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公开(公告)号：US11988966B2
公开(公告)日：2024-05-21
申请号：US15734359
申请日：2019-05-16
申请人： Cymer, LLC
发明人： Andrei Dorobantu , Shreyas Bhaban
CPC分类号： G03F7/70025 , G03F7/70483 , H01S3/036 , H01S3/097 , H01S3/10069 , H01S3/134 , H01S3/225 , H01S3/2308
摘要： A system includes an optical source configured to emit a pulsed light beam, the optical source comprising one or more chambers, each of the one or more chambers configured to hold a gaseous gain medium, the gaseous gain medium being associated with an assumed gas life; at least one detection module configured to: receive and analyze data related to the pulsed light beam, and produce a beam quality metric based on the data related to the pulsed light beam; and a monitoring module configured to: analyze the beam quality metric, determine a health status of the gaseous gain medium based on the analysis of the beam quality metric, and produce a status signal based on the determined health status, the status signal indicating whether to extend use of the gaseous gain medium beyond the assumed gas life or to end use of the gaseous gain medium.
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公开(公告)号：US20210194202A1
公开(公告)日：2021-06-24
申请号：US17267949
申请日：2019-08-15
申请人： Cymer, LLC
发明人： Andrei Dorobantu , Jacob Arthur Cohen , Kumar Raja Guvindan Raju , Walter Dale Gillespie , Eric Shaun Gross , Richard Carl Ujazdowski
IPC分类号： H01S3/0971 , H01S3/034 , H01S3/101
摘要： A light source apparatus includes a gas discharge stage including a three-dimensional body defining a cavity that is configured to interact with an energy source, the body including at least two ports that are transmissive to a light beam having a wavelength in the ultraviolet range; a sensor system comprising a plurality of sensors, each sensor is configured to measure a physical aspect of a respective distinct region of the body of the gas discharge stage relative to that sensor; and a control apparatus in communication with the sensor system. The control apparatus is configured to analyze the measured physical aspects from the sensors to thereby determine a position of the body of the gas discharge stage in an XYZ coordinate system defined by an X axis, wherein the X axis is defined by the geometry of the gas discharge stage.
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公开(公告)号：US10234769B2
公开(公告)日：2019-03-19
申请号：US15602028
申请日：2017-05-22
申请人： Cymer, LLC
摘要： An optical lithography system is monitored. Information is received from the optical lithography system; a rule is accessed, the rule being associated with one or more of an event in the optical lithography system and an amount of time; a module stored in a library of modules is identified based on the accessed rule; whether a particular condition exists in the optical lithography system is determined using the identified module and the information received from the optical lithography system; and if the particular condition exists, a command signal is generated based on one or more characteristics of the particular condition and provided to an optical source of the optical lithography system. The command signal is based on the determined particular condition, and the command signal is sufficient to change one or more operating parameters of the optical source.
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公开(公告)号：US20210226407A1
公开(公告)日：2021-07-22
申请号：US15734359
申请日：2019-05-16
申请人： Cymer, LLC
发明人： Andrei Dorobantu , Shreyas Bhaban
摘要： A system includes an optical source configured to emit a pulsed light beam, the optical source comprising one or more chambers, each of the one or more chambers configured to hold a gaseous gain medium, the gaseous gain medium being associated with an assumed gas life; at least one detection module configured to: receive and analyze data related to the pulsed light beam, and produce a beam quality metric based on the data related to the pulsed light beam; and a monitoring module configured to: analyze the beam quality metric, determine a health status of the gaseous gain medium based on the analysis of the beam quality metric, and produce a status signal based on the determined health status, the status signal indicating whether to extend use of the gaseous gain medium beyond the assumed gas life or to end use of the gaseous gain medium.
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公开(公告)号：US20180335701A1
公开(公告)日：2018-11-22
申请号：US15602028
申请日：2017-05-22
申请人： Cymer, LLC
IPC分类号： G03F7/20
CPC分类号： G03F7/7055
摘要： An optical lithography system is monitored. Information is received from the optical lithography system; a rule is accessed, the rule being associated with one or more of an event in the optical lithography system and an amount of time; a module stored in a library of modules is identified based on the accessed rule; whether a particular condition exists in the optical lithography system is determined using the identified module and the information received from the optical lithography system; and if the particular condition exists, a command signal is generated based on one or more characteristics of the particular condition and provided to an optical source of the optical lithography system. The command signal is based on the determined particular condition, and the command signal is sufficient to change one or more operating parameters of the optical source.
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