公开(公告)号：US20070115453A1

公开(公告)日：2007-05-24

申请号：US11653835

申请日：2007-01-17

申请人： Derek Coon ,  Andrew Hazelton

发明人： Derek Coon ,  Andrew Hazelton

IPC分类号： G03B27/32

CPC分类号： G03F7/70341 ,  G03F7/2041 ,  G03F7/70808

摘要： A pattern formation method includes the steps of forming a resist film on a substrate, performing pattern exposure by selectively irradiating the resist film with exposing light with a liquid provided on the resist film, and forming a resist pattern by developing the resist film after the pattern exposure. An electric field or a magnetic is applied to the liquid in the step of performing pattern exposure.

摘要翻译： 图案形成方法包括以下步骤：在基板上形成抗蚀剂膜，通过用设置在抗蚀剂膜上的液体曝光来选择性地照射抗蚀剂膜，进行图案曝光，以及通过在图案之后显影抗蚀剂膜形成抗蚀剂图案 曝光。 在进行图案曝光的步骤中，对液体施加电场或磁场。

公开(公告)号：US20070268468A1

公开(公告)日：2007-11-22

申请号：US11878547

申请日：2007-07-25

申请人： Derek Coon ,  Andrew Hazelton

发明人： Derek Coon ,  Andrew Hazelton

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/2041 ,  G03F7/70808

摘要： An immersion lithography apparatus includes an optical member, a gap defined between the optical member and a surface disposed opposite the optical member, a fluid-supplying device which provides an immersion liquid to the gap, and a field generator which generates a magnetic field or an electric field such that the immersion liquid is subjected to the magnetic or electric field generated by the field generator.

摘要翻译： 浸没式光刻设备包括光学构件，在光学构件和与光学构件相对设置的表面之间限定的间隙，向间隙提供浸没液体的流体供应装置和产生磁场的场发生器， 电场使得浸没液体受到场发生器产生的磁场或电场的影响。

公开(公告)号：US20070263184A1

公开(公告)日：2007-11-15

申请号：US11878540

申请日：2007-07-25

申请人： Derek Coon ,  Andrew Hazelton

发明人： Derek Coon ,  Andrew Hazelton

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/2041 ,  G03F7/70808

摘要： An immersion lithography apparatus includes an optical member, a gap defined between the optical member and a surface disposed opposite the optical member being filled with an immersion liquid, and a fluid control device including a gas outlet through which a gas is supplied to prevent the immersion liquid from entering a surround area external to an exposure area. A flow velocity of the gas supplied from the gas outlet depends on a contact angle between the immersion liquid and the surface.

摘要翻译： 浸没式光刻设备包括光学构件，限定在光学构件和与填充有浸没液体的光学构件相对设置的表面之间的间隙，以及包括气体出口的流体控制装置，通过该气体出口供应气体以防止浸没 液体进入暴露区域外部的环绕区域。 从气体出口供给的气体的流速取决于浸没液体和表面之间的接触角。

公开(公告)号：US20060023184A1

公开(公告)日：2006-02-02

申请号：US11237650

申请日：2005-09-29

申请人： Derek Coon ,  Andrew Hazelton

发明人： Derek Coon ,  Andrew Hazelton

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/2041 ,  G03F7/70808

摘要： A fluid control system for immersion lithography that uses an optical member such as a lens, a workpiece such as a semiconductor wafer with a surface disposed opposite to the optical member with a gap in between, includes a fluid-supplying device for providing an immersion fluid such as water to a specified exposure area in the gap, and a fluid control device that activates a force on the fluid so that the immersion fluid is retained in the exposure area and its vicinity at least while the immersion lithography operation is being carried out. A pressured gas may be caused to apply a hydrodynamic force on the fluid to keep it in its place.

摘要翻译： 一种用于浸没式光刻的流体控制系统，其使用诸如透镜的光学构件，诸如半导体晶片的工件，具有与光学构件相对的表面设置在其间的间隙，所述液体控制系统包括用于提供浸液的流体供应装置 例如水到间隙中的指定曝光区域;以及流体控制装置，其至少在进行浸没光刻操作时，激活流体上的力，使得浸没流体保持在曝光区域及其附近。 可能导致加压气体对流体施加流体动力以将其保持在其位置。

公开(公告)号：US08102501B2

公开(公告)日：2012-01-24

申请号：US11878547

申请日：2007-07-25

申请人： Derek Coon ,  Andrew J Hazelton

发明人： Derek Coon ,  Andrew J Hazelton

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/2041 ,  G03F7/70808

摘要： An immersion lithography apparatus includes an optical member, a gap defined between the optical member and a surface disposed opposite the optical member, a fluid-supplying device which provides an immersion liquid to the gap, and a field generator which generates a magnetic field or an electric field such that the immersion liquid is subjected to the magnetic or electric field generated by the field generator.

摘要翻译： 浸没式光刻设备包括光学构件，在光学构件和与光学构件相对设置的表面之间限定的间隙，向间隙提供浸没液体的流体供应装置和产生磁场的场发生器， 电场使得浸没液体受到场发生器产生的磁场或电场的影响。

公开(公告)号：US08068209B2

公开(公告)日：2011-11-29

申请号：US12073783

申请日：2008-03-10

申请人： Alex Ka Tim Poon ,  Leonard Wai Fung Kho ,  Guarav Keswani ,  Derek Coon

发明人： Alex Ka Tim Poon ,  Leonard Wai Fung Kho ,  Guarav Keswani ,  Derek Coon

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70341

摘要： An immersion lithography tool with a diverter element, positioned between the immersion element and the substrate, for altering the “footprint” or shape of the meniscus of the body of immersion liquid between the last optical element and an immersion element on one side, and the substrate on the other side when the substrate is moved. The apparatus includes a substrate holder to hold the substrate having an imaging surface and a projection optical system having a last optical element. The projection optical system projects an image onto a target imaging area on the substrate through the immersion liquid filled in a gap between the imaging surface of the substrate and the last optical element. An immersion element maintains the immersion fluid in the gap. The diverter element is positioned between the immersion element and the substrate. The diverter element alters the footprint shape of the meniscus of the body of immersion liquid, thereby preventing or reducing the amount of leakage from a space between the substrate and the immersion element.

摘要翻译： 浸没式光刻工具，其具有位于浸没元件和基底之间的转向元件，用于改变在最后的光学元件与一侧的浸没元件之间的浸没液体的弯液面的“占地”或形状，以及 当基板移动时在另一侧的基板。 该装置包括用于保持具有成像表面的基板的基板保持器和具有最后光学元件的投影光学系统。 投影光学系统通过填充在基板的成像表面和最后一个光学元件之间的间隙中的浸渍液体将图像投影到基板上的目标成像区域上。 浸没元件将浸没液保持在间隙中。 分流器元件位于浸没元件和基底之间。 分流器元件改变浸没液体的弯液面的足迹形状，从而防止或减少从基板和浸没元件之间的空间的泄漏量。

公开(公告)号：US07745079B2

公开(公告)日：2010-06-29

申请号：US11373398

申请日：2006-03-09

申请人： Derek Coon

发明人： Derek Coon

IPC分类号： G03C5/00 ,  G03B27/52 ,  F26B5/04

CPC分类号： G03F7/70933 ,  G03F7/70875 ,  G03F7/70916

摘要： Embodiments disclosed herein relate to an apparatus for and method of protecting a reticle in a lithography system from particle deposition using thermophoresis, but still allowing a high vacuum area for the photo-optics.

摘要翻译： 本文公开的实施例涉及一种用于保护光刻系统中的掩模版的装置和方法，其不使用热泳法进行颗粒沉积，而是仍允许光学光学的高真空区域。

公开(公告)号：US07591561B2

公开(公告)日：2009-09-22

申请号：US11382342

申请日：2006-05-09

申请人： Alton H. Phillips ,  Derek Coon ,  Douglas C. Watson

发明人： Alton H. Phillips ,  Derek Coon ,  Douglas C. Watson

IPC分类号： G02B5/08

CPC分类号： G02B5/10 ,  G02B7/1815 ,  G03F7/70783 ,  G03F7/70891 ,  G03F7/70983 ,  G21K1/06 ,  G21K2201/065

摘要： Methods and apparatus for internally or directly cooling a mirror using a fluid with laminar flow properties are disclosed. According to one aspect of the present invention, an internally cooled mirror includes an optical surface that absorbs light, and at least one microchannel formed beneath the optical surface. The mirror also includes a port that supplied a fluid to the microchannel. The fluid is subjected to a laminar flow and absorbs heat associated with the absorbed light.

摘要翻译： 公开了使用具有层流性质的流体内部或直接冷却反射镜的方法和装置。 根据本发明的一个方面，内部冷却镜包括吸收光的光学表面和形成在光学表面下方的至少一个微通道。 镜子还包括向微通道供应流体的端口。 流体经受层流并吸收与吸收的光相关的热量。

公开(公告)号：US20090075211A1

公开(公告)日：2009-03-19

申请号：US12292251

申请日：2008-11-14

申请人： Derek Coon ,  Andrew J. Hazelton

发明人： Derek Coon ,  Andrew J. Hazelton

IPC分类号： G03F7/20 ,  G03B27/52 ,  G03B27/32

CPC分类号： G03F7/70341 ,  G03F7/2041 ,  G03F7/70808

摘要： An immersion lithography apparatus includes an optical member, a gap defined between the optical member and a surface disposed opposite the optical member being filled with an immersion liquid, and a fluid control device including a gas outlet through which a gas is supplied to prevent the immersion liquid from entering a surround area external to an exposure area. A flow velocity of the gas supplied from the gas outlet depends on a contact angle between the immersion liquid and the surface.

摘要翻译： 浸没式光刻设备包括光学构件，限定在光学构件和与填充有浸没液体的光学构件相对设置的表面之间的间隙，以及包括气体出口的流体控制装置，通过该气体出口供应气体以防止浸没 液体进入暴露区域外部的环绕区域。 从气体出口供给的气体的流速取决于浸没液体和表面之间的接触角。

公开(公告)号：US20080094590A1

公开(公告)日：2008-04-24

申请号：US11794814

申请日：2005-05-18

申请人： Derek Coon

发明人： Derek Coon

IPC分类号： G03B27/52

CPC分类号： G03F7/70808 ,  G03F7/70341

摘要： A substrate processing apparatus includes a device for partially sealing a gap between a final optical element (22) of a projection lens (14) and an immersion nozzle (20). In one embodiment, the apparatus includes a table configured to support a substrate (16); a patterning element defining a pattern (12); a projection system configured to project the pattern onto the substrate (16), the projection system having a last optical element (22); a gap between the substrate and the last optical element; an immersion element configured to maintain immersion fluid in the gap; and a first seal (102) positioned between the projection system and the immersion element. The first seal (104) is configured to substantially prevent immersion fluid from exiting the space between the projection system and the immersion element.

摘要翻译： 基板处理装置包括用于部分地密封投影透镜（14）的最终光学元件（22）与浸没喷嘴（20）之间的间隙的装置。 在一个实施例中，该装置包括配置成支撑衬底（16）的工作台; 限定图案（12）的图案形成元件; 投影系统，被配置为将所述图案投影到所述基板（16）上，所述投影系统具有最后的光学元件（22）; 衬底和最后一个光学元件之间的间隙; 浸没元件，被配置为将浸没流体保持在间隙中; 以及位于投影系统和浸没元件之间的第一密封件（102）。 第一密封件（104）构造成基本上防止浸没流体离开投影系统和浸没元件之间的空间。