摘要:
A method and system for providing a homogeneous processing environment in a high pressure processing system is described. A high pressure fluid and a process chemistry are mixed in a pre-mixing system prior to exposure with the fluid in a supercritical state of a substrate in the high pressure processing system. For example, the pre-mixing system can include a fluid circulation system configured to bypass the high pressure processing system until the high pressure fluid and the process chemistry are mixed. Alternatively, the pre-mixing system can include a mixing chamber, and optionally include means for agitating the high pressure fluid and process chemistry in the mixing chamber.
摘要:
A system for cooling the bearings and motor in a pump assembly used for circulating supercritical fluid is disclosed. The system uses a pressurized coolant fluid that can be substantially pure CO2. The pressure difference between the circulating supercritical fluid and the coolant fluid is minimized to prevent cross-contamination of the fluids. In addition, the coolant fluid can provide a small amount of bearing lubrication.
摘要:
A substrate processing apparatus include a spin chuck capable of holding a semiconductor wafer in a horizontal position, a drive motor for driving the spin chuck for rotation, and a processing vessel accommodating the spin chuck and the drive motor 50 therein and capable of sealing a supercritical fluid, such as supercritical carbon dioxide, therein. The supercritical fluid flows along the upper and the lower surface of the semiconductor wafer at velocities relative to the upper and the lower surface of the semiconductor wafer as the spin chuck holding the semiconductor wafer in a horizontal position rotates to remove contaminants including particles and adhering to the semiconductor wafer from the semiconductor wafer.
摘要:
A system for cooling the bearings and motor in a pump assembly used for circulating supercritical fluid is disclosed. The system uses a pressurized coolant fluid that can be substantially pure CO2. The pressure difference between the circulating supercritical fluid and the coolant fluid is minimized to prevent cross-contamination of the fluids. In addition, the coolant fluid can provide a small amount of bearing lubrication.
摘要:
An apparatus for use in providing a fluid at a predetermined temperature is disclosed. The apparatus comprises: means for supplying a first quantity of a fluid at a first temperature; means for supplying a second quantity of a fluid at a second temperature; and flow-control means for controlling a ratio of the first quantity of the fluid to the second quantity of the fluid for forming a mixed fluid, wherein the ratio is determined in response to a measured temperature of the mixed fluid.
摘要:
A processing system utilizing a supercritical fluid for treating a substrate is described as having a pump for recirculating the supercritical fluid over the substrate. For various applications in supercritical fluid processing, the fluid temperature for the treatment process can elevate above the temperature acceptable for safe operation of the pump. Therefore, in accordance with one embodiment, a fraction of supercritical fluid from the primary recirculating flow of supercritical fluid over the substrate is circulated from the pressure side of the pump, through a heat exchanger to lower the temperature of the supercritical fluid, through the pump, and it is returned to the primary flow on the suction side of the pump. In accordance with yet another embodiment, supercritical fluid is circulated through the pump from an independent source to vent.
摘要:
A method and system is described for treating a substrate with a high pressure fluid, such as carbon dioxide in a supercritical state. A process chemistry is introduced to the high pressure fluid for treating the substrate surface. The process chemistry includes a peroxide-based chemistry.
摘要:
A processing system utilizing a supercritical fluid for treating a substrate is described as having a pump for recirculating the supercritical fluid over the substrate. For various applications in supercritical fluid processing, the fluid temperature for the treatment process can elevate above the temperature acceptable for safe operation of the pump. Therefore, in accordance with one embodiment, a fraction of supercritical fluid from the primary recirculating flow of supercritical fluid over the substrate is circulated from the pressure side of the pump, through a heat exchanger to lower the temperature of the supercritical fluid, through the pump, and it is returned to the primary flow on the suction side of the pump. In accordance with yet another embodiment, supercritical fluid is circulated through the pump from an independent source to vent.