摘要:
Electrostatic chucks and methods of manufacturing the same are provided herein. In some embodiments, an electrostatic chuck comprises an electrically conductive body having one or more channels formed in an upper surface thereof; a plate positioned within the one or more channels to define one or more plenums between the body and the plate, wherein the surfaces of the plenum are anodized; one or more fluid passages disposed in the plate and fluidly coupling the one or more plenums to the upper surface of the body, wherein the surfaces of the fluid passages are electrically insulated; and a dielectric layer disposed over the upper surface of the body and the plate, wherein the dielectric layer forms a support surface for a substrate to be disposed thereon.
摘要:
Electrostatic chucks and methods of manufacturing the same are provided herein. In some embodiments, an electrostatic chuck comprises an electrically conductive body having one or more channels formed in an upper surface thereof; a plate positioned within the one or more channels to define one or more plenums between the body and the plate, wherein the surfaces of the plenum are anodized; one or more fluid passages disposed in the plate and fluidly coupling the one or more plenums to the upper surface of the body, wherein the surfaces of the fluid passages are electrically insulated; and a dielectric layer disposed over the upper surface of the body and the plate, wherein the dielectric layer forms a support surface for a substrate to be disposed thereon.
摘要:
The present invention relates to the compounds generating strong acids (described hereafter as “acid generators”) decomposed by heat and the composition of thin film containing the same. Provided are the compounds represented by the structure of formula I and the composition containing the compounds. wherein X is alkyl or aryl group and R is hydrogen atom, hydroxy, alkoxy or alkyl group. The abovementioned acid generators of the present invention generate acid by heat at relatively low temperatures, preventing the change in the ratio of the composition due to evaporation of some components in the composition. Accordingly, it has the advantageous effect that the ratio of components in the composition is controlled and the preparation of the thin film with the wanted properties is simplified.
摘要:
Provided are an integrated authentication method and an integrated authentication server. The integrated authentication method using the integrated authentication server includes receiving integrated authentication request information and a company code for password authentication by the integrated authentication server, requesting a serial number of a predetermined authentication device and determining whether the received company code is identical to a provider company code in response to the received serial number, if the received company code is identical to the provider company code, requesting generation of a test password and determining whether a received test password is identical to a reference password, and if the test password is identical to the reference password, approving password authentication using the authentication device at a provider company corresponding to the provider company code. The integrated authentication method and the integrated authentication server enable all types of financial trades and e-commerce using a single authentication device authenticated by the integrated authentication server and allow the authentication device to avoid the risk of hacking. Moreover, companies commonly bear an authentication fee for the authentication device, thereby promoting the spread and utilization of the authentication device.
摘要:
A positive chemical amplified photoresist composition comprising as a matrix resin a polymer having the repeating unit of Formula (I) and a photoacid generator. The polymer ranges, in polystyrene-reduced weight average molecular weight, from about 2,000 to 1,000,000. The photoresist composition is possible to develop in alkali and shows excellent sensitivity, resolution and transmissivity to deep uv light in addition to being superior in storage preservativity. The repeating unit is: ##STR1## wherein, R.sub.1, R.sub.2 and R.sub.3 are independently represented by a hydrogen atom or a methyl group; R.sub.4 is a hydrogen atom, an alkyl group or an alkoxy group; R.sub.5, R.sub.6 and R.sub.7 are independently represented by a hydrogen atom, a methyl group, an ethyl group, a t-butyl group, a tetrahydropyranyl group or an alkoxymethylene group; j is an integer of 1-8; k is an integer of 0-8; and l, m and n each represent a mole ratio, satisfying the condition of 1=0.1.about.0.5/l+m+n, m=0.3.about.0.8/l+m+n, n=0.1.about.0.4/l+m+n and l+m+n+l. The acid labile protective group can be the t-butyl group, the tetrahydropyranyl group or the alkoxymethylene group.
摘要翻译:一种正性化学放大光致抗蚀剂组合物,其包含作为基质树脂的具有式(I)的重复单元的聚合物和光酸产生剂。 聚苯乙烯换算的聚合物的重均分子量范围为约2,000至1,000,000。 光致抗蚀剂组合物可以在碱中显影,并且除了具有优异的储存保存性之外,对深紫外光具有优异的灵敏度,分辨率和透射率。 重复单元是:其中,R1,R2和R3独立地由氢原子或甲基表示; R4是氢原子,烷基或烷氧基; R5,R6和R7独立地由氢原子,甲基,乙基,叔丁基,四氢吡喃基或烷氧基亚甲基表示; j为1-8的整数; k是0-8的整数; l,m和n各自表示摩尔比,满足条件1 = 0.1 DIFFERENCE 0.5 / l + m + n,m = 0.3差异0.8 / l + m + n,n = 0.1差异0.4 / l + n和l + m + n + 1。 酸不稳定保护基可以是叔丁基,四氢吡喃基或烷氧基亚甲基。
摘要:
This invention relates to a chemically amplified positive photoresist composition comprising a multi copolymer copolymer whose repeating units is represented by the following formula I, a low molecular additive represented by the following formula 2 or 3, an acid generator and a solvent wherein the repeating units comprising X and Y are independent monomers, respectively, selected from the group consisting of the following formulae (II), (III) and (IV):
摘要:
This invention relates to novel carboxylic acid derivatives represented by the following formula I and their synthesis: wherein, R1 is an hydrogen atom, an alkyl group or an alkoxy group of 1 to 20 carbon atoms in a linear, branched or cyclic form; R2 is a carboxy group of 1 to 40 carbon atoms in a linear, branched or cyclic form which is unsubstituted, or substituted into a hydroxy group, an ester group and an ether group. The novel carboxylic acid derivatives are more easily decomposed by acid than t-butyl ester compounds but are not dissolved in basic aqueous solution. According to this invention, carboxylic acid is under condensation with halogen compounds designed to prepare a larger monomolecular compound compared to the conventional method. Further, the condensed site is easily decomposed by acid but is extremely insoluble by basic aqueous solution. The carboxylic acid derivatives in a photoresist composition function not only as a dissolution promoter in the exposed area due to formation of the carboxylic acid, thus enhancement of etching resistance and pattern profile in a resist.
摘要:
This invention relates to a copolymer for the manufacture of chemical amplified photoresist and a chemical amplified positive photoresist composition comprising a copolymer for the manufacture of chemical amplified photoresist as a base resin, as represented by the following formula 1, an acid generator and additive, Wherein, R1, R2, R3 and R4 are independently a hydrogen atom or a lower alkyl group; R5, R6, R7 and R8 are a hydrogen atom, an alkyl group of C1-8, an alkoxy group, an alkoxycarbonyl group or a halogen atom; h and i are independently an integer of 0-8; k, l, m and n represent an integer of element units provided that 0.3