particular condition and provided to an optical source of the optical lithography system. The command signal is based on the determined particular condition, and the command signal is sufficient to change one or more operating parameters of the optical source.

公开(公告)号：US09772556B2

公开(公告)日：2017-09-26

申请号：US15435491

申请日：2017-02-17

Applicant: Cymer, LLC

Inventor： Kevin M. O'Brien ,  Rahul Ahlawat

IPC: G03F7/20 ,  G01J3/12 ,  H01S3/10 ,  H01S3/11 ,  G02B26/00 ,  H01S3/104

CPC classification number: G03F7/2006 ,  G01B11/02 ,  G01J3/12 ,  G02B26/007 ,  G03F7/70 ,  G03F7/70141 ,  G03F7/70575 ,  H01S3/10 ,  H01S3/104 ,  H01S3/11

Abstract: A system includes a first actuatable apparatus of an optical source, the first actuatable apparatus being altered within a range of values about a target value to thereby alter a spectral feature of the light beam; a second actuatable apparatus of the optical source, the second actuatable apparatus being altered to thereby alter the spectral feature of the light beam; a metrology system including an observation system configured to output an indication of a deviation between the actual value at which the first actuatable apparatus is operating and the target value; and a control system configured to determine whether the deviation is greater than an acceptable deviation, and, if it is greater than the acceptable deviation, then send a signal to a second actuation module controlling the second actuatable apparatus to adjust the actual value at which the first actuatable apparatus is operating to be closer to the target value.