公开(公告)号：US20080074665A1

公开(公告)日：2008-03-27

申请号：US11945058

申请日：2007-11-26

Applicant: Boaz BRILL ,  Moshe Finarov ,  David Scheiner

Inventor： Boaz BRILL ,  Moshe Finarov ,  David Scheiner

IPC: G01B11/00 ,  G01N21/84

CPC classification number: G03F7/70633 ,  G01B11/14 ,  G01B11/27 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/956 ,  H01L22/12

Abstract: Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements include at least two measurements with different polarization states of incident light, each measurement including illuminating the measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between the diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.

Abstract translation: 通过对样品中的测量部位进行光学测量来控制多层样品的制造过程中层的对准。 测量部位包括两个分别位于两个不同层之间的衍射结构。 光学测量包括具有不同入射光偏振态的至少两次测量，每个测量包括照亮测量位置，以便通过另一个照射衍射结构之一。 测量部位的衍射特性表示衍射结构之间的横向偏移。 对入射光的不同极化状态分析检测的衍射特性，以确定层之间现有的横向偏移。

公开(公告)号：US20060001883A1

公开(公告)日：2006-01-05

申请号：US10525568

申请日：2003-05-08

Applicant: Boaz Brill ,  Moshe Finarov ,  David Scheiner

Inventor： Boaz Brill ,  Moshe Finarov ,  David Scheiner

IPC: G01N21/55

CPC classification number: G01N21/55

Abstract: An optical system for use in measurements in a sample comprising a light source (102) operable to produce an incident light beam propagating in a certain direction towards the sample (S) through an illumination channel (IC), a detector unit (104) for collecting light coming from the sample through a detection channel (DC), and generating data indicative of the collected light, a light directing assembly (106) operable to direct the incident beam onto a certain location on the sample's plane with a plurality of incident angles, and to direct light returned from the illuminated location to the detector unit (104), the light directing assembly (106) comprising a plurality of beam deflector elements (108 A-D), at least one of the deflector elements being movable and position of said at least one movable deflector element defining one of the selected incident angles.

Abstract translation: 一种用于样品测量的光学系统，包括可操作以产生通过照明通道（IC）向特定方向向样品（S）传播的入射光束的光源（102），用于 收集来自样品的光通过检测通道（DC）并产生指示所收集的光的数据;导光组件（106），其可操作以将入射光束以多个入射角度引导到样品平面上的特定位置 ，并且将从所述照明位置返回的光引导到所述检测器单元（104），所述光引导组件（106）包括多个光束偏转元件（108AD），所述偏转元件中的至少一个可移动并且所述 限定所选入射角中的一个的至少一个可移动偏转元件。

公开(公告)号：US20110089348A1

公开(公告)日：2011-04-21

申请号：US12966595

申请日：2010-12-13

Applicant: Moshe Finarov ,  David Scheiner ,  Yoav Lishzinker ,  On Haran

Inventor： Moshe Finarov ,  David Scheiner ,  Yoav Lishzinker ,  On Haran

IPC: G01N21/86

CPC classification number: G01N21/31 ,  G01N21/6489 ,  G01N21/65 ,  G01N21/8422 ,  G01N21/8901 ,  G01N21/9501 ,  G01N2021/3568 ,  G01N2021/8908 ,  G01N2201/0826 ,  G01N2201/0833 ,  G01N2201/1085

Abstract: Photovoltaic thin film quality control is obtained where the thin film is supported by a support and a section of the film is illuminated by a polychromatic or monochromatic illumination source. The illumination is positioned in certain locations including locations where the layer stack includes a reduced number of thin film layers. Such locations may be discrete sampled points located within scribe lines, contact frames or dedicated measurement targets. The light collected from such discrete sampled points is transferred to a photo-sensitive sensor through an optical switch. The spectral signal of the light reflected, transmitted or scattered by the sampled points is collected by the sensor and processed by a controller in such a way that parameters of simplified stacks are used for accurate determination of desired parameters of the full cell stack. In this way the photovoltaic thin film parameters applicable to the quality control are derived e.g. thin film thickness, index of refraction, extinction coefficient, absorption coefficient, energy gap, conductivity, crystallinity, surface roughness, crystal phase, material composition and photoluminescence spectrum and intensity. Manufacturing equipment parameters influencing the material properties may be changed to provide a uniform thin film layer with pre-defined properties.

Abstract translation: 获得光电薄膜质量控制，其中薄膜由支撑体支撑并且膜的一部分被多色或单色照明源照射。 照明被定位在某些位置，包括层堆叠减少数量的薄膜层的位置。 这些位置可以是位于划线，接触框架或专用测量目标内的离散采样点。 从这些离散采样点收集的光通过光学开关传送到光敏传感器。 由采样点反射，传播或散射的光的光谱信号由传感器收集并由控制器进行处理，使得简化堆栈的参数用于精确确定全单元堆栈的期望参数。 以这种方式，可以使用适用于质量控制的光伏薄膜参数。 薄膜厚度，折射率，消光系数，吸收系数，能隙，导电率，结晶度，表面粗糙度，结晶相，材料组成和光致发光光谱和强度。 可以改变影响材料性能的制造设备参数，以提供具有预定特性的均匀薄膜层。

公开(公告)号：US06801326B2

公开(公告)日：2004-10-05

申请号：US09942849

申请日：2001-08-31

Applicant: Moshe Finarov ,  David Scheiner ,  Avi Ravid

Inventor： Moshe Finarov ,  David Scheiner ,  Avi Ravid

IPC: G01B1106

CPC classification number: H01L22/34 ,  B24B37/013 ,  B24B49/02 ,  B24B49/12 ,  H01L21/67253 ,  H01L22/12 ,  H01L22/26

Abstract: A method is presented for optical control of the quality of a process of chemical mechanical planarization (CMP) performed by a polishing tool applied to an article having a patterned area. The article contains a plurality of stacks each formed by a plurality of different layers, thereby defining a pattern in the form of spaced-apart metal regions. The method is capable of locating at least one of residues, erosion and dishing conditions on the article. At least one predetermined site on the article is selected for control. This at least one predetermined site is illuminated, and spectral characteristics of light components reflected from this location are detected. Data representative of the detected light components is analyzed for determining at least one parameter of the article within the at least one illuminated site.

Abstract translation: 提出了一种用于光学控制由应用于具有图案化区域的制品的抛光工具执行的化学机械平面化（CMP）工艺的质量的方法。 该物品包含多个由多个不同层形成的堆叠，从而限定了间隔金属区域形式的图案。 该方法能够定位物品上的残留物，侵蚀和凹陷条件中的至少一种。 选择物品上至少一个预定的位置进行控制。 该至少一个预定位置被照亮，并且检测从该位置反射的光分量的光谱特性。 分析表示检测到的光成分的数据，以确定至少一个照明部位内的物品的至少一个参数。

公开(公告)号：US20060102830A1

公开(公告)日：2006-05-18

申请号：US11271773

申请日：2005-11-14

Applicant: Boaz Brill ,  Moshe Finarov ,  David Scheiner

Inventor： Boaz Brill ,  Moshe Finarov ,  David Scheiner

IPC: H01J40/14 ,  G02F1/01 ,  G01N21/86

CPC classification number: G03F7/70633 ,  G01B11/14 ,  G01B11/27 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/956 ,  H01L22/12

Abstract: Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements comprise at least two measurements with different polarization states of incident light, each measurement including illuminating eh measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between eth diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.

公开(公告)号：US20100214566A1

公开(公告)日：2010-08-26

申请号：US12775883

申请日：2010-05-07

Applicant: Boaz Brill ,  Moshe Finarov ,  David Scheiner

Inventor： Boaz Brill ,  Moshe Finarov ,  David Scheiner

IPC: G01B11/00 ,  H01L23/544

CPC classification number: G03F7/70633 ,  G01B11/14 ,  G01B11/27 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/956 ,  H01L22/12

Abstract: Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements include at least two measurements with different polarization states of incident light, each measurement including illuminating the measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between the diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.

Abstract translation: 通过对样品中的测量部位进行光学测量来控制多层样品的制造期间层的对准。 测量部位包括两个分别位于两个不同层之间的衍射结构。 光学测量包括具有不同入射光偏振态的至少两次测量，每个测量包括照亮测量位置，以便通过另一个照射衍射结构之一。 测量部位的衍射特性表示衍射结构之间的横向偏移。 对入射光的不同极化状态分析检测的衍射特性，以确定层之间现有的横向偏移。

公开(公告)号：US07292341B2

公开(公告)日：2007-11-06

申请号：US10525568

申请日：2003-05-08

Applicant: Boaz Brill ,  Moshe Finarov ,  David Scheiner

Inventor： Boaz Brill ,  Moshe Finarov ,  David Scheiner

IPC: G01N21/55 ,  G01N21/00

CPC classification number: G01N21/55

Abstract: An optical system for use in measurements in a sample comprising a light source (102) operable to produce an incident light beam propagating in a certain direction towards the sample (S) through an illumination channel (IC), a detector unit (104) for collecting light coming from the sample through a detection channel (DC), and generating data indicative of the collected light, a light directing assembly (106) operable to direct the incident beam onto a certain location on the sample's plane with a plurality of incident angles, and to direct light returned from the illuminated location to the detector unit (104), the light directing assembly (106) comprising a plurality of beam deflector elements (108 A-D), at least one of the deflector elements being movable and position of said at least one movable deflector element defining one of the selected incident angles.

Abstract translation: 一种用于样品测量的光学系统，包括可操作以产生通过照明通道（IC）向特定方向向样品（S）传播的入射光束的光源（102），用于 收集来自样品的光通过检测通道（DC）并产生指示所收集的光的数据;导光组件（106），其可操作以将入射光束以多个入射角度引导到样品平面上的特定位置 ，并且将从所述照明位置返回的光引导到所述检测器单元（104），所述光引导组件（106）包括多个光束偏转元件（108AD），所述偏转元件中的至少一个可移动并且所述 限定所选入射角中的一个的至少一个可移动偏转元件。

公开(公告)号：US06974962B2

公开(公告)日：2005-12-13

申请号：US10257544

申请日：2001-09-20

Applicant: Boaz Brill ,  Moshe Finarov ,  David Scheiner

Inventor： Boaz Brill ,  Moshe Finarov ,  David Scheiner

IPC: H01L21/66 ,  G01N21/86

CPC classification number: G03F7/70633 ,  G01B11/14 ,  G01B11/27 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/956 ,  H01L22/12

Abstract: The method for controlling layers alignment in a multi-layer sample (10), such a semiconductors wafer based on detecting a diffraction efficiency of radiation diffracted from the patterned structures (12, 14) located one above the other in two different layers of the sample.

Abstract translation: 用于控制多层样品（10）中的层对准的方法，这种半导体晶片基于检测从图案化结构（12,14）衍射的辐射的衍射效率，所述图案化结构（12,14）在样品的两个不同层中彼此上下 。

公开(公告)号：US06801315B2

公开(公告)日：2004-10-05

申请号：US10303052

申请日：2002-11-25

Applicant: Moshe Finarov ,  David Scheiner

Inventor： Moshe Finarov ,  David Scheiner

IPC: G01B1127

CPC classification number: G03F7/70633

Abstract: An optical measurement method and system are presented for imaging two target structures in two parallel layers, respectively, of a sample, to enable determination of a registration between the two target structures along two mutually perpendicular axes of the layer. The sample is illuminated with incident radiation to produce a radiation response of the sample. The radiation response is collected by an objective lens arrangement, and the collected radiation response is split into two spatially separated radiation components. The split radiation components are directed towards at least one imaging plane along different optical channels characterized by optical paths of different lengths, respectively. The two split radiation components are detected in said at least one imaging plane, and two image parts are thereby acquired, each image part containing images of the two target structures. This enables determination of the relative distance between the two target structures.

Abstract translation: 提出了一种光学测量方法和系统，用于分别对样本的两个平行层中的两个目标结构进行成像，以便能够沿着该层的两个相互垂直的轴确定两个目标结构之间的配准。 用入射辐射照射样品以产生样品的辐射响应。 辐射响应由物镜布置收集，并且收集的辐射响应被分成两个空间上分离的辐射分量。 分裂的辐射分量被引导到沿着不同长度的光路的不同光通道的至少一个成像平面。 在所述至少一个成像平面中检测到两个分离的辐射分量，从而获得两个图像部分，每个图像部分包含两个目标结构的图像。 这使得能够确定两个目标结构之间的相对距离。

公开(公告)号：US06292265B1

公开(公告)日：2001-09-18

申请号：US09326665

申请日：1999-06-07

Applicant: Moshe Finarov ,  David Scheiner ,  Avi Ravid

Inventor： Moshe Finarov ,  David Scheiner ,  Avi Ravid

IPC: G01B1106

CPC classification number: H01L22/34 ,  B24B37/013 ,  B24B49/02 ,  B24B49/12 ,  H01L21/67253 ,  H01L22/12 ,  H01L22/26

Abstract: A method is presented for optical control of the quality of a process of chemical mechanical planarization (CMP) performed by a polishing tool applied to an article having a patterned area. The article contains a plurality of stacks each formed by a plurality of different layers, thereby defining a pattern in the form of spaced-apart metal regions. The method is capable of locating at least one of residues, erosion and dishing conditions on the article. At least one predetermined site on the article is selected for control. This at least one predetermined site is illuminated, and spectral characteristics of light components reflected from this location are detected. Data representative of the detected light components is analyzed for determining at least one parameter of the article within the at least one illuminated site.

Abstract translation: 提出了一种用于光学控制由应用于具有图案化区域的制品的抛光工具执行的化学机械平面化（CMP）工艺的质量的方法。 该物品包含多个由多个不同层形成的堆叠，从而限定了间隔金属区域形式的图案。 该方法能够定位物品上的残留物，侵蚀和凹陷条件中的至少一种。 选择物品上至少一个预定的位置进行控制。 该至少一个预定位置被照亮，并且检测从该位置反射的光分量的光谱特性。 分析表示检测到的光成分的数据，以确定至少一个照明部位内的物品的至少一个参数。