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    METHODS AND SYSTEMS FOR CREATING OR PERFORMING A DYNAMIC SAMPLING SCHEME FOR A PROCESS DURING WHICH MEASUREMENTS ARE PERFORMED ON WAFERS
    3.
    发明申请
    METHODS AND SYSTEMS FOR CREATING OR PERFORMING A DYNAMIC SAMPLING SCHEME FOR A PROCESS DURING WHICH MEASUREMENTS ARE PERFORMED ON WAFERS 有权
    用于创建或执行测量过程中的过程的动态采样方案的方法和系统

    公开(公告)号：US20080286885A1

    公开(公告)日：2008-11-20

    申请号：US12107346

    申请日：2008-04-22

    申请人： Pavel Izikson ,  John Robinson ,  Mike Adel ,  Amir Widmann ,  Dongsub Choi ,  Anat Marchelli

    发明人： Pavel Izikson ,  John Robinson ,  Mike Adel ,  Amir Widmann ,  Dongsub Choi ,  Anat Marchelli

    IPC分类号： G06F19/00 ,  H01L21/66

    CPC分类号： G05B21/02 ,  G03F7/70508 ,  G03F7/70625 ,  G03F7/70633

    摘要： Various methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers are provided. One method for creating a dynamic sampling scheme for a process during which measurements are performed on wafers includes performing the measurements on all of the wafers in at least one lot at all measurement spots on the wafers. The method also includes determining an optimal sampling scheme, an enhanced sampling scheme, a reduced sampling scheme, and thresholds for the dynamic sampling scheme for the process based on results of the measurements. The thresholds correspond to values of the measurements at which the optimal sampling scheme, the enhanced sampling scheme, and the reduced sampling scheme are to be used for the process.

    摘要翻译： 提供了用于创建或执行在晶片上执行测量的过程的动态采样方案的各种方法和系统。 用于为在晶片上进行测量的过程创建动态采样方案的一种方法包括在晶片上的所有测量点处对至少一批中的所有晶片执行测量。 该方法还包括基于测量结果确定用于该过程的动态采样方案的最佳采样方案，增强采样方案，减少采样方案和阈值。 阈值对应于最佳采样方案，增强采样方案和减少采样方案将用于该过程的测量值。

    Methods and Systems for Creating or Performing a Dynamic Sampling Scheme for a Process During Which Measurements Are Performed on Wafers
    5.
    发明申请
    Methods and Systems for Creating or Performing a Dynamic Sampling Scheme for a Process During Which Measurements Are Performed on Wafers 有权
    用于创建或执行在晶圆上执行测量的过程的动态采样方案的方法和系统

    公开(公告)号：US20120208301A1

    公开(公告)日：2012-08-16

    申请号：US13457383

    申请日：2012-04-26

    申请人： Pavel Izikson ,  John Robinson ,  Mike Adel ,  Amir Widmann ,  Dongsub Choi ,  Anat Marchelli

    发明人： Pavel Izikson ,  John Robinson ,  Mike Adel ,  Amir Widmann ,  Dongsub Choi ,  Anat Marchelli

    IPC分类号： H01L21/66 ,  G06F19/00

    CPC分类号： G05B21/02 ,  G03F7/70508 ,  G03F7/70625 ,  G03F7/70633

    摘要： Various methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers are provided. One method for creating a dynamic sampling scheme for a process during which measurements are performed on wafers includes performing the measurements on all of the wafers in at least one tot at all measurement spots on the wafers. The method also includes determining an optimal sampling scheme, an enhanced sampling scheme, a reduced sampling scheme, and thresholds for the dynamic sampling scheme for the process based on results of the measurements. The thresholds correspond to values of the measurements at which the optimal sampling scheme, the enhanced sampling scheme, and the reduced sampling scheme are to be used for the process.

    摘要翻译： 提供了用于创建或执行在晶片上执行测量的过程的动态采样方案的各种方法和系统。 用于为在晶片上进行测量的过程创建动态采样方案的一种方法包括在晶片上的所有测量点处以至少一个tot对所有晶片进行测量。 该方法还包括基于测量结果确定用于该过程的动态采样方案的最佳采样方案，增强采样方案，减少采样方案和阈值。 阈值对应于最佳采样方案，增强采样方案和减少采样方案将用于该过程的测量值。

    Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers
    9.
    发明授权
    Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers 有权
    用于为晶片执行测量的过程创建或执行动态采样方案的方法和系统

    公开(公告)号：US08175831B2

    公开(公告)日：2012-05-08

    申请号：US12107346

    申请日：2008-04-22

    申请人： Pavel Izikson ,  John Robinson ,  Mike Adel ,  Amir Widmann ,  Dongsub Choi ,  Anat Marchelli

    发明人： Pavel Izikson ,  John Robinson ,  Mike Adel ,  Amir Widmann ,  Dongsub Choi ,  Anat Marchelli

    IPC分类号： G01N37/00

    CPC分类号： G05B21/02 ,  G03F7/70508 ,  G03F7/70625 ,  G03F7/70633

    摘要： Various methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers are provided. One method for creating a dynamic sampling scheme for a process during which measurements are performed on wafers includes performing the measurements on all of the wafers in at least one lot at all measurement spots on the wafers. The method also includes determining an optimal sampling scheme, an enhanced sampling scheme, a reduced sampling scheme, and thresholds for the dynamic sampling scheme for the process based on results of the measurements. The thresholds correspond to values of the measurements at which the optimal sampling scheme, the enhanced sampling scheme, and the reduced sampling scheme are to be used for the process.

    摘要翻译： 提供了用于创建或执行在晶片上执行测量的过程的动态采样方案的各种方法和系统。 用于为在晶片上进行测量的过程创建动态采样方案的一种方法包括在晶片上的所有测量点处对至少一批中的所有晶片进行测量。 该方法还包括基于测量结果确定用于该过程的动态采样方案的最佳采样方案，增强采样方案，减少采样方案和阈值。 阈值对应于最佳采样方案，增强采样方案和减少采样方案将用于该过程的测量值。