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94 条记录 (耗时 0.029 秒)

    Method of and apparatus for modifying polarity of light
    1.
    发明授权
    Method of and apparatus for modifying polarity of light 失效
    修改光的极性的方法和装置

    公开(公告)号：US07760431B2

    公开(公告)日：2010-07-20

    申请号：US11123562

    申请日：2005-05-05

    申请人： David L. Williams ,  Michael Goldstein ,  James P. Kardach

    发明人： David L. Williams ,  Michael Goldstein ,  James P. Kardach

    IPC分类号： G02B27/28

    CPC分类号： G02B27/286

    摘要： A method of modifying polarity of light is provided. The light propagates through a first transverse plane and has known polarization states in respective cells of the first transverse plane. A first retardation compensator having respective waveplates matching the cells then changes the polarity of the light so that light propagating through a second transverse plane is circularly polarized across the entire second transverse plane. A second retardation compensator includes a plurality of quarter waveplates that change the polarization of the circularly polarized light, so that light passing through a third transverse plane is linearly polarized. The crystal alignment of the quarter waveplates and their shape and configuration are selected so that the direction of the polarization is normal to a radius from a single point.

    摘要翻译： 提供了改变光的极性的方法。 光通过第一横向平面传播并且在第一横向平面的相应单元中具有已知的偏振状态。 具有与单元匹配的各个波片的第一延迟补偿器然后改变光的极性，使得通过第二横向平面传播的光在整个第二横向平面上被圆偏振。 第二延迟补偿器包括改变圆偏振光的偏振的多个四分之一波片，使得穿过第三横向平面的光线性偏振。 选择四分之一波片的晶体对准及其形状和结构，使得偏振方向垂直于单个点的半径。

    Superconductor-based modulator for extreme ultraviolet (EUV)
    2.
    发明授权
    Superconductor-based modulator for extreme ultraviolet (EUV) 有权

    公开(公告)号：US07253939B2

    公开(公告)日：2007-08-07

    申请号：US11241588

    申请日：2005-09-30

    申请人： David L. Williams ,  Michael Goldstein

    发明人： David L. Williams ,  Michael Goldstein

    IPC分类号： G02B26/00

    CPC分类号： G21K1/06 ,  G03F7/70291 ,  G03F7/7055

    摘要： A superconductor-based modulator includes a superconductor coupled to a cold reservoir to receive extreme ultra-violet (EUV) light beams. The light beams are modulated by altering transmission and reflection properties of the superconductor. Magnetic field, temperature, or a combination of both, may be used to control the superconducting properties of the superconductor. The modulator may perform temporal, spatial, and grey-scale modulations. The surface of the superconductor may be patterned with heat or infrared radiation to facilitate light focusing.

    Method and apparatus for polarizing electromagnetic radiation
    3.
    发明授权
    Method and apparatus for polarizing electromagnetic radiation 有权
    用于偏振电磁辐射的方法和装置

    公开(公告)号：US07199936B2

    公开(公告)日：2007-04-03

    申请号：US11386496

    申请日：2006-03-21

    申请人： David L. Williams ,  James Kardach ,  Michael Goldstein

    发明人： David L. Williams ,  James Kardach ,  Michael Goldstein

    IPC分类号： G02B27/14 ,  G02B27/10 ,  G02B27/28 ,  G03B27/54

    CPC分类号： G02B27/286 ,  G02B27/283 ,  G02F1/0136 ,  G02F1/09 ,  G03F7/70058 ,  G03F7/7055 ,  G03F7/70566

    摘要： According to one aspect of the invention, a method and apparatus for polarizing electromagnetic radiation is provided. The electromagnetic radiation may be divided into first and second portions, substantially all of the first portion may be linearly polarized in a first direction and substantially all of the second portion may be linearly polarized in a second direction, the first direction being substantially orthogonal to the second direction. The linear polarization of at least one of the first and second portions may be changed such that substantially all of both of the first and second portions are linearly polarized in a third direction. At least one of the first and second portions may be redirected such that substantially all of both the first and second portions are propagating in a fourth direction.

    摘要翻译： 根据本发明的一个方面，提供了一种用于偏振电磁辐射的方法和装置。 电磁辐射可以被分成第一和第二部分，基本上所有的第一部分可以在第一方向上线性偏振，并且基本上所有的第二部分可以在第二方向上线性偏振，第一方向基本上与 第二个方向 可以改变第一和第二部分中的至少一个的线性极化，使得第一和第二部分的基本上全部都在第三方向上线性偏振。 第一部分和第二部分中的至少一个可以被重定向，使得第一部分和第二部分基本上全部都在第四方向上传播。

    Composite metal films and carbon nanotube fabrication
    6.
    发明申请
    Composite metal films and carbon nanotube fabrication 有权
    复合金属薄膜和碳纳米管制作

    公开(公告)号：US20070196575A1

    公开(公告)日：2007-08-23

    申请号：US11359165

    申请日：2006-02-21

    申请人： Juan Dominguez ,  Valery Dubin ,  Florian Gstrein ,  Michael Goldstein

    发明人： Juan Dominguez ,  Valery Dubin ,  Florian Gstrein ,  Michael Goldstein

    IPC分类号： C23C16/00 ,  C01B31/02

    CPC分类号： B82Y40/00 ,  B82Y30/00 ,  C01B32/162 ,  Y10S977/742

    摘要： Embodiments of the present invention provide methods for the fabrication of carbon nanotubes using composite metal films. A composite metal film is fabricated to provide uniform catalytic sites to facilitate the uniform growth of carbon nanotubes. Further embodiments provide embedded nanoparticles for carbon nanotube fabrication. Embodiments of the invention are capable of maintaining the integrity of the catalytic sites at temperatures used in carbon nanotube fabrication processes, 600 to 1100° C.

    摘要翻译： 本发明的实施例提供了使用复合金属膜制造碳纳米管的方法。 制造复合金属膜以提供均匀的催化位点以促进碳纳米管的均匀生长。 另外的实施方案提供用于碳纳米管制造的嵌入式纳米颗粒。 本发明的实施方案能够在碳纳米管制造工艺中使用的温度下维持催化部位的完整性，其温度为600至1100℃

    Compensation of reflective mask effects in lithography systems
    8.
    发明授权
    Compensation of reflective mask effects in lithography systems 失效
    光刻系统中反射掩模效应的补偿

    公开(公告)号：US07022443B2

    公开(公告)日：2006-04-04

    申请号：US10366583

    申请日：2003-02-12

    申请人： Manish Chandhok ,  Michael Goldstein

    发明人： Manish Chandhok ,  Michael Goldstein

    IPC分类号： G03F7/20

    CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F7/70283 ,  G03F7/70425 ,  G03F7/706

    摘要： Aberrations may be introduced in mirror surfaces used in a lithography system utilizing a reflective mask to compensate for adverse optical effects associated with reflective masks. A spherical aberration may be introduced to compensate for a shift in the location of best focus. A coma aberration may be introduced to compensate for a pattern shift.

    摘要翻译： 可以在使用反射掩模的光刻系统中使用的镜面中引入像差，以补偿与反射掩模相关的不利的光学效应。 可以引入球面像差以补偿最佳聚焦位置的偏移。 可以引入彗形像差以补偿图案偏移。