摘要:
Methods, systems, and computer-readable media implementing various aspects of complex data in a conceptual table are disclosed which enable complex data in the form of tables to be added to a conceptual table. The complex data can map to scalar values in a plurality of data tables. Complex data may be entered via data modeling methods, accessed via cursoring methods, and queried via query expansion methods.
摘要:
A device including an elastic member and means for connecting the ends of it to a person so that the elastic strip is operable, when the person's leg is straight or nearly straight, to exert a force that tends to bend the leg at the knee and hip is disclosed. The device assists someone using the device to achieve a safe and adequate lift of his or her legs during the swing phase of the gait cycle. Prolonged use of the device has been observed to cause a person, when later walking without the device, to exhibit better leg lift during the swing phase of the gait cycle than that person did before using the device. The elastic strip can be connected at one end to a shoe insert and, at the other end, to a belt.
摘要:
A method of forming an image having reduced comer rounding in a photoresist layer is provided which comprises exposing a photoresist layer to a first mask having a first image, said first image having at least two edges; exposing said photoresist layer to a second mask having a second image, said second image having at least two edges, the second image edges being substantially rotated relative to the first image edges to produce a latent image in said photoresist layer having edges substantially rotated relative to the first and second image edges; and developing the photoresist layer to produce said image.
摘要:
Fine feature lithography is enhanced by selectively providing exposures to correct for effects such as foreshortening, corner rounding, nested to isolated print bias, feature size dependent bias, and other image biases in semiconductor processing. These results are achieved by increasing the local exposure dose in critical areas of specific images, such as line ends and corners. The general process incorporates techniques which tailor the exposure dose as a function of position to achieve the desired final image shape. The techniques include contrast enhancement layers (CEL), scanning optical beams, and exposures with different masks. In one embodiment the process of forming a pattern comprises the steps of providing a substrate having a photosensitive coating, exposing the center area of the pattern on the photosensitive coating with one mask, and exposing ends of the pattern on the photosensitive coating without exposing the center area with a second mask. The second exposure overlaps the first exposure and may extend beyond the pattern but the second dose is much lower than the first dose.
摘要:
A device including an elastic member and means for connecting the ends of it to a person so that the elastic strip is operable, when the person's leg is straight or nearly straight, to exert a force that tends to bend the leg at the knee and hip is disclosed. The device assists someone using the device to achieve a safe and adequate lift of his or her legs during the swing phase of the gait cycle. Prolonged use of the device has been observed to cause a person, when later walking without the device, to exhibit better leg lift during the swing phase of the gait cycle than that person did before using the device. The elastic strip can be connected at one end to a shoe insert and, at the other end, to a belt.
摘要:
A structure for a semiconductor chip which includes a first region having first cells for storing and processing data, and a second region outside the first region having OPC structures, wherein the OPC structures comprise decoupling capacitors. The line widths of the active gates of first cells are the same size or similar in size as the OPC structures. The OPC structures reduce proximity effects of active devices in the first cells, and comprise N-type FETs and P-type FETs, that are located in the second region. The OPC structures may have a width greater than the first cells. The second region can be multiple OPC structures, whereby the second region comprises multiple decoupling capacitors. The active devices in the first cells are separated by a first distance and the OPC structures are separated from the active devices by the first distance.
摘要:
A proximity correction serif design methodology is described that provides improved inner and outer corner rounding, line end shortening, as well as improvements in more general undesirable two-dimensional shape distortions introduced into the lithographic printing process due to proximity effects. Using this method, exact solutions are shown for the specialized cases of either coherent or incoherent illumination exposing a hypothetical resist that develops via a simple diffusion like mechanism. The basis of this method for predicting the positions and shapes of serifs is tied to the need to increase the components of high spatial frequency that are essentially lost due to diffraction, diffusion, dissolution, and etching related effects. The correct amount to increase the spatial components is determined in the coordinate space and makes use of an empirical characterization of these physical factors.