Conformal coating of highly structured surfaces
    1.
    发明授权
    Conformal coating of highly structured surfaces 有权
    高度结构化表面的保形涂层

    公开(公告)号:US08329502B2

    公开(公告)日:2012-12-11

    申请号:US12904959

    申请日:2010-10-14

    IPC分类号: H01L23/532 H01L21/283

    摘要: Method of applying a conformal coating to a highly structured substrate and devices made by the disclosed methods are disclosed. An example method includes the deposition of a substantially contiguous layer of a material upon a highly structured surface within a deposition process chamber. The highly structured surface may be associated with a substrate or another layer deposited on a substrate. The method includes depositing a material having an amorphous structure on the highly structured surface at a deposition pressure of equal to or less than about 3 mTorr. The method may also include removing a portion of the amorphous material deposited on selected surfaces and depositing additional amorphous material on the highly structured surface.

    摘要翻译: 公开了将共形涂层施加到高度结构化的衬底上的方法和通过公开的方法制造的器件。 一种示例性方法包括将沉积处理室内的高度结构化表面的基本上邻接的材料层沉积。 高度结构化的表面可以与沉积在基底上的基底或另一层相关联。 该方法包括以等于或小于约3mTorr的沉积压力将具有非晶结构的材料沉积在高度结构化的表面上。 该方法还可以包括去除沉积在选定表面上的非晶材料的一部分,并在高度结构化的表面上沉积额外的无定形材料。

    CONFORMAL COATING OF HIGHLY STRUCTURED SURFACES
    2.
    发明申请
    CONFORMAL COATING OF HIGHLY STRUCTURED SURFACES 有权
    高结构表面的合适涂层

    公开(公告)号:US20120091586A1

    公开(公告)日:2012-04-19

    申请号:US12904959

    申请日:2010-10-14

    IPC分类号: H01L23/532 H01L21/283

    摘要: Method of applying a conformal coating to a highly structured substrate and devices made by the disclosed methods are disclosed. An example method includes the deposition of a substantially contiguous layer of a material upon a highly structured surface within a deposition process chamber. The highly structured surface may be associated with a substrate or another layer deposited on a substrate. The method includes depositing a material having an amorphous structure on the highly structured surface at a deposition pressure of equal to or less than about 3 mTorr. The method may also include removing a portion of the amorphous material deposited on selected surfaces and depositing additional amorphous material on the highly structured surface.

    摘要翻译: 公开了将共形涂层施加到高度结构化的衬底上的方法和通过公开的方法制造的器件。 一种示例性方法包括将沉积处理室内的高度结构化表面的基本上邻接的材料层沉积。 高度结构化的表面可以与沉积在基底上的基底或另一层相关联。 该方法包括以等于或小于约3mTorr的沉积压力将具有非晶结构的材料沉积在高度结构化的表面上。 该方法还可以包括去除沉积在选定表面上的非晶材料的一部分,并在高度结构化的表面上沉积额外的无定形材料。

    Metal-doped single-walled carbon nanotubes and production thereof
    7.
    发明授权
    Metal-doped single-walled carbon nanotubes and production thereof 失效
    金属掺杂单壁碳纳米管及其制备

    公开(公告)号:US07160530B2

    公开(公告)日:2007-01-09

    申请号:US10416218

    申请日:2002-04-04

    IPC分类号: D01F9/12

    摘要: Metal-doped single-walled carbon nanotubes and production thereof. The metal-doped single-walled carbon nanotubes may be produced according to one embodiment of the invention by combining single-walled carbon nanotube precursor material and metal in a solution, and mixing the solution to incorporate at least a portion of the metal with the single-walled carbon nanotube precursor material. Other embodiments may comprise sputter deposition, evaporation, and other mixing techniques.

    摘要翻译: 金属掺杂单壁碳纳米管及其制备。 金属掺杂的单壁碳纳米管可以根据本发明的一个实施方案通过将单壁碳纳米管前体材料和金属在溶液中组合来制备,并将该溶液混合以将至少一部分金属与单一的 壁碳纳米管前体材料。 其他实施方案可以包括溅射沉积,蒸发和其它混合技术。