BACKLIGHT ASSEMBLY AND LIQUID CRYSTAL DISPLAY APPARATUS HAVING THE SAME
    2.
    发明申请
    BACKLIGHT ASSEMBLY AND LIQUID CRYSTAL DISPLAY APPARATUS HAVING THE SAME 审中-公开
    背光组件和液晶显示装置

    公开(公告)号:US20080043462A1

    公开(公告)日:2008-02-21

    申请号:US11841088

    申请日:2007-08-20

    IPC分类号: F21S4/00

    摘要: A backlight assembly includes a plurality of lamps, a receiving container, and a reflective plate. The lamps are disposed substantially parallel with each other and generate light. The receiving container receives the lamps, and openings corresponding to the lamps are formed therein. The reflective plate is disposed between the lamps and the receiving container and reflects the light from the lamps. The reflective plate is formed from an insulating material.

    摘要翻译: 背光组件包括多个灯,接收容器和反射板。 灯基本上彼此平行地设置并产生光。 接收容器接收灯,并且在其中形成与灯相对应的开口。 反射板设置在灯和接收容器之间并且反射来自灯的光。 反射板由绝缘材料形成。

    Method of driving light source and display apparatus for performing the method
    3.
    发明授权
    Method of driving light source and display apparatus for performing the method 有权
    驱动光源的方法和执行该方法的显示装置

    公开(公告)号:US08283871B2

    公开(公告)日:2012-10-09

    申请号:US12764277

    申请日:2010-04-21

    IPC分类号: H05B37/02

    CPC分类号: H05B33/0815 H05B33/0827

    摘要: A method of driving a light source apparatus includes inverting a direct current voltage to generate a first alternating current voltage, transforming the first alternating current voltage into a second alternating current voltage having a voltage level that is greater than a voltage level of the first alternating current voltage, compensating a driving alternating current voltage based on the second alternating current voltage to generate a compensated driving alternating current voltage such that a substantially equal current flows through each light emitting string of a plurality of light emitting string included in the light source apparatus, and rectifying the compensated driving alternating current voltage to apply a driving voltage to the light emitting strings.

    摘要翻译: 一种驱动光源装置的方法包括使直流电压反相以产生第一交流电压,将第一交流电压转换成具有大于第一交流电压电平的电压电平的第二交流电压 电压,基于所述第二交流电压补偿驱动交流电压,以产生经补偿的驱动交流电压,使得基本相等的电流流过包括在所述光源装置中的多个发光串的每个发光串,以及 整流补偿的驱动交流电压以向驱动电压施加驱动电压。

    Connector for light source module and backlight assembly having the same
    4.
    发明授权
    Connector for light source module and backlight assembly having the same 有权
    具有相同光源模块和背光组件的连接器

    公开(公告)号:US08704972B2

    公开(公告)日:2014-04-22

    申请号:US13181555

    申请日:2011-07-13

    IPC分类号: G02F1/1335

    摘要: A connector for a light source module includes a body portion and a terminal portion. The body portion includes a first opening portion and a second opening portion. The first opening portion receives a portion of the light source module. The second opening portion receives a portion of a light source driver which drives the light source module. The terminal portion includes a first terminal and a second terminal. The first terminal is in the first opening portion of the body portion. The second terminal is connected to the first terminal. The second terminal is in the second opening portion of the body portion.

    摘要翻译: 用于光源模块的连接器包括主体部分和端子部分。 主体部分包括第一开口部分和第二开口部分。 第一开口部分接收光源模块的一部分。 第二开口部分接收驱动光源模块的光源驱动器的一部分。 端子部分包括第一端子和第二端子。 第一端子位于主体部分的第一开口部分中。 第二终端连接到第一终端。 第二端子位于主体部分的第二开口部分中。

    Liquid crystal display
    5.
    发明授权
    Liquid crystal display 有权
    液晶显示器

    公开(公告)号:US08169390B2

    公开(公告)日:2012-05-01

    申请号:US12011779

    申请日:2008-01-28

    IPC分类号: G09G3/36

    摘要: The present invention relates to a method of controlling luminance of a backlight based on a processed image data after receiving information of image data, in order to improve the visibility of moving picture. An inverter according to the present invention includes a first block generating a first luminance control signal with an analog value depending on the luminance control signal with a duty ratio depending on a synchronization signal. The luminance control signals generated by the respective blocks are synthesized luminance control signal. Accordingly, a liquid crystal display employing two backlight control methods can be provided. Thus, it is possible to remove the drag phenomenon of a screen and, at the same time, to improve the visibility for moving picture.

    摘要翻译: 本发明涉及一种在接收到图像数据的信息之后基于经处理的图像数据控制背光的亮度的方法,以便提高运动图像的可视性。 根据本发明的逆变器包括:第一块,其根据具有取决于同步信号的占空比的亮度控制信号产生具有模拟值的第一亮度控制信号。 由各个块产生的亮度控制信号是合成亮度控制信号。 因此,可以提供采用两种背光控制方法的液晶显示器。 因此,可以消除屏幕的拖动现象,并且同时提高运动图像的可视性。

    Backlight unit and liquid crystal display device including the same
    6.
    发明授权
    Backlight unit and liquid crystal display device including the same 有权
    背光单元和包括其的液晶显示装置

    公开(公告)号:US08058813B2

    公开(公告)日:2011-11-15

    申请号:US12207639

    申请日:2008-09-10

    IPC分类号: H05B37/00

    摘要: A backlight unit of a liquid crystal display includes a lamp, a balancing pattern capacitor electrically connected to the lamp for current balance, a transformer electrically connected to the lamp via the balancing pattern capacitor, a sensing pattern capacitor electrically connected to a terminal of the balancing pattern capacitor connected to the lamp to detect an abnormal driving state of the lamp, and a feedback circuit unit electrically connected to the sensing pattern capacitor to control the abnormal driving state of the lamp. A liquid crystal display device including the backlight unit is also disclosed.

    摘要翻译: 液晶显示器的背光单元包括灯,电连接到用于电流平衡的灯的平衡图形电容器,通过平衡图形电容器电连接到灯的变压器,电连接到平衡端子的感测图案电容器 连接到灯的图案电容器以检测灯的异常驱动状态,以及电连接到感测图案电容器以控制灯的异常驱动状态的反馈电路单元。 还公开了包括背光单元的液晶显示装置。

    Method for detecting defects in a substrate having a semiconductor device thereon
    7.
    发明授权
    Method for detecting defects in a substrate having a semiconductor device thereon 失效
    用于检测其上具有半导体器件的衬底中的缺陷的方法

    公开(公告)号:US08055057B2

    公开(公告)日:2011-11-08

    申请号:US12007680

    申请日:2008-01-14

    IPC分类号: G06K9/00

    摘要: An inspection apparatus and a method for detecting defects in a substrate having a semiconductor device thereon are provided. The method includes establishing a first inspection region including first patterns repeatedly formed in a first direction and a second inspection region including second patterns repeatedly formed in a second direction on the substrate, determining a first unit inspection size of the first inspection region and a second unit inspection size of the second inspection region, obtaining images of the first and second patterns by moving the substrate in the first direction, and detecting defects in the first and second inspection regions by comparing the obtained images of portions of the first and second inspection regions, respectively, with each other. The first inspection size and second inspection size function as comparison units if defects are detected. The substrate may face an image receiving member.

    摘要翻译: 提供一种用于检测其上具有半导体器件的衬底中的缺陷的检查装置和方法。 该方法包括建立包括在第一方向上重复形成的第一图案的第一检查区域和包括在基板上沿第二方向重复形成的第二图案的第二检查区域,确定第一检查区域的第一单位检查尺寸和第二单元检查区域 第二检查区域的检查尺寸,通过沿第一方向移动基板获得第一图案和第二图案的图像,并且通过比较获得的第一和第二检查区域的部分的图像来检测第一和第二检查区域中的缺陷, 分别彼此。 如果检测到缺陷,则第一检查尺寸和第二检查尺寸用作比较单元。 基板可面向图像接收部件。

    METHOD OF ANALYZING A WAFER SAMPLE
    8.
    发明申请
    METHOD OF ANALYZING A WAFER SAMPLE 失效
    分析样品的方法

    公开(公告)号:US20080219547A1

    公开(公告)日:2008-09-11

    申请号:US12041127

    申请日:2008-03-03

    IPC分类号: G06K9/00

    摘要: In a method of analyzing a wafer sample, a first defect of a photoresist pattern on the wafer sample having shot regions exposed with related exposure conditions is detected. A first portion of the pattern includes the shot regions exposed with an exposure condition corresponding to a reference exposure condition and a tolerance error range of the reference exposure condition. The first defect repeatedly existing in at least two of the shot regions in a second portion of the pattern is set up as a second defect of the pattern. A first reference image displaying the second defect is obtained. The first defect of the shot regions in the first portion corresponding to the second defect is set up as a third defect corresponding to weak points of the pattern. The exposure conditions of the shot region having no weak points are set up as an exposure margin of an exposure process.

    摘要翻译: 在分析晶片样品的方法中,检测具有用相关曝光条件曝光的拍摄区域的晶片样品上的光致抗蚀剂图案的第一缺陷。 图案的第一部分包括用与参考曝光条件相对应的曝光条件和参考曝光条件的公差误差范围暴露的照射区域。 在图案的第二部分中的至少两个拍摄区域中重复存在的第一缺陷被设置为图案的第二缺陷。 获得显示第二缺陷的第一参考图像。 对应于第二缺陷的第一部分中的拍摄区域的第一缺陷被设置为对应于图案的弱点的第三缺陷。 没有弱点的照射区域的曝光条件被设置为曝光处理的曝光余量。

    Method of detecting defects in patterns and apparatus for performing the same
    9.
    发明申请
    Method of detecting defects in patterns and apparatus for performing the same 有权
    检测图案中的缺陷的方法及其执行方法

    公开(公告)号:US20080112608A1

    公开(公告)日:2008-05-15

    申请号:US11979776

    申请日:2007-11-08

    IPC分类号: G06K9/00

    摘要: In a method of detecting defects in patterns and an apparatus for performing the method, a first image of a detection region on a semiconductor substrate may be acquired. A second image may be acquired from the first image by performing a Fourier transform and performing a low pass filtering. The second image may be compared with a reference image so that the defects of the detection region are detected. Existence of the defect of the second image is determined using a relation value between a grey level of each of pixels of the second image and the reference image, respectively. When a defect exists, the horizontal and the vertical positions of the pixel where the relation value is minimum are combined to determine the position of the defect.

    摘要翻译: 在检测图案中的缺陷的方法和执行该方法的装置中,可以获取半导体衬底上的检测区域的第一图像。 可以通过执行傅里叶变换并执行低通滤波从第一图像获取第二图像。 可以将第二图像与参考图像进行比较,从而检测出检测区域的缺陷。 使用第二图像的每个像素的灰度级与参考图像之间的关系值来确定第二图像的缺陷的存在。 当存在缺陷时,组合关系值最小的像素的水平和垂直位置以确定缺陷的位置。

    WAFER INSPECTING METHOD
    10.
    发明申请
    WAFER INSPECTING METHOD 有权
    波形检测方法

    公开(公告)号:US20080049219A1

    公开(公告)日:2008-02-28

    申请号:US11693356

    申请日:2007-03-29

    IPC分类号: G01N21/00

    摘要: A wafer inspecting method including the steps of: multi-scanning a pattern image of a unit inspection region in a normal state and a pattern image of a unit inspection region to be inspected, respectively, using different inspection conditions; comparing the multi-scanned pattern images in the normal state with the multi-scanned pattern images to be inspected obtained by the same inspection conditions, and storing differences between the pattern images as difference images; generating a discrimination difference image by calculating a balance between the stored difference images; and discriminating a defect from noise by using the discrimination difference image.

    摘要翻译: 一种晶片检查方法,包括以下步骤:使用不同的检查条件分别对正常状态下的单位检查区域的图案图像和要检查的单位检查区域的图案图像进行多次扫描; 将正常状态下的多扫描图案图像与通过相同检查条件获得的待检查的多扫描图案图像进行比较,并且将图案图像之间的差异存储为差分图像; 通过计算所存储的差分图像之间的平衡来产生鉴别差异图像; 以及通过使用辨别差异图像来区分缺陷和噪声。