Complex data access
    1.
    发明申请
    Complex data access 有权
    复杂的数据访问

    公开(公告)号:US20060129572A1

    公开(公告)日:2006-06-15

    申请号:US11013619

    申请日:2004-12-15

    IPC分类号: G06F7/00

    摘要: Methods, systems, and computer-readable media implementing various aspects of complex data in a conceptual table are disclosed which enable complex data in the form of tables to be added to a conceptual table. The complex data can map to scalar values in a plurality of data tables. Complex data may be entered via data modeling methods, accessed via cursoring methods, and queried via query expansion methods.

    摘要翻译: 公开了在概念表中实现复杂数据的各个方面的方法,系统和计算机可读介质,其使得以表的形式的复杂数据被添加到概念表中。 复数数据可以映射到多个数据表中的标量值。 可以通过数据建模方法输入复杂数据,通过游标方式访问,并通过查询扩展方法进行查询。

    Ambulatory aid and method for providing ambulatory aid
    2.
    发明授权
    Ambulatory aid and method for providing ambulatory aid 失效
    动作辅助和提供行走辅助的方法

    公开(公告)号:US07175604B2

    公开(公告)日:2007-02-13

    申请号:US11057610

    申请日:2005-02-14

    申请人: Daniel Cole

    发明人: Daniel Cole

    IPC分类号: A61F5/00 A63B21/02

    CPC分类号: A61F5/0102

    摘要: A device including an elastic member and means for connecting the ends of it to a person so that the elastic strip is operable, when the person's leg is straight or nearly straight, to exert a force that tends to bend the leg at the knee and hip is disclosed. The device assists someone using the device to achieve a safe and adequate lift of his or her legs during the swing phase of the gait cycle. Prolonged use of the device has been observed to cause a person, when later walking without the device, to exhibit better leg lift during the swing phase of the gait cycle than that person did before using the device. The elastic strip can be connected at one end to a shoe insert and, at the other end, to a belt.

    摘要翻译: 一种包括弹性构件的装置和用于将其端部连接到人的装置,使得当人的腿是直的或几乎直的时,弹性条可操作地施加倾向于使膝盖和臀部的腿弯曲的力 被披露。 该装置帮助使用该装置的人在步态循环的摆动阶段期间实现他或她的腿的安全和适当的提升。 已经观察到长时间使用该装置导致一个人,当后来在没有装置的情况下行走时,在步态循环的摆动阶段比在使用该装置之前表现出更好的腿部提升。 弹性条可以在一端连接到鞋子插入件,另一端连接到皮带上。

    Method of forming sharp corners in a photoresist layer
    3.
    发明授权
    Method of forming sharp corners in a photoresist layer 失效
    在光致抗蚀剂层中形成锐角的方法

    公开(公告)号:US06238850B1

    公开(公告)日:2001-05-29

    申请号:US09379454

    申请日:1999-08-23

    IPC分类号: G03C500

    摘要: A method of forming an image having reduced comer rounding in a photoresist layer is provided which comprises exposing a photoresist layer to a first mask having a first image, said first image having at least two edges; exposing said photoresist layer to a second mask having a second image, said second image having at least two edges, the second image edges being substantially rotated relative to the first image edges to produce a latent image in said photoresist layer having edges substantially rotated relative to the first and second image edges; and developing the photoresist layer to produce said image.

    摘要翻译: 提供了一种在光致抗蚀剂层中形成具有减角的图像的方法,其包括将光致抗蚀剂层暴露于具有第一图像的第一掩模,所述第一图像具有至少两个边缘; 将所述光致抗蚀剂层暴露于具有第二图像的第二掩模,所述第二图像具有至少两个边缘,所述第二图像边缘相对于所述第一图像边缘基本旋转,以在所述光致抗蚀剂层中产生潜像,所述潜像基本上相对于 第一和第二图像边缘; 并显影光致抗蚀剂层以产生所述图像。

    Process for enhanced lithographic imaging
    4.
    发明授权
    Process for enhanced lithographic imaging 失效
    增强光刻成像的过程

    公开(公告)号:US06383719B1

    公开(公告)日:2002-05-07

    申请号:US09081456

    申请日:1998-05-19

    IPC分类号: G03F720

    摘要: Fine feature lithography is enhanced by selectively providing exposures to correct for effects such as foreshortening, corner rounding, nested to isolated print bias, feature size dependent bias, and other image biases in semiconductor processing. These results are achieved by increasing the local exposure dose in critical areas of specific images, such as line ends and corners. The general process incorporates techniques which tailor the exposure dose as a function of position to achieve the desired final image shape. The techniques include contrast enhancement layers (CEL), scanning optical beams, and exposures with different masks. In one embodiment the process of forming a pattern comprises the steps of providing a substrate having a photosensitive coating, exposing the center area of the pattern on the photosensitive coating with one mask, and exposing ends of the pattern on the photosensitive coating without exposing the center area with a second mask. The second exposure overlaps the first exposure and may extend beyond the pattern but the second dose is much lower than the first dose.

    摘要翻译: 通过选择性地提供曝光以校正诸如缩短,拐角舍入,嵌套到隔离印刷偏移,特征尺寸依赖偏置和半导体处理中的其他图像偏移的效果来增强精细特征光刻。 这些结果通过增加特定图像的关键区域(例如线端和角)的局部曝光剂量来实现。 一般过程包括将曝光剂量定制为位置的函数以实现期望的最终图像形状的技术。 这些技术包括对比度增强层(CEL),扫描光束和具有不同掩模的曝光。 在一个实施方案中,形成图案的方法包括以下步骤:提供具有感光涂层的基底,用一个掩模曝光在感光涂层上的图案的中心区域,以及将图案的端部暴露在感光涂层上,而不暴露中心 区域与第二个掩模。 第二次暴露与第一次暴露重叠,并且可能延伸超出模式,但是第二次剂量比第一次剂量低得多。

    Ambulatory aid and method for providing ambulartory aid
    5.
    发明申请
    Ambulatory aid and method for providing ambulartory aid 失效
    提供救护援助和提供救护的方法

    公开(公告)号:US20050182346A1

    公开(公告)日:2005-08-18

    申请号:US11057610

    申请日:2005-02-14

    申请人: Daniel Cole

    发明人: Daniel Cole

    IPC分类号: A61F5/01 A61F2/48 A61F5/00

    CPC分类号: A61F5/0102

    摘要: A device including an elastic member and means for connecting the ends of it to a person so that the elastic strip is operable, when the person's leg is straight or nearly straight, to exert a force that tends to bend the leg at the knee and hip is disclosed. The device assists someone using the device to achieve a safe and adequate lift of his or her legs during the swing phase of the gait cycle. Prolonged use of the device has been observed to cause a person, when later walking without the device, to exhibit better leg lift during the swing phase of the gait cycle than that person did before using the device. The elastic strip can be connected at one end to a shoe insert and, at the other end, to a belt.

    摘要翻译: 一种包括弹性构件的装置和用于将其端部连接到人的装置,使得当人的腿是直的或几乎直的时,弹性条可操作地施加倾向于使膝盖和臀部的腿弯曲的力 被披露。 该装置帮助使用该装置的人在步态循环的摆动阶段期间实现他或她的腿的安全和适当的提升。 已经观察到长时间使用该装置导致一个人,当后来在没有装置的情况下行走时,在步态循环的摆动阶段比在使用该装置之前表现出更好的腿部提升。 弹性条可以在一端连接到鞋子插入件,另一端连接到皮带上。

    Optical Proximity Correction Structures Having Decoupling Capacitors
    6.
    发明授权
    Optical Proximity Correction Structures Having Decoupling Capacitors 失效
    具有去耦电容器的光学接近校正结构

    公开(公告)号:US06429469B1

    公开(公告)日:2002-08-06

    申请号:US09705031

    申请日:2000-11-02

    IPC分类号: H01L2710

    CPC分类号: H01L27/0629

    摘要: A structure for a semiconductor chip which includes a first region having first cells for storing and processing data, and a second region outside the first region having OPC structures, wherein the OPC structures comprise decoupling capacitors. The line widths of the active gates of first cells are the same size or similar in size as the OPC structures. The OPC structures reduce proximity effects of active devices in the first cells, and comprise N-type FETs and P-type FETs, that are located in the second region. The OPC structures may have a width greater than the first cells. The second region can be multiple OPC structures, whereby the second region comprises multiple decoupling capacitors. The active devices in the first cells are separated by a first distance and the OPC structures are separated from the active devices by the first distance.

    摘要翻译: 一种用于半导体芯片的结构,其包括具有用于存储和处理数据的第一单元的第一区域,以及具有OPC结构的第一区域之外的第二区域,其中OPC结构包括去耦电容器。 第一单元的有源栅极的线宽与OPC结构尺寸相同或相似。 OPC结构减少了第一单元中的有源器件的邻近效应,并且包括位于第二区域中的N型FET和P型FET。 OPC结构可以具有大于第一单元的宽度。 第二区域可以是多个OPC结构,由此第二区域包括多个去耦电容器。 第一单元中的有源器件被隔开第一距离,并且OPC结构与有源器件分开第一距离。

    Serif mask design methodology based on enhancing high spatial frequency contribution for improved printability
    7.
    发明授权
    Serif mask design methodology based on enhancing high spatial frequency contribution for improved printability 失效
    基于增强高空间频率贡献以提高可印刷性的Serif掩模设计方法

    公开(公告)号:US06214494B1

    公开(公告)日:2001-04-10

    申请号:US09167948

    申请日:1998-10-07

    IPC分类号: G03F900

    CPC分类号: G03F7/70441 G03F1/36

    摘要: A proximity correction serif design methodology is described that provides improved inner and outer corner rounding, line end shortening, as well as improvements in more general undesirable two-dimensional shape distortions introduced into the lithographic printing process due to proximity effects. Using this method, exact solutions are shown for the specialized cases of either coherent or incoherent illumination exposing a hypothetical resist that develops via a simple diffusion like mechanism. The basis of this method for predicting the positions and shapes of serifs is tied to the need to increase the components of high spatial frequency that are essentially lost due to diffraction, diffusion, dissolution, and etching related effects. The correct amount to increase the spatial components is determined in the coordinate space and makes use of an empirical characterization of these physical factors.

    摘要翻译: 描述了接近校正衬线设计方法,其提供改进的内角和外角圆角,线端缩短,以及由于邻近效应而被引入到平版印刷工艺中的更一般的不期望的二维形状变形的改进。 使用这种方法,对于相干或非相干照明的特殊情况,显示了明确的解决方案,暴露了通过简单的扩散机制发展的假想抗蚀剂。 用于预测衬线的位置和形状的这种方法的基础与增加基本上由于衍射,扩散,溶解和蚀刻相关效应而损失的高空间频率的分量的需要相关联。 在坐标空间中确定增加空间分量的正确数量,并利用这些物理因素的经验表征。