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    CLEANING FORMULATION
    1.
    发明申请
    CLEANING FORMULATION 有权

    公开(公告)号：US20250043213A1

    公开(公告)日：2025-02-06

    申请号：US18718877

    申请日：2021-12-14

    Applicant: Dow Global Technologies LLC

    Inventor： Qi Jiang ,  Edward D. Daugs ,  Meijia He

    IPC: C11D3/20 ,  C11D3/30 ,  C11D17/00

    Abstract: A glycol ether-containing water-based composition useful for cleaning contaminants present on the surface of a substrate, such as the surface of a printed circuit board during the manufacturing process of the printed circuit board, the contaminants including for example, solder flux and photoresist on the printed circuit board; the glycol ether-containing water-based composition including: (a) at least one glycol ether having a high boiling point and a low VOC; (b) at least one organic amine; (c) at least one surfactant; and (d) water; a process for producing the above glycol ether-containing water-based composition; and a process for cleaning a printed circuit board using the above glycol ether-containing water-based composition.

    ISOLATION OF DIALKYLENE PHENOLIC GLYCOL ETHER
    4.
    发明申请
    ISOLATION OF DIALKYLENE PHENOLIC GLYCOL ETHER 有权

    公开(公告)号：US20240376034A1

    公开(公告)日：2024-11-14

    申请号：US18686783

    申请日：2022-08-24

    Applicant: Dow Global Technologies LLC

    Inventor： Edward D. Daugs

    IPC: C07C41/40

    Abstract: The present disclosure provides a method for isolating dialkylene phenolic glycol ether (DPGE) from a mixture that includes DPGE and glycosylated phenol impurities. The method includes adding a source of an alkali metal to the mixture to form a phenolic glycol product having an alkali phenolic salt formed from a reaction between the alkali metal and the glycosylated phenol impurities; and separating the DPGE from the alkali phenolic salt in the phenolic glycol product through a thin film evaporation process to produce a dialkylene phenolic glycol ether product. The disclosure also includes a phenolic glycol product that includes DPGE; water; glycosylated phenol impurities; a source of alkali metal; and an alkali phenolic salt formed from a reaction between the alkali metal and the glycosylated phenol impurities.

    DISPERSANT SUITABLE FOR LUBRICANT FORMULATIONS
    8.
    发明申请
    DISPERSANT SUITABLE FOR LUBRICANT FORMULATIONS 审中-公开
    适用于润滑剂配方的分散剂

    公开(公告)号：US20170073603A1

    公开(公告)日：2017-03-16

    申请号：US15124871

    申请日：2015-03-18

    Applicant: DOW GLOBAL TECHNOLOGIES LLC

    Inventor： Cynthia Pierre ,  Edward D. Daugs ,  Paul R. Elowe

    IPC: C10M133/40 ,  C10M133/10 ,  C10M133/14 ,  C10M133/08

    CPC classification number: C10M133/40 ,  C10M133/08 ,  C10M133/10 ,  C10M133/14 ,  C10M2215/042 ,  C10M2215/044 ,  C10M2215/221 ,  C10N2220/021 ,  C10N2230/04 ,  C10N2240/10

    Abstract: A dispersant includes the reaction product of an amine and at least one equivalent of glycidyl ether where the amine is selected from a group consisting of aminoethylpiperazine, bis(2-(piperazin-1-yl)ethyl)amine, 4,4′-methylenebiscyclohexylamine, m-xylenediamine, diethylenetriamine, and triethylenetetramine and where the glycidyl ether has the structure (A), where R is selected from aromatic carbon chains, non-aromatic carbon chains and polyalkylene glycol groups. The dispersant is useful in a lubricant with a base oil for increasing soot dispersibility of the lubricant.

    Abstract translation: 分散剂包括胺和至少一当量缩水甘油醚的反应产物，其中胺选自氨基乙基哌嗪，双（2-（哌嗪-1-基）乙基）胺，4,4'-亚甲基双环己基胺 ，间二甲苯胺和二亚乙基三胺和三亚乙基四胺，其中缩水甘油醚具有结构（A），其中R选自芳族碳链，非芳族碳链和聚亚烷基二醇基团。 分散剂可用于具有增加润滑剂的烟灰分散性的基础油的润滑剂中。

    MAKING ETHYLENEDIAMINETETRAACETIC ACID
    9.
    发明申请
    MAKING ETHYLENEDIAMINETETRAACETIC ACID 有权

    公开(公告)号：US20220234993A1

    公开(公告)日：2022-07-28

    申请号：US17603846

    申请日：2020-06-03

    Applicant: Dow Global Technologies LLC ,  Dow Silicones Corporation

    Inventor： Deboleena Chakraborty ,  Edward D. Daugs ,  Kenneth E. Stockman ,  Ronald Peterson

    IPC: C07C227/02 ,  C07C255/25

    Abstract: Provided is a method of making ethylenediaminetetraacetic acid (EDTA) comprising the steps: (a) providing a reaction mixture (a) comprising ethylenediamine (EDA) and glycolonitrile (GN), wherein reaction mixture (a) comprises 0% to 0.1% by weight, based on the weight of reaction mixture (a), of any base having pKa of the conjugate acid (PKaH) of 13 or higher; (b) causing or allowing reaction mixture (a) to react to form a dinitrile (DN) compound; (c) bringing the DN into contact with aqueous solution of a base having pKaH of 11 or higher, and causing or allowing the resulting mixture to react to form a diacid compound (DA); (d) causing or allowing the DA to react, either sequentially or simultaneously, with additional GN to form products (Pd); (e) causing or allowing products (Pd) to react with a base having pKaH of 11 or higher, to form EDTA. Also provided is a composition comprising a diacid/dinitrile compound (DADN) wherein each —R has the structure:

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