摘要:
A lamp, lamp holder, and a power supply substrate that allow easy fabrication of a backlight assembly or a power supply module for a display device are presented. The lamp includes a lamp tube and an electrode that extends outside the lamp tube to form a lamp lead. The lamp holder includes a body for holding the lamp tube and a power supply member for providing voltage to the lamp lead. A power supply module includes a power supply substrate combined with a lamp holder holding the lamp. The lamp holders are fixed to fixing portions of the power supply substrate or to fixing holes of a connection plate. As the design allows easy separation of the lamp holders from the power supply substrate, building a backlight assembly or a display device is facilitated.
摘要:
A backlight assembly includes a plurality of lamps, a receiving container, and a reflective plate. The lamps are disposed substantially parallel with each other and generate light. The receiving container receives the lamps, and openings corresponding to the lamps are formed therein. The reflective plate is disposed between the lamps and the receiving container and reflects the light from the lamps. The reflective plate is formed from an insulating material.
摘要:
A method of driving a light source apparatus includes inverting a direct current voltage to generate a first alternating current voltage, transforming the first alternating current voltage into a second alternating current voltage having a voltage level that is greater than a voltage level of the first alternating current voltage, compensating a driving alternating current voltage based on the second alternating current voltage to generate a compensated driving alternating current voltage such that a substantially equal current flows through each light emitting string of a plurality of light emitting string included in the light source apparatus, and rectifying the compensated driving alternating current voltage to apply a driving voltage to the light emitting strings.
摘要:
A connector for a light source module includes a body portion and a terminal portion. The body portion includes a first opening portion and a second opening portion. The first opening portion receives a portion of the light source module. The second opening portion receives a portion of a light source driver which drives the light source module. The terminal portion includes a first terminal and a second terminal. The first terminal is in the first opening portion of the body portion. The second terminal is connected to the first terminal. The second terminal is in the second opening portion of the body portion.
摘要:
The present invention relates to a method of controlling luminance of a backlight based on a processed image data after receiving information of image data, in order to improve the visibility of moving picture. An inverter according to the present invention includes a first block generating a first luminance control signal with an analog value depending on the luminance control signal with a duty ratio depending on a synchronization signal. The luminance control signals generated by the respective blocks are synthesized luminance control signal. Accordingly, a liquid crystal display employing two backlight control methods can be provided. Thus, it is possible to remove the drag phenomenon of a screen and, at the same time, to improve the visibility for moving picture.
摘要:
A backlight unit of a liquid crystal display includes a lamp, a balancing pattern capacitor electrically connected to the lamp for current balance, a transformer electrically connected to the lamp via the balancing pattern capacitor, a sensing pattern capacitor electrically connected to a terminal of the balancing pattern capacitor connected to the lamp to detect an abnormal driving state of the lamp, and a feedback circuit unit electrically connected to the sensing pattern capacitor to control the abnormal driving state of the lamp. A liquid crystal display device including the backlight unit is also disclosed.
摘要:
An inspection apparatus and a method for detecting defects in a substrate having a semiconductor device thereon are provided. The method includes establishing a first inspection region including first patterns repeatedly formed in a first direction and a second inspection region including second patterns repeatedly formed in a second direction on the substrate, determining a first unit inspection size of the first inspection region and a second unit inspection size of the second inspection region, obtaining images of the first and second patterns by moving the substrate in the first direction, and detecting defects in the first and second inspection regions by comparing the obtained images of portions of the first and second inspection regions, respectively, with each other. The first inspection size and second inspection size function as comparison units if defects are detected. The substrate may face an image receiving member.
摘要:
In a method of analyzing a wafer sample, a first defect of a photoresist pattern on the wafer sample having shot regions exposed with related exposure conditions is detected. A first portion of the pattern includes the shot regions exposed with an exposure condition corresponding to a reference exposure condition and a tolerance error range of the reference exposure condition. The first defect repeatedly existing in at least two of the shot regions in a second portion of the pattern is set up as a second defect of the pattern. A first reference image displaying the second defect is obtained. The first defect of the shot regions in the first portion corresponding to the second defect is set up as a third defect corresponding to weak points of the pattern. The exposure conditions of the shot region having no weak points are set up as an exposure margin of an exposure process.
摘要:
In a method of detecting defects in patterns and an apparatus for performing the method, a first image of a detection region on a semiconductor substrate may be acquired. A second image may be acquired from the first image by performing a Fourier transform and performing a low pass filtering. The second image may be compared with a reference image so that the defects of the detection region are detected. Existence of the defect of the second image is determined using a relation value between a grey level of each of pixels of the second image and the reference image, respectively. When a defect exists, the horizontal and the vertical positions of the pixel where the relation value is minimum are combined to determine the position of the defect.
摘要:
A wafer inspecting method including the steps of: multi-scanning a pattern image of a unit inspection region in a normal state and a pattern image of a unit inspection region to be inspected, respectively, using different inspection conditions; comparing the multi-scanned pattern images in the normal state with the multi-scanned pattern images to be inspected obtained by the same inspection conditions, and storing differences between the pattern images as difference images; generating a discrimination difference image by calculating a balance between the stored difference images; and discriminating a defect from noise by using the discrimination difference image.