公开(公告)号：US20230207264A1

公开(公告)日：2023-06-29

申请号：US18086406

申请日：2022-12-21

Applicant: DAIHEN CORPORATION

Inventor： Yuichi HASEGAWA

IPC: H01J37/32

CPC classification number: H01J37/32165 ,  H01J37/32183 ,  H01J2237/327

Abstract: To simplify a process of suppressing an increase in a reflected wave power caused by IMD, provided is a high-frequency power supply system for providing a high-frequency power to a load, including: a first power supply for supplying a first high-frequency power to the load; a second power supply for supplying a second high-frequency power to the load; and a matching device. The matching device provides a system clock to each of the first power supply and the second power supply. The second power supply outputs a second high-frequency voltage at a control period determined based on the system clock provided from the matching device. The first power supply outputs a first high-frequency voltage obtained by frequency modulation of a fundamental wave signal having a first fundamental frequency and through amplification, in each control period determined based on the system clock provided from the matching device.

公开(公告)号：US20230097183A1

公开(公告)日：2023-03-30

申请号：US17903467

申请日：2022-09-06

Applicant: DAIHEN CORPORATION

Inventor： Yuichi HASEGAWA ,  Yuya UENO

IPC: H03H7/40 ,  H01J37/32

Abstract: The present disclosure, calculating an impedance change considering a reflected wave due to IMD, provides an impedance matching device for performing impedance matching between a source power supply side and a load side, including: a detector that detects a forward wave power supplied from the source power supply and a reflected wave power from the load and outputs a forward wave voltage as a component of the forward wave power and a reflected wave voltage as a component of the reflected wave power, an impedance information output part that calculates impedance from the forward wave voltage and the reflected wave voltage, and a matching part that performs matching operation based on an impedance value supplied from the impedance information output part. The impedance information output part complexifies each of the forward wave voltage and the reflected wave voltage to calculate an impedance value to generate an impedance locus.

公开(公告)号：US20240223063A1

公开(公告)日：2024-07-04

申请号：US18396718

申请日：2023-12-27

Applicant: DAIHEN Corporation

Inventor： Yuya UENO ,  Yuichi HASEGAWA

IPC: H02M1/00

CPC classification number: H02M1/0003

Abstract: A high-frequency power supply system according to the present disclosure includes a first power supply, a second power supply, a first matcher, and a second matcher. The second power supply performs pulse modulation of repeating an ON operation of outputting a second forward wave voltage and an OFF operation of not outputting the second forward wave voltage. The first power supply performs frequency modulation control in a second power supply ON period, and performs frequency offset control of outputting a forward wave voltage having a fundamental frequency obtained by adding an offset frequency to a fundamental frequency in a second power supply OFF period.

公开(公告)号：US20240222074A1

公开(公告)日：2024-07-04

申请号：US18396319

申请日：2023-12-26

Applicant: DAIHEN Corporation

Inventor： Yuya UENO ,  Yuichi HASEGAWA

IPC: H01J37/32 ,  H03H7/01

CPC classification number: H01J37/32009 ,  H03H7/0115 ,  H01J2237/327 ,  H01J2237/334

Abstract: A high-frequency power supply device includes a first power supply that outputs a high-frequency AC voltage having a first frequency, a second power supply that outputs a DC pulse voltage including one or more continuous pulse waveforms, a matching box that receives the high-frequency AC voltage, performs impedance matching such that impedance viewed from the first power supply becomes constant, and outputs the high-frequency AC voltage, a filter that receives the DC pulse voltage, filters the DC pulse voltage, and outputs the DC pulse voltage to a pulse-power input terminal of a load, and an IMD suppression circuit that includes a first inductor having predetermined inductance provided between the matching box and an AC-power input terminal of the load, receives the high-frequency AC voltage, allows the input high-frequency AC voltage to pass through the first inductor, and outputs the high-frequency AC voltage to the AC-power input terminal of the load.

公开(公告)号：US20230207269A1

公开(公告)日：2023-06-29

申请号：US18086344

申请日：2022-12-21

Applicant: DAIHEN Corporation

Inventor： Yuichi HASEGAWA ,  Tatsuya MORlI

IPC: H01J37/32

CPC classification number: H01J37/32183 ,  H01J37/32165 ,  H01J37/32128 ,  H01J2237/24564 ,  H01J2237/334

Abstract: A high-frequency power supply apparatus includes the following elements. A first power supply supplies first power to a load by outputting a first voltage whose fundamental frequency is higher than a second voltage output by a second power supply. A period signal generation circuit generates a period signal matching a frequency and a phase of the second voltage. A waveform control circuit generates a modulation signal for performing frequency modulation on a fundamental wave signal of the first voltage, and adjusts an output timing of the modulation signal in accordance with a timing of the period signal. The first power supply generates a first frequency signal by performing frequency modulation on the fundamental wave signal of the first voltage by using the modulation signal. The first power supply performs power amplification on the first frequency signal and outputs, to the load, the first frequency signal as first power.

公开(公告)号：US20240222079A1

公开(公告)日：2024-07-04

申请号：US18396695

申请日：2023-12-27

Applicant: DAIHEN Corporation

Inventor： Yuichi HASEGAWA ,  Yuya UENO

IPC: H01J37/32

CPC classification number: H01J37/32165 ,  H01J37/32128 ,  H01J37/32146 ,  H01J37/32183

Abstract: A high-frequency power supply system according to the present disclosure includes a first power supply, a second power supply, a first matcher, and a second matcher. The second power supply performs pulse modulation of repeating an ON operation of outputting a second forward wave voltage and an OFF operation of not outputting the second forward wave voltage. The first power supply performs frequency modulation control in a second power supply ON period, and performs frequency offset control of outputting a forward wave voltage VF3 having a fundamental frequency obtained by adding an offset frequency to a fundamental frequency in a second power supply OFF period. The second matcher generates a phase reset signal having a frequency lower than a fundamental frequency based on detection information of a forward wave voltage, and supplies the phase reset signal to the first power supply.

公开(公告)号：US20240222076A1

公开(公告)日：2024-07-04

申请号：US18396451

申请日：2023-12-26

Applicant: DAIHEN Corporation

Inventor： Yuya UENO ,  Yuichi HASEGAWA

IPC: H01J37/32

CPC classification number: H01J37/32146 ,  H01J37/32155 ,  H01J37/32183

Abstract: A high-frequency power supply system according to the present disclosure includes a first power supply, a second power supply, a first matcher, and a second matcher. The second power supply performs pulse modulation of repeating an ON operation of outputting a second forward wave voltage and an OFF operation of not outputting the second forward wave voltage are repeated. The first power supply performs frequency modulation control in a second power supply ON period, and performs frequency offset control of outputting a forward wave voltage having a fundamental frequency obtained by adding an offset frequency to a fundamental frequency in a second power supply OFF period.

公开(公告)号：US20230094385A1

公开(公告)日：2023-03-30

申请号：US17901477

申请日：2022-09-01

Applicant: DAIHEN CORPORATION

Inventor： Yuichi HASEGAWA ,  Tatsuya MORII

IPC: H01J37/32

Abstract: A radio-frequency (RF) power supply apparatus includes a first power supply, a second power supply, and a matching device connected to the first/second power supplies. The first power supply supplies first RF power to a load by outputting first RF voltage with a first fundamental frequency. The second power supply supplies second RF power to the load by outputting second RF voltage with a second fundamental frequency lower than the first fundamental frequency. The matching device generates a clock signal with a frequency higher than the first fundamental frequency and provides the clock signal to the first power supply. The first power supply generates, by using the clock signal, a waveform signal with the same cycle as the second RF voltage. The first power supply performs, by using the clock signal, frequency modulation control on the first RF voltage to be output from the first power supply.

公开(公告)号：US20240222082A1

公开(公告)日：2024-07-04

申请号：US18396693

申请日：2023-12-26

Applicant: DAIHEN Corporation

Inventor： Yuichi HASEGAWA ,  Yuya UENO

IPC: H01J37/32 ,  H03H7/40

CPC classification number: H01J37/32183 ,  H01J37/32128 ,  H01J37/32146 ,  H01J37/32155 ,  H03H7/40

Abstract: A high-frequency power supply system according to the present disclosure includes a first power supply, a second power supply, a first matcher, and a second matcher. The second power supply performs pulse modulation of repeating an ON operation of outputting a second forward wave voltage and an OFF operation of not outputting the second forward wave voltage are repeated. The first power supply performs frequency modulation control in a second power supply ON period, and outputs a first forward wave voltage having a first fundamental frequency in a second power supply OFF period.

公开(公告)号：US20230207268A1

公开(公告)日：2023-06-29

申请号：US18085191

申请日：2022-12-20

Applicant: DAIHEN Corporation

Inventor： Yuya UENO ,  Yuichi HASEGAWA

IPC: H01J37/32

CPC classification number: H01J37/32183 ,  H01J37/32165

Abstract: A high-frequency power supply device includes: a first power supply that supplies first high-frequency power to a load by outputting a first high-frequency voltage having a first fundamental frequency; a second power supply that supplies second high-frequency power to the load by outputting a second high-frequency voltage having a second fundamental frequency lower than the first fundamental frequency; a first matching unit between the first power supply and the load; and a second matching unit between the second power supply and the load. When frequency-modulating the first high-frequency voltage with a modulation signal having a same frequency as the second fundamental frequency to output a modulated wave, the first power supply repeatedly performs search processing of a start phase of the modulation signal and search processing of a frequency shift amount of the modulated wave such that magnitude of a reflection coefficient or magnitude of reflected wave power reduces.