公开(公告)号：US08405815B2

公开(公告)日：2013-03-26

申请号：US12795091

申请日：2010-06-07

申请人： Danny Maria Hubertus Philips ,  Daniel Jozef Maria Direcks ,  Maikel Adrianus Cornelis Schepers ,  Paul Petrus Joannes Berkvens

发明人： Danny Maria Hubertus Philips ,  Daniel Jozef Maria Direcks ,  Maikel Adrianus Cornelis Schepers ,  Paul Petrus Joannes Berkvens

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  Y10T137/8593

摘要： A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. A first portion of an undersurface of the fluid handling structure, in use, is a different distance from the facing surface than a second portion of the undersurface. Further, the first portion has defined in it a supply opening configured to supply liquid toward the facing surface, and an extraction opening configured to remove fluid from between the fluid handling structure and the facing surface.

摘要翻译： 公开了一种流体处理结构，其被配置为将浸没液体供应并限制在限定在投影系统和面向流体处理结构的面对表面之间的空间中。 在使用中，流体处理结构的下表面的第一部分与面向下表面的第二部分的距离与面对表面不同。 此外，第一部分在其中限定了供给开口，其构造成朝向相对表面供应液体;以及提取开口，构造成从流体处理结构和面对表面之间移除流体。

公开(公告)号：US08421993B2

公开(公告)日：2013-04-16

申请号：US12437433

申请日：2009-05-07

申请人： Daniel Jozef Maria Direcks ,  Danny Maria Hubertus Philips ,  Clemens Johannes Gerardus Van Den Dungen ,  Maikel Adrianus Cornelis Schepers ,  Paul Petrus Joannes Berkvens ,  Koen Steffens ,  Arnold Jan Van Putten

发明人： Daniel Jozef Maria Direcks ,  Danny Maria Hubertus Philips ,  Clemens Johannes Gerardus Van Den Dungen ,  Maikel Adrianus Cornelis Schepers ,  Paul Petrus Joannes Berkvens ,  Koen Steffens ,  Arnold Jan Van Putten

IPC分类号： G03B27/52

CPC分类号： G03B27/52 ,  G03F7/70341

摘要： A fluid handling structure is disclosed in which the size and arrangement of the fluid extraction openings is specified in order to reduce the vibrations which are transmitted to the fluid handling structure as a result of two-phase extraction. The area of each fluid extraction opening and/or the total area of all of the fluid extraction openings and/or the space in between neighboring fluid extraction openings may be controlled. The reduction in vibrations increases the accuracy of the exposure.

摘要翻译： 公开了一种流体处理结构，其中指定了流体提取开口的尺寸和布置，以便减少由于两相抽取而被传送到流体处理结构的振动。 可以控制每个流体提取开口的面积和/或所有流体提取开口的总面积和/或相邻流体提取开口之间的空间。 振动的减少增加了曝光的准确性。

公开(公告)号：US08638417B2

公开(公告)日：2014-01-28

申请号：US13085069

申请日：2011-04-12

申请人： Danny Maria Hubertus Philips ,  Daniel Jozef Maria Direcks ,  Clemens Johannes Gerardus Van Den Dungen ,  Maikel Adrianus Cornelis Schepers ,  Paul Petrus Joannes Berkvens ,  Marcus Johannes Van Der Zanden ,  Pieter Mulder

发明人： Danny Maria Hubertus Philips ,  Daniel Jozef Maria Direcks ,  Clemens Johannes Gerardus Van Den Dungen ,  Maikel Adrianus Cornelis Schepers ,  Paul Petrus Joannes Berkvens ,  Marcus Johannes Van Der Zanden ,  Pieter Mulder

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70341 ,  Y10T137/86292

摘要： A fluid handling structure configured to supply immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. An undersurface of the fluid handling structure has a supply opening configured to supply fluid toward the facing surface, a plurality of extraction openings configured to remove fluid from between the fluid handling structure and the facing surface, and a protrusion between the supply opening and the extraction openings.

摘要翻译： 公开了一种流体处理结构，其被配置为将浸没液体供应到在投影系统和面向流体处理结构的相对表面之间限定的空间中。 流体处理结构的下表面具有供给开口，其构造成朝向相对表面供应流体;多个提取开口，其构造成从流体处理结构和相对表面之间移除流体;以及在供给开口和提取物之间的突起 开口

公开(公告)号：US20100060868A1

公开(公告)日：2010-03-11

申请号：US12550481

申请日：2009-08-31

申请人： Gheorghe Tanasa ,  Nicolaas Ten Kate ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Danny Maria Hubertus Philips ,  Maikel Adrianus Cornelis Schepers ,  Laurentius Johannes Adrianus Van Bokhoven

发明人： Gheorghe Tanasa ,  Nicolaas Ten Kate ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Danny Maria Hubertus Philips ,  Maikel Adrianus Cornelis Schepers ,  Laurentius Johannes Adrianus Van Bokhoven

IPC分类号： G03B27/42 ,  F17D1/00 ,  G03B27/52

CPC分类号： G03F7/70341 ,  Y10T137/87169

摘要： A fluid handling structure is disclosed which is designed for all wet immersion lithography. The fluid handling structure has a first opening to provide fluid to a space between a final element of a projection system and a substrate and/or substrate table, a barrier to resist the flow of liquid out of the space between the fluid handling structure and the substrate, and a second opening, which opens into an area radially outwardly of the space, to provide a flow of fluid from the fluid handling structure onto a top surface of the substrate and/or substrate table radially outwardly of the space. A controller may be provided such that flow of fluid towards a center of the substrate table is greater than the flow of fluid in a direction away from the center of the substrate table.

摘要翻译： 公开了一种流体处理结构，其被设计用于所有湿式浸渍光刻。 流体处理结构具有第一开口以将流体提供到投影系统的最终元件与基板和/或基板台之间的空间，阻挡液体流出流体处理结构和流体处理结构之间的空间的屏障 基板和第二开口，该第二开口通向该空间的径向外侧的区域，以将流体从流体处理结构提供到该空间的径向向外的基板和/或基板台的顶表面上。 可以设置控制器，使得朝向衬底台的中心的流体流大于离开衬底台的中心的方向的流体流动。

公开(公告)号：US09383654B2

公开(公告)日：2016-07-05

申请号：US12506565

申请日：2009-07-21

申请人： Daniel Jozef Maria Direcks ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Rudolf Kemper ,  Danny Maria Hubertus Philips ,  Michel Riepen ,  Clemens Johannes Gerardus Van Den Dungen ,  Adrianes Johannes Baeten ,  Fabrizio Evangelista

发明人： Daniel Jozef Maria Direcks ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Rudolf Kemper ,  Danny Maria Hubertus Philips ,  Michel Riepen ,  Clemens Johannes Gerardus Van Den Dungen ,  Adrianes Johannes Baeten ,  Fabrizio Evangelista

IPC分类号： G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/70991

摘要： A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table. The substrate table is configured to support the substrate. Outward of the line of openings is a damper. The damper may have a width that varies along the line of openings. The damper width is defined between the line of openings and an opposing damper edge.

摘要翻译： 公开了一种用于光刻设备的流体处理结构。 流体处理结构具有以平面方式排成一行的多个开口。 流体处理结构被配置为使得开口在使用中朝向相对表面定向，面对表面是基底和/或基底台。 衬底台被配置为支撑衬底。 开口线的外侧是阻尼器。 阻尼器可以具有沿着开口线变化的宽度。 阻尼器宽度限定在开口线和相对的阻尼器边缘之间。

公开(公告)号：US20090279063A1

公开(公告)日：2009-11-12

申请号：US12437466

申请日：2009-05-07

申请人： Michel Riepen ,  Nicolaas Rudolf Kemper ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Daniel Jozef Maria Direcks ,  Danny Maria Hubertus Philips ,  Arnold Jan Van Putten

发明人： Michel Riepen ,  Nicolaas Rudolf Kemper ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Daniel Jozef Maria Direcks ,  Danny Maria Hubertus Philips ,  Arnold Jan Van Putten

IPC分类号： G03B27/52

CPC分类号： G03B27/52 ,  G03F7/70341 ,  G03F7/70916

摘要： An immersion lithographic apparatus is described in which a liquid removal device is arranged to remove liquid from the substrate, e.g. during exposures, through a plurality of elongate slots arranged along a line and angled to that line. The liquid removal device may act as a meniscus pinning device in an immersion hood or may be used in a drying device to remove a droplet from the substrate.

摘要翻译： 描述了一种浸没式光刻设备，其中液体去除装置被布置成从基板除去液体，例如， 在曝光期间，通过沿着一条线布置并与该线成角度的多个细长槽。 液体移除装置可以用作浸没罩中的弯月面钉扎装置，或者可以用于干燥装置中以从基底去除液滴。

公开(公告)号：US08351018B2

公开(公告)日：2013-01-08

申请号：US12436626

申请日：2009-05-06

申请人： Daniel Jozef Maria Direcks ,  Danny Maria Hubertus Philips ,  Clemens Johannes Gerardus Van Den Dungen ,  Koen Steffens ,  Arnold Jan Van Putten

发明人： Daniel Jozef Maria Direcks ,  Danny Maria Hubertus Philips ,  Clemens Johannes Gerardus Van Den Dungen ,  Koen Steffens ,  Arnold Jan Van Putten

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  Y10T29/49401 ,  Y10T137/8593

摘要： A fluid handling structure is disclosed in which measures are taken to increase the speed at which meniscus breakdown occurs. Measures include the shape of a plurality of fluid extraction openings and the shape and density of a plurality of fluid supply openings in the fluid handling structure.

摘要翻译： 公开了一种流体处理结构，其中采取措施来提高发生弯月面破裂的速度。 措施包括多个流体提取开口的形状以及流体处理结构中的多个流体供应开口的形状和密度。

公开(公告)号：US20100085545A1

公开(公告)日：2010-04-08

申请号：US12506565

申请日：2009-07-21

申请人： Daniel Jozef Maria DIRECKS ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Rudolf Kemper ,  Danny Maria Hubertus Philips ,  Michel Riepen ,  Clemens Johannes Gerardus Van Den Dungen ,  Adrianes Johannes Baeten ,  Fabrizio Evangelista

发明人： Daniel Jozef Maria DIRECKS ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Rudolf Kemper ,  Danny Maria Hubertus Philips ,  Michel Riepen ,  Clemens Johannes Gerardus Van Den Dungen ,  Adrianes Johannes Baeten ,  Fabrizio Evangelista

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70991

摘要： A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table. The substrate table is configured to support the substrate. Outward of the line of openings is a damper. The damper may have a width that varies along the line of openings. The damper width is defined between the line of openings and an opposing damper edge.

摘要翻译： 公开了一种用于光刻设备的流体处理结构。 流体处理结构具有以平面方式排成一行的多个开口。 流体处理结构被配置为使得开口在使用中朝向相对表面定向，面对表面是基底和/或基底台。 衬底台被配置为支撑衬底。 开口线的外侧是阻尼器。 阻尼器可以具有沿着开口线变化的宽度。 阻尼器宽度限定在开口线和相对的阻尼器边缘之间。

公开(公告)号：US08345218B2

公开(公告)日：2013-01-01

申请号：US12437466

申请日：2009-05-07

申请人： Michel Riepen ,  Nicolaas Rudolf Kemper ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Daniel Jozef Maria Direcks ,  Danny Maria Hubertus Philips ,  Arnold Jan Van Putten

发明人： Michel Riepen ,  Nicolaas Rudolf Kemper ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Daniel Jozef Maria Direcks ,  Danny Maria Hubertus Philips ,  Arnold Jan Van Putten

IPC分类号： G03B27/52

CPC分类号： G03B27/52 ,  G03F7/70341 ,  G03F7/70916

摘要： An immersion lithographic apparatus is described in which a liquid removal device is arranged to remove liquid from the substrate, e.g. during exposures, through a plurality of elongate slots arranged along a line and angled to that line. The liquid removal device may act as a meniscus pinning device in an immersion hood or may be used in a drying device to remove a droplet from the substrate.

摘要翻译： 描述了一种浸没式光刻设备，其中液体去除装置被布置成从基板除去液体，例如， 在曝光期间，通过沿着一条线布置并与该线成角度的多个细长槽。 液体移除装置可以用作浸没罩中的弯月面钉扎装置，或者可以用于干燥装置中以从基底去除液滴。

公开(公告)号：US20090237632A1

公开(公告)日：2009-09-24

申请号：US12408392

申请日：2009-03-20

申请人： Daniel Jozef Maria Direcks ,  Nicolaas Rudolf Kemper ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Danny Maria Hubertus Philips ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Marcus Johannes Van Der Zanden ,  Pieter Mulder

发明人： Daniel Jozef Maria Direcks ,  Nicolaas Rudolf Kemper ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Danny Maria Hubertus Philips ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Marcus Johannes Van Der Zanden ,  Pieter Mulder

IPC分类号： G03B27/52

CPC分类号： G03B27/52 ,  G03F7/70341

摘要： An immersion lithographic apparatus is described in which a droplet removal device removes droplets from the substrate, e.g. during exposures, using an angled flow of gas from a gas knife.

摘要翻译： 描述了一种浸没式光刻设备，其中液滴去除装置从基板去除液滴。 在曝光期间，使用来自气刀的倾斜流动的气体。