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公开(公告)号:US20070196011A1
公开(公告)日:2007-08-23
申请号:US11610468
申请日:2006-12-13
申请人: Damon Cox , Todd Egan , Randhir Thakur , Arkadii Samoilov , Per-Ove Hansson
发明人: Damon Cox , Todd Egan , Randhir Thakur , Arkadii Samoilov , Per-Ove Hansson
CPC分类号: G01N21/33 , H01L21/67109 , H01L21/67115 , H01L21/67161 , H01L21/67167 , H01L21/67196 , H01L21/67207 , H01L21/67745
摘要: Aspects of the invention generally provide an apparatus and method for processing substrates using a multi-chamber processing system that is adapted to process substrates and analyze the results of the processes performed on the substrate. In one aspect of the invention, one or more analysis steps and/or pre-processing steps are performed on the substrate to provide data for processes performed on subsequent substrates. In one aspect of the invention, a system controller and one or more analysis devices are utilized to monitor and control a process chamber recipe and/or a process sequence to reduce substrate scrap due to defects in the formed device and device performance variability issues. Embodiments of the present invention also generally provide methods and a system for repeatably and reliably forming semiconductor devices used in a variety of applications.
摘要翻译: 本发明的方面通常提供一种使用多室处理系统来处理衬底的装置和方法,所述多室处理系统适于处理衬底并分析在衬底上执行的工艺的结果。 在本发明的一个方面,在衬底上执行一个或多个分析步骤和/或预处理步骤以提供在后续衬底上执行的处理的数据。 在本发明的一个方面,系统控制器和一个或多个分析装置用于监测和控制处理室配方和/或处理顺序,以减少由于所形成的装置中的缺陷和装置性能变异性问题引起的衬底废料。 本发明的实施例还通常提供了用于可重复且可靠地形成用于各种应用的半导体器件的方法和系统。
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公开(公告)号:US06582175B2
公开(公告)日:2003-06-24
申请号:US10135261
申请日:2002-04-29
IPC分类号: B65G100
CPC分类号: H01L21/68707 , H01L21/67742
摘要: A multi-set robot is provided that includes a first robot set having a first motor coupled to a first rotatable member that is rotatable about an axis; a second motor coupled to a second rotatable member that is rotatable about the axis; a first plurality of blades vertically spaced from one another; and a first linkage adapted to enable coordinated movement of the blades on rotation of the first and second rotatable members. The robot also includes a second robot set positioned above the first robot set having a third motor coupled to a third rotatable member that is rotatable about the axis; a fourth motor coupled to a fourth rotatable member that is rotatable about the axis; a second plurality of blades vertically spaced from one another; and a second linkage adapted to enable coordinated movement of the blades on rotation of the third and fourth rotatable members. Other aspects are provided.
摘要翻译: 提供了一种多组机器人,其包括第一机器人组,其具有联接到可围绕轴线旋转的第一可旋转构件的第一电动机; 耦合到可围绕所述轴线旋转的第二可旋转构件的第二马达; 彼此垂直间隔开的第一组多个叶片; 以及第一连杆,其适于使所述叶片在所述第一和第二可旋转构件的旋转时能够协调地运动。 所述机器人还包括位于所述第一机器人组件上方的第二机器人组件,所述第二机器人组具有联接到可围绕所述轴线旋转的第三可旋转构件的第三 耦合到可围绕所述轴线旋转的第四可旋转构件的第四电动机; 第二多个叶片,彼此垂直间隔开; 以及第二联动装置,其适于在第三和第四可旋转构件旋转时实现叶片的协调运动。 提供其他方面。
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公开(公告)号:US20050137751A1
公开(公告)日:2005-06-23
申请号:US11002732
申请日:2004-12-02
申请人: Damon Cox , Marvin Freeman
发明人: Damon Cox , Marvin Freeman
CPC分类号: B25J9/1692 , G05B2219/39025 , G05B2219/45032 , H01L21/67259
摘要: Methods for automated calibration and diagnostics of a workpiece transfer system are provided. In one embodiment, a method for locating an end effector includes retrieving a workpiece located at a target location, passing the workpiece through a plurality of sensors, wherein at least one of the sensors changes state in response to a position of at least one of the end effector or workpiece, recording a metric of robot position associated with the sensor change of state, determining an error for an expected metric of the end effector position from the recorded robot position metric and correcting a taught location of the robot for the target position. In another embodiment, a process for monitoring a robotic transfer system is provided that includes detecting a first positional error in a robotic transfer system, and comparing the first positional error to a second positional error in the robotic transfer system.
摘要翻译: 提供了用于工件传送系统的自动校准和诊断的方法。 在一个实施例中,用于定位末端执行器的方法包括检索位于目标位置处的工件,使工件穿过多个传感器,其中至少一个传感器响应于至少一个传感器的位置改变状态 记录与传感器状态变化相关联的机器人位置的度量,从记录的机器人位置度量确定末端执行器位置的预期度量的误差,并校正目标位置的机器人的教导位置。 在另一个实施例中,提供了一种用于监视机器人传送系统的过程,其包括检测机器人传送系统中的第一位置错误,并将第一位置误差与机器人传送系统中的第二位置误差进行比较。
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公开(公告)号:US20080063504A1
公开(公告)日:2008-03-13
申请号:US11837267
申请日:2007-08-10
申请人: WHITNEY KROETZ , Damon Cox , Jeffrey Brodine , Domingo Guerra
发明人: WHITNEY KROETZ , Damon Cox , Jeffrey Brodine , Domingo Guerra
IPC分类号: B66C1/42
CPC分类号: B25J9/0012 , B25J9/108 , Y10T74/20335
摘要: The present invention provides methods, apparatus, and systems for a wrist assembly including a housing having a cap and a bottom, at least one pivot at least partially enclosed in the housing and adapted to be coupled to a robot arm, and a belt coupled to the pivot and adapted to rotate the pivot about a bearing. The bottom of the housing is adapted to reflect heat away from the at least one pivot and the bearing.
摘要翻译: 本发明提供了一种用于腕部组件的方法,装置和系统,其包括具有盖和底部的壳体,至少一个至少部分地封闭在壳体中并且适于联接到机器人手臂的枢轴和耦合到 枢轴并且适于围绕轴承旋转枢轴。 壳体的底部适于将热量从至少一个枢轴和轴承反射出来。
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公开(公告)号:US06379095B1
公开(公告)日:2002-04-30
申请号:US09549777
申请日:2000-04-14
申请人: Martin R. Elliott , Jeffrey C. Hudgens , Chris Pencis , Damon Cox
发明人: Martin R. Elliott , Jeffrey C. Hudgens , Chris Pencis , Damon Cox
IPC分类号: B65H160
CPC分类号: H01L21/68707 , H01L21/67742
摘要: An apparatus for processing semiconductor wafers has an automatic robot for independently and simultaneously handling two wafers (W) at the same time on two separate transfer planes. The robot comprises a first arm assembly having a left and a right arm each mounted at one end for independent rotation in a first horizontal plane about a center vertical axis, the other ends of the arms being movably joined together and holding a blade on which a wafer can be carried, the arms being horizontally bendable near their centers so they can be folded to retract the blade toward the center axis and rotated to a desired angular position, the arms being extendable along a radius from the center axis by moving the arms together near their centers to bring the arms nearly parallel to each other and to extend the blade from the center axis by a maximum amount; and a second arm assembly substantially identical to the first assembly and rotatable in a second horizontal plane closely spaced above the first plane, the operation of the second assembly being substantially identical to that of the first assembly but independent thereof.
摘要翻译: 用于处理半导体晶片的设备具有自动机器人,用于在两个分开的转移平面上同时处理两个晶片(W)。 机器人包括第一臂组件,其具有左臂和右臂,每个臂在一端安装在围绕中心垂直轴线的第一水平平面中独立旋转,臂的另一端可移动地接合在一起, 可以承载晶片,臂可以在其中心附近水平弯曲,使得它们可以被折叠以使叶片朝向中心轴线缩回并且旋转到期望的角位置,臂可以通过将臂移动在一起而从中心轴线的半径延伸 靠近它们的中心以使臂几乎彼此平行,并且使叶片从中心轴线延伸最大量; 以及第二臂组件,其基本上与第一组件相同,并且可在紧邻第一平面的第二水平面中旋转,第二组件的操作基本上与第一组件的操作相同,但与之独立。
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