Cleaning sheet, transfer member provided with cleaning function, and method for cleaning substrate processing apparatus
    1.
    发明授权
    Cleaning sheet, transfer member provided with cleaning function, and method for cleaning substrate processing apparatus 失效
    具有清洁功能的清洁片,转印部件以及清洗基板处理装置的方法

    公开(公告)号:US08524007B2

    公开(公告)日:2013-09-03

    申请号:US12977762

    申请日:2010-12-23

    IPC分类号: B08B7/00 B32B3/30 B32B17/10

    摘要: A cleaning sheet including a cleaning layer which has a microasperity shape having an arithmetic average roughness Ra of 0.05 μm or less and a maximum height Rz of 1.0 μm or less. Preferably, a substantial surface area of the cleaning layer per a flat surface of 1 mm2 is 150% or more of a substantial surface area of a silicon wafer mirror surface per a flat area of 1 mm2. The cleaning sheet may be provided on at least one surface of a transfer member so that the transfer member has a cleaning function. When the cleaning sheet or the transfer member having a cleaning function is transferred in a substrate processing apparatus in place of a substrate to be processed therein, the cleaning sheet contacts and cleans a site of the substrate processing apparatus.

    摘要翻译: 一种清洁片,包括具有0.05微米以下的算术平均粗糙度Ra和1.0mum以下的最大高度Rz的微细度形状的清洁层。 优选地,每1mm平坦表面的清洁层的基本表面积为1mm 2的平坦区域的硅晶片镜表面的基本表面积的150%或更多。 清洁片可以设置在转印构件的至少一个表面上,使得转印构件具有清洁功能。 当清洁片或具有清洁功能的转印元件在衬底处理设备中转移以代替待处理衬底时,清洁片接触并清洁衬底处理设备的位置。

    CLEANING SHEET, TRANSFER MEMBER PROVIDED WITH CLEANING FUNCTION, AND METHOD FOR CLEANING SUBSTRATE PROCESSING APPARATUS
    2.
    发明申请
    CLEANING SHEET, TRANSFER MEMBER PROVIDED WITH CLEANING FUNCTION, AND METHOD FOR CLEANING SUBSTRATE PROCESSING APPARATUS 失效
    清洁片,具有清洁功能的转移构件以及清洁基板处理装置的方法

    公开(公告)号:US20090263153A1

    公开(公告)日:2009-10-22

    申请号:US12067235

    申请日:2006-10-12

    IPC分类号: G03G21/00 B32B3/00

    摘要: There are provided a transfer member provided with a cleaning function, which have excellent foreign matter removing performance and transfer performance, and which can remove foreign matters having a predetermined particle diameter with especially high efficiency.The transfer member provided with a cleaning function includes a transfer member and the cleaning layer provided on at least one surface of the transfer member. The cleaning layer has a microasperity shape having an arithmetic average roughness Ra of 0.05 μm or less and a maximum height Rz of 1.0 μm or less. Preferably, a substantial surface area of the cleaning layer per a flat surface of 1 mm2 is 150% or more of a substantial surface area of a silicon wafer mirror surface per a flat area of 1 mm2.

    摘要翻译: 提供具有清除功能的转印构件,其具有优异的异物去除性能和转印性能,并且可以以特别高的效率去除具有预定粒径的异物。 设置有清洁功能的传送构件包括传送构件和设置在传送构件的至少一个表面上的清洁层。 清洁层具有0.05微米以下的算术平均粗糙度Ra和1.0μm以下的最大高度Rz的微细度形状。 优选地,每1mm平坦表面的清洁层的基本表面积为1mm 2的平坦区域的硅晶片镜表面的基本表面积的150%或更多。

    CLEANING SHEET, TRANSFER MEMBER PROVIDED WITH CLEANING FUNCTION, AND METHOD FOR CLEANING SUBSTRATE PROCESSING APPARATUS
    4.
    发明申请
    CLEANING SHEET, TRANSFER MEMBER PROVIDED WITH CLEANING FUNCTION, AND METHOD FOR CLEANING SUBSTRATE PROCESSING APPARATUS 失效
    清洁片,具有清洁功能的转移构件以及清洁基板处理装置的方法

    公开(公告)号:US20110088721A1

    公开(公告)日:2011-04-21

    申请号:US12977762

    申请日:2010-12-23

    IPC分类号: B08B1/00

    摘要: A cleaning sheet including a cleaning layer which has a microasperity shape having an arithmetic average roughness Ra of 0.05 μm or less and a maximum height Rz of 1.0 μm or less. Preferably, a substantial surface area of the cleaning layer per a flat surface of 1 mm2 is 150% or more of a substantial surface area of a silicon wafer mirror surface per a flat area of 1 mm2. The cleaning sheet may be provided on at least one surface of a transfer member so that the transfer member has a cleaning function. When the cleaning sheet or the transfer member having a cleaning function is transferred in a substrate processing apparatus in place of a substrate to be processed therein, the cleaning sheet contacts and cleans a site of the substrate processing apparatus.

    摘要翻译: 一种清洁片,包括具有0.05微米以下的算术平均粗糙度Ra和1.0微米或更小的最大高度Rz的微细凹凸形状的清洁层。 优选地,每1mm平坦表面的清洁层的基本表面积为1mm 2的平坦区域的硅晶片镜表面的基本表面积的150%或更多。 清洁片可以设置在转印构件的至少一个表面上,使得转印构件具有清洁功能。 当清洁片或具有清洁功能的转印元件在衬底处理设备中转移以代替待处理衬底时,清洁片接触并清洁衬底处理设备的位置。

    PROCESS FOR PRODUCING ORGANIC ELECTROLUMINESCENT PANEL
    9.
    发明申请
    PROCESS FOR PRODUCING ORGANIC ELECTROLUMINESCENT PANEL 失效
    生产有机电致发光面板的方法

    公开(公告)号:US20110124136A1

    公开(公告)日:2011-05-26

    申请号:US13003269

    申请日:2009-06-30

    IPC分类号: H01L33/00

    摘要: Provided is a process for producing an organic EL panel by using an ultrathin glass plate, in which the ultrathin glass plate is not “fractured” or “cut” in the production process, the organic EL element is formed reliably when formed by vacuum deposition, and recovered without damage after the production process, and there is no need for installing an additional step of cleaning the rear face of the ultrathin glass plate. The process for producing an organic EL panel according to the present invention is a process for producing an organic electroluminescent panel by forming an organic electroluminescent element on an ultrathin glass plate by vacuum deposition method, comprising forming electrodes on the ultrathin glass plate, by temporarily fixing the ultrathin glass plate to a supporting plate via a double-sided adhesive tape having a thermal release adhesive layer formed at least on one face of the base material layer, containing heat-expandable microspheres that start expansion and/or foaming at temperature higher than the vacuum deposition temperature.

    摘要翻译: 本发明提供一种通过使用超薄玻璃板在生产过程中不“断裂”或“切割”的超薄玻璃板制造有机EL面板的方法,当通过真空沉积形成时可靠地形成有机EL元件, 并且在生产过程之后没有损坏地恢复,并且不需要安装清洁超薄玻璃板的后表面的附加步骤。 根据本发明的有机EL面板的制造方法是通过真空蒸镀法在超薄玻璃板上形成有机电致发光元件来制造有机电致发光面板的方法,其特征在于,在所述超薄玻璃板上,通过临时固定 超薄玻璃板通过双面胶带连接到支撑板上,该双面胶带具有形成在基材层的至少一个表面上的热分解粘合剂层,该热剥离粘合剂层含有在高于所述基材层的温度下开始膨胀和/或发泡的热膨胀性微球 真空沉积温度。